NZ592100A - Gas liquid contactor and effluent cleaning system and method - Google Patents

Gas liquid contactor and effluent cleaning system and method

Info

Publication number
NZ592100A
NZ592100A NZ592100A NZ59210009A NZ592100A NZ 592100 A NZ592100 A NZ 592100A NZ 592100 A NZ592100 A NZ 592100A NZ 59210009 A NZ59210009 A NZ 59210009A NZ 592100 A NZ592100 A NZ 592100A
Authority
NZ
New Zealand
Prior art keywords
gas
liquid
inlet
nozzles
array
Prior art date
Application number
NZ592100A
Other languages
English (en)
Inventor
Nicholas J Miller
William E Mcdermott
Keith R Hobbs
Jason K Brasseur
David Kurt Neumann
Jason A Tobias
Thomas Lee Henshaw
Boris R Nizamov
Andrew R Awtry
Original Assignee
Neumann Systems Group Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Neumann Systems Group Inc filed Critical Neumann Systems Group Inc
Publication of NZ592100A publication Critical patent/NZ592100A/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/095—Processes or apparatus for excitation, e.g. pumping using chemical or thermal pumping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/14—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by absorption
    • B01D53/18—Absorbing units; Liquid distributors therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/036—Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering, replenishing; Means for circulating the gas, e.g. for equalising the pressure within the tube
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2251/00—Reactants
    • B01D2251/10—Oxidants
    • B01D2251/106—Peroxides
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2251/00—Reactants
    • B01D2251/20—Reductants
    • B01D2251/206—Ammonium compounds
    • B01D2251/2065—Ammonium hydroxide
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2251/00—Reactants
    • B01D2251/30—Alkali metal compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2251/00—Reactants
    • B01D2251/40—Alkaline earth metal or magnesium compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2251/00—Reactants
    • B01D2251/80—Organic bases or salts
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2257/00—Components to be removed
    • B01D2257/30—Sulfur compounds
    • B01D2257/302—Sulfur oxides
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2257/00—Components to be removed
    • B01D2257/30—Sulfur compounds
    • B01D2257/304—Hydrogen sulfide
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2257/00—Components to be removed
    • B01D2257/40—Nitrogen compounds
    • B01D2257/404—Nitrogen oxides other than dinitrogen oxide
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2257/00—Components to be removed
    • B01D2257/40—Nitrogen compounds
    • B01D2257/406—Ammonia
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2257/00—Components to be removed
    • B01D2257/50—Carbon oxides
    • B01D2257/504—Carbon dioxide
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2257/00—Components to be removed
    • B01D2257/60—Heavy metals or heavy metal compounds
    • B01D2257/602—Mercury or mercury compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2259/00—Type of treatment
    • B01D2259/12—Methods and means for introducing reactants
    • B01D2259/124—Liquid reactants
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/2215—Iodine compounds or atomic iodine

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Gas Separation By Absorption (AREA)
  • Treating Waste Gases (AREA)
NZ592100A 2008-09-26 2009-07-06 Gas liquid contactor and effluent cleaning system and method NZ592100A (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US10060608P 2008-09-26 2008-09-26
US10056408P 2008-09-26 2008-09-26
US10059108P 2008-09-26 2008-09-26
PCT/US2009/049707 WO2010036436A1 (en) 2008-09-26 2009-07-06 Gas liquid contactor and effluent cleaning system and method

Publications (1)

Publication Number Publication Date
NZ592100A true NZ592100A (en) 2013-11-29

Family

ID=42060040

Family Applications (1)

Application Number Title Priority Date Filing Date
NZ592100A NZ592100A (en) 2008-09-26 2009-07-06 Gas liquid contactor and effluent cleaning system and method

Country Status (9)

Country Link
EP (1) EP2329567A4 (xx)
JP (1) JP5777215B2 (xx)
KR (1) KR20110091658A (xx)
CN (1) CN102217152B (xx)
AU (1) AU2009297005B2 (xx)
CA (1) CA2737637A1 (xx)
MX (1) MX2011003098A (xx)
NZ (1) NZ592100A (xx)
WO (1) WO2010036436A1 (xx)

