JP5820559B2 - 高速基板配置装置 - Google Patents
高速基板配置装置 Download PDFInfo
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- JP5820559B2 JP5820559B2 JP2008504279A JP2008504279A JP5820559B2 JP 5820559 B2 JP5820559 B2 JP 5820559B2 JP 2008504279 A JP2008504279 A JP 2008504279A JP 2008504279 A JP2008504279 A JP 2008504279A JP 5820559 B2 JP5820559 B2 JP 5820559B2
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67259—Position monitoring, e.g. misposition detection or presence detection
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
- H01L21/681—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment using optical controlling means
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- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B19/00—Programme-control systems
- G05B19/02—Programme-control systems electric
- G05B19/18—Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form
- G05B19/402—Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by control arrangements for positioning, e.g. centring a tool relative to a hole in the workpiece, additional detection means to correct position
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68728—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a plurality of separate clamping members, e.g. clamping fingers
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/30—Nc systems
- G05B2219/37—Measurements
- G05B2219/37608—Center and diameter of hole, wafer, object
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S414/00—Material or article handling
- Y10S414/135—Associated with semiconductor wafer handling
- Y10S414/136—Associated with semiconductor wafer handling including wafer orienting means
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S414/00—Material or article handling
- Y10S414/135—Associated with semiconductor wafer handling
- Y10S414/141—Associated with semiconductor wafer handling includes means for gripping wafer
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Human Computer Interaction (AREA)
- Automation & Control Theory (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Description
102 多基板処理チャンバー
103 基板搬送装置
104 搬送チャンバー
105 基板配置装置
106 エンドエフェクター
205 フレーム
205A 最高部
205B 底面
206 逆把部
206A スパン部材
206B 下降伸張部
206C 載置パッド
207 駆動システム
208 汚染遮蔽体
209 検出装置
210 基板搬送機構
210A リフター
210B リフター
210C 上昇伸張部
211 搬送機構駆動部
212 基板
213 スロット
216 逆把部駆動部
219 載置パッド
222 駆動システム
316A センサーヘッド基板支持体
316B センサーヘッド基板支持体
317 検出装置
317A 検出装置
317B 検出装置
318 センサーヘッド
318A 基盤部材
318B 基盤拡張部材
318C スパン部材
318D 下方拡張部材
319 基板支持体
319A スパン部材
319B 上方拡張部材
320A 基板支持載置パッド
320B 基板支持載置パッド
321 駆動部
423A 基盤部
423B 腕部
423C 腕部
423D 上方拡張部材
423E カンチレバー部材
424 検出装置
425 把部
425A 基盤部材
425B 腕部
425C 腕部
425D 載置パッドシステム
425E 載置パッド拡張部材
425F 載置パッド拡張部材
425G 載置パッド
425H 載置パッド
430 回転シャフト
431 回転シャフト
440 基板緩和装置
1105 基板配置装置
1205 フレーム
1206 把部
1206C 基板載置パッド
1207 駆動システム
1207T 搬送部材
1209 検出装置
1210 基板搬送システム
1210A 部材
1216 駆動部
1219 基板載置パッド
1222 直線駆動部
Claims (11)
- 基板配置装置であって、
端部保持エンドエフェクターを有する基板搬送装置が前記基板配置装置へまたは前記基板配置装置から基板を搬送することを許容するフレームと、
前記フレームに接続されている端部保持チャックシステムと、を含み、
前記端部保持チャックシステムは、
前記基板の端部を把持して前記基板を安定的に保持する複数のセンサーヘッド基板支持体及び少なくとも1つのセンサを含む回転自在なセンサーヘッドと、
前記基板搬送装置とは別個であり、前記基板が前記少なくとも1つのセンサによってスキャンされる際に前記基板を保持し、かつ所定のアラインメント後の基板配向に前記基板を回転自在に位置決めするために前記基板を前記回転自在なセンサーヘッドの前記センサーヘッド基板支持体に搬送する基板サポートと、を有し、
前記回転自在なセンサーヘッドは、前記基板サポートに配された前記基板の位置決定特徴を検出し、前記基板サポートは、前記基板を前記センサーヘッド基板支持体に搬送して、前記基板搬送装置に依存せずに所定のアラインメント後の基板配向をもたらし、前記基板搬送装置に対する前記所定のアラインメント後の基板配向に関わらず、前記基板搬送装置への前記基板のアラインメント後の搬送は、前記回転自在なセンサーヘッドによる前記基板の回転による再位置決めなしに行われることを特徴とする基板配置装置。 - 基板配置装置であって、
