JP5932820B2 - 光学装置の表面処理プロセス及びそれによって製造される防汚性物品 - Google Patents
光学装置の表面処理プロセス及びそれによって製造される防汚性物品 Download PDFInfo
- Publication number
- JP5932820B2 JP5932820B2 JP2013538810A JP2013538810A JP5932820B2 JP 5932820 B2 JP5932820 B2 JP 5932820B2 JP 2013538810 A JP2013538810 A JP 2013538810A JP 2013538810 A JP2013538810 A JP 2013538810A JP 5932820 B2 JP5932820 B2 JP 5932820B2
- Authority
- JP
- Japan
- Prior art keywords
- surface treatment
- group
- substrate
- groups
- combinations
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G06—COMPUTING OR CALCULATING; COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/14—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/22—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
- C08G77/24—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen halogen-containing groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/48—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/48—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms
- C08G77/50—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms by carbon linkages
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/48—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms
- C08G77/54—Nitrogen-containing linkages
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Theoretical Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Human Computer Interaction (AREA)
- Paints Or Removers (AREA)
- Polyethers (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US41213410P | 2010-11-10 | 2010-11-10 | |
| US61/412,134 | 2010-11-10 | ||
| PCT/US2011/059576 WO2012064649A1 (en) | 2010-11-10 | 2011-11-07 | Optical device surface treatment process and smudge-resistant article produced thereby |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2014502210A JP2014502210A (ja) | 2014-01-30 |
| JP2014502210A5 JP2014502210A5 (enExample) | 2014-12-18 |
| JP5932820B2 true JP5932820B2 (ja) | 2016-06-08 |
Family
ID=45003083
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013538810A Expired - Fee Related JP5932820B2 (ja) | 2010-11-10 | 2011-11-07 | 光学装置の表面処理プロセス及びそれによって製造される防汚性物品 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20130229378A1 (enExample) |
| EP (1) | EP2638116B1 (enExample) |
| JP (1) | JP5932820B2 (enExample) |
| CN (1) | CN103221497B (enExample) |
| WO (1) | WO2012064649A1 (enExample) |
Families Citing this family (38)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105917266A (zh) * | 2013-11-14 | 2016-08-31 | 瑞士艾发科技 | 用于防指纹涂层的退火的设备和过程 |
| WO2015142561A1 (en) * | 2014-03-17 | 2015-09-24 | Dow Corning Corporation | Non-aqueous emulsion and methods of preparing surface-treated articles therewith |
| WO2016006584A1 (ja) * | 2014-07-07 | 2016-01-14 | ダイキン工業株式会社 | パーフルオロ(ポリ)エーテル変性アミドシラン化合物を含む組成物 |
| CN104267042A (zh) * | 2014-09-03 | 2015-01-07 | 东莞市华星镀膜科技有限公司 | 一种适用于玻璃制品上af镀膜效果的检测方法 |
| US9994732B1 (en) | 2014-09-12 | 2018-06-12 | Steven Martin Johnson | Polysilazane and fluoroacrylate coating composition |
| CN105220120B (zh) * | 2015-10-27 | 2017-06-23 | 中国科学院兰州化学物理研究所 | 一种多层复合类富勒烯薄膜在汽车发动机上产业化的方法 |
| US10562065B1 (en) | 2015-11-03 | 2020-02-18 | Newtech Llc | Systems and methods for application of polysilazane and fluoroacrylate coating compositions |
| US10584264B1 (en) | 2016-02-25 | 2020-03-10 | Newtech Llc | Hydrophobic and oleophobic coating compositions |
| BR112018075793B1 (pt) * | 2016-06-13 | 2022-07-12 | Nissan Motor Co., Ltd | Estrutura antifuligem e componente automotivo com a mesma |
