JP5927619B2 - プラズマリアクタ - Google Patents

プラズマリアクタ Download PDF

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Publication number
JP5927619B2
JP5927619B2 JP2013508441A JP2013508441A JP5927619B2 JP 5927619 B2 JP5927619 B2 JP 5927619B2 JP 2013508441 A JP2013508441 A JP 2013508441A JP 2013508441 A JP2013508441 A JP 2013508441A JP 5927619 B2 JP5927619 B2 JP 5927619B2
Authority
JP
Japan
Prior art keywords
gas
exhaust
plasma
plasma reactor
vacuum vessel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2013508441A
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English (en)
Japanese (ja)
Other versions
JP2013527610A5 (enExample
JP2013527610A (ja
Inventor
サラバス，アウレル
タハ，アベド・アル・ヘイ
チョーダリー，デベンドラ
クリントボルト，マルクス
エラート，クリストフ
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Evatec AG
Original Assignee
Evatec AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Evatec AG filed Critical Evatec AG
Publication of JP2013527610A publication Critical patent/JP2013527610A/ja
Publication of JP2013527610A5 publication Critical patent/JP2013527610A5/ja
Application granted granted Critical
Publication of JP5927619B2 publication Critical patent/JP5927619B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • H01J37/32449—Gas control, e.g. control of the gas flow
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32623—Mechanical discharge control means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
    • H01J37/32816—Pressure
    • H01J37/32834—Exhausting

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Plasma Technology (AREA)
JP2013508441A 2010-05-06 2011-04-29 プラズマリアクタ Expired - Fee Related JP5927619B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US33188710P 2010-05-06 2010-05-06
US61/331,887 2010-05-06
PCT/EP2011/056820 WO2011138239A1 (en) 2010-05-06 2011-04-29 Plasma reactor

Publications (3)

Publication Number Publication Date
JP2013527610A JP2013527610A (ja) 2013-06-27
JP2013527610A5 JP2013527610A5 (enExample) 2014-06-05
JP5927619B2 true JP5927619B2 (ja) 2016-06-01

Family

ID=44148910

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013508441A Expired - Fee Related JP5927619B2 (ja) 2010-05-06 2011-04-29 プラズマリアクタ

Country Status (5)

Country Link
US (1) US20130052369A1 (enExample)
EP (1) EP2567392A1 (enExample)
JP (1) JP5927619B2 (enExample)
CN (2) CN202246850U (enExample)
WO (1) WO2011138239A1 (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103137521A (zh) * 2011-12-02 2013-06-05 中国科学院微电子研究所 一种进气装置
TWI480417B (zh) * 2012-11-02 2015-04-11 Ind Tech Res Inst 具氣幕之氣體噴灑裝置及其薄膜沉積裝置
US20150087108A1 (en) * 2013-09-26 2015-03-26 Tel Solar Ag Process, Film, and Apparatus for Top Cell for a PV Device
US9859088B2 (en) * 2015-04-30 2018-01-02 Lam Research Corporation Inter-electrode gap variation methods for compensating deposition non-uniformity
JP6903662B2 (ja) * 2015-08-31 2021-07-14 ジーレイ スイッツァーランド エスアー モノリシックｃｍｏｓ集積ピクセル検出器を備えた光子計数コーンビームｃｔ装置
CN114093739B (zh) * 2020-08-24 2024-03-12 中微半导体设备(上海)股份有限公司 一种气体流量调节装置和调节方法及等离子体处理装置

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2589168B1 (fr) 1985-10-25 1992-07-17 Solems Sa Appareil et son procede d'utilisation pour la formation de films minces assistee par plasma
US4913790A (en) * 1988-03-25 1990-04-03 Tokyo Electron Limited Treating method
JPH0776781A (ja) * 1993-09-10 1995-03-20 Matsushita Electric Ind Co Ltd プラズマ気相成長装置
US6228438B1 (en) 1999-08-10 2001-05-08 Unakis Balzers Aktiengesellschaft Plasma reactor for the treatment of large size substrates
US6502530B1 (en) 2000-04-26 2003-01-07 Unaxis Balzers Aktiengesellschaft Design of gas injection for the electrode in a capacitively coupled RF plasma reactor
US6433484B1 (en) * 2000-08-11 2002-08-13 Lam Research Corporation Wafer area pressure control
KR101033123B1 (ko) * 2004-06-30 2011-05-11 엘지디스플레이 주식회사 액정표시장치의 제조를 위한 챔버형 장치
JP5027667B2 (ja) * 2004-11-24 2012-09-19 エリコン・ソーラー・アクチェンゲゼルシャフト，トリュープバッハ 超大面積基板用真空処理チャンバ
JP2006303309A (ja) * 2005-04-22 2006-11-02 Hitachi High-Technologies Corp プラズマ処理装置
US8043430B2 (en) * 2006-12-20 2011-10-25 Lam Research Corporation Methods and apparatuses for controlling gas flow conductance in a capacitively-coupled plasma processing chamber
US8522715B2 (en) * 2008-01-08 2013-09-03 Lam Research Corporation Methods and apparatus for a wide conductance kit
WO2009104732A1 (ja) * 2008-02-20 2009-08-27 東京エレクトロン株式会社 ガス供給装置
US20090286397A1 (en) * 2008-05-15 2009-11-19 Lam Research Corporation Selective inductive double patterning
MY176065A (en) * 2009-01-20 2020-07-23 Mitsubishi Materials Corp Apparatus for producing trichlorosilane and method for producing trichlorosilane

Also Published As

Publication number Publication date
CN102237247A (zh) 2011-11-09
US20130052369A1 (en) 2013-02-28
EP2567392A1 (en) 2013-03-13
WO2011138239A1 (en) 2011-11-10
JP2013527610A (ja) 2013-06-27
CN202246850U (zh) 2012-05-30

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