KR101542272B1 - 결상 광학 시스템 및 이러한 유형의 결상 광학 시스템을 구비하는 마이크로리소그래피용 투영 노광 장치 - Google Patents

결상 광학 시스템 및 이러한 유형의 결상 광학 시스템을 구비하는 마이크로리소그래피용 투영 노광 장치 Download PDF

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KR101542272B1
KR101542272B1 KR1020107010270A KR20107010270A KR101542272B1 KR 101542272 B1 KR101542272 B1 KR 101542272B1 KR 1020107010270 A KR1020107010270 A KR 1020107010270A KR 20107010270 A KR20107010270 A KR 20107010270A KR 101542272 B1 KR101542272 B1 KR 101542272B1
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mirrors
optical system
imaging
plane
mirror
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KR20100084652A (ko
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한스-위르겐 만
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칼 짜이스 에스엠티 게엠베하
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G02B17/0647—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors
    • G02B17/0657—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020107010270A 2007-10-26 2008-10-21 결상 광학 시스템 및 이러한 유형의 결상 광학 시스템을 구비하는 마이크로리소그래피용 투영 노광 장치 Active KR101542272B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102007051668 2007-10-26
DE102007051668.3 2007-10-26

Related Child Applications (1)

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KR1020157001537A Division KR101645142B1 (ko) 2007-10-26 2008-10-21 결상 광학 시스템 및 이러한 유형의 결상 광학 시스템을 구비하는 마이크로리소그래피용 투영 노광 장치

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KR20100084652A KR20100084652A (ko) 2010-07-27
KR101542272B1 true KR101542272B1 (ko) 2015-08-06

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KR1020107010270A Active KR101542272B1 (ko) 2007-10-26 2008-10-21 결상 광학 시스템 및 이러한 유형의 결상 광학 시스템을 구비하는 마이크로리소그래피용 투영 노광 장치
KR1020157001537A Active KR101645142B1 (ko) 2007-10-26 2008-10-21 결상 광학 시스템 및 이러한 유형의 결상 광학 시스템을 구비하는 마이크로리소그래피용 투영 노광 장치

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US (1) US8717538B2 (enExample)
JP (2) JP5902884B2 (enExample)
KR (2) KR101542272B1 (enExample)
DE (1) DE102008043162A1 (enExample)
WO (1) WO2009053023A2 (enExample)

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CN102819197B (zh) 2007-10-26 2016-06-22 卡尔蔡司Smt有限责任公司 成像光学系统、投射曝光设备、微结构部件及其产生方法
DE102007051671A1 (de) 2007-10-26 2009-05-07 Carl Zeiss Smt Ag Abbildende Optik sowie Projektionsbelichtungsanlage für die Mikrolithographie mit einer derartigen abbildenden Optik
DE102009046685A1 (de) * 2009-11-13 2011-05-26 Carl Zeiss Smt Gmbh Abbildende Optik
DE102011083888A1 (de) 2011-09-30 2013-04-04 Carl Zeiss Smt Gmbh Abbildende katoptrische EUV-Projektionsoptik
DE102012208793A1 (de) * 2012-05-25 2013-11-28 Carl Zeiss Smt Gmbh Abbildende Optik sowie Projektionsbelichtungsanlage für die Projektionslithographie mit einer derartigen abbildenden Optik
US10261296B1 (en) 2014-08-29 2019-04-16 Wavefront Research, Inc. Telecentric reflective imager
CN106169178B (zh) * 2016-06-30 2019-01-11 北京大学 一种改善镜头渐晕的方法
DE102017205130A1 (de) 2017-03-27 2017-07-06 Carl Zeiss Smt Gmbh Abbildende Optik zur Abbildung eines Objektfeldes in ein Bildfeld sowie Projektionsbelichtungsanlage mit einer derartigen abbildenden Optik
DE102017207542A1 (de) 2017-05-04 2017-06-29 Carl Zeiss Smt Gmbh Abbildende Optik zur Abbildung eines Objektfeldes in ein Bildfeld sowie Projektionsbelichtungsanlage mit einer derartigen abbildenden Optik
DE102017210269A1 (de) 2017-06-20 2017-08-31 Carl Zeiss Smt Gmbh Abbildende Optik zur Abbildung eines Objektfeldes in ein Bildfeld sowie Projektionsbelichtungsanlage mit einer derartigen abbildenden Optik
TWI812626B (zh) 2017-07-26 2023-08-21 德商卡爾蔡司Ｓｍｔ有限公司 投射微影中用於成像光之光束導引的光學元件
DE102018200152A1 (de) 2018-01-08 2019-07-11 Carl Zeiss Smt Gmbh Optisches Element zur Strahlführung von Abbildungslicht bei der Projektionslithographie
DE102017212869A1 (de) 2017-07-26 2019-01-31 Carl Zeiss Smt Gmbh Optisches Element zur Strahlführung von Abbildungslicht bei der Projektionslithographie
DE102017216458A1 (de) 2017-09-18 2019-03-21 Carl Zeiss Smt Gmbh Verfahren zur Herstellung eines Spiegels als optischer Komponente für ein optisches System einer Projektionsbelichtungsanlage für die Projektionslithographie
DE102018200956A1 (de) 2018-01-22 2018-12-27 Carl Zeiss Smt Gmbh Optisches Element zur Strahlführung von Abbildungslicht bei der Projektionslithographie
DE102018200955A1 (de) 2018-01-22 2019-01-10 Carl Zeiss Smt Gmbh Spiegel-Baugruppe zur Strahlführung von Abbildungslicht bei der Projektionslithographie
DE102018200954A1 (de) 2018-01-22 2019-07-25 Carl Zeiss Smt Gmbh Optisches Element zur Strahlführung von Abbildungslicht bei der Projektionslithographie
DE102018203283A1 (de) 2018-03-06 2018-05-17 Carl Zeiss Smt Gmbh Verfahren zur Herstellung eines optischen Systems einer Projektionsbestimmungsanlage für die Projektionslithographie
DE102018207277A1 (de) 2018-05-09 2019-11-14 Carl Zeiss Smt Gmbh Lithografiemaske, optisches System zur Übertragung von Original Strukturabschnitten der Lithografiemaske sowie Projektionsoptik zur Abbildung eines Objektfeldes, in dem mindestens ein Original-Strukturabschnitt einer Lithografiemaske anordenbar ist
DE102018208373A1 (de) 2018-05-28 2019-06-19 Carl Zeiss Smt Gmbh Optisches Element zur Strahlführung von Abbildungslicht bei der Projektionslithographie
DE102018216832A1 (de) 2018-10-01 2018-11-22 Carl Zeiss Smt Gmbh Verfahren zur Bereitstellung einer Optik-Baugruppe
DE102021202847A1 (de) 2021-03-24 2022-09-29 Carl Zeiss Smt Gmbh Beleuchtungsoptik für eine Projektionsbelichtungsanlage für die Lithografie

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Also Published As

Publication number Publication date
DE102008043162A1 (de) 2009-04-30
US8717538B2 (en) 2014-05-06
KR20150024896A (ko) 2015-03-09
JP2011501448A (ja) 2011-01-06
WO2009053023A2 (en) 2009-04-30
JP5902884B2 (ja) 2016-04-13
WO2009053023A3 (en) 2009-07-09
KR101645142B1 (ko) 2016-08-02
KR20100084652A (ko) 2010-07-27
JP2014167655A (ja) 2014-09-11
JP6146918B2 (ja) 2017-06-14
US20100231886A1 (en) 2010-09-16

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