JP5747311B2 - スルホン酸誘導体及び光酸発生剤 - Google Patents
スルホン酸誘導体及び光酸発生剤 Download PDFInfo
- Publication number
- JP5747311B2 JP5747311B2 JP2011551796A JP2011551796A JP5747311B2 JP 5747311 B2 JP5747311 B2 JP 5747311B2 JP 2011551796 A JP2011551796 A JP 2011551796A JP 2011551796 A JP2011551796 A JP 2011551796A JP 5747311 B2 JP5747311 B2 JP 5747311B2
- Authority
- JP
- Japan
- Prior art keywords
- ion
- group
- photoacid generator
- sulfonic acid
- sulfonium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 150000003458 sulfonic acid derivatives Chemical class 0.000 title claims description 25
- 239000002253 acid Substances 0.000 claims description 40
- 229920002120 photoresistant polymer Polymers 0.000 claims description 20
- 125000004432 carbon atom Chemical group C* 0.000 claims description 16
- 239000000463 material Substances 0.000 claims description 11
- 125000003118 aryl group Chemical group 0.000 claims description 10
- 125000001424 substituent group Chemical group 0.000 claims description 8
- 150000001768 cations Chemical class 0.000 claims description 7
- 229920000642 polymer Polymers 0.000 claims description 7
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 6
- 229910021645 metal ion Inorganic materials 0.000 claims description 6
- 125000006239 protecting group Chemical group 0.000 claims description 6
- 150000004010 onium ions Chemical class 0.000 claims description 5
- RWSOTUBLDIXVET-UHFFFAOYSA-O sulfonium Chemical compound [SH3+] RWSOTUBLDIXVET-UHFFFAOYSA-O 0.000 claims description 5
- 238000010894 electron beam technology Methods 0.000 claims description 4
- 238000004519 manufacturing process Methods 0.000 claims description 4
- 238000000034 method Methods 0.000 claims description 4
- 238000000206 photolithography Methods 0.000 claims description 4
- GPRLSGONYQIRFK-UHFFFAOYSA-N hydron Chemical compound [H+] GPRLSGONYQIRFK-UHFFFAOYSA-N 0.000 claims description 3
- MGFYSGNNHQQTJW-UHFFFAOYSA-N iodonium Chemical compound [IH2+] MGFYSGNNHQQTJW-UHFFFAOYSA-N 0.000 claims description 2
- 238000000354 decomposition reaction Methods 0.000 claims 1
- -1 i-pentyl group Chemical group 0.000 description 133
- 150000002500 ions Chemical class 0.000 description 27
- 238000005481 NMR spectroscopy Methods 0.000 description 24
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 15
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 11
- 230000015572 biosynthetic process Effects 0.000 description 10
- 239000000126 substance Substances 0.000 description 10
- 238000003786 synthesis reaction Methods 0.000 description 10
- 238000011161 development Methods 0.000 description 9
- 150000003839 salts Chemical class 0.000 description 9
- 239000011347 resin Substances 0.000 description 8
- 229920005989 resin Polymers 0.000 description 8
- AFCARXCZXQIEQB-UHFFFAOYSA-N N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical compound O=C(CCNC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)N1CC2=C(CC1)NN=N2 AFCARXCZXQIEQB-UHFFFAOYSA-N 0.000 description 7
- 239000003513 alkali Substances 0.000 description 7
- 239000007983 Tris buffer Substances 0.000 description 6
- 150000001875 compounds Chemical class 0.000 description 6
- 125000001153 fluoro group Chemical group F* 0.000 description 6
- 238000004255 ion exchange chromatography Methods 0.000 description 6
- 238000005259 measurement Methods 0.000 description 6
- 239000011342 resin composition Substances 0.000 description 6
- 239000013076 target substance Substances 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 5
- 238000006243 chemical reaction Methods 0.000 description 5
- 229910052710 silicon Inorganic materials 0.000 description 5
- GVONCOQCCRXMCN-UHFFFAOYSA-M 1,1,2-trifluoro-4-hydroxybutane-1-sulfonate;triphenylsulfanium Chemical compound OCCC(F)C(F)(F)S([O-])(=O)=O.C1=CC=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 GVONCOQCCRXMCN-UHFFFAOYSA-M 0.000 description 4
- SMQGSLLYTNNNES-UHFFFAOYSA-M 4-(cyclohexanecarbonyloxy)-1,1,2-trifluorobutane-1-sulfonate;triphenylsulfanium Chemical compound C1=CC=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1.[O-]S(=O)(=O)C(F)(F)C(F)CCOC(=O)C1CCCCC1 SMQGSLLYTNNNES-UHFFFAOYSA-M 0.000 description 4
- 239000012153 distilled water Substances 0.000 description 4
