JP5777215B2 - 気液接触器および排気洗浄システムおよび方法 - Google Patents

気液接触器および排気洗浄システムおよび方法 Download PDF

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Publication number
JP5777215B2
JP5777215B2 JP2011529041A JP2011529041A JP5777215B2 JP 5777215 B2 JP5777215 B2 JP 5777215B2 JP 2011529041 A JP2011529041 A JP 2011529041A JP 2011529041 A JP2011529041 A JP 2011529041A JP 5777215 B2 JP5777215 B2 JP 5777215B2
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gas
liquid
nozzle
jet
contactor
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Expired - Fee Related
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JP2011529041A
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Japanese (ja)
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JP2012503541A5 (cg-RX-API-DMAC7.html
JP2012503541A (ja
Inventor
ニューマン、ディビッド、カート
ミラー、ニコラス、ジェー.
ニザノフ、ボリス、アール.
ヘンシャウ、トーマス、リー
アウトライ、アンドリュー、アール.
ブラシェウア、ジェイソン、ケー.
ホブス、キース、アール.
トビアス、ジェイソン、エー.
マクダーモット、ウィリアム、イー.
Original Assignee
ニューマン システムズ グループ、インコーポレイティッド
ニューマン システムズ グループ、インコーポレイティッド
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09Processes or apparatus for excitation, e.g. pumping
    • H01S3/095Processes or apparatus for excitation, e.g. pumping using chemical or thermal pumping
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D53/00Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/14Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by absorption
    • B01D53/18Absorbing units; Liquid distributors therefor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02Constructional details
    • H01S3/03Constructional details of gas laser discharge tubes
    • H01S3/036Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering, replenishing; Means for circulating the gas, e.g. for equalising the pressure within the tube
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2251/00Reactants
    • B01D2251/10Oxidants
    • B01D2251/106Peroxides
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2251/00Reactants
    • B01D2251/20Reductants
    • B01D2251/206Ammonium compounds
    • B01D2251/2065Ammonium hydroxide
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2251/00Reactants
    • B01D2251/30Alkali metal compounds
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2251/00Reactants
    • B01D2251/40Alkaline earth metal or magnesium compounds
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2251/00Reactants
    • B01D2251/80Organic bases or salts
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2257/00Components to be removed
    • B01D2257/30Sulfur compounds
    • B01D2257/302Sulfur oxides
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2257/00Components to be removed
    • B01D2257/30Sulfur compounds
    • B01D2257/304Hydrogen sulfide
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2257/00Components to be removed
    • B01D2257/40Nitrogen compounds
    • B01D2257/404Nitrogen oxides other than dinitrogen oxide
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2257/00Components to be removed
    • B01D2257/40Nitrogen compounds
    • B01D2257/406Ammonia
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2257/00Components to be removed
    • B01D2257/50Carbon oxides
    • B01D2257/504Carbon dioxide
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2257/00Components to be removed
    • B01D2257/60Heavy metals or heavy metal compounds
    • B01D2257/602Mercury or mercury compounds
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2259/00Type of treatment
    • B01D2259/12Methods and means for introducing reactants
    • B01D2259/124Liquid reactants
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22Gases
    • H01S3/2215Iodine compounds or atomic iodine

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  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Gas Separation By Absorption (AREA)
  • Treating Waste Gases (AREA)
JP2011529041A 2008-09-26 2009-07-06 気液接触器および排気洗浄システムおよび方法 Expired - Fee Related JP5777215B2 (ja)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
US10056408P 2008-09-26 2008-09-26
US10059108P 2008-09-26 2008-09-26
US10060608P 2008-09-26 2008-09-26
US61/100,606 2008-09-26
US61/100,591 2008-09-26
US61/100,564 2008-09-26
PCT/US2009/049707 WO2010036436A1 (en) 2008-09-26 2009-07-06 Gas liquid contactor and effluent cleaning system and method

Publications (3)

Publication Number Publication Date
JP2012503541A JP2012503541A (ja) 2012-02-09
JP2012503541A5 JP2012503541A5 (cg-RX-API-DMAC7.html) 2012-05-24
JP5777215B2 true JP5777215B2 (ja) 2015-09-09

Family

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Family Applications (1)

