JP5781464B2 - 塗膜付きフィルムの製造方法 - Google Patents
塗膜付きフィルムの製造方法 Download PDFInfo
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- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/48—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation
- C23C16/482—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation using incoherent light, UV to IR, e.g. lamps
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/26—Processes for applying liquids or other fluent materials performed by applying the liquid or other fluent material from an outlet device in contact with, or almost in contact with, the surface
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/02—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by baking
- B05D3/0209—Multistage baking
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
- B05D7/02—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials to macromolecular substances, e.g. rubber
- B05D7/04—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials to macromolecular substances, e.g. rubber to surfaces of films or sheets
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D2252/00—Sheets
- B05D2252/02—Sheets of indefinite length
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D2350/00—Pretreatment of the substrate
- B05D2350/60—Adding a layer before coating
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/02—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by baking
- B05D3/0254—After-treatment
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/06—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
- B05D7/50—Multilayers
Description
図1に示す塗布液調製装置12では、活性線硬化成分が含有された塗布液が調製される。本実施の形態では、活性線硬化成分として、活性線硬化モノマー以外に分子量が2500以上の活性線硬化樹脂を使用した例で説明する。
図1に示すように、送出装置22から塗布装置18に向けて帯状支持体20が送り出される。この帯状支持体20の塗布液が塗布される面には、無機蒸着膜が予め形成されている。
次に、塗膜10が形成された帯状支持体20は、第1活性線照射装置26に搬送され、塗膜10が湿潤状態(溶媒が20質量%以上ある状態)にあるうちに塗膜10に活性線が照射される。
次に、塗膜10に活性線が照射された帯状支持体20は、第1乾燥装置28に搬送されて塗膜10が乾燥される。この第1乾燥装置28では、活性線照射終了時から塗膜10の固形分濃度が減率乾燥開始時固形分濃度の80%に達するまでの間、塗膜10から蒸発する溶媒の平均蒸発速度が3.00g/m2・秒以下になるように乾燥することが好ましい。
次に、第1乾燥装置28での塗膜乾燥を終了した帯状支持体20は、第2乾燥装置32に搬送され、減率乾燥開始時固形分濃度の80%を超えた状態から乾燥が終了するまでの略減率乾燥期の乾燥を行う。この、減率乾燥期間における塗膜10の乾燥は、上記のような平均蒸発速度が3.00g/m2・秒以下の緩やかな乾燥を行う必要はなく、乾燥効率を上げるために通常の乾燥速度で行えばよい。具体的には塗膜から蒸発する溶媒の平均蒸発速度が3.00g/m2・秒を超えた乾燥条件で乾燥を行えばよい。
次に、第2乾燥装置32で塗膜10が急速乾燥された帯状支持体20は、第2活性線照射装置34に搬送され、塗膜10の硬化反応を最後まで行う。
塗布液中に硬化成分として活性線硬化モノマー以外に活性線硬化樹脂を含有させたことによって、塗膜10が湿潤状態にある場合でも、活性線の照射によって塗膜10の硬化反応を迅速に進行できるメカニズムを以下に説明する。
帯状支持体20としてポリエステルフィルム(東洋紡工業製のA4300,厚み100μm)を使用し、帯状支持体20上に形成する無機蒸着膜としてアルミナ蒸着膜を用いた。
以下の組成の塗布液を調製した。
・UV硬化モノマー(日本化薬製 PET−30) 23.5質量%
・UV硬化樹脂(ウレタンアクレート) 23.5質量%
・重合開始剤(BASF製 イルガキュア369) 3質量%
(3)塗布工程
エクストルージョン型ダイコータを用いて、調製した塗布液を無機蒸着膜上に塗布した。塗布は、帯状支持体20を搬送速度30m/分で搬送しながら、ウエット塗布量が15cc/m2になるように塗布した。
第1照射工程では、塗布工程で塗布された塗膜が湿潤状態(50%の状態)で、UV照度を0.5W/cm2、UV照射量を0.02J/cm2の照射条件で行った。そして、照射時間を変えることによって、UV照射後の塗膜中の活性線硬化成分の硬化率が5%〜90%の範囲において8段階で変わるようにした(図4参照)。