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* Cited by examiner, † Cited by third party
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DE102012214065A1 (de) * 2012-08-08 2014-02-13 EnBW Energie Baden-Württemberg AG Verfahren zum Entfernen von Quecksilber aus Rauchgas in einem Nasswäscher
DE102014105030A1 (de) * 2014-04-09 2015-10-15 Heinz Tischmacher Vorrichtung sowie Verfahren zum Herstellen von Düngemitteln aus Abgasen einer Produktionsanlage
CN103920384B (zh) * 2014-04-25 2016-02-17 中国人民解放军63605部队 一种常压法吸收高浓度氮氧化物的设备
US9216934B1 (en) 2014-09-29 2015-12-22 Cameron Solutions, Inc. System and method for pH control of lean MEG product from MEG regeneration and reclamation packages
CN108362828B (zh) * 2014-11-21 2020-02-18 中国环境科学研究院 一种用于采集大气中过氧化物的雾液吸收装置
JP6740036B2 (ja) 2016-06-30 2020-08-12 株式会社東芝 二酸化炭素回収システムおよび排ガス処理方法
CN107551763A (zh) * 2016-09-18 2018-01-09 叶涛 一种有机物废气的环保处理方法及其设备
CN106902633B (zh) * 2017-03-13 2020-06-16 华北电力大学（保定） 脱除烟气中元素汞的仿生酶吸收剂及其制备方法和应用
WO2019010344A2 (en) 2017-07-06 2019-01-10 Qatar Foundation For Education, Science And Community Development ACID GAS REMOVAL SYSTEM FOR REMOVING ACIDIC GAS FROM GASEOUS HYDROCARBONS
CN108585534B (zh) * 2018-07-25 2021-07-13 湖北鸿创科技有限公司 一种玻璃蚀刻用鼓泡装置
CN111115575A (zh) * 2020-01-17 2020-05-08 中国华能集团清洁能源技术研究院有限公司 一种基于燃烧前co2捕集系统的等温变换系统
CN112591769A (zh) * 2020-12-16 2021-04-02 湖南福千府生物科技有限公司 一种配置亚硫酸钠溶液装置
CN112933866B (zh) * 2021-03-22 2022-07-22 哈尔滨工程大学 一种可用于有害气体净化处理的气液两相引射器
AU2022258431A1 (en) 2021-04-13 2023-11-30 Enviro Ambient Corporation System and methods for carbon dioxide capture and recovery
WO2023102165A1 (en) * 2021-12-03 2023-06-08 Michigan Technological University SIMULTANEOUS REMOVAL OF CO2, NOx AND SOx USING SINGLE STAGE ABSORPTION COLUMN
CN114307693B (zh) * 2022-01-04 2022-11-11 大连理工大学 一种MOFs与聚合物双连续的混合基质膜的制备方法

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US1256808A (en) 1917-06-05 1918-02-19 Lanston Monotype Machine Co Mold for casting printers' leads and the like.
US3948608A (en) * 1972-03-24 1976-04-06 Weir Jr Alexander Apparatus for treating stack gases
US3985860A (en) * 1975-09-22 1976-10-12 Pullman Incorporated Method for oxidation of SO2 scrubber sludge
US4246245A (en) * 1979-01-02 1981-01-20 Bechtel International Corporation SO2 Removal
US4968328A (en) * 1986-05-16 1990-11-06 Duke Eddie D De-mister baffle and assembly
US4948402A (en) * 1988-12-09 1990-08-14 Davis Water & Waste Industries, Inc. Modular air scrubber system
JPH05293332A (ja) * 1992-04-21 1993-11-09 Showa Shell Sekiyu Kk 揮発性有機化合物含有ガスの除去方法
US5395482A (en) * 1992-11-13 1995-03-07 Fuji Photo Film Co., Ltd. Ultra high purity vapor phase treatment
JPH11114354A (ja) * 1997-10-14 1999-04-27 Japan Energy Corp 二酸化炭素吸収装置の防食方法
JPH11116223A (ja) * 1997-10-17 1999-04-27 Mayekawa Mfg Co Ltd 自家発電設備を備えた炭酸飲料工場におけるｃｏ２ の製造方法とその製造装置
JPH11197499A (ja) * 1998-01-17 1999-07-27 Kawasaki Heavy Ind Ltd 気液反応装置
US6875247B2 (en) * 2000-06-06 2005-04-05 Battelle Memorial Institute Conditions for fluid separations in microchannels, capillary-driven fluid separations, and laminated devices capable of separating fluids
JP2002136828A (ja) * 2000-11-07 2002-05-14 Fuji Photo Film Co Ltd 気液接触装置及び気液接触方法
ATE318792T1 (de) * 2001-04-20 2006-03-15 Shell Int Research Verfahren zur karbonisierung von mineralien mit kohlenstoffdioxid
DE60316264T2 (de) * 2002-03-19 2008-05-29 Entegris, Inc., Chaska Hohlfasermembrankontaktvorrichtung und -verfahren
AU2003236884A1 (en) * 2002-05-16 2003-12-02 Graeme Stewart Shortis Particle separation
US7214356B2 (en) * 2003-07-09 2007-05-08 Belco Technologies Corporation Wet scrubbing apparatus and method for controlling NOx emissions
US7379487B2 (en) * 2005-02-14 2008-05-27 Neumann Information Systems, Inc. Two phase reactor
US7318855B2 (en) * 2005-03-30 2008-01-15 The Boeing Company Gas/liquid separation utilizing structured separator material
US20070085227A1 (en) * 2005-10-13 2007-04-19 Tonkovich Anna L Multi-phase contacting process using microchannel technology

Also Published As

Publication number Publication date
AU2009297005A1 (en) 2010-04-01
JP2012503541A (ja) 2012-02-09
EP2329567A1 (en) 2011-06-08
EP2329567A4 (en) 2012-03-14
KR20110091658A (ko) 2011-08-12
MX2011003098A (es) 2011-08-03
CN102217152B (zh) 2013-06-12
WO2010036436A1 (en) 2010-04-01
CN102217152A (zh) 2011-10-12
JP5777215B2 (ja) 2015-09-09
AU2009297005B2 (en) 2014-05-29
CA2737637A1 (en) 2010-04-01

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Legal Events

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PSEA Patent sealed
RENW Renewal (renewal fees accepted)

Free format text: PATENT RENEWED FOR 3 YEARS UNTIL 06 JUL 2016 BY AJ PARK

Effective date: 20140429

RENW Renewal (renewal fees accepted)

Free format text: PATENT RENEWED FOR 1 YEAR UNTIL 06 JUL 2017 BY COMPUTER PACKAGES INC

Effective date: 20160701

LAPS Patent lapsed