JP5855825B2 - テクスチャを持たせた超疎油性表面を有するインクジェットプリントヘッド前面を準備するためのプロセス - Google Patents
テクスチャを持たせた超疎油性表面を有するインクジェットプリントヘッド前面を準備するためのプロセス Download PDFInfo
- Publication number
- JP5855825B2 JP5855825B2 JP2010293181A JP2010293181A JP5855825B2 JP 5855825 B2 JP5855825 B2 JP 5855825B2 JP 2010293181 A JP2010293181 A JP 2010293181A JP 2010293181 A JP2010293181 A JP 2010293181A JP 5855825 B2 JP5855825 B2 JP 5855825B2
- Authority
- JP
- Japan
- Prior art keywords
- textured
- silicon
- oleophobic
- oxide layer
- ink
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 8
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 102
- 229910052710 silicon Inorganic materials 0.000 claims description 100
- 239000010703 silicon Substances 0.000 claims description 100
- 238000000034 method Methods 0.000 claims description 57
- 238000000576 coating method Methods 0.000 claims description 45
- 230000008569 process Effects 0.000 claims description 41
- 239000011248 coating agent Substances 0.000 claims description 40
- 239000000758 substrate Substances 0.000 claims description 39
- 238000005530 etching Methods 0.000 claims description 25
- 239000007788 liquid Substances 0.000 claims description 25
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 21
- XPBBUZJBQWWFFJ-UHFFFAOYSA-N fluorosilane Chemical compound [SiH3]F XPBBUZJBQWWFFJ-UHFFFAOYSA-N 0.000 claims description 13
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 13
- 238000000206 photolithography Methods 0.000 claims description 10
- 238000012545 processing Methods 0.000 claims description 10
- 238000012993 chemical processing Methods 0.000 claims description 8
- 238000002161 passivation Methods 0.000 claims description 7
- 238000000059 patterning Methods 0.000 claims description 4
- 238000005229 chemical vapour deposition Methods 0.000 claims description 3
- 230000001681 protective effect Effects 0.000 claims description 3
- 239000002210 silicon-based material Substances 0.000 claims description 3
- 238000007740 vapor deposition Methods 0.000 claims description 3
- 239000003921 oil Substances 0.000 claims description 2
- 239000000976 ink Substances 0.000 description 77
- DCAYPVUWAIABOU-UHFFFAOYSA-N hexadecane Chemical compound CCCCCCCCCCCCCCCC DCAYPVUWAIABOU-UHFFFAOYSA-N 0.000 description 32
- 239000007787 solid Substances 0.000 description 27
- 239000000463 material Substances 0.000 description 23
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 19
- 229920002120 photoresistant polymer Polymers 0.000 description 14
- 238000004140 cleaning Methods 0.000 description 10
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 10
- 239000004810 polytetrafluoroethylene Substances 0.000 description 10
- 238000000708 deep reactive-ion etching Methods 0.000 description 7
- 238000012423 maintenance Methods 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 229920001296 polysiloxane Polymers 0.000 description 6
- DNVQGNXDBSMTCA-UHFFFAOYSA-N trichloro(8-fluorooctyl)silane Chemical compound FCCCCCCCC[Si](Cl)(Cl)Cl DNVQGNXDBSMTCA-UHFFFAOYSA-N 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 239000012530 fluid Substances 0.000 description 5
- -1 polytetrafluoroethylene Polymers 0.000 description 5
- 230000003068 static effect Effects 0.000 description 5
- 238000009736 wetting Methods 0.000 description 5
- 239000004215 Carbon black (E152) Substances 0.000 description 4
- 229930195733 hydrocarbon Natural products 0.000 description 4
- 150000002430 hydrocarbons Chemical class 0.000 description 4
- 239000000377 silicon dioxide Substances 0.000 description 4
- 235000012239 silicon dioxide Nutrition 0.000 description 4
- 230000003075 superhydrophobic effect Effects 0.000 description 4
- 241000252506 Characiformes Species 0.000 description 3
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 230000009471 action Effects 0.000 description 3
