JP5832372B2 - 真空処理装置 - Google Patents

真空処理装置 Download PDF

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Publication number
JP5832372B2
JP5832372B2 JP2012110585A JP2012110585A JP5832372B2 JP 5832372 B2 JP5832372 B2 JP 5832372B2 JP 2012110585 A JP2012110585 A JP 2012110585A JP 2012110585 A JP2012110585 A JP 2012110585A JP 5832372 B2 JP5832372 B2 JP 5832372B2
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carrier
processed
chamber
vacuum processing
processing apparatus
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Japanese (ja)
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JP2012255207A5 (enExample
JP2012255207A (ja
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和人 山中
和人 山中
祥悟 平松
祥悟 平松
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Canon Anelva Corp
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Canon Anelva Corp
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  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
JP2012110585A 2011-05-16 2012-05-14 真空処理装置 Active JP5832372B2 (ja)

Priority Applications (1)

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JP2012110585A JP5832372B2 (ja) 2011-05-16 2012-05-14 真空処理装置

Applications Claiming Priority (3)

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JP2011109622 2011-05-16
JP2011109622 2011-05-16
JP2012110585A JP5832372B2 (ja) 2011-05-16 2012-05-14 真空処理装置

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JP2012255207A JP2012255207A (ja) 2012-12-27
JP2012255207A5 JP2012255207A5 (enExample) 2015-05-07
JP5832372B2 true JP5832372B2 (ja) 2015-12-16

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JP2012110585A Active JP5832372B2 (ja) 2011-05-16 2012-05-14 真空処理装置

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3227130B2 (ja) 1997-09-05 2001-11-12 ネースディスプレイ・カンパニー・リミテッド ポリイミドを含む有機薄膜層を有する電気発光素子

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6303167B2 (ja) 2013-11-07 2018-04-04 昭和電工株式会社 インライン式成膜装置及びそれを用いた磁気記録媒体の製造方法
TWI846328B (zh) * 2022-02-15 2024-06-21 美商因特瓦克公司 製作厚的多層介電質薄膜的直線型濺射系統

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04125222A (ja) * 1990-09-17 1992-04-24 Kokusai Electric Co Ltd 真空装置用縦型トレイ搬送機構
JP3175333B2 (ja) * 1992-06-15 2001-06-11 日新電機株式会社 基板処理装置
JP3732250B2 (ja) * 1995-03-30 2006-01-05 キヤノンアネルバ株式会社 インライン式成膜装置
JP3629371B2 (ja) * 1998-10-29 2005-03-16 シャープ株式会社 成膜装置および成膜方法
JP4614529B2 (ja) * 2000-12-07 2011-01-19 キヤノンアネルバ株式会社 インライン式基板処理装置
JP4447279B2 (ja) * 2003-10-15 2010-04-07 キヤノンアネルバ株式会社 成膜装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3227130B2 (ja) 1997-09-05 2001-11-12 ネースディスプレイ・カンパニー・リミテッド ポリイミドを含む有機薄膜層を有する電気発光素子

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Publication number Publication date
JP2012255207A (ja) 2012-12-27

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