- OCUXHFVNHQTZKR-UHFFFAOYSA-M methanesulfonate;triphenylsulfanium Chemical compound CS([O-])(=O)=O.C1=CC=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 OCUXHFVNHQTZKR-UHFFFAOYSA-M 0.000 description 4
- 125000004433 nitrogen atom Chemical group N* 0.000 description 4
- 125000004437 phosphorous atom Chemical group 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- 125000004434 sulfur atom Chemical group 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 125000000217 alkyl group Chemical group 0.000 description 3
- 239000012295 chemical reaction liquid Substances 0.000 description 3
- RVOJTCZRIKWHDX-UHFFFAOYSA-N cyclohexanecarbonyl chloride Chemical compound ClC(=O)C1CCCCC1 RVOJTCZRIKWHDX-UHFFFAOYSA-N 0.000 description 3
- 229910052731 fluorine Inorganic materials 0.000 description 3
- 125000005843 halogen group Chemical group 0.000 description 3
- 150000002430 hydrocarbons Chemical group 0.000 description 3
- 239000010410 layer Substances 0.000 description 3
- 230000005855 radiation Effects 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- FDERTMZIESPUHC-UHFFFAOYSA-M sodium;1,1,2-trifluoro-4-hydroxybutane-1-sulfonate Chemical compound [Na+].OCCC(F)C(F)(F)S([O-])(=O)=O FDERTMZIESPUHC-UHFFFAOYSA-M 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- QFABNUVNDKOIEH-UHFFFAOYSA-N 2-methylsulfanylcyclohexan-1-one Chemical compound CSC1CCCCC1=O QFABNUVNDKOIEH-UHFFFAOYSA-N 0.000 description 2
- PCYKQGRAPGQQCB-UHFFFAOYSA-N 3,4,4-trifluorobut-3-en-1-ol Chemical compound OCCC(F)=C(F)F PCYKQGRAPGQQCB-UHFFFAOYSA-N 0.000 description 2
- AISKXQGJDZGMPK-UHFFFAOYSA-N 3,4,4-trifluorobut-3-enyl acetate Chemical compound CC(=O)OCCC(F)=C(F)F AISKXQGJDZGMPK-UHFFFAOYSA-N 0.000 description 2
- XRIYEOBBIBEEMW-UHFFFAOYSA-N 3-bicyclo[2.2.1]heptanyl-methyl-(2-oxocyclohexyl)sulfanium Chemical compound C1C(C2)CCC2C1[S+](C)C1CCCCC1=O XRIYEOBBIBEEMW-UHFFFAOYSA-N 0.000 description 2
- GQCQMFYIFUDARF-UHFFFAOYSA-N 4-bromo-1,1,2-trifluorobut-1-ene Chemical compound FC(F)=C(F)CCBr GQCQMFYIFUDARF-UHFFFAOYSA-N 0.000 description 2
- JGEQTLMNYPALLR-UHFFFAOYSA-M CC(C)(C)C(=O)OCCC(F)C(F)(F)S([O-])(=O)=O.C1=CC=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 Chemical compound CC(C)(C)C(=O)OCCC(F)C(F)(F)S([O-])(=O)=O.C1=CC=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 JGEQTLMNYPALLR-UHFFFAOYSA-M 0.000 description 2
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 description 2
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- XCUQQOIAOMPPHX-UHFFFAOYSA-N OS(C(C(CCOC(C1CCCCC1)=O)F)(F)F)(=O)=O.I Chemical compound OS(C(C(CCOC(C1CCCCC1)=O)F)(F)F)(=O)=O.I XCUQQOIAOMPPHX-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- VMHLLURERBWHNL-UHFFFAOYSA-M Sodium acetate Chemical compound [Na+].CC([O-])=O VMHLLURERBWHNL-UHFFFAOYSA-M 0.000 description 2
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 2
- 229910001431 copper ion Inorganic materials 0.000 description 2
- 125000004122 cyclic group Chemical group 0.000 description 2
- 238000004090 dissolution Methods 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 125000005842 heteroatom Chemical group 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 125000004184 methoxymethyl group Chemical group [H]C([H])([H])OC([H])([H])* 0.000 description 2
- 229910001453 nickel ion Inorganic materials 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 125000000962 organic group Chemical group 0.000 description 2
- 239000012044 organic layer Substances 0.000 description 2
- 125000004430 oxygen atom Chemical group O* 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 229910052698 phosphorus Inorganic materials 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- 239000001632 sodium acetate Substances 0.000 description 2
- 235000017281 sodium acetate Nutrition 0.000 description 2
- GEHJYWRUCIMESM-UHFFFAOYSA-L sodium sulfite Chemical compound [Na+].[Na+].[O-]S([O-])=O GEHJYWRUCIMESM-UHFFFAOYSA-L 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- CBYUQCKIONICAC-UHFFFAOYSA-N sulfanium 4-(cyclohexanecarbonyloxy)-1,1,2-trifluorobutane-1-sulfonate Chemical compound C1(CCCCC1)C(=O)OCCC(C(S(=O)(=O)[O-])(F)F)F.[SH3+] CBYUQCKIONICAC-UHFFFAOYSA-N 0.000 description 2
- 229910052717 sulfur Inorganic materials 0.000 description 2
- QEMXHQIAXOOASZ-UHFFFAOYSA-N tetramethylammonium Chemical compound C[N+](C)(C)C QEMXHQIAXOOASZ-UHFFFAOYSA-N 0.000 description 2
