JP5845542B2 - 露光用led光源モジュール、露光用led光源装置及び露光用led光源装置管理システム - Google Patents
露光用led光源モジュール、露光用led光源装置及び露光用led光源装置管理システム Download PDFInfo
- Publication number
- JP5845542B2 JP5845542B2 JP2014510267A JP2014510267A JP5845542B2 JP 5845542 B2 JP5845542 B2 JP 5845542B2 JP 2014510267 A JP2014510267 A JP 2014510267A JP 2014510267 A JP2014510267 A JP 2014510267A JP 5845542 B2 JP5845542 B2 JP 5845542B2
- Authority
- JP
- Japan
- Prior art keywords
- light source
- led light
- exposure
- led
- lens
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000004891 communication Methods 0.000 claims description 17
- 239000013307 optical fiber Substances 0.000 claims description 12
- 230000003287 optical effect Effects 0.000 claims description 11
- 238000012546 transfer Methods 0.000 claims description 7
- 230000017525 heat dissipation Effects 0.000 claims description 4
- 230000002093 peripheral effect Effects 0.000 claims description 4
- 235000012431 wafers Nutrition 0.000 description 15
- 239000004065 semiconductor Substances 0.000 description 12
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 11
- 229910052753 mercury Inorganic materials 0.000 description 11
- 238000000034 method Methods 0.000 description 9
- 230000008569 process Effects 0.000 description 8
- 239000000758 substrate Substances 0.000 description 7
- 238000010586 diagram Methods 0.000 description 6
- 238000000926 separation method Methods 0.000 description 6
- 230000008901 benefit Effects 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 3
- 229910052736 halogen Inorganic materials 0.000 description 3
- 150000002367 halogens Chemical class 0.000 description 3
- 238000002955 isolation Methods 0.000 description 3
- 230000008859 change Effects 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- 230000005856 abnormality Effects 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 238000010891 electric arc Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000003344 environmental pollutant Substances 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 238000007781 pre-processing Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/0001—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems
- G02B6/0005—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems the light guides being of the fibre type
- G02B6/0006—Coupling light into the fibre
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/0001—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems
- G02B6/0005—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems the light guides being of the fibre type
- G02B6/0008—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems the light guides being of the fibre type the light being emitted at the end of the fibre
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Planar Illumination Modules (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020110106834A KR101344037B1 (ko) | 2011-10-19 | 2011-10-19 | 노광용 led 광원 모듈, 노광용 led 광원 장치 및 노광용 led 광원장치 관리시스템 |
KR10-2011-0106834 | 2011-10-19 | ||
PCT/KR2012/008498 WO2013058552A1 (ko) | 2011-10-19 | 2012-10-17 | 노광용 led 광원 모듈, 노광용 led 광원 장치 및 노광용 led 광원장치 관리시스템 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2014519053A JP2014519053A (ja) | 2014-08-07 |
JP5845542B2 true JP5845542B2 (ja) | 2016-01-20 |
Family
ID=48141118
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2014510267A Active JP5845542B2 (ja) | 2011-10-19 | 2012-10-17 | 露光用led光源モジュール、露光用led光源装置及び露光用led光源装置管理システム |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP5845542B2 (ko) |
KR (1) | KR101344037B1 (ko) |
CN (1) | CN103502723B (ko) |
WO (1) | WO2013058552A1 (ko) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101532352B1 (ko) * | 2013-10-30 | 2015-06-29 | 주식회사 인피테크 | 노광용 led 광원 장치 및 노광용 led 광원장치 관리시스템 |
KR101761279B1 (ko) | 2015-08-12 | 2017-08-04 | 주식회사 인피테크 | 대면적 패턴 노광용 led어레이광원모듈 및 그 제어장치 |
US10234769B2 (en) | 2017-05-22 | 2019-03-19 | Cymer, Llc | Monitoring system for an optical lithography system |
JP6921150B2 (ja) * | 2019-07-24 | 2021-08-18 | 株式会社Screenホールディングス | 追加露光装置およびパターン形成方法 |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000260684A (ja) * | 1999-03-08 | 2000-09-22 | Nikon Corp | 露光装置、及び照明装置 |