| JP6741074B2 (ja) * | 2016-10-31 | 2020-08-19 | Agc株式会社 | 含フッ素エーテル組成物、コーティング液および物品 |
| CN111548026B (zh) | 2017-06-21 | 2022-04-12 | Agc株式会社 | 带拒水拒油层的物品及其制造方法 |
| CN107936750B (zh) * | 2017-12-19 | 2020-01-31 | 衢州氟硅技术研究院 | 一种固化型防水覆膜用氟化组合物及其应用 |
| EP3877454A4 (en) | 2018-11-09 | 2022-11-16 | 3M Innovative Properties Company | NANOSTRUCTURED OPTICAL FILMS AND INTERMEDIATE PRODUCTS |
| CN113039307B (zh) | 2018-11-13 | 2023-11-28 | Agc株式会社 | 带拒水拒油层的基材、蒸镀材料及带拒水拒油层的基材的制造方法 |
| JP7439769B2 (ja) | 2018-12-26 | 2024-02-28 | Agc株式会社 | 撥水撥油層付き基材、およびその製造方法 |
| EP3922626B1 (en) | 2019-02-08 | 2024-09-04 | Agc Inc. | Fluorine-containing ether compound, fluorine-containing ether composition, coating liquid, article, method for producing article, and method for producing fluorine-containing compound |
| WO2020225717A1 (en) | 2019-05-08 | 2020-11-12 | 3M Innovative Properties Company | Nanostructured article |
| JP7480780B2 (ja) | 2019-05-31 | 2024-05-10 | Agc株式会社 | 防汚層付き透明基板 |
| US20220213421A1 (en) | 2019-06-25 | 2022-07-07 | 3M Innovative Properties Company | Device for growing microorganisms |
| JP7544060B2 (ja) | 2019-09-20 | 2024-09-03 | Agc株式会社 | 含フッ素エーテル化合物、表面処理剤、含フッ素エーテル組成物、コーティング液、物品、及び化合物 |
| CN218272766U (zh) | 2019-11-08 | 2023-01-10 | 3M创新有限公司 | 光学膜 |
| US12305063B2 (en) * | 2020-05-14 | 2025-05-20 | 3M Innovative Properties Company | Fluorinated coupling agents and fluorinated (co)polymer layers made using the same |
| WO2022043787A1 (en) | 2020-08-28 | 2022-03-03 | 3M Innovative Properties Company | Articles including nanostructured surfaces and enclosed voids, methods of making same, and optical elements |
| CN116615331A (zh) | 2020-12-18 | 2023-08-18 | 3M创新有限公司 | 结构化膜和包括结构化膜的光学制品 |
| EP4272034A1 (en) | 2020-12-31 | 2023-11-08 | 3M Innovative Properties Company | Metallic nanohole arrays on nanowells with controlled depth and methods of making the same |
| CN116762007A (zh) | 2020-12-31 | 2023-09-15 | 3M创新有限公司 | 具有图案化表面化学成分的纳米图案化膜 |
| WO2022195368A1 (en) | 2021-03-16 | 2022-09-22 | 3M Innovative Properties Company | A nonwoven decontamination wipe comprising a small diameter fiber |
| CN117136296A (zh) | 2021-04-07 | 2023-11-28 | 3M创新有限公司 | 用于发光成像的荧光增强膜 |
| WO2023074874A1 (ja) | 2021-10-29 | 2023-05-04 | Agc株式会社 | 化合物、組成物、表面処理剤、コーティング液、物品及び物品の製造方法 |
| EP4433870B1 (en) | 2021-11-16 | 2025-11-26 | 3M Innovative Properties Company | Methacrylate copolymer and methods of making and using the same |
| CN118541337A (zh) | 2021-12-17 | 2024-08-23 | 3M创新有限公司 | 具有附接至无机氧化物表面的光引发转移终止剂的制品和由其制备的聚合物 |
| CN114854243B (zh) * | 2022-05-20 | 2023-05-30 | 义乌市中力工贸有限公司 | 一种环保型拒水拒油涂层用改性二氧化硅的制备方法及应用 |
| TWI827197B (zh) * | 2022-08-16 | 2023-12-21 | 馗鼎奈米科技股份有限公司 | 電漿輔助縮合裝置及電漿輔助縮合方法 |
| EP4577776A1 (en) | 2022-08-26 | 2025-07-02 | 3M Innovative Properties Company | Optical waveguides and methods of making same |
| CN119768641A (zh) | 2022-08-26 | 2025-04-04 | 3M创新有限公司 | 多层光学光栅 |
| US20240392142A1 (en) * | 2022-09-26 | 2024-11-28 | Lg Chem, Ltd. | Article for antifouling |
| WO2024236381A1 (en) | 2023-05-15 | 2024-11-21 | 3M Innovative Properties Company | Transferable film-based structured substrates |
| WO2025022240A2 (en) | 2023-07-21 | 2025-01-30 | 3M Innovative Properties Company | Filmless, chemically differentiated, nanostructured substrate on a rigid substrate |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CA725747A (en) | 1966-01-11 | N. Short James | Preparation of random copolymers | |
