JP5889416B2 - 構造体形成方法、構造体および二官能性前駆体分子 - Google Patents
構造体形成方法、構造体および二官能性前駆体分子 Download PDFInfo
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- 238000000034 method Methods 0.000 title claims description 45
- 239000002243 precursor Substances 0.000 title claims description 36
- 230000001588 bifunctional effect Effects 0.000 title claims description 21
- 239000002041 carbon nanotube Substances 0.000 claims description 98
- 239000000758 substrate Substances 0.000 claims description 78
- 125000000524 functional group Chemical group 0.000 claims description 58
- 239000013545 self-assembled monolayer Substances 0.000 claims description 38
- 239000002094 self assembled monolayer Substances 0.000 claims description 29
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 25
- 229910021393 carbon nanotube Inorganic materials 0.000 claims description 25
- 239000000243 solution Substances 0.000 claims description 20
- 239000002563 ionic surfactant Substances 0.000 claims description 17
- 239000010410 layer Substances 0.000 claims description 17
- 239000006185 dispersion Substances 0.000 claims description 16
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 14
- 239000002356 single layer Substances 0.000 claims description 12
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical class C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 claims description 9
- 150000002500 ions Chemical class 0.000 claims description 9
- 239000000463 material Substances 0.000 claims description 9
- 150000004706 metal oxides Chemical group 0.000 claims description 9
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 7
- 229910044991 metal oxide Inorganic materials 0.000 claims description 7
- 150000003839 salts Chemical class 0.000 claims description 7
- 239000002253 acid Substances 0.000 claims description 6
- 239000012954 diazonium Substances 0.000 claims description 6
- 150000001989 diazonium salts Chemical class 0.000 claims description 6
- 150000004714 phosphonium salts Chemical class 0.000 claims description 6
- 239000004094 surface-active agent Substances 0.000 claims description 6
- 229910052751 metal Inorganic materials 0.000 claims description 5
- 239000002184 metal Substances 0.000 claims description 5
- 239000000203 mixture Substances 0.000 claims description 5
- NEAQRZUHTPSBBM-UHFFFAOYSA-N 2-hydroxy-3,3-dimethyl-7-nitro-4h-isoquinolin-1-one Chemical class C1=C([N+]([O-])=O)C=C2C(=O)N(O)C(C)(C)CC2=C1 NEAQRZUHTPSBBM-UHFFFAOYSA-N 0.000 claims description 4
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical class S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 claims description 4
- DBMJMQXJHONAFJ-UHFFFAOYSA-M Sodium laurylsulphate Chemical compound [Na+].CCCCCCCCCCCCOS([O-])(=O)=O DBMJMQXJHONAFJ-UHFFFAOYSA-M 0.000 claims description 4
- 150000003573 thiols Chemical class 0.000 claims description 4
- ABLZXFCXXLZCGV-UHFFFAOYSA-N Phosphorous acid Chemical compound OP(O)=O ABLZXFCXXLZCGV-UHFFFAOYSA-N 0.000 claims description 3
- 239000007864 aqueous solution Substances 0.000 claims description 3
- 150000001733 carboxylic acid esters Chemical group 0.000 claims description 3
- 238000000502 dialysis Methods 0.000 claims description 3
- 150000002527 isonitriles Chemical class 0.000 claims description 3
