JP5902884B2 - 結像光学系及びこの種の結像光学系を含むマイクロリソグラフィ用の投影露光装置 - Google Patents

結像光学系及びこの種の結像光学系を含むマイクロリソグラフィ用の投影露光装置 Download PDF

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JP5902884B2
JP5902884B2 JP2010530321A JP2010530321A JP5902884B2 JP 5902884 B2 JP5902884 B2 JP 5902884B2 JP 2010530321 A JP2010530321 A JP 2010530321A JP 2010530321 A JP2010530321 A JP 2010530321A JP 5902884 B2 JP5902884 B2 JP 5902884B2
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optical system
mirrors
plane
imaging
mirror
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JP2011501448A (ja
JP2011501448A5 (enExample
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ハンス ユールゲン マン
ハンス ユールゲン マン
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カール・ツァイス・エスエムティー・ゲーエムベーハー
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G02B17/0647—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors
    • G02B17/0657—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2010530321A 2007-10-26 2008-10-21 結像光学系及びこの種の結像光学系を含むマイクロリソグラフィ用の投影露光装置 Active JP5902884B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102007051668 2007-10-26
DE102007051668.3 2007-10-26
PCT/EP2008/008886 WO2009053023A2 (en) 2007-10-26 2008-10-21 Imaging optical system and projection exposure apparatus for microlithography comprising an imaging optical system of this type

Related Child Applications (1)

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JP2014114893A Division JP6146918B2 (ja) 2007-10-26 2014-06-03 結像光学系及びこの種の結像光学系を含むマイクロリソグラフィ用の投影露光装置

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JP2011501448A JP2011501448A (ja) 2011-01-06
JP2011501448A5 JP2011501448A5 (enExample) 2011-12-08
JP5902884B2 true JP5902884B2 (ja) 2016-04-13

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JP2014114893A Active JP6146918B2 (ja) 2007-10-26 2014-06-03 結像光学系及びこの種の結像光学系を含むマイクロリソグラフィ用の投影露光装置

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Country Link
US (1) US8717538B2 (enExample)
JP (2) JP5902884B2 (enExample)
KR (2) KR101542272B1 (enExample)
DE (1) DE102008043162A1 (enExample)
WO (1) WO2009053023A2 (enExample)

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DE102011083888A1 (de) 2011-09-30 2013-04-04 Carl Zeiss Smt Gmbh Abbildende katoptrische EUV-Projektionsoptik
DE102012208793A1 (de) * 2012-05-25 2013-11-28 Carl Zeiss Smt Gmbh Abbildende Optik sowie Projektionsbelichtungsanlage für die Projektionslithographie mit einer derartigen abbildenden Optik
US10261296B1 (en) 2014-08-29 2019-04-16 Wavefront Research, Inc. Telecentric reflective imager
CN106169178B (zh) * 2016-06-30 2019-01-11 北京大学 一种改善镜头渐晕的方法
DE102017205130A1 (de) 2017-03-27 2017-07-06 Carl Zeiss Smt Gmbh Abbildende Optik zur Abbildung eines Objektfeldes in ein Bildfeld sowie Projektionsbelichtungsanlage mit einer derartigen abbildenden Optik
DE102017207542A1 (de) 2017-05-04 2017-06-29 Carl Zeiss Smt Gmbh Abbildende Optik zur Abbildung eines Objektfeldes in ein Bildfeld sowie Projektionsbelichtungsanlage mit einer derartigen abbildenden Optik
DE102017210269A1 (de) 2017-06-20 2017-08-31 Carl Zeiss Smt Gmbh Abbildende Optik zur Abbildung eines Objektfeldes in ein Bildfeld sowie Projektionsbelichtungsanlage mit einer derartigen abbildenden Optik
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DE102018200152A1 (de) 2018-01-08 2019-07-11 Carl Zeiss Smt Gmbh Optisches Element zur Strahlführung von Abbildungslicht bei der Projektionslithographie
DE102017212869A1 (de) 2017-07-26 2019-01-31 Carl Zeiss Smt Gmbh Optisches Element zur Strahlführung von Abbildungslicht bei der Projektionslithographie
DE102017216458A1 (de) 2017-09-18 2019-03-21 Carl Zeiss Smt Gmbh Verfahren zur Herstellung eines Spiegels als optischer Komponente für ein optisches System einer Projektionsbelichtungsanlage für die Projektionslithographie
DE102018200956A1 (de) 2018-01-22 2018-12-27 Carl Zeiss Smt Gmbh Optisches Element zur Strahlführung von Abbildungslicht bei der Projektionslithographie
DE102018200955A1 (de) 2018-01-22 2019-01-10 Carl Zeiss Smt Gmbh Spiegel-Baugruppe zur Strahlführung von Abbildungslicht bei der Projektionslithographie
DE102018200954A1 (de) 2018-01-22 2019-07-25 Carl Zeiss Smt Gmbh Optisches Element zur Strahlführung von Abbildungslicht bei der Projektionslithographie
DE102018203283A1 (de) 2018-03-06 2018-05-17 Carl Zeiss Smt Gmbh Verfahren zur Herstellung eines optischen Systems einer Projektionsbestimmungsanlage für die Projektionslithographie
DE102018207277A1 (de) 2018-05-09 2019-11-14 Carl Zeiss Smt Gmbh Lithografiemaske, optisches System zur Übertragung von Original Strukturabschnitten der Lithografiemaske sowie Projektionsoptik zur Abbildung eines Objektfeldes, in dem mindestens ein Original-Strukturabschnitt einer Lithografiemaske anordenbar ist
DE102018208373A1 (de) 2018-05-28 2019-06-19 Carl Zeiss Smt Gmbh Optisches Element zur Strahlführung von Abbildungslicht bei der Projektionslithographie
DE102018216832A1 (de) 2018-10-01 2018-11-22 Carl Zeiss Smt Gmbh Verfahren zur Bereitstellung einer Optik-Baugruppe
DE102021202847A1 (de) 2021-03-24 2022-09-29 Carl Zeiss Smt Gmbh Beleuchtungsoptik für eine Projektionsbelichtungsanlage für die Lithografie

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Also Published As

Publication number Publication date
DE102008043162A1 (de) 2009-04-30
US8717538B2 (en) 2014-05-06
KR20150024896A (ko) 2015-03-09
JP2011501448A (ja) 2011-01-06
WO2009053023A2 (en) 2009-04-30
WO2009053023A3 (en) 2009-07-09
KR101645142B1 (ko) 2016-08-02
KR20100084652A (ko) 2010-07-27
JP2014167655A (ja) 2014-09-11
JP6146918B2 (ja) 2017-06-14
KR101542272B1 (ko) 2015-08-06
US20100231886A1 (en) 2010-09-16

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