JP5929860B2 - グリッド偏光素子製造方法 - Google Patents
グリッド偏光素子製造方法 Download PDFInfo
- Publication number
- JP5929860B2 JP5929860B2 JP2013196988A JP2013196988A JP5929860B2 JP 5929860 B2 JP5929860 B2 JP 5929860B2 JP 2013196988 A JP2013196988 A JP 2013196988A JP 2013196988 A JP2013196988 A JP 2013196988A JP 5929860 B2 JP5929860 B2 JP 5929860B2
- Authority
- JP
- Japan
- Prior art keywords
- layer
- thin film
- etching
- polarizing element
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 238000004519 manufacturing process Methods 0.000 title claims description 44
- 239000010409 thin film Substances 0.000 claims description 116
- 238000005530 etching Methods 0.000 claims description 70
- 239000010408 film Substances 0.000 claims description 56
- 239000000463 material Substances 0.000 claims description 51
- 230000008033 biological extinction Effects 0.000 claims description 45
- 238000000034 method Methods 0.000 claims description 43
- 239000000758 substrate Substances 0.000 claims description 42
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 22
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 21
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims description 10
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims description 10
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 8
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 8
- 229910021417 amorphous silicon Inorganic materials 0.000 claims description 7
- 238000000206 photolithography Methods 0.000 claims description 6
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 5
- 229910000420 cerium oxide Inorganic materials 0.000 claims description 5
- 229910000449 hafnium oxide Inorganic materials 0.000 claims description 5
- WIHZLLGSGQNAGK-UHFFFAOYSA-N hafnium(4+);oxygen(2-) Chemical compound [O-2].[O-2].[Hf+4] WIHZLLGSGQNAGK-UHFFFAOYSA-N 0.000 claims description 5
- MRNHPUHPBOKKQT-UHFFFAOYSA-N indium;tin;hydrate Chemical compound O.[In].[Sn] MRNHPUHPBOKKQT-UHFFFAOYSA-N 0.000 claims description 5
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 claims description 5
- 229910001635 magnesium fluoride Inorganic materials 0.000 claims description 5
- 229910000484 niobium oxide Inorganic materials 0.000 claims description 5
- URLJKFSTXLNXLG-UHFFFAOYSA-N niobium(5+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Nb+5] URLJKFSTXLNXLG-UHFFFAOYSA-N 0.000 claims description 5
- QGLKJKCYBOYXKC-UHFFFAOYSA-N nonaoxidotritungsten Chemical compound O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1 QGLKJKCYBOYXKC-UHFFFAOYSA-N 0.000 claims description 5
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 claims description 5
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 claims description 5
- 229910001936 tantalum oxide Inorganic materials 0.000 claims description 5
- 229910001930 tungsten oxide Inorganic materials 0.000 claims description 5
- RUDFQVOCFDJEEF-UHFFFAOYSA-N yttrium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[Y+3].[Y+3] RUDFQVOCFDJEEF-UHFFFAOYSA-N 0.000 claims description 5
- 239000011787 zinc oxide Substances 0.000 claims description 5
- 239000010410 layer Substances 0.000 description 231
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 29
- 229910052710 silicon Inorganic materials 0.000 description 29
- 239000010703 silicon Substances 0.000 description 29
- 230000010287 polarization Effects 0.000 description 21
- 230000002093 peripheral effect Effects 0.000 description 17
- 230000005684 electric field Effects 0.000 description 14
- 238000010521 absorption reaction Methods 0.000 description 13
- 238000002834 transmittance Methods 0.000 description 13
- 238000009826 distribution Methods 0.000 description 9
- 239000007789 gas Substances 0.000 description 9
- 229920002120 photoresistant polymer Polymers 0.000 description 9