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JP2011529041A Expired - Fee Related JP5777215B2 (ja) 2008-09-26 2009-07-06 気液接触器および排気洗浄システムおよび方法

Country Status (9)

Country Link
EP (1) EP2329567A4 (cg-RX-API-DMAC7.html)
JP (1) JP5777215B2 (cg-RX-API-DMAC7.html)
KR (1) KR20110091658A (cg-RX-API-DMAC7.html)
CN (1) CN102217152B (cg-RX-API-DMAC7.html)
AU (1) AU2009297005B2 (cg-RX-API-DMAC7.html)
CA (1) CA2737637A1 (cg-RX-API-DMAC7.html)
MX (1) MX2011003098A (cg-RX-API-DMAC7.html)
NZ (1) NZ592100A (cg-RX-API-DMAC7.html)
WO (1) WO2010036436A1 (cg-RX-API-DMAC7.html)

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DE102012214065A1 (de) * 2012-08-08 2014-02-13 EnBW Energie Baden-Württemberg AG Verfahren zum Entfernen von Quecksilber aus Rauchgas in einem Nasswäscher
DE102014105030A1 (de) * 2014-04-09 2015-10-15 Heinz Tischmacher Vorrichtung sowie Verfahren zum Herstellen von Düngemitteln aus Abgasen einer Produktionsanlage
CN103920384B (zh) * 2014-04-25 2016-02-17 中国人民解放军63605部队 一种常压法吸收高浓度氮氧化物的设备
US9216934B1 (en) 2014-09-29 2015-12-22 Cameron Solutions, Inc. System and method for pH control of lean MEG product from MEG regeneration and reclamation packages
CN104359723B (zh) * 2014-11-21 2018-01-23 中国环境科学研究院 用于采集大气中过氧化物的雾液吸收装置
JP6740036B2 (ja) 2016-06-30 2020-08-12 株式会社東芝 二酸化炭素回収システムおよび排ガス処理方法
CN107551763A (zh) * 2016-09-18 2018-01-09 叶涛 一种有机物废气的环保处理方法及其设备
CN106902633B (zh) * 2017-03-13 2020-06-16 华北电力大学(保定) 脱除烟气中元素汞的仿生酶吸收剂及其制备方法和应用
US11446603B2 (en) 2017-07-06 2022-09-20 Qatar Foundation For Education, Science, Andcommunity Development Acid gas removal system for removing acidic gases from gaseous hydrocarbons
CN108585534B (zh) * 2018-07-25 2021-07-13 湖北鸿创科技有限公司 一种玻璃蚀刻用鼓泡装置
CN111115575A (zh) * 2020-01-17 2020-05-08 中国华能集团清洁能源技术研究院有限公司 一种基于燃烧前co2捕集系统的等温变换系统
CN112591769A (zh) * 2020-12-16 2021-04-02 湖南福千府生物科技有限公司 一种配置亚硫酸钠溶液装置
CN112933866B (zh) * 2021-03-22 2022-07-22 哈尔滨工程大学 一种可用于有害气体净化处理的气液两相引射器
CN117279703A (zh) 2021-04-13 2023-12-22 外界环境公司 用于二氧化碳捕获和回收的系统和方法
WO2023102165A1 (en) * 2021-12-03 2023-06-08 Michigan Technological University SIMULTANEOUS REMOVAL OF CO2, NOx AND SOx USING SINGLE STAGE ABSORPTION COLUMN
CN114307693B (zh) * 2022-01-04 2022-11-11 大连理工大学 一种MOFs与聚合物双连续的混合基质膜的制备方法

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Also Published As

Publication number Publication date
CN102217152A (zh) 2011-10-12
JP2012503541A (ja) 2012-02-09
EP2329567A1 (en) 2011-06-08
NZ592100A (en) 2013-11-29
AU2009297005A1 (en) 2010-04-01
WO2010036436A1 (en) 2010-04-01
AU2009297005B2 (en) 2014-05-29
KR20110091658A (ko) 2011-08-12
CA2737637A1 (en) 2010-04-01
MX2011003098A (es) 2011-08-03
EP2329567A4 (en) 2012-03-14
CN102217152B (zh) 2013-06-12

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