JP2001135560A (ja) * | 1999-11-04 | 2001-05-18 | Nikon Corp | 照明光学装置、該照明光学装置を備えた露光装置、および該露光装置を用いたマイクロデバイス製造方法 |
US7022960B2 (en) * | 2002-02-12 | 2006-04-04 | Konica Corporation | Photographic film image reading apparatus with film density detection |
JP2005353927A (ja) * | 2004-06-14 | 2005-12-22 | Dainippon Screen Mfg Co Ltd | パターン描画装置 |
US6945674B2 (en) * | 2002-07-16 | 2005-09-20 | Ccs, Inc. | Light irradiating unit |
JP4119329B2 (ja) * | 2002-07-16 | 2008-07-16 | シーシーエス株式会社 | 光照射装置 |
WO2004077533A1 (ja) * | 2003-02-28 | 2004-09-10 | Kabushiki Kaisha Hayashi Soken | 露光装置 |
JP2007194583A (ja) * | 2005-12-21 | 2007-08-02 | Ark Tech株式会社 | 周辺露光用光源装置 |
DE102006009444A1 (de) * | 2006-03-01 | 2007-09-13 | Texmag Gmbh Vertriebsgesellschaft Gmbh | Vorrichtung zur Emission von linienartigem Licht |
JP2007292999A (ja) * | 2006-04-25 | 2007-11-08 | Y E Data Inc | 露光装置の光源 |
CN201159832Y (zh) * | 2008-02-27 | 2008-12-03 | 芯硕半导体(中国)有限公司 | 具有超高强度led光源的无掩膜直写光刻机 |
JP2010114054A (ja) | 2008-11-05 | 2010-05-20 | Tozai Denko Co Ltd | 光源装置 |
JP5345443B2 (ja) * | 2009-04-21 | 2013-11-20 | 株式会社日立ハイテクノロジーズ | 露光装置、露光光照射方法、及び表示用パネル基板の製造方法 |
KR101073671B1 (ko) * | 2009-11-26 | 2011-10-14 | (주)와이티에스 | 노광용 led 램프 및 이를 이용한 노광장치 |
-
2011
- 2011-10-19 KR KR1020110106834A patent/KR101344037B1/ko active IP Right Grant
-
2012
- 2012-10-17 CN CN201280021659.4A patent/CN103502723B/zh active Active
- 2012-10-17 WO PCT/KR2012/008498 patent/WO2013058552A1/ko active Application Filing
- 2012-10-17 JP JP2014510267A patent/JP5845542B2/ja active Active
Also Published As
Publication number | Publication date |
---|---|
KR20130042766A (ko) | 2013-04-29 |
CN103502723A (zh) | 2014-01-08 |
KR101344037B1 (ko) | 2013-12-24 |
WO2013058552A1 (ko) | 2013-04-25 |
CN103502723B (zh) | 2016-01-06 |
JP2014519053A (ja) | 2014-08-07 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US20080111983A1 (en) | Illumination System for a Microlithographic Projection Exposure Apparatus | |
KR101532352B1 (ko) | 노광용 led 광원 장치 및 노광용 led 광원장치 관리시스템 | |
JP5845542B2 (ja) | 露光用led光源モジュール、露光用led光源装置及び露光用led光源装置管理システム | |
US8330938B2 (en) | Solid-state array for lithography illumination | |
TWI608309B (zh) | 曝光用光源模組單元及具備該光源模組單元的曝光裝置 | |
KR100960083B1 (ko) | 웨이퍼 엣지 노광용 광원 장치 | |
US9857690B2 (en) | Extreme ultraviolet generation device and exposure system including the same | |
JP2006351586A (ja) | 照明装置、投影露光装置、及びマイクロデバイスの製造方法 | |
KR101401238B1 (ko) | 디스플레이 패널 노광용 led 광원장치 | |
US9063406B2 (en) | Exposure apparatus and a method of manufacturing a device that conduct exposure using a set light source shape | |
KR20190117642A (ko) | 조명 장치 및 방법, 노광 장치 및 방법, 및 디바이스 제조 방법 | |
JP2013171088A (ja) | プロキシミティ露光装置、プロキシミティ露光装置の露光光形成方法、及び表示用パネル基板の製造方法 | |
WO2004049409A1 (ja) | 露光装置の製造方法、光源ユニット、露光装置、露光方法及び露光装置の調整方法 | |
US8520188B2 (en) | Illumination apparatus for efficiently gathering illumination light | |
KR20130002954A (ko) | 노광 방법 및 그 장치 | |
JP5355261B2 (ja) | プロキシミティ露光装置、プロキシミティ露光装置の露光光形成方法、及び表示用パネル基板の製造方法 | |
CN108780281B (zh) | 曝光用光源模块单元以及设置有所述光源模块单元的曝光装置 | |
KR20150121530A (ko) | Led 광원 노광장치 | |
KR20170019632A (ko) | 대면적 패턴 노광용 led어레이광원모듈 및 그 제어장치 | |
JP2004207343A (ja) | 照明光源、照明装置、露光装置及び露光方法 | |
JP7427352B2 (ja) | 露光装置 | |
JP2003295459A (ja) | 露光装置及び露光方法 | |
KR20150120180A (ko) | 광 출력제어 기능을 구비한 led 노광 장치 및 그 제어 방법 | |
JP5394320B2 (ja) | 光源ユニット、光源ユニットの光軸調整方法、プロキシミティ露光装置、プロキシミティ露光装置の露光光照射方法、及び表示用パネル基板の製造方法 | |
KR20170015075A (ko) | 노광용 광원모듈 유닛 및 그 광원모듈 유닛이 구비된 노광장치 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20140515 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20141216 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20141217 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20150316 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20150811 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20150825 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20151105 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 5845542 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |