JP5896665B2 - 電気機械変換装置の製造方法 - Google Patents

電気機械変換装置の製造方法 Download PDF

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Publication number
JP5896665B2
JP5896665B2 JP2011204970A JP2011204970A JP5896665B2 JP 5896665 B2 JP5896665 B2 JP 5896665B2 JP 2011204970 A JP2011204970 A JP 2011204970A JP 2011204970 A JP2011204970 A JP 2011204970A JP 5896665 B2 JP5896665 B2 JP 5896665B2
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JP
Japan
Prior art keywords
insulating layer
substrate
partition
silicon substrate
partition wall
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2011204970A
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English (en)
Japanese (ja)
Other versions
JP2013070112A5 (enExample
JP2013070112A (ja
Inventor
綾子 加藤
綾子 加藤
虎島　和敏
和敏 虎島
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2011204970A priority Critical patent/JP5896665B2/ja
Priority to KR1020120099744A priority patent/KR101473709B1/ko
Priority to US13/610,219 priority patent/US8518733B2/en
Priority to EP12006480.3A priority patent/EP2572804A3/en
Priority to CN201210344319.7A priority patent/CN103011054B/zh
Publication of JP2013070112A publication Critical patent/JP2013070112A/ja
Publication of JP2013070112A5 publication Critical patent/JP2013070112A5/ja
Application granted granted Critical
Publication of JP5896665B2 publication Critical patent/JP5896665B2/ja
Expired - Fee Related legal-status Critical Current
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    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04R—LOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKE ACOUSTIC ELECTROMECHANICAL TRANSDUCERS; DEAF-AID SETS; PUBLIC ADDRESS SYSTEMS
    • H04R19/00—Electrostatic transducers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B06—GENERATING OR TRANSMITTING MECHANICAL VIBRATIONS IN GENERAL
    • B06B—METHODS OR APPARATUS FOR GENERATING OR TRANSMITTING MECHANICAL VIBRATIONS OF INFRASONIC, SONIC, OR ULTRASONIC FREQUENCY, e.g. FOR PERFORMING MECHANICAL WORK IN GENERAL
    • B06B1/00—Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency
    • B06B1/02—Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency making use of electrical energy
    • B06B1/0292—Electrostatic transducers, e.g. electret-type
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61B—DIAGNOSIS; SURGERY; IDENTIFICATION
    • A61B8/00—Diagnosis using ultrasonic, sonic or infrasonic waves
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B3/00—Devices comprising flexible or deformable elements, e.g. comprising elastic tongues or membranes
    • B81B3/0064—Constitution or structural means for improving or controlling the physical properties of a device
    • B81B3/0067—Mechanical properties
    • B81B3/0075—For improving wear resistance
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04R—LOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKE ACOUSTIC ELECTROMECHANICAL TRANSDUCERS; DEAF-AID SETS; PUBLIC ADDRESS SYSTEMS
    • H04R19/00—Electrostatic transducers
    • H04R19/005—Electrostatic transducers using semiconductor materials
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04R—LOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKE ACOUSTIC ELECTROMECHANICAL TRANSDUCERS; DEAF-AID SETS; PUBLIC ADDRESS SYSTEMS
    • H04R31/00—Apparatus or processes specially adapted for the manufacture of transducers or diaphragms therefor
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D48/00—Individual devices not covered by groups H10D1/00 - H10D44/00
    • H10D48/50—Devices controlled by mechanical forces, e.g. pressure
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B2201/00—Specific applications of microelectromechanical systems
    • B81B2201/02—Sensors
    • B81B2201/0221—Variable capacitors
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B2203/00—Basic microelectromechanical structures
    • B81B2203/01—Suspended structures, i.e. structures allowing a movement
    • B81B2203/0127—Diaphragms, i.e. structures separating two media that can control the passage from one medium to another; Membranes, i.e. diaphragms with filtering function
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B2203/00—Basic microelectromechanical structures
    • B81B2203/03—Static structures
    • B81B2203/0315—Cavities
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B2203/00—Basic microelectromechanical structures
    • B81B2203/03—Static structures
    • B81B2203/0369—Static structures characterized by their profile
    • B81B2203/0392—Static structures characterized by their profile profiles not provided for in B81B2203/0376 - B81B2203/0384
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/49005—Acoustic transducer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/49007—Indicating transducer

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Acoustics & Sound (AREA)
  • Signal Processing (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Pathology (AREA)
  • Medical Informatics (AREA)
  • Computer Hardware Design (AREA)
  • Biophysics (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Radiology & Medical Imaging (AREA)
  • Biomedical Technology (AREA)
  • Heart & Thoracic Surgery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Molecular Biology (AREA)
  • Surgery (AREA)
  • Animal Behavior & Ethology (AREA)
  • General Health & Medical Sciences (AREA)
  • Public Health (AREA)
  • Veterinary Medicine (AREA)
  • Pressure Sensors (AREA)
  • Transducers For Ultrasonic Waves (AREA)
JP2011204970A 2011-09-20 2011-09-20 電気機械変換装置の製造方法 Expired - Fee Related JP5896665B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2011204970A JP5896665B2 (ja) 2011-09-20 2011-09-20 電気機械変換装置の製造方法
KR1020120099744A KR101473709B1 (ko) 2011-09-20 2012-09-10 전기기계 변환장치의 제조 방법
US13/610,219 US8518733B2 (en) 2011-09-20 2012-09-11 Method of manufacturing an electromechanical transducer
EP12006480.3A EP2572804A3 (en) 2011-09-20 2012-09-14 Method of manufacturing an electromechanical transducer
CN201210344319.7A CN103011054B (zh) 2011-09-20 2012-09-17 机电换能器的制造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011204970A JP5896665B2 (ja) 2011-09-20 2011-09-20 電気機械変換装置の製造方法

