JP5758569B2 - スラブ型レーザ装置 - Google Patents

スラブ型レーザ装置 Download PDF

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Publication number
JP5758569B2
JP5758569B2 JP2009029011A JP2009029011A JP5758569B2 JP 5758569 B2 JP5758569 B2 JP 5758569B2 JP 2009029011 A JP2009029011 A JP 2009029011A JP 2009029011 A JP2009029011 A JP 2009029011A JP 5758569 B2 JP5758569 B2 JP 5758569B2
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Japan
Prior art keywords
laser
slab type
light
incident
mirror
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Expired - Fee Related
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JP2009029011A
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English (en)
Japanese (ja)
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JP2010021518A5 (cg-RX-API-DMAC7.html
JP2010021518A (ja
Inventor
クリストフ・ノバック
崇 菅沼
崇 菅沼
若林　理
理 若林
遠藤　彰
彰 遠藤
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Gigaphoton Inc
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Gigaphoton Inc
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Priority to JP2009029011A priority Critical patent/JP5758569B2/ja
Priority to DE102009024360A priority patent/DE102009024360A1/de
Priority to US12/482,824 priority patent/US7903715B2/en
Publication of JP2010021518A publication Critical patent/JP2010021518A/ja
Publication of JP2010021518A5 publication Critical patent/JP2010021518A5/ja
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/06—Construction or shape of active medium
    • H01S3/07—Construction or shape of active medium consisting of a plurality of parts, e.g. segments
    • H01S3/073—Gas lasers comprising separate discharge sections in one cavity, e.g. hybrid lasers
    • H01S3/076—Folded-path lasers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70025—Production of exposure light, i.e. light sources by lasers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
    • H01S3/2308—Amplifier arrangements, e.g. MOPA
    • H01S3/2325—Multi-pass amplifiers, e.g. regenerative amplifiers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/0971—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/11—Mode locking; Q-switching; Other giant-pulse techniques, e.g. cavity dumping
    • H01S3/1123—Q-switching
    • H01S3/115—Q-switching using intracavity electro-optic devices
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/2232—Carbon dioxide (CO2) or monoxide [CO]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
    • H01S3/2308—Amplifier arrangements, e.g. MOPA
    • H01S3/2316—Cascaded amplifiers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
    • H01S3/2308—Amplifier arrangements, e.g. MOPA
    • H01S3/2325—Multi-pass amplifiers, e.g. regenerative amplifiers
    • H01S3/235—Regenerative amplifiers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
    • H01S3/2375—Hybrid lasers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/14—External cavity lasers
    • H01S5/141—External cavity lasers using a wavelength selective device, e.g. a grating or etalon
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/40—Arrangement of two or more semiconductor lasers, not provided for in groups H01S5/02 - H01S5/30
    • H01S5/4025—Array arrangements, e.g. constituted by discrete laser diodes or laser bar
    • H01S5/4087—Array arrangements, e.g. constituted by discrete laser diodes or laser bar emitting more than one wavelength

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Electromagnetism (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Lasers (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • X-Ray Techniques (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2009029011A 2008-06-12 2009-02-10 スラブ型レーザ装置 Expired - Fee Related JP5758569B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2009029011A JP5758569B2 (ja) 2008-06-12 2009-02-10 スラブ型レーザ装置
DE102009024360A DE102009024360A1 (de) 2008-06-12 2009-06-09 Slab-Typ-Laser-Vorrichtung
US12/482,824 US7903715B2 (en) 2008-06-12 2009-06-11 Slab type laser apparatus

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2008154264 2008-06-12
JP2008154264 2008-06-12
JP2009029011A JP5758569B2 (ja) 2008-06-12 2009-02-10 スラブ型レーザ装置

Publications (3)

Publication Number Publication Date
JP2010021518A JP2010021518A (ja) 2010-01-28
JP2010021518A5 JP2010021518A5 (cg-RX-API-DMAC7.html) 2012-04-05
JP5758569B2 true JP5758569B2 (ja) 2015-08-05

Family

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Family Applications (1)

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JP2009029011A Expired - Fee Related JP5758569B2 (ja) 2008-06-12 2009-02-10 スラブ型レーザ装置

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US (1) US7903715B2 (cg-RX-API-DMAC7.html)
JP (1) JP5758569B2 (cg-RX-API-DMAC7.html)
DE (1) DE102009024360A1 (cg-RX-API-DMAC7.html)

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JP5536401B2 (ja) * 2008-10-16 2014-07-02 ギガフォトン株式会社 レーザ装置および極端紫外光光源装置
JP5474576B2 (ja) * 2009-01-14 2014-04-16 ギガフォトン株式会社 レーザ光増幅器及びそれを用いたレーザ装置
NL2004837A (en) * 2009-07-09 2011-01-10 Asml Netherlands Bv Radiation system and lithographic apparatus.
JP5701618B2 (ja) * 2010-03-04 2015-04-15 ギガフォトン株式会社 極端紫外光生成装置
JP5666285B2 (ja) 2010-03-15 2015-02-12 ギガフォトン株式会社 再生増幅器、レーザ装置および極端紫外光生成装置
JP2012109417A (ja) * 2010-11-17 2012-06-07 Komatsu Ltd スラブ型増幅装置、レーザ装置および極端紫外光源装置
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JP2013080743A (ja) * 2011-09-30 2013-05-02 Shibuya Kogyo Co Ltd レーザ発振装置
WO2013084608A1 (ja) * 2011-12-07 2013-06-13 三菱電機株式会社 Ｃｏ２レーザ装置およびｃｏ２レーザ加工装置
JP2013214708A (ja) 2012-03-30 2013-10-17 Gigaphoton Inc レーザ装置、レーザシステムおよび極端紫外光生成装置
WO2013144691A2 (en) * 2012-03-30 2013-10-03 Gigaphoton Inc. Amplifier, laser apparatus, and extreme ultraviolet light generation system
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US9281651B2 (en) * 2014-04-30 2016-03-08 Gsi Group Corporation Laser resonator with parasitic mode suppression
CN104319619B (zh) * 2014-11-20 2017-06-16 中国科学院理化技术研究所 一种基于衍射光栅的激光光束脉冲时序合成装置
RU2713082C2 (ru) * 2015-07-22 2020-02-03 Академи Оф Опто-Электроникс, Чайнис Академи Оф Сайенсис Эксимер-лазерная система с конструкцией кольцевого резонатора
JP6261057B1 (ja) 2016-09-07 2018-01-17 大学共同利用機関法人自然科学研究機構 選択増幅装置
WO2018167819A1 (ja) * 2017-03-13 2018-09-20 三菱電機株式会社 波長多重光送信モジュールおよびその製造方法
US10431952B2 (en) * 2017-05-11 2019-10-01 Lightsense Ip Ltd. Compact plasma ultraintense laser
JP7258178B2 (ja) 2019-11-11 2023-04-14 三菱電機株式会社 ガスレーザ増幅器、ガスレーザ装置、ｅｕｖ光発生装置およびｅｕｖ露光装置
DE102020113631B3 (de) 2020-05-20 2021-10-21 Helmut-Schmidt-Universität Universität der Bundeswehr Hamburg Vorrichtung zur spektralen Verbreiterung eines Laserimpulses und Lasersystem
CN112057041B (zh) * 2020-08-07 2021-12-28 中国科学院深圳先进技术研究院 偏振光声成像探头及光声成像装置
DE102021003704A1 (de) * 2020-10-18 2022-04-21 Keming Du Multipass-Pumpanordnung für Verstärker und Multipass-Verstärker mit großen Mode-Querschnitt
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Publication number Publication date
US20090316746A1 (en) 2009-12-24
DE102009024360A1 (de) 2010-01-07
US7903715B2 (en) 2011-03-08
JP2010021518A (ja) 2010-01-28

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