JP2012255207A5 - - Google Patents

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Publication number
JP2012255207A5
JP2012255207A5 JP2012110585A JP2012110585A JP2012255207A5 JP 2012255207 A5 JP2012255207 A5 JP 2012255207A5 JP 2012110585 A JP2012110585 A JP 2012110585A JP 2012110585 A JP2012110585 A JP 2012110585A JP 2012255207 A5 JP2012255207 A5 JP 2012255207A5
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JP
Japan
Prior art keywords
processed
carrier
processing apparatus
vacuum processing
load lock
Prior art date
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Granted
Application number
JP2012110585A
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English (en)
Japanese (ja)
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JP5832372B2 (ja
JP2012255207A (ja
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Priority to JP2012110585A priority Critical patent/JP5832372B2/ja
Priority claimed from JP2012110585A external-priority patent/JP5832372B2/ja
Publication of JP2012255207A publication Critical patent/JP2012255207A/ja
Publication of JP2012255207A5 publication Critical patent/JP2012255207A5/ja
Application granted granted Critical
Publication of JP5832372B2 publication Critical patent/JP5832372B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2012110585A 2011-05-16 2012-05-14 真空処理装置 Active JP5832372B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2012110585A JP5832372B2 (ja) 2011-05-16 2012-05-14 真空処理装置

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2011109622 2011-05-16
JP2011109622 2011-05-16
JP2012110585A JP5832372B2 (ja) 2011-05-16 2012-05-14 真空処理装置

Publications (3)

Publication Number Publication Date
JP2012255207A JP2012255207A (ja) 2012-12-27
JP2012255207A5 true JP2012255207A5 (enExample) 2015-05-07
JP5832372B2 JP5832372B2 (ja) 2015-12-16

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ID=47527020

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012110585A Active JP5832372B2 (ja) 2011-05-16 2012-05-14 真空処理装置

Country Status (1)

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JP (1) JP5832372B2 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6497969B2 (en) 1997-09-05 2002-12-24 Nessdisplay Co., Ltd. Electroluminescent device having an organic layer including polyimide
JP6303167B2 (ja) 2013-11-07 2018-04-04 昭和電工株式会社 インライン式成膜装置及びそれを用いた磁気記録媒体の製造方法
TWI846328B (zh) * 2022-02-15 2024-06-21 美商因特瓦克公司 製作厚的多層介電質薄膜的直線型濺射系統

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04125222A (ja) * 1990-09-17 1992-04-24 Kokusai Electric Co Ltd 真空装置用縦型トレイ搬送機構
JP3175333B2 (ja) * 1992-06-15 2001-06-11 日新電機株式会社 基板処理装置
JP3732250B2 (ja) * 1995-03-30 2006-01-05 キヤノンアネルバ株式会社 インライン式成膜装置
JP3629371B2 (ja) * 1998-10-29 2005-03-16 シャープ株式会社 成膜装置および成膜方法
JP4614529B2 (ja) * 2000-12-07 2011-01-19 キヤノンアネルバ株式会社 インライン式基板処理装置
JP4447279B2 (ja) * 2003-10-15 2010-04-07 キヤノンアネルバ株式会社 成膜装置

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