- QPJVMBTYPHYUOC-UHFFFAOYSA-N methyl benzoate Chemical class COC(=O)C1=CC=CC=C1 QPJVMBTYPHYUOC-UHFFFAOYSA-N 0.000 claims description 3
- 238000002156 mixing Methods 0.000 claims description 2
- 239000000377 silicon dioxide Substances 0.000 claims description 2
- 235000012239 silicon dioxide Nutrition 0.000 claims description 2
- NRHMKIHPTBHXPF-TUJRSCDTSA-M sodium cholate Chemical compound [Na+].C([C@H]1C[C@H]2O)[C@H](O)CC[C@]1(C)[C@@H]1[C@@H]2[C@@H]2CC[C@H]([C@@H](CCC([O-])=O)C)[C@@]2(C)[C@@H](O)C1 NRHMKIHPTBHXPF-TUJRSCDTSA-M 0.000 claims description 2
- 125000003262 carboxylic acid ester group Chemical group [H]C([H])([*:2])OC(=O)C([H])([H])[*:1] 0.000 claims 3
- 150000003009 phosphonic acids Chemical class 0.000 claims 1
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 13
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 12
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 6
- 229910000449 hafnium oxide Inorganic materials 0.000 description 6
- WIHZLLGSGQNAGK-UHFFFAOYSA-N hafnium(4+);oxygen(2-) Chemical compound [O-2].[O-2].[Hf+4] WIHZLLGSGQNAGK-UHFFFAOYSA-N 0.000 description 6
- 150000001350 alkyl halides Chemical class 0.000 description 5
- 150000003863 ammonium salts Chemical group 0.000 description 5
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- 239000011248 coating agent Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 238000010586 diagram Methods 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 239000003945 anionic surfactant Substances 0.000 description 4
- 229910052739 hydrogen Inorganic materials 0.000 description 4
- 239000001257 hydrogen Substances 0.000 description 4
- 0 *c1cc*(*)cc1 Chemical compound *c1cc*(*)cc1 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 238000004873 anchoring Methods 0.000 description 3
- 238000007306 functionalization reaction Methods 0.000 description 3
- 230000002209 hydrophobic effect Effects 0.000 description 3
- 150000002894 organic compounds Chemical class 0.000 description 3
- 229910052814 silicon oxide Inorganic materials 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- HUCVOHYBFXVBRW-UHFFFAOYSA-M caesium hydroxide Chemical compound [OH-].[Cs+] HUCVOHYBFXVBRW-UHFFFAOYSA-M 0.000 description 2
- -1 carboxylate ester Chemical class 0.000 description 2
- 239000003093 cationic surfactant Substances 0.000 description 2
- 239000008367 deionised water Substances 0.000 description 2
- 229910021641 deionized water Inorganic materials 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 230000005669 field effect Effects 0.000 description 2
- 239000012467 final product Substances 0.000 description 2
- 239000013505 freshwater Substances 0.000 description 2
- INQOMBQAUSQDDS-UHFFFAOYSA-N iodomethane Chemical compound IC INQOMBQAUSQDDS-UHFFFAOYSA-N 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000001000 micrograph Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 239000002071 nanotube Substances 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 229910052755 nonmetal Inorganic materials 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- CPRMKOQKXYSDML-UHFFFAOYSA-M rubidium hydroxide Chemical compound [OH-].[Rb+] CPRMKOQKXYSDML-UHFFFAOYSA-M 0.000 description 2
- RWSOTUBLDIXVET-UHFFFAOYSA-O sulfonium Chemical compound [SH3+] RWSOTUBLDIXVET-UHFFFAOYSA-O 0.000 description 2