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 2
- NRZWQKGABZFFKE-UHFFFAOYSA-N trimethylsulfonium Chemical compound C[S+](C)C NRZWQKGABZFFKE-UHFFFAOYSA-N 0.000 description 2
- WLOQLWBIJZDHET-UHFFFAOYSA-N triphenylsulfonium Chemical compound C1=CC=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 WLOQLWBIJZDHET-UHFFFAOYSA-N 0.000 description 2
- 239000012953 triphenylsulfonium Substances 0.000 description 2
- LGMNXDYGRFAFIR-UHFFFAOYSA-N (2,3-dimethylphenyl)-diphenylsulfanium Chemical compound CC1=CC=CC([S+](C=2C=CC=CC=2)C=2C=CC=CC=2)=C1C LGMNXDYGRFAFIR-UHFFFAOYSA-N 0.000 description 1
- IYIDRELMZNODQQ-UHFFFAOYSA-N (2-methylphenyl)-diphenylsulfanium Chemical compound CC1=CC=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 IYIDRELMZNODQQ-UHFFFAOYSA-N 0.000 description 1
- MIOPJNTWMNEORI-GMSGAONNSA-N (S)-camphorsulfonic acid Chemical compound C1C[C@@]2(CS(O)(=O)=O)C(=O)C[C@@H]1C2(C)C MIOPJNTWMNEORI-GMSGAONNSA-N 0.000 description 1
- MMDMAUHADOFKQK-UHFFFAOYSA-N 1,1,2-trifluoro-4-hydroxybutane-1-sulfonic acid Chemical compound OCCC(F)C(F)(F)S(O)(=O)=O MMDMAUHADOFKQK-UHFFFAOYSA-N 0.000 description 1
- 125000001637 1-naphthyl group Chemical group [H]C1=C([H])C([H])=C2C(*)=C([H])C([H])=C([H])C2=C1[H] 0.000 description 1
- JVSFQJZRHXAUGT-UHFFFAOYSA-N 2,2-dimethylpropanoyl chloride Chemical compound CC(C)(C)C(Cl)=O JVSFQJZRHXAUGT-UHFFFAOYSA-N 0.000 description 1
- VZSRBBMJRBPUNF-UHFFFAOYSA-N 2-(2,3-dihydro-1H-inden-2-ylamino)-N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]pyrimidine-5-carboxamide Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C(=O)NCCC(N1CC2=C(CC1)NN=N2)=O VZSRBBMJRBPUNF-UHFFFAOYSA-N 0.000 description 1
- 125000000022 2-aminoethyl group Chemical group [H]C([*])([H])C([H])([H])N([H])[H] 0.000 description 1
- 125000001622 2-naphthyl group Chemical group [H]C1=C([H])C([H])=C2C([H])=C(*)C([H])=C([H])C2=C1[H] 0.000 description 1
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000006201 3-phenylpropyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004800 4-bromophenyl group Chemical group [H]C1=C([H])C(*)=C([H])C([H])=C1Br 0.000 description 1
- 125000001255 4-fluorophenyl group Chemical group [H]C1=C([H])C(*)=C([H])C([H])=C1F 0.000 description 1
- 125000006306 4-iodophenyl group Chemical group [H]C1=C([H])C(*)=C([H])C([H])=C1I 0.000 description 1
- 125000004172 4-methoxyphenyl group Chemical group [H]C1=C([H])C(OC([H])([H])[H])=C([H])C([H])=C1* 0.000 description 1
- UQRONKZLYKUEMO-UHFFFAOYSA-N 4-methyl-1-(2,4,6-trimethylphenyl)pent-4-en-2-one Chemical group CC(=C)CC(=O)Cc1c(C)cc(C)cc1C UQRONKZLYKUEMO-UHFFFAOYSA-N 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 1
- ZZOFTCVRLJDMDM-UHFFFAOYSA-N CC(C)(C)C(C=CC=C1)=C1I.OCCC(C(F)(F)S(O)(=O)=O)F Chemical compound CC(C)(C)C(C=CC=C1)=C1I.OCCC(C(F)(F)S(O)(=O)=O)F ZZOFTCVRLJDMDM-UHFFFAOYSA-N 0.000 description 1
- OSOABCYZAGOTQY-UHFFFAOYSA-N CC(C)(C)c(cc1)ccc1S(c1ccc(C(C)(C)C)cc1)c1ccc(C(C)(C)C)cc1 Chemical compound CC(C)(C)c(cc1)ccc1S(c1ccc(C(C)(C)C)cc1)c1ccc(C(C)(C)C)cc1 OSOABCYZAGOTQY-UHFFFAOYSA-N 0.000 description 1
- BGSRKRHPZDCNPA-UHFFFAOYSA-N CC(C)(C)c(cc1)ccc1[IH]C(CC1)=CC=C1C(C)(C)C[O](CCC(C(F)(F)S(O)(=O)=O)F)C(C1CCCCC1)=O Chemical compound CC(C)(C)c(cc1)ccc1[IH]C(CC1)=CC=C1C(C)(C)C[O](CCC(C(F)(F)S(O)(=O)=O)F)C(C1CCCCC1)=O BGSRKRHPZDCNPA-UHFFFAOYSA-N 0.000 description 1
- BHPQYMZQTOCNFJ-UHFFFAOYSA-N Calcium cation Chemical compound [Ca+2] BHPQYMZQTOCNFJ-UHFFFAOYSA-N 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- RAXXELZNTBOGNW-UHFFFAOYSA-O Imidazolium Chemical compound C1=C[NH+]=CN1 RAXXELZNTBOGNW-UHFFFAOYSA-O 0.000 description 1
- HBBGRARXTFLTSG-UHFFFAOYSA-N Lithium ion Chemical compound [Li+] HBBGRARXTFLTSG-UHFFFAOYSA-N 0.000 description 1
- JLVVSXFLKOJNIY-UHFFFAOYSA-N Magnesium ion Chemical compound [Mg+2] JLVVSXFLKOJNIY-UHFFFAOYSA-N 0.000 description 1
- BZLVMXJERCGZMT-UHFFFAOYSA-N Methyl tert-butyl ether Chemical compound COC(C)(C)C BZLVMXJERCGZMT-UHFFFAOYSA-N 0.000 description 1
- BAVYZALUXZFZLV-UHFFFAOYSA-O Methylammonium ion Chemical compound [NH3+]C BAVYZALUXZFZLV-UHFFFAOYSA-O 0.000 description 1
- KWYHDKDOAIKMQN-UHFFFAOYSA-N N,N,N',N'-tetramethylethylenediamine Chemical compound CN(C)CCN(C)C KWYHDKDOAIKMQN-UHFFFAOYSA-N 0.000 description 1