第1乾燥工程では、第1照射工程での活性線照射終了時から塗膜10の固形分濃度が減率乾燥開始時固形分濃度の80%に達するまでの間、塗膜中の溶媒が蒸発する平均蒸発速度が3.00g/m2・秒で行った。
第2照射工程では、乾燥後の塗膜10への照射は、UV照度を0.5W/cm2、UV照射量を0.3J/cm2の照射条件で行った。なお、第1及び第2の照射工程ともに、UV照射には、LEDを用いたUV照射装置[(株)センテック製OX224]を用いた。
第1照射工程において試験1〜8の硬化率になる条件で8サンプルの塗膜付きフィルムを製造し、それぞれの塗膜付きフィルムについて帯状支持体20側の面から光を照射し、目視にて塗布抜けの状態を観察した。
試験結果を図4の表に示す。
Claims (2)
- 活性線硬化成分を含有させた塗布液を調製する塗布液調製工程と、
前記塗布液を、支持体に予め蒸着された無機蒸着膜上に塗布して塗膜を形成する塗布工程と、
前記塗膜に活性線を照射する照射工程と、
前記照射した塗膜を乾燥する乾燥工程と、を順に備え、
前記照射工程では、前記塗膜が湿潤状態にある状態で活性線を照射して、塗膜中の硬化成分の硬化率を10〜80%まで上昇させることを特徴とする塗膜付きフィルムの製造方法。 - 前記活性線硬化成分は、活性線硬化モノマー以外に分子量が2500以上の活性線硬化樹脂を、前記塗布液中に固形分濃度として3質量%以上含有し、且つ前記活性線硬化樹脂と前記活性線硬化モノマーとの合計固形濃度として30質量%以上含有する請求項1に記載の塗膜付きフィルムの製造方法。
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JP2012081703A JP5781464B2 (ja) | 2012-03-30 | 2012-03-30 | 塗膜付きフィルムの製造方法 |
KR1020147026692A KR101599660B1 (ko) | 2012-03-30 | 2013-03-26 | 도막 형성 필름의 제조 방법 |
CN201380018530.2A CN104245158B (zh) | 2012-03-30 | 2013-03-26 | 带涂膜的薄膜的制造方法 |
PCT/JP2013/058685 WO2013146730A1 (ja) | 2012-03-30 | 2013-03-26 | 塗膜付きフィルムの製造方法 |
US14/499,961 US9145610B2 (en) | 2012-03-30 | 2014-09-29 | Method for producing film with coating |
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JP2012081703A JP5781464B2 (ja) | 2012-03-30 | 2012-03-30 | 塗膜付きフィルムの製造方法 |
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JP5781464B2 true JP5781464B2 (ja) | 2015-09-24 |
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JP (1) | JP5781464B2 (ja) |
KR (1) | KR101599660B1 (ja) |
CN (1) | CN104245158B (ja) |
WO (1) | WO2013146730A1 (ja) |
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JP5809186B2 (ja) * | 2013-03-29 | 2015-11-10 | 富士フイルム株式会社 | 複層フィルムの製造方法 |
JP6614833B2 (ja) * | 2015-07-15 | 2019-12-04 | 日東電工株式会社 | 光学積層体の製造方法 |
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JP2893770B2 (ja) * | 1989-12-04 | 1999-05-24 | 大日本印刷株式会社 | 化粧シートの製造方法 |
JP2005111756A (ja) * | 2003-10-06 | 2005-04-28 | Fuji Photo Film Co Ltd | ハードコート処理物品、硬化性組成物、および情報記録担体 |
CN100582817C (zh) * | 2005-03-29 | 2010-01-20 | 株式会社巴川制纸所 | 防眩光膜 |
JP4708287B2 (ja) * | 2006-08-25 | 2011-06-22 | 富士フイルム株式会社 | 光学フィルムの製造方法、光学フィルム、偏光板、転写材料、液晶表示装置、及び偏光紫外線露光装置 |
JP5038224B2 (ja) * | 2007-05-08 | 2012-10-03 | 日東電工株式会社 | 粘着型光学フィルムおよび画像表示装置 |
JP5183371B2 (ja) * | 2007-08-31 | 2013-04-17 | 三洋化成工業株式会社 | プラスチック基材被覆金属膜用ハードコート組成物 |
JP2009073901A (ja) * | 2007-09-19 | 2009-04-09 | Nippon Shokubai Co Ltd | 硬化物の製造方法、および硬化物、および光記録媒体 |
JP5616657B2 (ja) | 2010-03-12 | 2014-10-29 | 富士フイルム株式会社 | 表面処理方法 |
JP2012014115A (ja) * | 2010-07-05 | 2012-01-19 | Fujifilm Corp | 光学フィルム及びその製造方法 |
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CN104245158A (zh) | 2014-12-24 |
JP2013208593A (ja) | 2013-10-10 |
US9145610B2 (en) | 2015-09-29 |
WO2013146730A1 (ja) | 2013-10-03 |
KR101599660B1 (ko) | 2016-03-03 |
KR20140136953A (ko) | 2014-12-01 |
US20150017347A1 (en) | 2015-01-15 |
CN104245158B (zh) | 2016-03-16 |
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