- 239000000725 suspension Substances 0.000 description 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- AVXURJPOCDRRFD-UHFFFAOYSA-N Hydroxylamine Chemical compound ON AVXURJPOCDRRFD-UHFFFAOYSA-N 0.000 description 1
- HZNTVAYNXKPCFK-UHFFFAOYSA-N N-hydroxy-4-pyridinecarboxamide Chemical compound ONC(=O)C1=CC=NC=C1 HZNTVAYNXKPCFK-UHFFFAOYSA-N 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 1
- RSKRRDDCOZDBJP-UHFFFAOYSA-L [I-].[I-].C[N+]1=CC=CC=C1.C[N+]1=CC=CC=C1 Chemical compound [I-].[I-].C[N+]1=CC=CC=C1.C[N+]1=CC=CC=C1 RSKRRDDCOZDBJP-UHFFFAOYSA-L 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 125000000129 anionic group Chemical group 0.000 description 1
- 239000007900 aqueous suspension Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 125000002091 cationic group Chemical group 0.000 description 1
- YMKDRGPMQRFJGP-UHFFFAOYSA-M cetylpyridinium chloride Chemical compound [Cl-].CCCCCCCCCCCCCCCC[N+]1=CC=CC=C1 YMKDRGPMQRFJGP-UHFFFAOYSA-M 0.000 description 1
- 229960001927 cetylpyridinium chloride Drugs 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- REZZEXDLIUJMMS-UHFFFAOYSA-M dimethyldioctadecylammonium chloride Chemical compound [Cl-].CCCCCCCCCCCCCCCCCC[N+](C)(C)CCCCCCCCCCCCCCCCCC REZZEXDLIUJMMS-UHFFFAOYSA-M 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- CJNBYAVZURUTKZ-UHFFFAOYSA-N hafnium(iv) oxide Chemical compound O=[Hf]=O CJNBYAVZURUTKZ-UHFFFAOYSA-N 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 150000002632 lipids Chemical class 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- LZXXNPOYQCLXRS-UHFFFAOYSA-N methyl 4-aminobenzoate Chemical compound COC(=O)C1=CC=C(N)C=C1 LZXXNPOYQCLXRS-UHFFFAOYSA-N 0.000 description 1
- 229940095102 methyl benzoate Drugs 0.000 description 1
- OLXYLDUSSBULGU-UHFFFAOYSA-N methyl pyridine-4-carboxylate Chemical compound COC(=O)C1=CC=NC=C1 OLXYLDUSSBULGU-UHFFFAOYSA-N 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 150000003904 phospholipids Chemical class 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- NNFCIKHAZHQZJG-UHFFFAOYSA-N potassium cyanide Chemical compound [K+].N#[C-] NNFCIKHAZHQZJG-UHFFFAOYSA-N 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- VHQYRVFLHBEPKW-UHFFFAOYSA-N pyridine-2-diazonium Chemical class N#[N+]C1=CC=CC=N1 VHQYRVFLHBEPKW-UHFFFAOYSA-N 0.000 description 1
- 238000004626 scanning electron microscopy Methods 0.000 description 1
- 239000013049 sediment Substances 0.000 description 1
- 238000001338 self-assembly Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 1
- 239000002109 single walled nanotube Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 239000006228 supernatant Substances 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
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- C07D213/00—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members
- C07D213/02—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members
- C07D213/04—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom
- C07D213/60—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D213/78—Carbon atoms having three bonds to hetero atoms, with at the most one bond to halogen, e.g. ester or nitrile radicals
- C07D213/79—Acids; Esters
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- H10K85/221—Carbon nanotubes