- 238000013461 design Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 230000003628 erosive effect Effects 0.000 description 3
- 229910052731 fluorine Inorganic materials 0.000 description 3
- 239000011737 fluorine Substances 0.000 description 3
- 230000002209 hydrophobic effect Effects 0.000 description 3
- 230000001965 increasing effect Effects 0.000 description 3
- 150000002500 ions Chemical class 0.000 description 3
- 230000002829 reductive effect Effects 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- 229920006362 Teflon® Polymers 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000002950 deficient Effects 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- KZALAKAWDLAOKY-UHFFFAOYSA-N hexadecane;octane Chemical compound CCCCCCCC.CCCCCCCCCCCCCCCC KZALAKAWDLAOKY-UHFFFAOYSA-N 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 238000001020 plasma etching Methods 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 2
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 2
- 235000012431 wafers Nutrition 0.000 description 2
- KRQUFUKTQHISJB-YYADALCUSA-N 2-[(E)-N-[2-(4-chlorophenoxy)propoxy]-C-propylcarbonimidoyl]-3-hydroxy-5-(thian-3-yl)cyclohex-2-en-1-one Chemical compound CCC\C(=N/OCC(C)OC1=CC=C(Cl)C=C1)C1=C(O)CC(CC1=O)C1CCCSC1 KRQUFUKTQHISJB-YYADALCUSA-N 0.000 description 1
- 244000020998 Acacia farnesiana Species 0.000 description 1
- 238000009623 Bosch process Methods 0.000 description 1
- 235000010643 Leucaena leucocephala Nutrition 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- YLSDKNQUERJZMW-UHFFFAOYSA-N [Xe].FOF Chemical compound [Xe].FOF YLSDKNQUERJZMW-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 238000004380 ashing Methods 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 238000009933 burial Methods 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000003670 easy-to-clean Effects 0.000 description 1
- 239000008393 encapsulating agent Substances 0.000 description 1
- 238000005538 encapsulation Methods 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- 238000003682 fluorination reaction Methods 0.000 description 1
- XEMZLVDIUVCKGL-UHFFFAOYSA-N hydrogen peroxide;sulfuric acid Chemical compound OO.OS(O)(=O)=O XEMZLVDIUVCKGL-UHFFFAOYSA-N 0.000 description 1
- 230000005661 hydrophobic surface Effects 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 238000004518 low pressure chemical vapour deposition Methods 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 238000001000 micrograph Methods 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000010422 painting Methods 0.000 description 1
- 125000005010 perfluoroalkyl group Chemical group 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 1
- 239000005871 repellent Substances 0.000 description 1
- 238000001338 self-assembly Methods 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 238000007764 slot die coating Methods 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000009987 spinning Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/164—Manufacturing processes thin film formation
- B41J2/1645—Manufacturing processes thin film formation thin film formation by spincoating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1606—Coating the nozzle area or the ink chamber
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/162—Manufacturing of the nozzle plates
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1626—Manufacturing processes etching
- B41J2/1628—Manufacturing processes etching dry etching
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1631—Manufacturing processes photolithography
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1632—Manufacturing processes machining
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/164—Manufacturing processes thin film formation