- 238000004544 sputter deposition Methods 0.000 description 8
- 230000015572 biosynthetic process Effects 0.000 description 7
- 229910052751 metal Inorganic materials 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 6
- 230000007423 decrease Effects 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 238000012545 processing Methods 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 229910052786 argon Inorganic materials 0.000 description 4
- 230000008878 coupling Effects 0.000 description 4
- 238000010168 coupling process Methods 0.000 description 4
- 238000005859 coupling reaction Methods 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 4
- 239000004973 liquid crystal related substance Substances 0.000 description 4
- 238000011160 research Methods 0.000 description 4
- 238000004088 simulation Methods 0.000 description 4
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 description 3
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 3
- 238000000231 atomic layer deposition Methods 0.000 description 3
- 238000011161 development Methods 0.000 description 3
- 229910001882 dioxygen Inorganic materials 0.000 description 3
- 238000001312 dry etching Methods 0.000 description 3
- 230000001965 increasing effect Effects 0.000 description 3
- 230000001939 inductive effect Effects 0.000 description 3
- 238000009616 inductively coupled plasma Methods 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 238000003825 pressing Methods 0.000 description 3
- 230000001902 propagating effect Effects 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- -1 argon ions Chemical class 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 238000002425 crystallisation Methods 0.000 description 2
- 230000008025 crystallization Effects 0.000 description 2
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 230000031700 light absorption Effects 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 238000004380 ashing Methods 0.000 description 1
- 230000002238 attenuated effect Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 230000005674 electromagnetic induction Effects 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 238000009828 non-uniform distribution Methods 0.000 description 1
- 238000001615 p wave Methods 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000013077 target material Substances 0.000 description 1
- 238000002230 thermal chemical vapour deposition Methods 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
- G02B5/3033—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state in the form of a thin sheet or foil, e.g. Polaroid
- G02B5/3041—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state in the form of a thin sheet or foil, e.g. Polaroid comprising multiple thin layers, e.g. multilayer stacks
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
- G02B5/3058—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state comprising electrically conductive elements, e.g. wire grids, conductive particles
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/18—Manufacture of films or sheets
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1847—Manufacturing methods
- G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
- G02B5/3033—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state in the form of a thin sheet or foil, e.g. Polaroid
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
- G02B5/3075—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state for use in the UV
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133528—Polarisers
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133528—Polarisers
- G02F1/133548—Wire-grid polarisers
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Nonlinear Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Mathematical Physics (AREA)