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- C07D—HETEROCYCLIC COMPOUNDS
- C07D213/00—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members
- C07D213/02—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members
- C07D213/04—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom
- C07D213/60—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D213/72—Nitrogen atoms
- C07D213/76—Nitrogen atoms to which a second hetero atom is attached
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- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
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- H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
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- H10K85/221—Carbon nanotubes
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- B82—NANOTECHNOLOGY
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Description
新鮮な水で数回透析した後、フィルタ内の溶液は遊離した界面活性剤を含有しておらず、全ての界面活性剤はカーボンナノチューブに取着する。
Claims (17)
- カーボンナノチューブ(「CNT」)が選択的に配置された構造体を形成する構造体形成方法であって、
表面に等電点を有する第1の領域と、該第1の領域が有する等電点よりも小さい等電点を有する第2の領域とを有する基板を用意するステップと、
前記基板の前記第1の領域および前記第2の領域を有する前記表面と、第1の官能基と第1のイオン電荷部分を有する第2の官能基とを有する前駆体分子の溶液とを接触させて、前記第1のイオン電荷部分を表面に有し、前記第1の官能基で前記基板の前記第1の領域に選択的に固着された前記前駆体分子の自己組織化単層を形成するステップと、
前記自己組織化単層と、第2のイオン電荷部分を有する複数のCNTの分散液とを接触させるステップと
を含む構造体形成方法。 - 過剰なCNTが除去されるように濯ぐステップをさらに含む、請求項1に記載の構造体形成方法。
- 前記第1および第2のイオン電荷部分が反対に帯電している、請求項1または請求項2に記載の構造体形成方法。
- 前記第1のイオン電荷部分が正であり、前記第2のイオン電荷部分が負である、請求項3に記載の構造体形成方法。
- 前記第1のイオン電荷部分が、ピリジニウム塩、スルホニウム塩、およびホスホニウム塩からなる群から選択されるオニウム塩である、請求項1ないし4のいずれか1項に記載の構造体形成方法。
- 前記第1の官能基が、チオールおよびイソニトリルからなる群から選択され、かつ、前記基板の前記第1の領域の材料が金属を含む、請求項1〜5のいずれか1項に記載の構造体形成方法。
- 前記第1の官能基が、ホスホン酸およびヒドロキサム酸からなる群から選択され、かつ、前記基板の前記第1の領域の材料が金属酸化物領域を含む、請求項1〜5のいずれか1項に記載の構造体形成方法。
- 前記第1の等電点と前記第2の等電点との間の差が、少なくとも4である、請求項1〜7のいずれか1項に記載の構造体形成方法。
- 前記第1の領域が金属酸化物であり、前記第2の領域が二酸化ケイ素である、請求項8に記載の構造体形成方法。
- 前記基板を前記複数のCNTの前記分散液に接触させる前に、
(1)前記複数のCNTを、カルボン酸エステル基を有する有機分子に結合して複数の官能化CNTを形成し、
(2)前記カルボン酸エステル基を前記第2のイオン電荷部分に変換する
ことによって、前記第2のイオン電荷部分を有する前記複数のCNTを形成するステップ
をさらに含む、請求項1〜9のいずれか1項に記載の構造体形成方法。 - 前記基板を前記複数のCNTの前記分散液に接触させる前に、
(1)前記複数のCNTと、イオン性界面活性剤の水溶液とを合わせて、前記イオン性界面活性剤の単層でコーティングされたCNTと、過剰なイオン性界面活性剤との混合物を形成し、
(2)前記混合物を水中で透析して、遊離した前記過剰なイオン性界面活性剤を除去することによって、前記第2のイオン電荷部分を有する前記複数のCNTを形成するステップ
をさらに含み、
前記単層の前記イオン性界面活性剤のイオン電荷部分が前記第2のイオン電荷部分である、請求項1〜9のいずれか1項に記載の構造体形成方法。 - 前記イオン性界面活性剤が、DNA、コール酸ナトリウム、およびドデシル硫酸ナトリウムからなる群から選択される、請求項11に記載の構造体形成方法。
- カーボンナノチューブ(「CNT」)が選択的に配置された構造体を形成する構造体形成方法であって、
表面を有する基板を用意するステップと、
前記基板の前記表面と前駆体分子の溶液とを接触させて、前記表面に第1のイオン電荷部分を有する自己組織化単層を形成するステップと、
前記自己組織化単層と、第2のイオン電荷部分を有する複数のCNTの分散液とを接触させるステップと
を含み、前記基板を前記複数のCNTの前記分散液に接触させる前に、
(1)前記複数のCNTを、カルボン酸エステル基を有する有機分子に結合して複数の官能化CNTを形成し、
(2)前記カルボン酸エステル基を前記第2のイオン電荷部分に変換する
ことによって、前記第2のイオン電荷部分を有する前記複数のCNTを形成するステップ
をさらに含む、構造体形成方法。 - 前記複数の官能化CNTを形成することが、
水、前記複数のCNT、界面活性剤、および安息香酸メチルのジアゾニウム塩を混合して、複数の安息香酸メチル官能化CNTを形成すること
を含む、請求項13に記載の構造体形成方法。 - 前記カルボン酸エステル基を変換することは、
塩基と前記複数の官能化CNTとを混合して、前記官能化CNT上に負電荷を有する前記第2のイオン電荷部分を形成すること
を含む、請求項13または請求項14に記載の構造体形成方法。 - カーボンナノチューブ(CNT)層を有する構造体であって、前記構造体が、
等電点を有する第1の領域と、該第1の領域が有する等電点よりも小さい等電点を有する第2の領域とを有する基板と、
前記第1の領域上の自己組織化単層であって、第1の官能基と第1のイオン電荷部分を有する第2の官能基とを有する分子を含み、前記第1のイオン電荷部分を表面に有し、前記第1の官能基で前記基板の前記第1の領域に選択的に固着された前記分子の当該自己組織化単層と、
前記自己組織化単層上のCNT層であって、前記CNT層は、前記自己組織化単層の前記第1のイオン電荷部分に結合する第2のイオン電荷部分を有するCNTを含む、当該CNT層と
