JP5856714B2 - シリコンを精製する方法 - Google Patents
シリコンを精製する方法 Download PDFInfo
- Publication number
- JP5856714B2 JP5856714B2 JP2015520382A JP2015520382A JP5856714B2 JP 5856714 B2 JP5856714 B2 JP 5856714B2 JP 2015520382 A JP2015520382 A JP 2015520382A JP 2015520382 A JP2015520382 A JP 2015520382A JP 5856714 B2 JP5856714 B2 JP 5856714B2
- Authority
- JP
- Japan
- Prior art keywords
- melt
- silicon
- sodium
- solvent metal
- mother liquor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/02—Silicon
- C01B33/037—Purification
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/80—Compositional purity
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Silicon Compounds (AREA)
- Manufacture And Refinement Of Metals (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201261663865P | 2012-06-25 | 2012-06-25 | |
| US61/663,865 | 2012-06-25 | ||
| PCT/US2013/047493 WO2014004434A1 (en) | 2012-06-25 | 2013-06-25 | Method of purifying silicon |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2015521580A JP2015521580A (ja) | 2015-07-30 |
| JP2015521580A5 JP2015521580A5 (cg-RX-API-DMAC10.html) | 2015-09-10 |
| JP5856714B2 true JP5856714B2 (ja) | 2016-02-10 |
Family
ID=48771739
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015520382A Expired - Fee Related JP5856714B2 (ja) | 2012-06-25 | 2013-06-25 | シリコンを精製する方法 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US20150336802A1 (cg-RX-API-DMAC10.html) |
| EP (1) | EP2864250A1 (cg-RX-API-DMAC10.html) |
| JP (1) | JP5856714B2 (cg-RX-API-DMAC10.html) |
| KR (1) | KR101663434B1 (cg-RX-API-DMAC10.html) |
| CN (1) | CN104583123B (cg-RX-API-DMAC10.html) |
| BR (1) | BR112014032597A2 (cg-RX-API-DMAC10.html) |
| TW (1) | TWI488808B (cg-RX-API-DMAC10.html) |
| WO (1) | WO2014004434A1 (cg-RX-API-DMAC10.html) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111017943B (zh) * | 2019-12-03 | 2022-11-04 | 浙江工业大学之江学院 | 一种利用菱镁矿尾矿制备镁皂石的方法 |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3201312C2 (de) * | 1982-01-18 | 1983-12-22 | Skw Trostberg Ag, 8223 Trostberg | Verfahren zur Reinigung von Silicium |
| US4822585A (en) * | 1982-05-05 | 1989-04-18 | Aluminum Company Of America | Silicon purification method using copper or copper-aluminum solvent metal |
| CN101137577A (zh) * | 2005-03-07 | 2008-03-05 | 新日铁高新材料 | 高纯硅的制备方法 |
| JP5140835B2 (ja) * | 2005-03-07 | 2013-02-13 | 新日鉄住金マテリアルズ株式会社 | 高純度シリコンの製造方法 |
| JP4671872B2 (ja) * | 2006-01-18 | 2011-04-20 | 新日鉄マテリアルズ株式会社 | シリコンの精錬方法 |
| JP4671871B2 (ja) | 2006-01-18 | 2011-04-20 | 新日鉄マテリアルズ株式会社 | シリコンの精錬方法 |
| KR101061530B1 (ko) * | 2006-04-04 | 2011-09-01 | 6엔 실리콘 아이엔씨. | 실리콘의 정제 방법 |
| US9243311B2 (en) * | 2007-03-13 | 2016-01-26 | Silicor Materials Inc. | Method for removing phosphorous and boron from aluminium silicon alloy for use in purifying silicon |
| CN101723382A (zh) * | 2008-10-21 | 2010-06-09 | 华南师范大学 | 一种硅的提纯方法 |
-
2013
- 2013-06-25 CN CN201380043556.2A patent/CN104583123B/zh not_active Expired - Fee Related
- 2013-06-25 EP EP13735146.6A patent/EP2864250A1/en not_active Withdrawn
- 2013-06-25 BR BR112014032597A patent/BR112014032597A2/pt not_active IP Right Cessation
- 2013-06-25 JP JP2015520382A patent/JP5856714B2/ja not_active Expired - Fee Related
- 2013-06-25 WO PCT/US2013/047493 patent/WO2014004434A1/en not_active Ceased
- 2013-06-25 TW TW102122460A patent/TWI488808B/zh not_active IP Right Cessation
- 2013-06-25 US US14/409,430 patent/US20150336802A1/en not_active Abandoned
- 2013-06-25 KR KR1020157001826A patent/KR101663434B1/ko not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| TWI488808B (zh) | 2015-06-21 |
| TW201404715A (zh) | 2014-02-01 |
| CN104583123A (zh) | 2015-04-29 |
| WO2014004434A1 (en) | 2014-01-03 |
| EP2864250A1 (en) | 2015-04-29 |
| JP2015521580A (ja) | 2015-07-30 |
| BR112014032597A2 (pt) | 2017-06-27 |
| US20150336802A1 (en) | 2015-11-26 |
| KR101663434B1 (ko) | 2016-10-06 |
| CN104583123B (zh) | 2017-07-25 |
| KR20150033674A (ko) | 2015-04-01 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP2171133B1 (en) | Use of acid washing to provide purified silicon crystals | |
| CN101460399B (zh) | 纯化硅的方法 | |
| US20170057831A1 (en) | Flux composition useful in directional solidification for purifying silicon | |
| US10773963B2 (en) | Method of purifying aluminum and use of purified aluminum to purify silicon | |
| TWI488807B (zh) | 添加鹼金屬鎂鹵化物至溶劑金屬 | |
| JP2015521580A (ja) | シリコンを精製する方法 | |
| TWI488818B (zh) | 坩堝及使用其於矽之純化之方法 | |
| JP2007270308A (ja) | アンチモン及びその精製方法 | |
| TWI541195B (zh) | 利用酸洗以提供純化之矽晶體 | |
| JP3784332B2 (ja) | ガリウムの精製方法 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20150204 |
|
| RD04 | Notification of resignation of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7424 Effective date: 20150526 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20150612 |
|
| A871 | Explanation of circumstances concerning accelerated examination |
Free format text: JAPANESE INTERMEDIATE CODE: A871 Effective date: 20150612 |
|
| A975 | Report on accelerated examination |
Free format text: JAPANESE INTERMEDIATE CODE: A971005 Effective date: 20150703 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20150722 |
|
| A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20151022 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20151028 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20151203 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20151211 |
|
| R150 | Certificate of patent or registration of utility model |
Ref document number: 5856714 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| LAPS | Cancellation because of no payment of annual fees |