- JLTDJTHDQAWBAV-UHFFFAOYSA-N N,N-dimethylaniline Chemical compound CN(C)C1=CC=CC=C1 JLTDJTHDQAWBAV-UHFFFAOYSA-N 0.000 description 1
- JCUFGOZZHXUOMP-UHFFFAOYSA-N OCCC(C(F)(F)S(O)(=O)=O)F.I Chemical compound OCCC(C(F)(F)S(O)(=O)=O)F.I JCUFGOZZHXUOMP-UHFFFAOYSA-N 0.000 description 1
- VIATXWSLOKELAR-UHFFFAOYSA-N OS(C(C(CCOC(C1CCCCC1)=O)F)(F)F)(=O)=O Chemical compound OS(C(C(CCOC(C1CCCCC1)=O)F)(F)F)(=O)=O VIATXWSLOKELAR-UHFFFAOYSA-N 0.000 description 1
- NPYPAHLBTDXSSS-UHFFFAOYSA-N Potassium ion Chemical compound [K+] NPYPAHLBTDXSSS-UHFFFAOYSA-N 0.000 description 1
- DWAQJAXMDSEUJJ-UHFFFAOYSA-M Sodium bisulfite Chemical compound [Na+].OS([O-])=O DWAQJAXMDSEUJJ-UHFFFAOYSA-M 0.000 description 1
- FKNQFGJONOIPTF-UHFFFAOYSA-N Sodium cation Chemical compound [Na+] FKNQFGJONOIPTF-UHFFFAOYSA-N 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- 230000021736 acetylation Effects 0.000 description 1
- 238000006640 acetylation reaction Methods 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- ORILYTVJVMAKLC-UHFFFAOYSA-N adamantane Chemical group C1C(C2)CC3CC1CC2C3 ORILYTVJVMAKLC-UHFFFAOYSA-N 0.000 description 1
- 125000003342 alkenyl group Chemical group 0.000 description 1
- 125000004202 aminomethyl group Chemical group [H]N([H])C([H])([H])* 0.000 description 1
- 125000002078 anthracen-1-yl group Chemical group [H]C1=C([H])C([H])=C2C([H])=C3C([*])=C([H])C([H])=C([H])C3=C([H])C2=C1[H] 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- JPAKGNVYASTTEN-UHFFFAOYSA-M bis(4-tert-butylphenyl)iodanium;methanesulfonate Chemical compound CS([O-])(=O)=O.C1=CC(C(C)(C)C)=CC=C1[I+]C1=CC=C(C(C)(C)C)C=C1 JPAKGNVYASTTEN-UHFFFAOYSA-M 0.000 description 1
- YFNONBGXNFCTMM-UHFFFAOYSA-N butoxybenzene Chemical group CCCCOC1=CC=CC=C1 YFNONBGXNFCTMM-UHFFFAOYSA-N 0.000 description 1
- 229910001424 calcium ion Inorganic materials 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000006555 catalytic reaction Methods 0.000 description 1
- 238000012512 characterization method Methods 0.000 description 1
- 125000004218 chloromethyl group Chemical group [H]C([H])(Cl)* 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 239000003431 cross linking reagent Substances 0.000 description 1
- CMKBCTPCXZNQKX-UHFFFAOYSA-N cyclohexanethiol Chemical compound SC1CCCCC1 CMKBCTPCXZNQKX-UHFFFAOYSA-N 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 125000001559 cyclopropyl group Chemical group [H]C1([H])C([H])([H])C1([H])* 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000010511 deprotection reaction Methods 0.000 description 1
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 1
- YCTPHBFPVPLULH-UHFFFAOYSA-N diphenyl-(3-phenylthiophen-2-yl)sulfanium Chemical compound S1C=CC(C=2C=CC=CC=2)=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 YCTPHBFPVPLULH-UHFFFAOYSA-N 0.000 description 1
- DMBHHRLKUKUOEG-UHFFFAOYSA-N diphenylamine Chemical compound C=1C=CC=CC=1NC1=CC=CC=C1 DMBHHRLKUKUOEG-UHFFFAOYSA-N 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 230000032050 esterification Effects 0.000 description 1
- 238000005886 esterification reaction Methods 0.000 description 1
- 125000005745 ethoxymethyl group Chemical group [H]C([H])([H])C([H])([H])OC([H])([H])* 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 125000004216 fluoromethyl group Chemical group [H]C([H])(F)* 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910001385 heavy metal Inorganic materials 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 125000004464 hydroxyphenyl group Chemical group 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 150000002605 large molecules Chemical class 0.000 description 1
- RVPVRDXYQKGNMQ-UHFFFAOYSA-N lead(2+) Chemical compound [Pb+2] RVPVRDXYQKGNMQ-UHFFFAOYSA-N 0.000 description 1
- 239000003446 ligand Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229910001416 lithium ion Inorganic materials 0.000 description 1
- 125000000040 m-tolyl group Chemical group [H]C1=C([H])C(*)=C([H])C(=C1[H])C([H])([H])[H] 0.000 description 1
- 229920002521 macromolecule Polymers 0.000 description 1
- 229910001425 magnesium ion Inorganic materials 0.000 description 1
- 229940098779 methanesulfonic acid Drugs 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 125000004092 methylthiomethyl group Chemical group [H]C([H])([H])SC([H])([H])* 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- 125000003518 norbornenyl group Chemical group C12(C=CC(CC1)C2)* 0.000 description 1