を含む、構造体。 - 自己組織化単層を作製するための二官能性前駆体分子であって、前記二官能性前駆体分子が、
前記自己組織化単層を基板に固着する第1の官能基と、
第1のイオン電荷部分を有する第2の官能基と
を含み、
前記第1の官能基が、チオール、イソニトリル、ホスホン酸、およびヒドロキサム酸からなる群から選択され、
前記第1のイオン電荷部分が、ピリジニウム塩、スルホニウム塩、およびホスホニウム塩からなる群から選択され、
前記第1の官能基は、等電点を有する第1の領域と該第1の領域よりも小さな等電点を有する第2の領域とを含む基板の表面に接触されると、前記第1の領域に選択的に固着され、
前記第1のイオン電荷部分は、第2のイオン電荷部分を有する複数のCNTの分散液に接触されると、前記第2のイオン電荷部分と結合する、
二官能性前駆体分子。
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Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8986524B2 (en) | 2011-01-28 | 2015-03-24 | International Business Machines Corporation | DNA sequence using multiple metal layer structure with different organic coatings forming different transient bondings to DNA |
US9273004B2 (en) | 2011-09-29 | 2016-03-01 | International Business Machines Corporation | Selective placement of carbon nanotubes via coulombic attraction of oppositely charged carbon nanotubes and self-assembled monolayers |
US10029915B2 (en) | 2012-04-04 | 2018-07-24 | International Business Machines Corporation | Functionally switchable self-assembled coating compound for controlling translocation of molecule through nanopores |
US9193585B2 (en) | 2013-06-07 | 2015-11-24 | International Business Machines Corporation | Surface modification using functional carbon nanotubes |
US9188578B2 (en) | 2013-06-19 | 2015-11-17 | Globalfoundries Inc. | Nanogap device with capped nanowire structures |
US9435896B2 (en) | 2013-07-31 | 2016-09-06 | Globalfoundries Inc. | Radiation detector based on charged self-assembled monolayers on nanowire devices |
US9214332B2 (en) | 2014-03-20 | 2015-12-15 | International Business Machines Corporation | Composite dielectric materials with improved mechanical and electrical properties |
US9442695B2 (en) | 2014-05-02 | 2016-09-13 | International Business Machines Corporation | Random bit generator based on nanomaterials |
KR102038124B1 (ko) * | 2016-06-27 | 2019-10-29 | 숭실대학교산학협력단 | 유기 반도체 소자의 제조 방법 |
US9800414B2 (en) | 2015-06-19 | 2017-10-24 | International Business Machines Corporation | Chip authentication technology using carbon nanotubes |
US10036744B2 (en) | 2015-12-18 | 2018-07-31 | International Business Machines Corporation | Bifunctional acid monolayers for the selective placement of carbon nanotubes |
JP2017121673A (ja) * | 2016-01-05 | 2017-07-13 | 株式会社ニコン | 加工装置及び加工方法、デバイス製造方法、並びに、コンピュータプログラム |
US9748334B1 (en) | 2016-02-18 | 2017-08-29 | International Business Machines Corporation | Fabrication of nanomaterial T-gate transistors with charge transfer doping layer |
US9859500B2 (en) * | 2016-02-18 | 2018-01-02 | International Business Machines Corporation | Formation of carbon nanotube-containing devices |
US9806265B1 (en) | 2016-04-07 | 2017-10-31 | International Business Machines Corporation | Heterogeneous nanostructures for hierarchal assembly |
US9691987B1 (en) | 2016-10-20 | 2017-06-27 | International Business Machines Corporation | Self-assembly of nanostructures |
TW201827120A (zh) * | 2017-01-27 | 2018-08-01 | 國立大學法人信州大學 | 碳被膜之製造方法及被膜之製造方法 |
US10243156B2 (en) * | 2017-03-16 | 2019-03-26 | International Business Machines Corporation | Placement of carbon nanotube guided by DSA patterning |
US10672986B2 (en) * | 2018-04-13 | 2020-06-02 | International Business Machines Corporation | Self-assembly of nanostructures |