Publications (3)

Publication Number Publication Date
JP2013070112A JP2013070112A (ja) 2013-04-18
JP2013070112A5 JP2013070112A5 (enExample) 2015-05-07
JP5896665B2 true JP5896665B2 (ja) 2016-03-30

Family

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Family Applications (1)

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JP2011204970A Expired - Fee Related JP5896665B2 (ja) 2011-09-20 2011-09-20 電気機械変換装置の製造方法

Country Status (5)

Country Link
US (1) US8518733B2 (enExample)
EP (1) EP2572804A3 (enExample)
JP (1) JP5896665B2 (enExample)
KR (1) KR101473709B1 (enExample)
CN (1) CN103011054B (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5511260B2 (ja) * 2009-08-19 2014-06-04 キヤノン株式会社 容量型電気機械変換装置、及びその感度調整方法
JP5479390B2 (ja) * 2011-03-07 2014-04-23 信越半導体株式会社 シリコンウェーハの製造方法
JP6381195B2 (ja) 2013-10-22 2018-08-29 キヤノン株式会社 静電容量型トランスデューサ及びその作製方法
US10581344B2 (en) * 2015-01-16 2020-03-03 Chambre De Commerce Et D'industrie De Region Paris Ile De France Miniature kinetic energy harvester for generating electrical energy from mechanical vibrations
CN105036058B (zh) * 2015-05-27 2016-10-05 华南理工大学 集成化电容式微加工超声换能器及其制备方法
JP6606034B2 (ja) * 2016-08-24 2019-11-13 株式会社日立製作所 容量検出型超音波トランスデューサおよびそれを備えた超音波撮像装置
KR20220098075A (ko) 2021-01-02 2022-07-11 김동호 참여용 골인보드
CN114380271B (zh) * 2021-09-02 2025-07-01 苏州清听声学科技有限公司 一种定向发声屏绝缘凸点压印制作方法

Family Cites Families (23)

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JPH0462875A (ja) * 1990-06-25 1992-02-27 Seiko Instr Inc 半導体装置
EP1271121A3 (en) * 1998-07-07 2003-05-02 The Goodyear Tire & Rubber Company Method of fabricating silicon capacitive sensor
US6958255B2 (en) 2002-08-08 2005-10-25 The Board Of Trustees Of The Leland Stanford Junior University Micromachined ultrasonic transducers and method of fabrication
WO2005120130A1 (ja) 2004-06-03 2005-12-15 Olympus Corporation 静電容量型超音波振動子とその製造方法、静電容量型超音波プローブ
US7037746B1 (en) * 2004-12-27 2006-05-02 General Electric Company Capacitive micromachined ultrasound transducer fabricated with epitaxial silicon membrane
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US7745248B2 (en) * 2007-10-18 2010-06-29 The Board Of Trustees Of The Leland Stanford Junior University Fabrication of capacitive micromachined ultrasonic transducers by local oxidation
KR100977826B1 (ko) 2007-11-27 2010-08-27 한국전자통신연구원 멤스 마이크로폰 및 그 제조 방법
JP2010004199A (ja) * 2008-06-19 2010-01-07 Hitachi Ltd 超音波トランスデューサおよびその製造方法
US8087153B2 (en) 2008-06-24 2012-01-03 Canon Kabushiki Kaisha Manufacturing method of an electromechanical transducer
US8099854B2 (en) * 2008-06-24 2012-01-24 Canon Kabushiki Kaisha Manufacturing method of an electromechanical transducer
US20100173437A1 (en) * 2008-10-21 2010-07-08 Wygant Ira O Method of fabricating CMUTs that generate low-frequency and high-intensity ultrasound
KR101150186B1 (ko) 2009-12-04 2012-05-25 주식회사 비에스이 멤스 마이크로폰 및 그 제조방법
JP5550363B2 (ja) * 2010-01-26 2014-07-16 キヤノン株式会社 静電容量型電気機械変換装置
KR20130014501A (ko) * 2010-01-29 2013-02-07 리써치 트라이앵글 인스티튜트 압전 초음파 변환 장치의 형성 방법들 및 연관된 장치들
JP5677016B2 (ja) * 2010-10-15 2015-02-25 キヤノン株式会社 電気機械変換装置及びその作製方法
JP5921079B2 (ja) * 2011-04-06 2016-05-24 キヤノン株式会社 電気機械変換装置及びその作製方法
JP5812660B2 (ja) 2011-04-19 2015-11-17 キヤノン株式会社 電気機械変換装置及びその製造方法
JP5751026B2 (ja) * 2011-05-31 2015-07-22 セイコーエプソン株式会社 超音波トランスデューサー、生体センサー、及び超音波トランスデューサーの製造方法
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JP2013051459A (ja) * 2011-08-30 2013-03-14 Canon Inc 電気機械変換装置及びその製造方法
JP5834657B2 (ja) * 2011-09-12 2015-12-24 セイコーエプソン株式会社 超音波プローブおよび超音波画像診断装置

Also Published As

Publication number Publication date
US20130071964A1 (en) 2013-03-21
CN103011054A (zh) 2013-04-03
KR101473709B1 (ko) 2014-12-17
EP2572804A3 (en) 2017-12-27
CN103011054B (zh) 2015-10-14
EP2572804A2 (en) 2013-03-27
US8518733B2 (en) 2013-08-27
JP2013070112A (ja) 2013-04-18
KR20130031206A (ko) 2013-03-28

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