- 125000003261 o-tolyl group Chemical group [H]C1=C([H])C(*)=C(C([H])=C1[H])C([H])([H])[H] 0.000 description 1
- 125000003854 p-chlorophenyl group Chemical group [H]C1=C([H])C(*)=C([H])C([H])=C1Cl 0.000 description 1
- 125000001037 p-tolyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)C([H])([H])[H] 0.000 description 1
- 230000037361 pathway Effects 0.000 description 1
- 125000005010 perfluoroalkyl group Chemical group 0.000 description 1
- BKHZCYXBIBRIQW-UHFFFAOYSA-N phenyl-bis[2-(trifluoromethyl)phenyl]sulfanium Chemical compound FC(F)(F)C1=CC=CC=C1[S+](C=1C(=CC=CC=1)C(F)(F)F)C1=CC=CC=C1 BKHZCYXBIBRIQW-UHFFFAOYSA-N 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 229910001414 potassium ion Inorganic materials 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 1
- ROSDSFDQCJNGOL-UHFFFAOYSA-N protonated dimethyl amine Natural products CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- JUJWROOIHBZHMG-UHFFFAOYSA-O pyridinium Chemical compound C1=CC=[NH+]C=C1 JUJWROOIHBZHMG-UHFFFAOYSA-O 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 1
- 235000017557 sodium bicarbonate Nutrition 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 229940079827 sodium hydrogen sulfite Drugs 0.000 description 1
- 235000010267 sodium hydrogen sulphite Nutrition 0.000 description 1
- 229910001415 sodium ion Inorganic materials 0.000 description 1
- 235000010265 sodium sulphite Nutrition 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- RXXMIODYKYGMIQ-UHFFFAOYSA-N sulfane 1,1,2-trifluoro-4-hydroxybutane-1-sulfonic acid Chemical compound FC(C(CCO)F)(S(=O)(=O)[O-])F.[SH3+] RXXMIODYKYGMIQ-UHFFFAOYSA-N 0.000 description 1
- JIPKHPRMLCLPSP-UHFFFAOYSA-N sulfanium;methanesulfonate Chemical compound [SH3+].CS([O-])(=O)=O JIPKHPRMLCLPSP-UHFFFAOYSA-N 0.000 description 1
- 150000008054 sulfonate salts Chemical class 0.000 description 1
- 238000006277 sulfonation reaction Methods 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- USFPINLPPFWTJW-UHFFFAOYSA-N tetraphenylphosphonium Chemical compound C1=CC=CC=C1[P+](C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 USFPINLPPFWTJW-UHFFFAOYSA-N 0.000 description 1
- 229910001428 transition metal ion Inorganic materials 0.000 description 1
- 125000003866 trichloromethyl group Chemical group ClC(Cl)(Cl)* 0.000 description 1
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 1
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 1
- ZNEOHLHCKGUAEB-UHFFFAOYSA-N trimethylphenylammonium Chemical compound C[N+](C)(C)C1=CC=CC=C1 ZNEOHLHCKGUAEB-UHFFFAOYSA-N 0.000 description 1
- ODHXBMXNKOYIBV-UHFFFAOYSA-O triphenylazanium Chemical compound C1=CC=CC=C1[NH+](C=1C=CC=CC=1)C1=CC=CC=C1 ODHXBMXNKOYIBV-UHFFFAOYSA-O 0.000 description 1
- ZFEAYIKULRXTAR-UHFFFAOYSA-M triphenylsulfanium;chloride Chemical compound [Cl-].C1=CC=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 ZFEAYIKULRXTAR-UHFFFAOYSA-M 0.000 description 1
- FAYMLNNRGCYLSR-UHFFFAOYSA-M triphenylsulfonium triflate Chemical compound [O-]S(=O)(=O)C(F)(F)F.C1=CC=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 FAYMLNNRGCYLSR-UHFFFAOYSA-M 0.000 description 1
- LENZDBCJOHFCAS-UHFFFAOYSA-N tris Chemical compound OCC(N)(CO)CO LENZDBCJOHFCAS-UHFFFAOYSA-N 0.000 description 1
- ZHHRYQXXYWVTPZ-UHFFFAOYSA-N tris(2-chlorophenyl)sulfanium Chemical compound ClC1=CC=CC=C1[S+](C=1C(=CC=CC=1)Cl)C1=CC=CC=C1Cl ZHHRYQXXYWVTPZ-UHFFFAOYSA-N 0.000 description 1
- NFEAPFABNXPJMP-UHFFFAOYSA-N tris(2-fluorophenyl)sulfanium Chemical compound FC1=CC=CC=C1[S+](C=1C(=CC=CC=1)F)C1=CC=CC=C1F NFEAPFABNXPJMP-UHFFFAOYSA-N 0.000 description 1
- PUNLMWKEFPBDHE-UHFFFAOYSA-O tris(2-hydroxyphenyl)sulfanium Chemical compound OC1=CC=CC=C1[S+](C=1C(=CC=CC=1)O)C1=CC=CC=C1O PUNLMWKEFPBDHE-UHFFFAOYSA-O 0.000 description 1
- YWTDARPOMXBETA-UHFFFAOYSA-N tris(2-methoxyphenyl)sulfanium Chemical compound COC1=CC=CC=C1[S+](C=1C(=CC=CC=1)OC)C1=CC=CC=C1OC YWTDARPOMXBETA-UHFFFAOYSA-N 0.000 description 1
- FACJZVSKOIMXOB-UHFFFAOYSA-N tris(2-octylphenyl)sulfanium Chemical compound CCCCCCCCC1=CC=CC=C1[S+](C=1C(=CC=CC=1)CCCCCCCC)C1=CC=CC=C1CCCCCCCC FACJZVSKOIMXOB-UHFFFAOYSA-N 0.000 description 1
