JP5914649B2 - 活性層を含む水素センサ及び水素センサの製造方法 - Google Patents

活性層を含む水素センサ及び水素センサの製造方法 Download PDF

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JP5914649B2
JP5914649B2 JP2014519472A JP2014519472A JP5914649B2 JP 5914649 B2 JP5914649 B2 JP 5914649B2 JP 2014519472 A JP2014519472 A JP 2014519472A JP 2014519472 A JP2014519472 A JP 2014519472A JP 5914649 B2 JP5914649 B2 JP 5914649B2
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hydrogen
active layer
hydrogen sensor
sensor
elements
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Japanese (ja)
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JP2014531017A (ja
Inventor
クラウス，イヴォン
コレル，エドモン
ラパン，ジャン−フィリップ
シュタルダー，ミヒャエル
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ザ・スウォッチ・グループ・リサーチ・アンド・ディベロップメント・リミテッド
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    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C5/00—Alloys based on noble metals
    • C22C5/04—Alloys based on a platinum group metal
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C30/00—Alloys containing less than 50% by weight of each constituent
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
    • G01N27/02—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance
    • G01N27/04—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance
    • G01N27/12—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance of a solid body in dependence upon absorption of a fluid; of a solid body in dependence upon reaction with a fluid, for detecting components in the fluid
    • G01N27/125—Composition of the body, e.g. the composition of its sensitive layer
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N33/00—Investigating or analysing materials by specific methods not covered by groups G01N1/00 - G01N31/00
    • G01N33/0004—Gaseous mixtures, e.g. polluted air
    • G01N33/0009—General constructional details of gas analysers, e.g. portable test equipment
    • G01N33/0027—General constructional details of gas analysers, e.g. portable test equipment concerning the detector
    • G01N33/0036—General constructional details of gas analysers, e.g. portable test equipment concerning the detector specially adapted to detect a particular component
    • G01N33/005—H2

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Health & Medical Sciences (AREA)
  • Biochemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Electrochemistry (AREA)
  • Medicinal Chemistry (AREA)
  • Food Science & Technology (AREA)
  • Combustion & Propulsion (AREA)
  • Investigating Or Analyzing Materials By The Use Of Fluid Adsorption Or Reactions (AREA)
JP2014519472A 2011-07-15 2012-06-06 活性層を含む水素センサ及び水素センサの製造方法 Active JP5914649B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
CH01191/11 2011-07-15
CH01191/11A CH705070B1 (fr) 2011-07-15 2011-07-15 Capteur d'hydrogène à couche active et procédé de fabrication de capteurs d'hydrogène.
PCT/EP2012/060755 WO2013010721A1 (fr) 2011-07-15 2012-06-06 Capteur d'hydrogene a couche active et procede de fabrication de capteurs d'hydrogene

Publications (2)

Publication Number Publication Date
JP2014531017A JP2014531017A (ja) 2014-11-20
JP5914649B2 true JP5914649B2 (ja) 2016-05-11

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP2014519472A Active JP5914649B2 (ja) 2011-07-15 2012-06-06 活性層を含む水素センサ及び水素センサの製造方法

Country Status (6)

Country Link
US (1) US9469886B2 (zh)
EP (1) EP2732275B1 (zh)
JP (1) JP5914649B2 (zh)
CN (2) CN109991284A (zh)
CH (1) CH705070B1 (zh)
WO (1) WO2013010721A1 (zh)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105717183A (zh) * 2016-03-22 2016-06-29 扬州大学 一种无酶葡萄糖传感器及其制备方法
CN108642471A (zh) * 2018-04-26 2018-10-12 江汉大学 一种钯纳米颗粒薄膜的制备工艺及其氢气传感器
CN111089882B (zh) * 2020-01-02 2022-09-02 宁波大学 一种氢气传感器结构及其制备方法
CN114324481A (zh) * 2021-12-27 2022-04-12 浙江工业大学 一种催化燃烧式氢气传感器及其制备方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3951603A (en) * 1972-07-08 1976-04-20 Hitachi, Ltd. Gas-sensor element and method for detecting reducing gas or oxygen gas
DE4334672C2 (de) * 1993-10-12 1996-01-11 Bosch Gmbh Robert Sensor zum Nachweis von Stickoxid
DE19623434A1 (de) * 1996-06-12 1997-12-18 Bosch Gmbh Robert Sensor zur Bestimmung der Konzentration oxidierbarer Bestandteile in einem Gasgemisch
US6006582A (en) * 1998-03-17 1999-12-28 Advanced Technology Materials, Inc. Hydrogen sensor utilizing rare earth metal thin film detection element
US6265222B1 (en) * 1999-01-15 2001-07-24 Dimeo, Jr. Frank Micro-machined thin film hydrogen gas sensor, and method of making and using the same
JP2003014677A (ja) * 2001-06-28 2003-01-15 Mikuni Corp ガスセンサー及びその製造方法
US20040093928A1 (en) 2002-11-20 2004-05-20 Dimeo Frank Rare earth metal sensor
JP2008261634A (ja) * 2007-04-10 2008-10-30 Mikuni Corp 水素センサー
CN101158662A (zh) * 2007-11-02 2008-04-09 华南理工大学 氢气传感器用薄膜材料及其制备方法

Also Published As

Publication number Publication date
WO2013010721A1 (fr) 2013-01-24
EP2732275B1 (fr) 2019-07-31
US9469886B2 (en) 2016-10-18
CH705070A2 (fr) 2013-01-15
US20140294676A1 (en) 2014-10-02
EP2732275A1 (fr) 2014-05-21
CN103649736A (zh) 2014-03-19
CN109991284A (zh) 2019-07-09
JP2014531017A (ja) 2014-11-20
CH705070B1 (fr) 2022-01-14

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