US11002730B2 (en) * | 2018-05-23 | 2021-05-11 | International Business Machines Corporation | Molecular design to suppress desorption of self-assembled monolayers |
CN113782674B (zh) * | 2020-06-09 | 2024-02-27 | 北京元芯碳基集成电路研究院 | 碳纳米管射频器件、制造方法及集成电路系统 |
Family Cites Families (41)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5301143A (en) | 1992-12-31 | 1994-04-05 | Micron Semiconductor, Inc. | Method for identifying a semiconductor die using an IC with programmable links |
DE50014713D1 (de) | 2000-01-11 | 2007-11-22 | Infineon Technologies Ag | Halbleiterchip mit eindeutiger identität und verfahren zur festlegung der eindeutigen identität eines halbleiterchips |
US7301199B2 (en) | 2000-08-22 | 2007-11-27 | President And Fellows Of Harvard College | Nanoscale wires and related devices |
US20030211129A1 (en) | 2001-04-13 | 2003-11-13 | Spillman William B | Self-assembled thin film coating to enhance biocompatibility of materials |
US6733828B2 (en) | 2002-01-29 | 2004-05-11 | Kuei-Jung Chao | Method of fabricating nanostructured materials |
DE60325903D1 (de) | 2002-07-25 | 2009-03-05 | California Inst Of Techn | Dreidimensionales Speicher-Array |
US20060099135A1 (en) * | 2002-09-10 | 2006-05-11 | Yodh Arjun G | Carbon nanotubes: high solids dispersions and nematic gels thereof |
US20050002851A1 (en) * | 2002-11-26 | 2005-01-06 | Mcelrath Kenneth O. | Carbon nanotube particulates, compositions and use thereof |
US6969690B2 (en) | 2003-03-21 | 2005-11-29 | The University Of North Carolina At Chapel Hill | Methods and apparatus for patterned deposition of nanostructure-containing materials by self-assembly and related articles |
FR2853657B1 (fr) | 2003-04-10 | 2005-06-24 | Centre Nat Rech Scient | Macromolecules auto assemblees et photopolymerisees autour de nanotubes de carbone, un procede pour leur preparation, et leurs applications |
US7312100B2 (en) | 2003-05-27 | 2007-12-25 | The North Carolina State University | In situ patterning of electrolyte for molecular information storage devices |
WO2005029498A2 (en) | 2003-07-24 | 2005-03-31 | California Institute Of Technology | Nanoscale wire coding for stochastic assembly |
US20050151126A1 (en) | 2003-12-31 | 2005-07-14 | Intel Corporation | Methods of producing carbon nanotubes using peptide or nucleic acid micropatterning |
FR2870376B1 (fr) | 2004-05-11 | 2006-09-22 | Yann Boutant | Procede de reconnaissance de supports fibreux, ainsi que les applications d'un tel procede dans le domaine informatique notamment |
US7296576B2 (en) * | 2004-08-18 | 2007-11-20 | Zyvex Performance Materials, Llc | Polymers for enhanced solubility of nanomaterials, compositions and methods therefor |
US7405129B2 (en) * | 2004-11-18 | 2008-07-29 | International Business Machines Corporation | Device comprising doped nano-component and method of forming the device |
EP1851732A4 (en) | 2005-01-19 | 2010-08-04 | Agency Science Tech & Res | IDENTIFICATION LABEL, OBJECT ADAPTED TO BE IDENTIFIED AND RELATED METHODS, DEVICES AND SYSTEMS |
US7504132B2 (en) * | 2005-01-27 | 2009-03-17 | International Business Machines Corporation | Selective placement of carbon nanotubes on oxide surfaces |
US7763353B2 (en) | 2005-06-10 | 2010-07-27 | Ut-Battelle, Llc | Fabrication of high thermal conductivity arrays of carbon nanotubes and their composites |