- UTCOSYZEYALTGJ-UHFFFAOYSA-N tris(2-tert-butylphenyl)sulfanium Chemical compound CC(C)(C)C1=CC=CC=C1[S+](C=1C(=CC=CC=1)C(C)(C)C)C1=CC=CC=C1C(C)(C)C UTCOSYZEYALTGJ-UHFFFAOYSA-N 0.000 description 1
- RTQVAMOEFSZTDV-UHFFFAOYSA-N tris[2-(trifluoromethyl)phenyl]sulfanium Chemical compound FC(F)(F)C1=CC=CC=C1[S+](C=1C(=CC=CC=1)C(F)(F)F)C1=CC=CC=C1C(F)(F)F RTQVAMOEFSZTDV-UHFFFAOYSA-N 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C309/00—Sulfonic acids; Halides, esters, or anhydrides thereof
- C07C309/01—Sulfonic acids
- C07C309/02—Sulfonic acids having sulfo groups bound to acyclic carbon atoms
- C07C309/03—Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton
- C07C309/07—Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton containing oxygen atoms bound to the carbon skeleton
- C07C309/12—Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton containing oxygen atoms bound to the carbon skeleton containing esterified hydroxy groups bound to the carbon skeleton
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C25/00—Compounds containing at least one halogen atom bound to a six-membered aromatic ring
- C07C25/18—Polycyclic aromatic halogenated hydrocarbons
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C381/00—Compounds containing carbon and sulfur and having functional groups not covered by groups C07C301/00 - C07C337/00
- C07C381/12—Sulfonium compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C2601/00—Systems containing only non-condensed rings
- C07C2601/12—Systems containing only non-condensed rings with a six-membered ring
- C07C2601/14—The ring being saturated
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
- G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
- G03F7/0397—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having an alicyclic moiety in a side chain
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Materials For Photolithography (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
Description
本発明に係るスルホン酸誘導体は、上記一般式で表されるが、Rは環状の炭化水素基又は炭素数6〜30のアリール基を示す。M + は対カチオンであることが好ましい。
上記の光酸発生剤において、式(1)において、Rで表される前記置換基は、環状の炭化水素基又は炭素数6〜30のアリール基であることが好ましい。
上記の光酸発生剤において、前記M + が、水素イオン、金属イオン又はオニウムイオンであることが好ましく、さらにヨードニウムイオン又はスルホニウムイオンであることがさらに好ましい。
本発明に係る他のフォトレジスト材料は、上記のスルホン酸誘導体と、ポリマーと、を含み、前記スルホン酸誘導体は光酸発生剤であることが好ましい。
本発明に係るフォトレジスト材料は、上記の光酸発生剤とポリマーと、を含むことを特徴とする。
上記の光酸発生剤において、前記フォトレジストは、KrFエキシマーレーザー光、ArFエキシマーレーザー光、F 2 エキシマーレーザー光、電子線、X線及び極端紫外線によって分解することが好ましい。
上記のフォトレジスト材料において、前記フォトレジストに対する光照射により前記光酸発生剤から酸が発生し、前記酸によって前記ポリマーに含まれる保護基が脱離することが好ましい。
本発明に係る電子デバイスの製造方法は、上記のフォトレジスト材料を用いたフォトリソグラフィーの工程を有する。
本発明のスルホン酸誘導体は、上記一般式(1)で表される。なお、スルホン酸誘導体とはスルホン酸及びその塩をいう。また、本発明の上記一般式(1)で表されるスルホン酸誘導体は、光学活性でも不活性でもよい。
(実施例1−1)ナトリウム 1,1,2−トリフルオロ−4−ヒドロキシブタンスルホネートの合成:
4−ブロモ−1,1,2−トリフルオロ−1−ブテン36.9g、酢酸ナトリウム65.4gを酢酸156.5gに溶解し、115℃まで昇温した。そして、40時間撹拌し、反応液を90℃に冷却し、蒸留水626gを加えた。その後、室温まで冷却し、t−ブチルメチルエーテル128gを用いて2回抽出した。次いで、炭酸ナトリウム水溶液165gを用いて洗浄し、残存する酸を除去した。その後、ロータリーエバポレーターで溶媒を留去し、4−アセトキシ−1,1,2−トリフルオロ−1−ブテンを得た。クルード状態で25.6gであった。この物質の1H NMR測定結果を以下に示す。
1H NMR (400 MHz,CDCl3)δ2.07(s,3H),2.63(d、t、d、d,2H),4.24(t,2H)
4−アセトキシ−1,1,2−トリフルオロ−1−ブテン25.0g、炭酸カリウム40.3gをメタノール49g、蒸留水49gに溶解した。そして、室温で15時間撹拌し、濾過により反応で析出した固形分を取り除いた後、ジクロロメタンで目的物を抽出した。その後、蒸留精製することにより、3,4,4−トリフルオロ−3−ブテン−1−オール13.8gを得た。この物質の1H NMR測定結果を以下に示す。
1H NMR (400 MHz,CDCl3)δ2.2(s,1H),2.55(d,t,d,d,2H),3.83(t,2H)
3,4,4−トリフルオロ−3−ブテン−1−オール11.9g、亜硫酸水素ナトリウム 29.5g、亜硫酸ナトリウム14.3gを蒸留水214gに溶解し、その後90℃まで昇温した。そして、15時間撹拌し、反応液を25℃以下に冷却した。次いで、トルエン24gで水層を洗浄した。その後、ロータリーエバポレーターで溶剤を留去することによりナトリウム 1,1,2−トリフルオロ−4−ヒドロキシブタンスルホネート18.46gを得た。この物質は、1H NMR及びイオンクロマトブラフィによる測定結果から、目的物であることが確認された。1H NMR測定結果を以下に示す。
1H NMR (400 MHz,CDCl3)δ1.9−2.4(m,2H),3.5−3.7(m,2H),4.9−5.2(m,1H)
トリフェニルスルホニウム 4−(シクロヘキシルカルボニルオキシ)−1,1,2−トリフルオロブタンスルホネートの合成:
ナトリウム 1,1,2−トリフルオロ−4−ヒドロキシブタンスルホネート17.6g、トリフェニルスルホニウム メタンスルホネート34.4gを水106g、ジクロロメタン360gに加え、3時間撹拌した。分液後、有機層をロータリーエバポレーターで溶剤を留去することにより、トリフェニルスルホニウム 1,1,2−トリフルオロ−4−ヒドロキシブタンスルホネート32.4gを得た。この物質の1H NMR測定結果を以下に示す。
1H NMR (400 MHz,CDCl3)δ1.9−2.4(m,2H),3.5−3.7(m,2H),4.9−5.2(m,1H),7.66−7.80(m,15H)
トリフェニルスルホニウム 1,1,2−トリフルオロ−4−ヒドロキシブタンスルホネート27.4g、トリエチルアミン7.07g、N,N,N´,N´−テトラメチルエチレンジアミン0.7gをジクロロメタン137gに溶解した。その後15℃以下でシクロヘキサンカルボニル クロリド10.2gを添加し20℃まで昇温した。そして、3時間撹拌し、反応液を15℃以下に冷却した。8%炭酸水素ナトリウム水溶液を加え、反応を停止した。その後、ジクロロメタン68gを加え攪拌し、ジクロロメタン層に目的物を抽出した。次いで、分離した水層のpHが7になるまで蒸留水で有機層の洗浄を繰り返した。その後、ロータリーエバポレーターで溶剤を留去することにより、トリフェニルスルホニウム 4−(シクロヘキシルカルボニルオキシ)−1,1,2−トリフルオロブタンスルホネート23.7gを得た。この物質は、1H NMR及びイオンクロマトブラフィによる測定結果から、目的物であることが確認された。1H NMR測定結果を以下に示す。