| US3250808A (en) | 1963-10-31 | 1966-05-10 | Du Pont | Fluorocarbon ethers derived from hexafluoropropylene epoxide |
| US3810874A (en) | 1969-03-10 | 1974-05-14 | Minnesota Mining & Mfg | Polymers prepared from poly(perfluoro-alkylene oxide) compounds |
| US3646085A (en) | 1970-09-24 | 1972-02-29 | Du Pont | Perfluoroalkyletheramidoalkyltrialkoxysilanes |
| US3787351A (en) | 1972-02-28 | 1974-01-22 | Minnesota Mining & Mfg | Use of soluble fluoroaliphatic oligomers in resin composite articles |
| US3950588A (en) | 1974-11-01 | 1976-04-13 | Minnesota Mining And Manufacturing Company | Coating of silanol-reactive surfaces with di-silyl poly(perfluorooxyalkylenes) |
| US4556471A (en) | 1983-10-14 | 1985-12-03 | Multi-Arc Vacuum Systems Inc. | Physical vapor deposition apparatus |
| DE69217574T2 (de) * | 1991-05-17 | 1997-06-12 | Asahi Glass Co Ltd | Oberflächenbehandeltes Substrat |
| US5274159A (en) | 1993-02-18 | 1993-12-28 | Minnesota Mining And Manufacturing Company | Destructable fluorinated alkoxysilane surfactants and repellent coatings derived therefrom |
| JPH0753919A (ja) * | 1993-08-11 | 1995-02-28 | Shin Etsu Chem Co Ltd | 常温硬化性組成物 |
| US5488142A (en) | 1993-10-04 | 1996-01-30 | Minnesota Mining And Manufacturing Company | Fluorination in tubular reactor system |
| US5658962A (en) | 1994-05-20 | 1997-08-19 | Minnesota Mining And Manufacturing Company | Omega-hydrofluoroalkyl ethers, precursor carboxylic acids and derivatives thereof, and their preparation and application |
| US6277485B1 (en) * | 1998-01-27 | 2001-08-21 | 3M Innovative Properties Company | Antisoiling coatings for antireflective surfaces and methods of preparation |
| US6696157B1 (en) | 2000-03-05 | 2004-02-24 | 3M Innovative Properties Company | Diamond-like glass thin films |
| US6656258B2 (en) * | 2001-03-20 | 2003-12-02 | 3M Innovative Properties Company | Compositions comprising fluorinated silanes and compressed fluid CO2 |
| US6649272B2 (en) * | 2001-11-08 | 2003-11-18 | 3M Innovative Properties Company | Coating composition comprising fluorochemical polyether silane polycondensate and use thereof |
| US6878419B2 (en) | 2001-12-14 | 2005-04-12 | 3M Innovative Properties Co. | Plasma treatment of porous materials |
| JP4126545B2 (ja) * | 2003-04-18 | 2008-07-30 | 信越化学工業株式会社 | 被覆物品並びに多層積層体 |
| US7294731B1 (en) * | 2006-08-28 | 2007-11-13 | 3M Innovative Properties Company | Perfluoropolyether silanes and use thereof |
| GB0721739D0 (en) * | 2007-11-06 | 2007-12-19 | 3M Innovative Properties Co | medicinal inhalation devices and components thereof |
| JP5669257B2 (ja) * | 2009-10-27 | 2015-02-12 | 信越化学工業株式会社 | フルオロオキシアルキレン基含有ポリマー組成物および該組成物を含む表面処理剤並びに該表面処理剤で表面処理された物品 |
-
2011
- 2011-11-07 CN CN201180053953.9A patent/CN103221497B/zh not_active Expired - Fee Related
- 2011-11-07 WO PCT/US2011/059576 patent/WO2012064649A1/en not_active Ceased
- 2011-11-07 EP EP11785869.6A patent/EP2638116B1/en not_active Not-in-force
- 2011-11-07 JP JP2013538810A patent/JP5932820B2/ja not_active Expired - Fee Related
- 2011-11-07 US US13/883,368 patent/US20130229378A1/en not_active Abandoned
Also Published As
| Publication number | Publication date |
|---|---|
| WO2012064649A1 (en) | 2012-05-18 |
| CN103221497B (zh) | 2016-06-08 |
| EP2638116B1 (en) | 2015-08-12 |
| US20130229378A1 (en) | 2013-09-05 |
| EP2638116A1 (en) | 2013-09-18 |
| CN103221497A (zh) | 2013-07-24 |
| JP2014502210A (ja) | 2014-01-30 |
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