US8859048B2 (en) * | 2006-01-03 | 2014-10-14 | International Business Machines Corporation | Selective placement of carbon nanotubes through functionalization |
US7544546B2 (en) | 2006-05-15 | 2009-06-09 | International Business Machines Corporation | Formation of carbon and semiconductor nanomaterials using molecular assemblies |
US7531293B2 (en) | 2006-06-02 | 2009-05-12 | International Business Machines Corporation | Radiation sensitive self-assembled monolayers and uses thereof |
WO2008013508A1 (en) | 2006-07-28 | 2008-01-31 | Nanyang Technological University | Method of aligning nanotubes |
JP2008258532A (ja) | 2007-04-09 | 2008-10-23 | Brother Ind Ltd | 薄膜トランジスタの製造方法及びその製造方法により製造された薄膜トランジスタ。 |
US7759063B2 (en) | 2007-08-29 | 2010-07-20 | International Business Machines Corporation | DNA-based functionalization of single walled carbon nanotubes for directed assembly |
US20090320911A1 (en) | 2007-09-18 | 2009-12-31 | Rodney Ruoff | Method and system for improving conductivity of nanotube nets and related materials |
JP2009092647A (ja) * | 2007-09-19 | 2009-04-30 | Hitachi High-Technologies Corp | 陰イオン濃度測定装置及び陰イオン濃度測定素子 |
US7732119B2 (en) | 2007-10-10 | 2010-06-08 | International Business Machines Corporation | Photosensitive self-assembled monolayer for selective placement of hydrophilic structures |
US20090232724A1 (en) | 2008-03-11 | 2009-09-17 | Ali Afzali-Ardakani | Method of separating metallic and semiconducting carbon nanotubes from a mixture of same |
KR101071325B1 (ko) * | 2008-08-05 | 2011-10-07 | 재단법인서울대학교산학협력재단 | 정렬된 나노구조물을 구비한 회로 기판 및 그 제조 방법 |
US8138102B2 (en) * | 2008-08-21 | 2012-03-20 | International Business Machines Corporation | Method of placing a semiconducting nanostructure and semiconductor device including the semiconducting nanostructure |
US20100044074A1 (en) * | 2008-08-25 | 2010-02-25 | Yong Hyup Kim | Carbon nanotube networks with metal bridges |
US8004018B2 (en) * | 2008-12-29 | 2011-08-23 | Nokia Corporation | Fabrication method of electronic devices based on aligned high aspect ratio nanoparticle networks |
US8323439B2 (en) | 2009-03-08 | 2012-12-04 | Hewlett-Packard Development Company, L.P. | Depositing carbon nanotubes onto substrate |
WO2010115143A1 (en) | 2009-04-03 | 2010-10-07 | University Of Southern California | Surface modification of nanosensor platforms to increase sensitivity and reproducibility |
US8028924B2 (en) | 2009-09-15 | 2011-10-04 | International Business Machines Corporation | Device and method for providing an integrated circuit with a unique identification |
JP4527194B1 (ja) * | 2009-12-11 | 2010-08-18 | エンパイア テクノロジー ディベロップメント エルエルシー | グラフェン構造体、グラフェン構造体の製造方法、及び電子デバイス |
KR101724064B1 (ko) * | 2010-02-18 | 2017-04-10 | 삼성전자주식회사 | 전도성 탄소나노튜브-금속 복합체 잉크 |
CN101950685B (zh) | 2010-08-23 | 2012-05-23 | 清华大学 | 三维结构聚吡咯微电极及其制造方法 |
US9273004B2 (en) | 2011-09-29 | 2016-03-01 | International Business Machines Corporation | Selective placement of carbon nanotubes via coulombic attraction of oppositely charged carbon nanotubes and self-assembled monolayers |
US9442695B2 (en) | 2014-05-02 | 2016-09-13 | International Business Machines Corporation | Random bit generator based on nanomaterials |
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