JP5842369B2 - アクチュエーターの製造方法、光スキャナーの製造方法および画像形成装置の製造方法、アクチュエーター、光スキャナーおよび画像形成装置 - Google Patents

アクチュエーターの製造方法、光スキャナーの製造方法および画像形成装置の製造方法、アクチュエーター、光スキャナーおよび画像形成装置 Download PDF

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Publication number
JP5842369B2
JP5842369B2 JP2011087764A JP2011087764A JP5842369B2 JP 5842369 B2 JP5842369 B2 JP 5842369B2 JP 2011087764 A JP2011087764 A JP 2011087764A JP 2011087764 A JP2011087764 A JP 2011087764A JP 5842369 B2 JP5842369 B2 JP 5842369B2
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Japan
Prior art keywords
movable
center axis
rotation center
manufacturing
light reflecting
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JP2011087764A
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English (en)
Japanese (ja)
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JP2012220796A (ja
JP2012220796A5 (enExample
Inventor
真希子 日野
真希子 日野
溝口　安志
安志 溝口
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Seiko Epson Corp
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Seiko Epson Corp
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Publication date
Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp
Priority to JP2011087764A priority Critical patent/JP5842369B2/ja
Priority to US13/442,318 priority patent/US9337711B2/en
Publication of JP2012220796A publication Critical patent/JP2012220796A/ja
Publication of JP2012220796A5 publication Critical patent/JP2012220796A5/ja
Priority to US14/565,002 priority patent/US9343946B2/en
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Publication of JP5842369B2 publication Critical patent/JP5842369B2/ja
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    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02K—DYNAMO-ELECTRIC MACHINES
    • H02K33/00—Motors with reciprocating, oscillating or vibrating magnet, armature or coil system
    • H02K33/16—Motors with reciprocating, oscillating or vibrating magnet, armature or coil system with polarised armatures moving in alternate directions by reversal or energisation of a single coil system
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B3/00—Devices comprising flexible or deformable elements, e.g. comprising elastic tongues or membranes
    • B81B3/0064—Constitution or structural means for improving or controlling the physical properties of a device
    • B81B3/0067—Mechanical properties
    • B81B3/0072—For controlling internal stress or strain in moving or flexible elements, e.g. stress compensating layers
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G02B26/085—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD the reflecting means being moved or deformed by electromagnetic means
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/10—Scanning systems
    • G02B26/101—Scanning systems with both horizontal and vertical deflecting means, e.g. raster or XY scanners
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/10—Scanning systems
    • G02B26/105—Scanning systems with one or more pivoting mirrors or galvano-mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
    • G02B7/1821—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors for rotating or oscillating mirrors
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N3/00—Scanning details of television systems; Combination thereof with generation of supply voltages
    • H04N3/02—Scanning details of television systems; Combination thereof with generation of supply voltages by optical-mechanical means only
    • H04N3/08—Scanning details of television systems; Combination thereof with generation of supply voltages by optical-mechanical means only having a moving reflector
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B2201/00—Specific applications of microelectromechanical systems
    • B81B2201/04—Optical MEMS
    • B81B2201/042—Micromirrors, not used as optical switches
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B2203/00—Basic microelectromechanical structures
    • B81B2203/01—Suspended structures, i.e. structures allowing a movement
    • B81B2203/0109—Bridges
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B2203/00—Basic microelectromechanical structures
    • B81B2203/01—Suspended structures, i.e. structures allowing a movement
    • B81B2203/0145—Flexible holders
    • B81B2203/0154—Torsion bars
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G02B26/0841—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD the reflecting element being moved or deformed by electrostatic means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/52—Details
    • G03B27/522—Projection optics
    • G03B27/525—Projection optics for slit exposure
    • G03B27/526—Projection optics for slit exposure in which the projection optics move
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F15/00—Digital computers in general; Data processing equipment in general