- B41J2/1642—Manufacturing processes thin film formation thin film formation by CVD [chemical vapor deposition]
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/164—Manufacturing processes thin film formation
- B41J2/1646—Manufacturing processes thin film formation thin film formation by sputtering
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Particle Formation And Scattering Control In Inkjet Printers (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US12/648,004 US8506051B2 (en) | 2009-12-28 | 2009-12-28 | Process for preparing an ink jet print head front face having a textured superoleophobic surface |
| US12/648,004 | 2009-12-28 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2011136561A JP2011136561A (ja) | 2011-07-14 |
| JP2011136561A5 JP2011136561A5 (enExample) | 2014-02-13 |
| JP5855825B2 true JP5855825B2 (ja) | 2016-02-09 |
Family
ID=44187006
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010293181A Expired - Fee Related JP5855825B2 (ja) | 2009-12-28 | 2010-12-28 | テクスチャを持たせた超疎油性表面を有するインクジェットプリントヘッド前面を準備するためのプロセス |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US8506051B2 (enExample) |
| JP (1) | JP5855825B2 (enExample) |
| CN (1) | CN102180015A (enExample) |
Families Citing this family (28)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9073323B2 (en) * | 2009-11-24 | 2015-07-07 | Xerox Corporation | Process for thermally stable oleophobic low adhesion coating for inkjet printhead front face |
| US9623442B2 (en) * | 2009-11-24 | 2017-04-18 | Xerox Corporation | Process for thermally stable oleophobic low adhesion coating for inkjet printhead front face |
| US8328328B2 (en) * | 2010-06-01 | 2012-12-11 | Pitney Bowes Inc. | Device for mitigating the production/removal of particulate matter from a substrate/mailpiece envelope |
| US8910380B2 (en) * | 2010-06-15 | 2014-12-16 | Xerox Corporation | Method of manufacturing inkjet printhead with self-clean ability |
| US8366970B2 (en) | 2010-07-08 | 2013-02-05 | Xerox Corporation | Method for treating a carbon allotrope |
| US9475105B2 (en) * | 2010-11-08 | 2016-10-25 | University Of Florida Research Foundation, Inc. | Articles having superhydrophobic and oleophobic surfaces |
| US8348390B2 (en) * | 2011-05-18 | 2013-01-08 | Xerox Corporation | Enhancing superoleophobicity and reducing adhesion through multi-scale roughness by ALD/CVD technique in inkjet application |
| JP2013028101A (ja) * | 2011-07-29 | 2013-02-07 | Seiko Epson Corp | 液体噴射ヘッド及び液体噴射装置 |
| JP2013052546A (ja) * | 2011-09-01 | 2013-03-21 | Fujifilm Corp | 撥液表面を有する構造体、インクジェットヘッドのノズルプレート、ならびに、該構造体および該ノズルプレートのクリーニング方法 |
| US8602523B2 (en) | 2011-11-11 | 2013-12-10 | Xerox Corporation | Fluorinated poly(amide-imide) copolymer printhead coatings |
| US8529015B2 (en) | 2012-02-02 | 2013-09-10 | Xerox Corporation | Apparatus and method for removal of ink from an exterior of a printhead |
| DE112012006015T5 (de) * | 2012-03-12 | 2014-12-11 | Mitsubishi Electric Corporation | Herstellungsverfahren für Solarzelle |
| US8615881B2 (en) * | 2012-05-09 | 2013-12-31 | Xerox Corporation | Oleophobic ink jet orifice plate |
| US8727485B2 (en) | 2012-05-14 | 2014-05-20 | Xerox Corporation | Three position printhead wiper assembly |
| US8931890B2 (en) * | 2012-06-15 | 2015-01-13 | Xerox Corporation | Method and apparatus for leveling a printed image and preventing image offset |
| US8870345B2 (en) | 2012-07-16 | 2014-10-28 | Xerox Corporation | Method of making superoleophobic re-entrant resist structures |
| US9228099B2 (en) | 2012-12-21 | 2016-01-05 | Xerox Corporation | Phase change ink composition and process for preparing same |
| US9016841B2 (en) | 2013-04-03 | 2015-04-28 | Palo Alto Research Center Incorporated | Methods and devices for venting air from ink jet printer subassemblies using oleophobic membranes |