1H NMR (400 MHz,DMSO−d6)δ1.1−1.8(m,10H),1.9−2.3(m,3H),4.0−4.2(m,2H),4.8−5.1(m,1H),7.7−7.8(m,15H)
トリス(p−t−ブチルフェニル)スルホニウム 4−(シクロヘキシルカルボニルオキシ)−1,1,2−トリフルオロブタンスルホネートの合成:
1H NMR (400 MHz,DMSO−d6)δ1.1−1.7(m,37H),1.9−2.3(m,3H),4.0−4.2(m,2H),4.8−5.1(m,1H),7.6−7.8(m,12H)
ビス(p−t−ブチルフェニル)ヨードニウム 4−(シクロヘキシルカルボニルオキシ)−1,1,2−トリフルオロブタンスルホネートの合成:
1H NMR (400 MHz,DMSO−d6)δ1.1−1.7(m,28H),1.9−2.3(m,3H),4.0−4.2(m,2H),4.8−5.1(m,1H),7.3−8.0(m,8H)
トリフェニルスルホニウム 4−(p−t−ブチルベンゾイルオキシ)−1,1,2−トリフルオロブタンスルホネートの合成:
1H NMR (400 MHz,DMSO−d6)δ1.3(s,9H),2.0−2.3(m,2H),4.2−4.4(m,2H),4.9−5.2(m,1H),7.4−8.1(m,19H)
トリフェニルスルホニウム 4−ピバロイルオキシ−1,1,2−トリフルオロブタンスルホネートの合成:
1H NMR (400 MHz,DMSO−d6)δ1.2(s,9H),1.9−2.2(m,2H),4.0−4.2(m,2H),4.8−5.1(m,1H),7.6−7.8(m,15H)
Claims (10)
- 請求項1に記載の光酸発生剤において、
式(1)において、Rで表される前記置換基は、環状の炭化水素基又は炭素数6〜30のアリール基であること、
を特徴とする光酸発生剤。 - 請求項1又は3に記載の光酸発生剤において、
前記M + が、水素イオン、金属イオン又はオニウムイオンであること、
を特徴とする光酸発生剤。 - 請求項4に記載の光酸発生剤において、
前記M + が、スルホニウムイオン又はヨードニウムイオンであること、
を特徴とする光酸発生剤。 - 請求項1、3、4又は5に記載の光酸発生剤において、
フォトレジストは、KrFエキシマーレーザー光、ArFエキシマーレーザー光、F 2 エキシマーレーザー光、電子線、X線及び極端紫外線によって分解すること、
を特徴とする光酸発生剤。 - 請求項1、3、4、5又は6に記載の光酸発生剤と、
ポリマーと、を含むこと、
を特徴とするフォトレジスト材料。 - 請求項2に記載のスルホン酸誘導体と、
ポリマーと、を含み、
前記スルホン酸誘導体は光酸発生剤であること、
を特徴とするフォトレジスト材料。 - 請求項7又は8に記載のフォトレジスト材料において、
前記フォトレジストに対する光照射により前記光酸発生剤から酸が発生し、
前記酸によって前記ポリマーに含まれる保護基が脱離すること、
を特徴とするフォトレジスト材料。 - 請求項7乃至9のいずれかに記載のフォトレジスト材料を用いたフォトリソグラフィーの工程を有する電子デバイスの製造方法。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011551796A JP5747311B2 (ja) | 2010-01-28 | 2011-01-13 | スルホン酸誘導体及び光酸発生剤 |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010017483 | 2010-01-28 | ||
JP2010017483 | 2010-01-28 | ||
JP2011551796A JP5747311B2 (ja) | 2010-01-28 | 2011-01-13 | スルホン酸誘導体及び光酸発生剤 |
PCT/JP2011/050454 WO2011093139A1 (ja) | 2010-01-28 | 2011-01-13 | スルホン酸誘導体及び光酸発生剤 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2015043715A Division JP5973020B2 (ja) | 2010-01-28 | 2015-03-05 | スルホン酸誘導体、光酸発生剤、フォトレジスト材料及び電子デバイスの製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2011093139A1 JPWO2011093139A1 (ja) | 2013-05-30 |
JP5747311B2 true JP5747311B2 (ja) | 2015-07-15 |
Family
ID=44319130
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2011551796A Active JP5747311B2 (ja) | 2010-01-28 | 2011-01-13 | スルホン酸誘導体及び光酸発生剤 |
JP2015043715A Active JP5973020B2 (ja) | 2010-01-28 | 2015-03-05 | スルホン酸誘導体、光酸発生剤、フォトレジスト材料及び電子デバイスの製造方法 |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2015043715A Active JP5973020B2 (ja) | 2010-01-28 | 2015-03-05 | スルホン酸誘導体、光酸発生剤、フォトレジスト材料及び電子デバイスの製造方法 |
Country Status (5)
Country | Link |
---|---|
US (1) | US9714217B2 (ja) |
JP (2) | JP5747311B2 (ja) |
KR (1) | KR101799325B1 (ja) |
TW (2) | TWI542572B (ja) |
WO (1) | WO2011093139A1 (ja) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5708500B2 (ja) | 2010-01-29 | 2015-04-30 | Jsr株式会社 | 感放射線性樹脂組成物 |
JP5761196B2 (ja) * | 2010-08-06 | 2015-08-12 | Jsr株式会社 | 感放射線性樹脂組成物 |
JP5816543B2 (ja) | 2011-12-27 | 2015-11-18 | 富士フイルム株式会社 | 感活性光線性又は感放射線性樹脂組成物、並びに、該組成物を用いたレジスト膜、パターン形成方法、及び電子デバイスの製造方法 |
US9541834B2 (en) * | 2012-11-30 | 2017-01-10 | Rohm And Haas Electronic Materials Llc | Ionic thermal acid generators for low temperature applications |
JP6007100B2 (ja) | 2012-12-27 | 2016-10-12 | 富士フイルム株式会社 | 感活性光線性または感放射線性樹脂組成物、感活性光線性または感放射線性膜及びパターン形成方法 |
KR101944290B1 (ko) * | 2014-12-05 | 2019-04-17 | 도요 고세이 고교 가부시키가이샤 | 설폰산 유도체, 그것을 사용한 광산발생제, 레지스트 조성물 및 디바이스의 제조 방법 |
JP6782569B2 (ja) * | 2016-06-28 | 2020-11-11 | 東京応化工業株式会社 | レジスト組成物及びレジストパターン形成方法 |
JP6720926B2 (ja) * | 2016-06-28 | 2020-07-08 | 信越化学工業株式会社 | レジスト材料及びパターン形成方法 |
JP6902832B2 (ja) * | 2016-06-28 | 2021-07-14 | 東京応化工業株式会社 | レジスト組成物及びレジストパターン形成方法、並びに、化合物及び酸発生剤 |
US9983475B2 (en) | 2016-08-12 | 2018-05-29 | International Business Machines Corporation | Fluorinated sulfonate esters of aryl ketones for non-ionic photo-acid generators |
US11347147B2 (en) | 2016-11-07 | 2022-05-31 | Toyo Gosei Co., Ltd. | Metal-containing onium salt compound, photodegradable base, resist composition, and method for manufacturing device using said resist composition |
KR102612130B1 (ko) * | 2016-12-22 | 2023-12-08 | 도오꾜오까고오교 가부시끼가이샤 | 레지스트 조성물 및 레지스트 패턴 형성 방법 |