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Multimedia (AREA)
  • Signal Processing (AREA)
  • Electromagnetism (AREA)
  • Mechanical Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Mechanical Optical Scanning Systems (AREA)
  • Micromachines (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
JP2011087764A 2011-04-11 2011-04-11 アクチュエーターの製造方法、光スキャナーの製造方法および画像形成装置の製造方法、アクチュエーター、光スキャナーおよび画像形成装置 Active JP5842369B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2011087764A JP5842369B2 (ja) 2011-04-11 2011-04-11 アクチュエーターの製造方法、光スキャナーの製造方法および画像形成装置の製造方法、アクチュエーター、光スキャナーおよび画像形成装置
US13/442,318 US9337711B2 (en) 2011-04-11 2012-04-09 Actuator, optical scanner, and image forming apparatus
US14/565,002 US9343946B2 (en) 2011-04-11 2014-12-09 Actuator, optical scanner, and image forming apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011087764A JP5842369B2 (ja) 2011-04-11 2011-04-11 アクチュエーターの製造方法、光スキャナーの製造方法および画像形成装置の製造方法、アクチュエーター、光スキャナーおよび画像形成装置

Publications (3)

Publication Number Publication Date
JP2012220796A JP2012220796A (ja) 2012-11-12
JP2012220796A5 JP2012220796A5 (enExample) 2014-05-22
JP5842369B2 true JP5842369B2 (ja) 2016-01-13

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US (2) US9337711B2 (enExample)
JP (1) JP5842369B2 (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2013111265A1 (ja) * 2012-01-24 2013-08-01 パイオニア株式会社 アクチュエータ
KR102067759B1 (ko) * 2013-02-15 2020-01-17 삼성전자주식회사 파이버 스캐닝 프로젝터
JP5873836B2 (ja) * 2013-05-31 2016-03-01 京セラドキュメントソリューションズ株式会社 光偏向器、その製造方法及び光走査装置
US9801563B2 (en) * 2013-11-06 2017-10-31 The Charles Stark Draper Laboratory, Inc. Micro-magnetic reporter and systems
JP6627436B2 (ja) * 2015-11-10 2020-01-08 船井電機株式会社 プロジェクタおよびヘッドアップディスプレイ装置
JP6585147B2 (ja) * 2017-12-01 2019-10-02 浜松ホトニクス株式会社 アクチュエータ装置
CN115051526A (zh) * 2017-12-01 2022-09-13 浜松光子学株式会社 致动器装置
JP7587994B2 (ja) * 2021-01-28 2024-11-21 浜松ホトニクス株式会社 アクチュエータデバイスの製造方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3740444B2 (ja) 2001-07-11 2006-02-01 キヤノン株式会社 光偏向器、それを用いた光学機器、ねじれ揺動体
US7468824B2 (en) * 2004-01-19 2008-12-23 Ricoh Company, Ltd. Imaging apparatus including optical scanning device with deflecting mirror module, and method of deflecting with the mirror module
JP2005345866A (ja) * 2004-06-04 2005-12-15 Ricoh Co Ltd 偏向ミラー、光走査装置および画像形成装置
JP4645067B2 (ja) * 2004-06-04 2011-03-09 ブラザー工業株式会社 反射ミラー製作方法
WO2005119309A1 (ja) 2004-06-04 2005-12-15 Brother Kogyo Kabushiki Kaisha 反射ミラー製作方法および反射ミラー
JP4277921B2 (ja) * 2007-06-05 2009-06-10 セイコーエプソン株式会社 アクチュエータ、光スキャナおよび画像形成装置
JP2011170370A (ja) 2008-03-13 2011-09-01 Seiko Epson Corp 光偏向器及びその製造方法
JP5521359B2 (ja) * 2008-03-13 2014-06-11 セイコーエプソン株式会社 光偏向器及びその製造方法
JP2011107675A (ja) * 2009-10-20 2011-06-02 Seiko Epson Corp 光偏向素子、光偏向器、及び画像形成装置
JP5909862B2 (ja) * 2011-04-06 2016-04-27 セイコーエプソン株式会社 アクチュエーター、光スキャナーおよび画像形成装置

Also Published As

Publication number Publication date
US9343946B2 (en) 2016-05-17
US20120257235A1 (en) 2012-10-11
JP2012220796A (ja) 2012-11-12
US20150092216A1 (en) 2015-04-02
US9337711B2 (en) 2016-05-10

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