- Materials Engineering (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Polarising Elements (AREA)
- Liquid Crystal (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013196988A JP5929860B2 (ja) | 2013-09-24 | 2013-09-24 | グリッド偏光素子製造方法 |
| TW103131154A TWI585473B (zh) | 2013-09-24 | 2014-09-10 | Method for manufacturing grating polarizer |
| KR1020140125765A KR101809313B1 (ko) | 2013-09-24 | 2014-09-22 | 그리드 편광 소자 및 그리드 편광 소자 제조 방법 |
| CN201410495255.XA CN104459862B (zh) | 2013-09-24 | 2014-09-24 | 栅偏振元件及栅偏振元件制造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013196988A JP5929860B2 (ja) | 2013-09-24 | 2013-09-24 | グリッド偏光素子製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2015064426A JP2015064426A (ja) | 2015-04-09 |
| JP5929860B2 true JP5929860B2 (ja) | 2016-06-08 |
Family
ID=52832368
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013196988A Active JP5929860B2 (ja) | 2013-09-24 | 2013-09-24 | グリッド偏光素子製造方法 |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP5929860B2 (ko) |
| KR (1) | KR101809313B1 (ko) |
| CN (1) | CN104459862B (ko) |
| TW (1) | TWI585473B (ko) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI613467B (zh) * | 2014-09-30 | 2018-02-01 | Ushio Electric Inc | 光柵偏光元件及光配向裝置 |
| JP5960319B1 (ja) * | 2015-04-30 | 2016-08-02 | デクセリアルズ株式会社 | 偏光素子 |
| JP6935352B2 (ja) * | 2015-07-03 | 2021-09-15 | ウシオ電機株式会社 | グリッド偏光素子 |
| JP6376057B2 (ja) * | 2015-07-03 | 2018-08-22 | ウシオ電機株式会社 | グリッド偏光素子製造方法 |
| KR101729683B1 (ko) * | 2015-09-16 | 2017-04-25 | 한국기계연구원 | 선격자 편광자의 제조 방법 |
| JP6610931B2 (ja) * | 2015-09-18 | 2019-11-27 | 東芝ライテック株式会社 | 偏光光照射装置 |
| JP2017215353A (ja) * | 2016-05-30 | 2017-12-07 | ウシオ電機株式会社 | 偏光光照射装置及び光配向装置 |
| KR102656857B1 (ko) | 2016-08-25 | 2024-04-12 | 삼성디스플레이 주식회사 | 편광소자, 편광소자 제조방법 및 표시 장치 |
| JP6988079B2 (ja) * | 2016-12-14 | 2022-01-05 | ウシオ電機株式会社 | 紫外線用グリッド偏光素子及びグリッド偏光素子製造方法 |
| FI128410B (en) | 2017-06-02 | 2020-04-30 | Dispelix Oy | A method of fabricating a height modulated optical diffractive grating |
| FI128376B (en) * | 2017-06-02 | 2020-04-15 | Dispelix Oy | Process for the preparation of a diffractive grating with varying efficiency and a diffraction grating |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6288840B1 (en) * | 1999-06-22 | 2001-09-11 | Moxtek | Imbedded wire grid polarizer for the visible spectrum |
| WO2003069381A2 (en) * | 2002-02-12 | 2003-08-21 | Unaxis Balzers Limited | Optical component comprising submicron hollow spaces |
| JP2005202104A (ja) * | 2004-01-15 | 2005-07-28 | Nikon Corp | 偏光化素子の製造方法、偏光化素子、および画像投影装置の製造方法、並びに画像投影装置 |
| JP5933910B2 (ja) * | 2006-08-15 | 2016-06-15 | ポラリゼーション ソリューションズ エルエルシー | 偏光子薄膜及びこの製作方法 |
| US8755113B2 (en) * | 2006-08-31 | 2014-06-17 | Moxtek, Inc. | Durable, inorganic, absorptive, ultra-violet, grid polarizer |
| JP4412372B2 (ja) * | 2007-09-12 | 2010-02-10 | セイコーエプソン株式会社 | 偏光素子の製造方法 |
| JP2009223222A (ja) * | 2008-03-18 | 2009-10-01 | Hitachi Maxell Ltd | ワイヤグリッド偏光子の製造方法、ワイヤグリッド偏光子および投射型液晶表示装置 |
| JP2010145854A (ja) * | 2008-12-19 | 2010-07-01 | Asahi Kasei E-Materials Corp | ワイヤグリッド偏光子 |
| KR101610376B1 (ko) | 2009-04-10 | 2016-04-08 | 엘지이노텍 주식회사 | 와이어 그리드 편광자, 이를 포함하는 액정 표시 장치 및 와이어 그리드 편광자의 제조 방법 |
-
2013
- 2013-09-24 JP JP2013196988A patent/JP5929860B2/ja active Active
-
2014
- 2014-09-10 TW TW103131154A patent/TWI585473B/zh active
- 2014-09-22 KR KR1020140125765A patent/KR101809313B1/ko active IP Right Grant
- 2014-09-24 CN CN201410495255.XA patent/CN104459862B/zh active Active
Also Published As
| Publication number | Publication date |
|---|---|
| JP2015064426A (ja) | 2015-04-09 |
| TW201533479A (zh) | 2015-09-01 |
| CN104459862A (zh) | 2015-03-25 |
| KR101809313B1 (ko) | 2018-01-18 |
| CN104459862B (zh) | 2018-04-13 |
| TWI585473B (zh) | 2017-06-01 |
| KR20150033561A (ko) | 2015-04-01 |
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