US20210397097A1 (en) | 2018-07-27 | 2021-12-23 | Tokyo University Of Science Foundation | Method of producing molded product, resist for collective molding with imprint-electronic lithography, method of producing replica mold, method of producing device, and imprint material |
IT201900001339A1 (it) | 2019-01-30 | 2020-07-30 | Isagro Spa | Derivati teofillinici ad attività nematocida, loro composizioni agronomiche e relativo uso |
US11709426B2 (en) * | 2020-01-22 | 2023-07-25 | Shin-Etsu Chemical Co., Ltd. | Resist composition and pattern forming process |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010256856A (ja) * | 2009-03-30 | 2010-11-11 | Fujifilm Corp | 感活性光線性又は感放射線性樹脂組成物、レジスト膜、及びそれを用いたパターン形成方法 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3918881B2 (ja) | 1995-11-02 | 2007-05-23 | 信越化学工業株式会社 | 新規スルホニウム塩及び化学増幅ポジ型レジスト材料 |
JP4122175B2 (ja) | 2002-05-13 | 2008-07-23 | 東洋合成工業株式会社 | 新規スルホン酸誘導体及び光酸発生剤 |
JP4548616B2 (ja) * | 2006-05-15 | 2010-09-22 | 信越化学工業株式会社 | 熱酸発生剤及びこれを含むレジスト下層膜材料、並びにこのレジスト下層膜材料を用いたパターン形成方法 |
JP5124806B2 (ja) * | 2006-06-27 | 2013-01-23 | 信越化学工業株式会社 | 光酸発生剤並びにこれを用いたレジスト材料及びパターン形成方法 |
JP5245956B2 (ja) * | 2008-03-25 | 2013-07-24 | 信越化学工業株式会社 | 新規光酸発生剤並びにこれを用いたレジスト材料及びパターン形成方法 |
-
2011
- 2011-01-13 JP JP2011551796A patent/JP5747311B2/ja active Active
- 2011-01-13 KR KR1020127019621A patent/KR101799325B1/ko active IP Right Grant
- 2011-01-13 WO PCT/JP2011/050454 patent/WO2011093139A1/ja active Application Filing
- 2011-01-13 US US13/574,683 patent/US9714217B2/en active Active
- 2011-01-14 TW TW100101336A patent/TWI542572B/zh active
- 2011-01-14 TW TW104139905A patent/TWI627157B/zh active
-
2015
- 2015-03-05 JP JP2015043715A patent/JP5973020B2/ja active Active
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010256856A (ja) * | 2009-03-30 | 2010-11-11 | Fujifilm Corp | 感活性光線性又は感放射線性樹脂組成物、レジスト膜、及びそれを用いたパターン形成方法 |
Non-Patent Citations (2)
Title |
---|
JPN6011008765; Mingxing Wang et al.: 'New Anionic Photoacid Generator Bound Polymer Resists for EUV Lithography' Macromolecules 40, 2007, 8220-8224 * |
JPN6011008766; Mingxing Wang et al.: 'Fluorine-contained photoacid generators (PAGs) and corresponding polymer resists' Journal of Fluorine Chemistry 129, 2008, 607-612 * |
Also Published As
Publication number | Publication date |
---|---|
US9714217B2 (en) | 2017-07-25 |
KR20120115523A (ko) | 2012-10-18 |
TW201134798A (en) | 2011-10-16 |
JPWO2011093139A1 (ja) | 2013-05-30 |
JP2015147772A (ja) | 2015-08-20 |
US20120289738A1 (en) | 2012-11-15 |
TWI542572B (zh) | 2016-07-21 |
TWI627157B (zh) | 2018-06-21 |
WO2011093139A1 (ja) | 2011-08-04 |
TW201613855A (en) | 2016-04-16 |
KR101799325B1 (ko) | 2017-11-20 |
JP5973020B2 (ja) | 2016-08-17 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5973020B2 (ja) | スルホン酸誘導体、光酸発生剤、フォトレジスト材料及び電子デバイスの製造方法 | |
JP5267126B2 (ja) | 感放射線性組成物及びそれに用いられる低分子量化合物の製造方法 | |
TWI532754B (zh) | 化合物、高分子化合物、酸產生劑、光阻組成物、光阻圖型之形成方法 | |
JP4854023B2 (ja) | 感光性組成物 | |
TWI361949B (en) | Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | |
KR20110133065A (ko) | 광산발생제용 화합물 및 이를 사용한 레지스트 조성물, 패턴 형성방법 | |
KR20140141512A (ko) | 레지스트 조성물, 화합물, 고분자 화합물 및 레지스트 패턴 형성 방법 | |
JP2016177202A (ja) | レジスト組成物、レジストパターン形成方法、酸発生剤及び化合物 | |
JP2007277219A (ja) | スルホニウム塩 | |
JP5116311B2 (ja) | スルホニウム塩 | |
WO2004065377A1 (ja) | スルホニウム塩化合物、感放射線性酸発生剤およびポジ型感放射線性樹脂組成物 | |
JP2008107817A (ja) | レジスト組成物およびこれを用いたパターン形成方法 | |
JP6472097B2 (ja) | スルホン酸誘導体、それを用いた光酸発生剤、レジスト組成物及びデバイスの製造方法 | |
JP5116312B2 (ja) | スルホニウム塩 | |
JP5116310B2 (ja) | スルホニウム塩 | |
JP2007293249A (ja) | ポジ型レジスト組成物およびそれを用いたパターン形成方法 | |
JP5948090B2 (ja) | 化合物、高分子化合物、酸発生剤、レジスト組成物、レジストパターン形成方法 | |
JP5088933B2 (ja) | スルホニウム塩 | |
JP5084289B2 (ja) | スルホニウム塩 | |
JP5084288B2 (ja) | スルホニウム塩 | |
JP6530957B2 (ja) | レジスト組成物、スルホン酸誘導体、該スルホン酸誘導体の製造方法及びデバイスの製造方法 | |
JP2004272102A (ja) | ポジ型レジスト組成物 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20140108 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20140307 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20140702 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20150210 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20150305 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20150420 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 5747311 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |