JP5869713B1 - 光源装置及び露光装置とその検査方法 - Google Patents
光源装置及び露光装置とその検査方法 Download PDFInfo
- Publication number
- JP5869713B1 JP5869713B1 JP2015081773A JP2015081773A JP5869713B1 JP 5869713 B1 JP5869713 B1 JP 5869713B1 JP 2015081773 A JP2015081773 A JP 2015081773A JP 2015081773 A JP2015081773 A JP 2015081773A JP 5869713 B1 JP5869713 B1 JP 5869713B1
- Authority
- JP
- Japan
- Prior art keywords
- discharge lamp
- lamp
- incandescent lamp
- voltage
- light source
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
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- 238000000034 method Methods 0.000 title abstract description 10
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- 239000000463 material Substances 0.000 abstract description 6
- 238000001514 detection method Methods 0.000 abstract description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 9
- 238000003780 insertion Methods 0.000 description 5
- 230000037431 insertion Effects 0.000 description 5
- 238000007789 sealing Methods 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- 230000004308 accommodation Effects 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
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- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 3
- 229910052721 tungsten Inorganic materials 0.000 description 3
- 239000010937 tungsten Substances 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
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- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000004590 computer program Methods 0.000 description 1
- 238000012790 confirmation Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
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- 150000002367 halogens Chemical class 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
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Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B47/00—Circuit arrangements for operating light sources in general, i.e. where the type of light source is not relevant
- H05B47/20—Responsive to malfunctions or to light source life; for protection
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70591—Testing optical components
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/24—Testing of discharge tubes
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/70016—Production of exposure light, i.e. light sources by discharge lamps
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70616—Monitoring the printed patterns
- G03F7/7065—Defects, e.g. optical inspection of patterned layer for defects
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Circuit Arrangement For Electric Light Sources In General (AREA)
Priority Applications (8)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2015081773A JP5869713B1 (ja) | 2015-04-13 | 2015-04-13 | 光源装置及び露光装置とその検査方法 |
| TW106131956A TWI639899B (zh) | 2015-04-13 | 2016-03-08 | 光源裝置 |
| TW105107036A TWI609249B (zh) | 2015-04-13 | 2016-03-08 | 曝光裝置及放電燈的檢查方法 |
| KR1020160044876A KR101804755B1 (ko) | 2015-04-13 | 2016-04-12 | 노광 장치와 그 검사 방법 |
| CN201710673011.XA CN107478976B (zh) | 2015-04-13 | 2016-04-13 | 光源装置 |
| CN201610225945.2A CN106061077B (zh) | 2015-04-13 | 2016-04-13 | 曝光装置及其检查方法 |
| KR1020170130254A KR20170118003A (ko) | 2015-04-13 | 2017-10-11 | 광원 장치 |
| KR1020180106232A KR101962099B1 (ko) | 2015-04-13 | 2018-09-06 | 광원 장치 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2015081773A JP5869713B1 (ja) | 2015-04-13 | 2015-04-13 | 光源装置及び露光装置とその検査方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP5869713B1 true JP5869713B1 (ja) | 2016-02-24 |
| JP2016200751A JP2016200751A (ja) | 2016-12-01 |
Family
ID=55360934
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015081773A Active JP5869713B1 (ja) | 2015-04-13 | 2015-04-13 | 光源装置及び露光装置とその検査方法 |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP5869713B1 (zh) |
| KR (3) | KR101804755B1 (zh) |
| CN (2) | CN106061077B (zh) |
| TW (2) | TWI609249B (zh) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2019039427A1 (ja) * | 2017-08-23 | 2019-02-28 | フェニックス電機株式会社 | 光源装置、露光装置、および光源装置の判定方法 |
| CN111066376A (zh) * | 2017-09-16 | 2020-04-24 | 凤凰电机公司 | 光源装置、曝光装置以及光源装置的判定方法 |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110249267B (zh) | 2017-02-02 | 2021-09-03 | 株式会社V技术 | 高压放电灯 |
| JP6951740B2 (ja) * | 2017-09-11 | 2021-10-20 | フェニックス電機株式会社 | 光源装置、それを備える照射装置、および光源装置の点灯方法 |
| US11913985B2 (en) * | 2018-03-13 | 2024-02-27 | Phoenix Electric Co., Ltd | Light source device including discharge lamp, irradiation device and distinguishing method for discharge lamp |
| JP7060244B2 (ja) * | 2018-12-12 | 2022-04-26 | フェニックス電機株式会社 | 露光装置用光源、それを用いた露光装置、およびレジストの露光方法 |
| JP7253798B2 (ja) | 2019-11-18 | 2023-04-07 | フェニックス電機株式会社 | ランプ保持用カセット、およびそれを用いた露光装置用光源 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05315090A (ja) * | 1992-05-13 | 1993-11-26 | Hitachi Medical Corp | Ｘ線装置 |
| JP2001210490A (ja) * | 2000-01-26 | 2001-08-03 | Matsushita Electric Works Ltd | 放電灯点灯装置 |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6243059A (ja) | 1985-08-19 | 1987-02-25 | 東芝ライテック株式会社 | 白熱電球の欠陥検出方法 |
| JPS62292548A (ja) * | 1986-06-10 | 1987-12-19 | Koito Mfg Co Ltd | 車輌用前照灯 |
| JP3214176B2 (ja) | 1993-08-16 | 2001-10-02 | 日産自動車株式会社 | 差動制限トルク制御装置 |
| KR19990031316U (ko) * | 1997-12-30 | 1999-07-26 | 정몽규 | 비순정 헤드 램프 사용시 헤드 램프 전원 차단 장치 |
| JP2007506239A (ja) * | 2003-09-18 | 2007-03-15 | コニンクリユケ フィリップス エレクトロニクス エヌ．ブイ． | 混合光ランプ |
| CN101223829B (zh) * | 2005-07-15 | 2011-09-07 | 松下电器产业株式会社 | 高压放电灯的点亮方法、点亮装置、光源装置以及投射型图像显示装置 |
| JP4101269B2 (ja) * | 2006-03-31 | 2008-06-18 | 株式会社オーク製作所 | 光源装置 |
| JP2007333965A (ja) | 2006-06-14 | 2007-12-27 | Adtec Engineeng Co Ltd | 露光用照明装置 |
| WO2008078241A1 (en) * | 2006-12-20 | 2008-07-03 | Philips Intellectual Property & Standards Gmbh | White light emitting electric lamp assembly |
| JP4937808B2 (ja) * | 2007-03-26 | 2012-05-23 | フェニックス電機株式会社 | 光源装置ならびにこれを用いた露光装置 |
| JP4955436B2 (ja) * | 2007-03-26 | 2012-06-20 | フェニックス電機株式会社 | 光源装置ならびにこれを用いた露光装置 |
| US7969100B2 (en) | 2007-05-17 | 2011-06-28 | Liberty Hardware Manufacturing Corp. | Bulb type detector for dimmer circuit and inventive resistance and short circuit detection |
| JP5247268B2 (ja) * | 2008-07-08 | 2013-07-24 | 三洋電機株式会社 | 投射型映像表示装置 |
| TWM409671U (en) * | 2010-12-29 | 2011-08-11 | Ecolumina Technologies Inc | Illumination control system |
| JP5069371B1 (ja) * | 2011-12-16 | 2012-11-07 | フェニックス電機株式会社 | 光源装置 |
| TWI609247B (zh) * | 2013-04-09 | 2017-12-21 | Orc Manufacturing Co Ltd | Light source apparatus and exposure apparatus including the light source apparatus |
| CN104062099A (zh) * | 2014-07-16 | 2014-09-24 | 苏州威盛视信息科技有限公司 | 侧发光led灯条测试装置和方法 |
-
2015
- 2015-04-13 JP JP2015081773A patent/JP5869713B1/ja active Active
-
2016
- 2016-03-08 TW TW105107036A patent/TWI609249B/zh active
- 2016-03-08 TW TW106131956A patent/TWI639899B/zh active
- 2016-04-12 KR KR1020160044876A patent/KR101804755B1/ko active IP Right Grant
- 2016-04-13 CN CN201610225945.2A patent/CN106061077B/zh active Active
- 2016-04-13 CN CN201710673011.XA patent/CN107478976B/zh active Active
-
2017
- 2017-10-11 KR KR1020170130254A patent/KR20170118003A/ko active Search and Examination
-
2018
- 2018-09-06 KR KR1020180106232A patent/KR101962099B1/ko active IP Right Grant
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05315090A (ja) * | 1992-05-13 | 1993-11-26 | Hitachi Medical Corp | Ｘ線装置 |
| JP2001210490A (ja) * | 2000-01-26 | 2001-08-03 | Matsushita Electric Works Ltd | 放電灯点灯装置 |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2019039427A1 (ja) * | 2017-08-23 | 2019-02-28 | フェニックス電機株式会社 | 光源装置、露光装置、および光源装置の判定方法 |
| KR20200043377A (ko) * | 2017-08-23 | 2020-04-27 | 페닉스덴키가부시키가이샤 | 광원 장치, 노광 장치 및 광원 장치의 판정 방법 |
| KR102537954B1 (ko) * | 2017-08-23 | 2023-05-30 | 페닉스덴키가부시키가이샤 | 광원 장치, 노광 장치 및 광원 장치의 판정 방법 |
| CN111066376A (zh) * | 2017-09-16 | 2020-04-24 | 凤凰电机公司 | 光源装置、曝光装置以及光源装置的判定方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| CN106061077A (zh) | 2016-10-26 |
| KR20160122086A (ko) | 2016-10-21 |
| KR101804755B1 (ko) | 2017-12-06 |
| KR20180103785A (ko) | 2018-09-19 |
| JP2016200751A (ja) | 2016-12-01 |
| CN106061077B (zh) | 2018-06-12 |
| TW201708971A (zh) | 2017-03-01 |
| TWI639899B (zh) | 2018-11-01 |
| KR20170118003A (ko) | 2017-10-24 |
| TW201809908A (zh) | 2018-03-16 |
| TWI609249B (zh) | 2017-12-21 |
| CN107478976A (zh) | 2017-12-15 |
| KR101962099B1 (ko) | 2019-03-27 |
| CN107478976B (zh) | 2020-05-19 |
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