JP5764650B2 - 金属電着浴の効率を制御するための装置および方法 - Google Patents

金属電着浴の効率を制御するための装置および方法 Download PDF

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Publication number
JP5764650B2
JP5764650B2 JP2013501914A JP2013501914A JP5764650B2 JP 5764650 B2 JP5764650 B2 JP 5764650B2 JP 2013501914 A JP2013501914 A JP 2013501914A JP 2013501914 A JP2013501914 A JP 2013501914A JP 5764650 B2 JP5764650 B2 JP 5764650B2
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Prior art keywords
sample
cathode
current
bath
electroplating bath
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Japanese (ja)
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JP2013524011A5 (de
JP2013524011A (ja
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ラグランジユ，フレデリツク
モレ，エルベ
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Safran Aircraft Engines SAS
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SNECMA SAS
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    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/10—Electrodes, e.g. composition, counter electrode
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/10—Electrodes, e.g. composition, counter electrode
    • C25D17/12—Shape or form
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/12—Process control or regulation

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Automation & Control Theory (AREA)
  • Electroplating Methods And Accessories (AREA)
JP2013501914A 2010-03-31 2011-03-30 金属電着浴の効率を制御するための装置および方法 Active JP5764650B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FR1052373 2010-03-31
FR1052373A FR2958300B1 (fr) 2010-03-31 2010-03-31 Dispositif pour controler des caracteristiques physiques d'un bain d'electrodeposition metallique.
PCT/FR2011/050715 WO2011121240A1 (fr) 2010-03-31 2011-03-30 Dispositif et procede pour controler l'efficacite d'un bain d'electrodeposition metallique

Publications (3)

Publication Number Publication Date
JP2013524011A JP2013524011A (ja) 2013-06-17
JP2013524011A5 JP2013524011A5 (de) 2015-03-12
JP5764650B2 true JP5764650B2 (ja) 2015-08-19

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ID=42751439

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JP2013501914A Active JP5764650B2 (ja) 2010-03-31 2011-03-30 金属電着浴の効率を制御するための装置および方法

Country Status (9)

Country Link
US (1) US20130008797A1 (de)
EP (1) EP2553148B1 (de)
JP (1) JP5764650B2 (de)
CN (1) CN102822393B (de)
BR (1) BR112012024387A2 (de)
CA (1) CA2794579A1 (de)
FR (1) FR2958300B1 (de)
RU (1) RU2553161C2 (de)
WO (1) WO2011121240A1 (de)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2020012144A (ja) * 2018-07-17 2020-01-23 株式会社ファシリティ 電解処理装置
JP7576490B2 (ja) 2021-03-03 2024-10-31 Tdk株式会社 電子部品の製造方法、及び、電子部品の製造装置

Family Cites Families (30)

* Cited by examiner, † Cited by third party
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US2149344A (en) * 1935-03-22 1939-03-07 Du Pont Apparatus and process for the study of plating solutions
FR863312A (fr) * 1939-02-20 1941-03-29 Procédé et appareil pour le dépôt électrolytique d'alliages d'étain
SU127339A1 (ru) * 1953-04-02 1959-11-30 М.А. Гинцбург Линейный ускоритель элементарных частиц и ионов
US3132080A (en) * 1960-10-26 1964-05-05 Thompson Ramo Wooldridge Inc Electroplating method and apparatus
US3470082A (en) * 1965-09-22 1969-09-30 Louis W Raymond Electroplating method and system
DE2537256C3 (de) * 1975-08-21 1979-05-17 Siemens Ag, 1000 Berlin Und 8000 Muenchen Vorrichtung zum galvanischen Abscheiden von Aluminium
JPS5954568U (ja) * 1982-09-30 1984-04-10 富士通株式会社 電着めつき装置
SU1108130A1 (ru) * 1983-04-15 1984-08-15 Предприятие П/Я Г-4733 Устройство дл контрол травильной способности растворов
US4721551A (en) * 1986-11-06 1988-01-26 The Regents Of The University Of California Iridium treatment of neuro-stimulating electrodes
JPS63138246A (ja) * 1986-11-29 1988-06-10 Oki Electric Ind Co Ltd メツキ液撹拌状態試験方法
GB8821005D0 (en) * 1988-09-07 1988-10-05 Johnson Matthey Plc Improvements in plating
JPH0737680B2 (ja) * 1990-07-09 1995-04-26 株式会社アルメックス 給電方法
JPH04114566A (ja) * 1990-09-04 1992-04-15 Sharp Corp テレビドアホン装置
JPH04114566U (ja) * 1991-03-20 1992-10-08 アイシン精機株式会社 メツキ処理装置
JPH0741998A (ja) * 1993-07-29 1995-02-10 Kawasaki Steel Corp 鉄系電気めっき方法
US7153410B2 (en) * 2000-08-30 2006-12-26 Micron Technology, Inc. Methods and apparatus for electrochemical-mechanical processing of microelectronic workpieces
US6582570B2 (en) * 2001-02-06 2003-06-24 Danny Wu Electroplating apparatus for wheel disk
US20040168925A1 (en) * 2002-10-09 2004-09-02 Uziel Landau Electrochemical system for analyzing performance and properties of electrolytic solutions
JP2004149872A (ja) * 2002-10-31 2004-05-27 Renesas Technology Corp メッキ処理装置およびメッキ処理方法
DE10323638B4 (de) * 2003-05-26 2006-11-23 Robert Bosch Gmbh Verfahren und Vorrichtung zur Entwicklung einer elektrochemischen Messanordnung
DE102004056158B3 (de) * 2004-11-17 2006-03-30 Siemens Ag Verfahren zum Überwachen eines elektrochemischen Behandlungsprozesses und für dieses Verfahren geeignete Elektrodenanordnung
US20060289299A1 (en) * 2005-06-22 2006-12-28 3M Innovative Properties Company Multi-channel current probe
CN101502106A (zh) * 2005-10-24 2009-08-05 Nxp股份有限公司 运动矢量场重定时器
JP2007262433A (ja) * 2006-03-27 2007-10-11 Teikoku Ion Kk クロムめっき用ハイブリッド電極、それを用いたクロムメッキ方法及びクロムめっき装置
JP5110269B2 (ja) * 2007-08-09 2012-12-26 上村工業株式会社 電気銅めっき方法
JP4942580B2 (ja) * 2007-08-20 2012-05-30 株式会社荏原製作所 アノードホルダ用通電ベルトおよびアノードホルダ
JP5293276B2 (ja) * 2008-03-11 2013-09-18 上村工業株式会社 連続電気銅めっき方法
US8062496B2 (en) * 2008-04-18 2011-11-22 Integran Technologies Inc. Electroplating method and apparatus
US8366884B2 (en) * 2008-04-30 2013-02-05 Alcatel Lucent Plating apparatus with direct electrolyte distribution system
US7776741B2 (en) * 2008-08-18 2010-08-17 Novellus Systems, Inc. Process for through silicon via filing

Also Published As

Publication number Publication date
WO2011121240A1 (fr) 2011-10-06
CA2794579A1 (fr) 2011-10-06
US20130008797A1 (en) 2013-01-10
BR112012024387A2 (pt) 2016-05-24
RU2012145547A (ru) 2014-05-10
EP2553148A1 (de) 2013-02-06
CN102822393A (zh) 2012-12-12
FR2958300B1 (fr) 2012-05-04
JP2013524011A (ja) 2013-06-17
EP2553148B1 (de) 2014-01-08
CN102822393B (zh) 2015-06-10
RU2553161C2 (ru) 2015-06-10
FR2958300A1 (fr) 2011-10-07

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