基板搬送装置が基板を前記基板配置装置へまたは前記基板配置装置から搬送することを許容するフレームと、
前記基板を安定的に保持する複数のセンサーヘッド基板支持体及び少なくとも1つのセンサデバイスを有する回転自在なセンサーヘッドと、を有し、
前記少なくとも1つのセンサデバイスは、前記回転自在なセンサーヘッド上に配されており、前記基板の位置決定特徴を検出し、前記回転自在センサーヘッドは、前記回転自在なセンサーヘッドに係合している駆動シャフトによって前記フレームと可動的に連結されることで、前記複数のセンサーヘッド基板支持体及び前記少なくとも1つのセンサデバイスを含む前記回転自在なセンサーヘッドが、前記フレームに対して共通の回転軸において一体に移動させられ、
前記基板配置装置は、さらに、
前記フレームに搭載され、前記位置決定特徴が前記回転自在なセンサーヘッドによって検知される際に前記基板を支持する1の基板支持体を含み、
前記1の基板支持体は前記基板の周縁部と接触しかつ透光性を有する支持パッドを有し、前記センサデバイスは、前記支持パッドに対する前記位置決定特徴の位置に関わらず、前記位置決定特徴を検知するビームセンサを有することを特徴とする基板配置装置。 - 前記回転自在なセンサーヘッドは、前記基板の配置中に、前記基板搬送装置が前記フレーム内に留まることができるように構成されていることを特徴とする請求項2に記載の基板配置装置。
- 前記回転自在なセンサーヘッドは、前記センサーヘッド基板支持体上に基板載置パッドを含むことを特徴とする請求項2に記載の基板配置装置。
- 前記基板載置パッドは、基板の端部に接触するように位置されていることを特徴とする請求項4に記載の基板配置装置。
- 前記回転自在なセンサーヘッドは、第1の側部及び第2の側部を有し、前記第2の側部は、前記第1の側部と反対側にあり、前記少なくとも1つのセンサデバイスは、第1及び第2のセンサデバイスを含み、前記第1のセンサデバイスは前記回転自在なセンサーヘッドの第1の側部に設けられており、前記第2のセンサデバイスは、前記回転自在なセンサーヘッドの前記第2の側部に設けられていることを特徴とする請求項2に記載の基板配置装置。
- 前記第1及び第2のセンサデバイスは反射光学センサを含むことを特徴とする請求項6に記載の基板配置装置。
- 前記少なくとも1つのセンサデバイスは、通しビームセンサを構成する前記第1及び第2のセンサデバイスを有し、前記通しビームセンサの各々は送信機と受信機を有することを特徴とする請求項6に記載の基板配置装置。
- 前記1の基板支持体は、可動するよう前記フレームに搭載され、前記回転自在なセンサーヘッドの回転軸と実質的に一致する動作軸に沿って前記回転自在なセンサーヘッドに対して移動可能であることを特徴とする請求項2に記載の基板配置装置。
- 前記支持パッドは実質的に透明であることを特徴とする請求項9に記載の基板配置装置。
- 前記1の基板支持体は、可動するよう前記フレームに搭載されており、前記1の基板支持体は前記回転自在なセンサーヘッドと共通の回転軸周りに前記フレームに対して回転自在であることを特徴とする請求項2に記載の基板配置装置。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/093,479 US7891936B2 (en) | 2005-03-30 | 2005-03-30 | High speed substrate aligner apparatus |
US11/093,479 | 2005-03-30 | ||
PCT/US2006/011400 WO2006105156A2 (en) | 2005-03-30 | 2006-03-29 | High speed substrate aligner apparatus |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP2013181312A Division JP5976612B2 (ja) | 2005-03-30 | 2013-09-02 | 高速基板配置装置 |
Publications (3)
Publication Number | Publication Date |
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JP2008538258A JP2008538258A (ja) | 2008-10-16 |
JP2008538258A5 JP2008538258A5 (ja) | 2015-09-10 |
JP5820559B2 true JP5820559B2 (ja) | 2015-11-24 |
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JP2008504279A Active JP5820559B2 (ja) | 2005-03-30 | 2006-03-29 | 高速基板配置装置 |
JP2013181312A Active JP5976612B2 (ja) | 2005-03-30 | 2013-09-02 | 高速基板配置装置 |
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JP2013181312A Active JP5976612B2 (ja) | 2005-03-30 | 2013-09-02 | 高速基板配置装置 |
Country Status (7)
Country | Link |
---|---|
US (2) | US7891936B2 (ja) |
EP (1) | EP1866958B1 (ja) |
JP (2) | JP5820559B2 (ja) |
KR (1) | KR101366754B1 (ja) |
CN (2) | CN101379604B (ja) |
TW (1) | TWI429013B (ja) |
WO (1) | WO2006105156A2 (ja) |
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Publication number | Publication date |
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KR101366754B1 (ko) | 2014-02-24 |
TWI429013B (zh) | 2014-03-01 |
JP2014013925A (ja) | 2014-01-23 |
EP1866958A4 (en) | 2010-04-21 |
KR20070119058A (ko) | 2007-12-18 |
CN102024735A (zh) | 2011-04-20 |
CN101379604B (zh) | 2010-12-15 |
EP1866958B1 (en) | 2014-06-25 |
WO2006105156A3 (en) | 2008-10-30 |
JP2008538258A (ja) | 2008-10-16 |
US8403619B2 (en) | 2013-03-26 |
WO2006105156A8 (en) | 2007-11-29 |
EP1866958A2 (en) | 2007-12-19 |
TW200703542A (en) | 2007-01-16 |
WO2006105156A2 (en) | 2006-10-05 |
US7891936B2 (en) | 2011-02-22 |
JP5976612B2 (ja) | 2016-08-23 |
CN102024735B (zh) | 2012-12-26 |
US20120045300A1 (en) | 2012-02-23 |
US20060245846A1 (en) | 2006-11-02 |
CN101379604A (zh) | 2009-03-04 |
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