| US9044943B2 (en) | 2013-04-03 | 2015-06-02 | Palo Alto Research Center Incorporated | Inkjet printhead incorporating oleophobic membrane |
| WO2015021192A1 (en) * | 2013-08-07 | 2015-02-12 | Hassan Tarek | Medical devices and instruments with non-coated superhydrophobic or superoleophobic surfaces |
| US9416237B2 (en) | 2014-10-17 | 2016-08-16 | Xerox Corporation | Tethered organic siloxy network film compositions |
| WO2017065774A1 (en) * | 2015-10-15 | 2017-04-20 | Hewlett-Packard Development Company, L.P. | Service structures in print heads |
| CN105297013B (zh) * | 2015-12-01 | 2018-04-24 | 河南理工大学 | 一种超疏油表面的制备方法 |
| JP6666032B2 (ja) * | 2015-12-16 | 2020-03-13 | キヤノン株式会社 | 液体吐出ヘッド、液体吐出ヘッドの製造方法及び液体吐出ヘッドの回復方法 |
| CN108695136A (zh) * | 2017-04-05 | 2018-10-23 | 中国科学院苏州纳米技术与纳米仿生研究所 | 氧化物半导体薄膜的制作方法及应用 |
| JP6972697B2 (ja) * | 2017-06-22 | 2021-11-24 | セイコーエプソン株式会社 | ノズルプレート、液体噴射ヘッド、及び、液体噴射装置 |
| JP2019077103A (ja) * | 2017-10-25 | 2019-05-23 | 東芝テック株式会社 | インクジェットヘッド及びインクジェットプリンタ |
| JP7286253B2 (ja) * | 2019-10-25 | 2023-06-05 | 株式会社吉野工業所 | 撥液構造及び容器 |
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| US4719480A (en) * | 1986-04-17 | 1988-01-12 | Xerox Corporation | Spatial stablization of standing capillary surface waves |
| JPS6440340A (en) * | 1987-08-07 | 1989-02-10 | Canon Kk | Cap device of liquid injection recording head |
| US4889560A (en) * | 1988-08-03 | 1989-12-26 | Tektronix, Inc. | Phase change ink composition and phase change ink produced therefrom |
| US4889761A (en) * | 1988-08-25 | 1989-12-26 | Tektronix, Inc. | Substrates having a light-transmissive phase change ink printed thereon and methods for producing same |
| US5221335A (en) * | 1990-05-23 | 1993-06-22 | Coates Electrographics Limited | Stabilized pigmented hot melt ink containing nitrogen-modified acrylate polymer as dispersion-stabilizer agent |
| US5121141A (en) * | 1991-01-14 | 1992-06-09 | Xerox Corporation | Acoustic ink printhead with integrated liquid level control layer |
| US5230926A (en) * | 1992-04-28 | 1993-07-27 | Xerox Corporation | Application of a front face coating to ink jet printheads or printhead dies |
| US5621022A (en) * | 1992-11-25 | 1997-04-15 | Tektronix, Inc. | Use of polymeric dyes in hot melt ink jet inks |
| US5372852A (en) * | 1992-11-25 | 1994-12-13 | Tektronix, Inc. | Indirect printing process for applying selective phase change ink compositions to substrates |
| US5381166A (en) * | 1992-11-30 | 1995-01-10 | Hewlett-Packard Company | Ink dot size control for ink transfer printing |
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| US6284377B1 (en) * | 1999-05-03 | 2001-09-04 | Guardian Industries Corporation | Hydrophobic coating including DLC on substrate |
| EP1172212B1 (en) * | 2000-07-11 | 2007-02-28 | Samsung Electronics Co., Ltd. | Bubble-jet type ink-jet printhead |
| DE60224170T2 (de) * | 2001-01-15 | 2008-04-30 | Seiko Epson Corp. | Auf öl basierende tintenzusammensetzung für tintenstrahldruckverfahren sowie tintenstrahldruckverfahren |
| US6737109B2 (en) * | 2001-10-31 | 2004-05-18 | Xerox Corporation | Method of coating an ejector of an ink jet printhead |
| JP2004160802A (ja) * | 2002-11-12 | 2004-06-10 | Canon Inc | インクジェット記録装置 |
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-
2009
- 2009-12-28 US US12/648,004 patent/US8506051B2/en active Active
-
2010
- 2010-12-28 CN CN2010106228032A patent/CN102180015A/zh active Pending
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Also Published As
| Publication number | Publication date |
|---|---|
| CN102180015A (zh) | 2011-09-14 |
| US8506051B2 (en) | 2013-08-13 |
| US20110157278A1 (en) | 2011-06-30 |
| JP2011136561A (ja) | 2011-07-14 |
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