JP5725481B2 - 誘電体層を含有する低放射ガラスおよびその製造方法 - Google Patents
誘電体層を含有する低放射ガラスおよびその製造方法 Download PDFInfo
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- 239000011521 glass Substances 0.000 title claims description 89
- 238000004519 manufacturing process Methods 0.000 title claims description 20
- 238000000034 method Methods 0.000 claims description 36
- 230000005855 radiation Effects 0.000 claims description 27
- 238000000151 deposition Methods 0.000 claims description 26
- 238000002834 transmittance Methods 0.000 claims description 26
- 229910044991 metal oxide Inorganic materials 0.000 claims description 21
- 150000004706 metal oxides Chemical class 0.000 claims description 21
- 230000008569 process Effects 0.000 claims description 21
- 229910052751 metal Inorganic materials 0.000 claims description 20
- 239000002184 metal Substances 0.000 claims description 20
- 239000002131 composite material Substances 0.000 claims description 19
- 230000008021 deposition Effects 0.000 claims description 17
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 16
- 239000007789 gas Substances 0.000 claims description 14
- 238000007740 vapor deposition Methods 0.000 claims description 14
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 10
- 239000010936 titanium Substances 0.000 claims description 10
- 229910052786 argon Inorganic materials 0.000 claims description 8
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 8
- 239000013077 target material Substances 0.000 claims description 7
- 230000004888 barrier function Effects 0.000 claims description 6
- 238000002294 plasma sputter deposition Methods 0.000 claims description 6
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 6
- 229910052684 Cerium Inorganic materials 0.000 claims description 5
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 claims description 5
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 5
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 5
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 claims description 5
- 229910000420 cerium oxide Inorganic materials 0.000 claims description 5
- 239000010949 copper Substances 0.000 claims description 5
- 229910001882 dioxygen Inorganic materials 0.000 claims description 5
- 239000010931 gold Substances 0.000 claims description 5
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 claims description 5
- 229910052709 silver Inorganic materials 0.000 claims description 5
- 239000004332 silver Substances 0.000 claims description 5
- 229910052719 titanium Inorganic materials 0.000 claims description 5
- 229910052782 aluminium Inorganic materials 0.000 claims description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 3
- 229910052802 copper Inorganic materials 0.000 claims description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 3
- 229910052737 gold Inorganic materials 0.000 claims description 3
- 229910052697 platinum Inorganic materials 0.000 claims description 3
- 230000035699 permeability Effects 0.000 claims 1
- 230000000052 comparative effect Effects 0.000 description 13
- 239000010409 thin film Substances 0.000 description 10
- 238000004544 sputter deposition Methods 0.000 description 9
- 239000000758 substrate Substances 0.000 description 9
- 230000000694 effects Effects 0.000 description 8
- 238000009413 insulation Methods 0.000 description 8
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 6
- 230000003287 optical effect Effects 0.000 description 6
- 239000002994 raw material Substances 0.000 description 6
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 5
- 229910052581 Si3N4 Inorganic materials 0.000 description 5
- 230000000007 visual effect Effects 0.000 description 5
- 239000010408 film Substances 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 4
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 230000003647 oxidation Effects 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 239000011787 zinc oxide Substances 0.000 description 3
- 229910004286 SiNxOy Inorganic materials 0.000 description 2
- 230000009471 action Effects 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 239000005357 flat glass Substances 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 238000001552 radio frequency sputter deposition Methods 0.000 description 2
- -1 silicon nitride Nitride Chemical class 0.000 description 2
- 229910001415 sodium ion Inorganic materials 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000004408 titanium dioxide Substances 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000000572 ellipsometry Methods 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 239000005344 low-emissivity glass Substances 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 229910003455 mixed metal oxide Inorganic materials 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 238000005546 reactive sputtering Methods 0.000 description 1
- 239000005361 soda-lime glass Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 230000008685 targeting Effects 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3618—Coatings of type glass/inorganic compound/other inorganic layers, at least one layer being metallic
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3626—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer one layer at least containing a nitride, oxynitride, boronitride or carbonitride
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3644—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the metal being silver
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3652—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the coating stack containing at least one sacrificial layer to protect the metal from oxidation
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3657—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating having optical properties
- C03C17/366—Low-emissivity or solar control coatings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/154—Deposition methods from the vapour phase by sputtering
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
- Y10T428/2495—Thickness [relative or absolute]
- Y10T428/24967—Absolute thicknesses specified
- Y10T428/24975—No layer or component greater than 5 mils thick
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Surface Treatment Of Glass (AREA)
- Glass Compositions (AREA)
- Physical Vapour Deposition (AREA)
Description
厚さが0.7mmのソーダ石灰ガラス基板の上に、下記表1に示す条件下で、RFスパッタリング法を用いてアンダーコート層、第1の誘電体層、低放射層、バリア層、第2の誘電体層およびオーバーコート層をこの順に蒸着することにより、実施例1による低放射ガラスが製造された。
第1の誘電体層および第2の誘電体層のターゲット原料として、TiCeOxの代わりに二酸化チタン(TiOx)を用いた以外は、実施例1と同じ条件下で比較例1による低放射ガラスを製造した。
1.光学性能および断熱性能の測定
実施例1による低放射ガラスの光学性能を、分光光度計(spectrophotometer;model Shimazu solid spec 3700)を用いて、300nm〜2100nm範囲の波長領域において区間幅を1nmにして測定した。可視光透過率および反射率、太陽光透過率および反射率はKSL2541に準拠して計算し、放射率は放射率測定装置(INGLAS TIR 100−2)により測定した。
実施例1および比較例1による低放射ガラスの色差を比較し、これを下記表3に示す。
誘電体層の薄膜蒸着速度を測定するために、3条件の工程時間で蒸着した後、厚さを測定して3点に対するリニアフィットを行った。実施例1および比較例1による低放射ガラスを製造する工程における誘電体層の蒸着速度を図2に示す。
エリプソメトリ(Ellipsometry)を用いて実施例1による低放射ガラスの誘電体層および比較例1による低放射ガラスの誘電体層に対する屈折率を測定した。その結果を図3に示す。
実施例1による低放射ガラスおよび比較例1による低放射ガラスの可視光透過率を比較したグラフを図4に示す。図4を参照すれば、比較例1による低放射ガラスの可視光透過率に比べて、実施例1による低放射ガラスの可視光透過率が約5%高く現れた。
110 基板
120 アンダーコート層
130 第1の誘電体層
140 低放射層
150 バリア層
160 第2の誘電体層
170 オーバーコート層
Claims (14)
- 電気伝導性金属を含有する低放射層と、前記低放射層の両面に形成され、一般式1:TiCeOxで表され、式中、Tiはチタン成分であり、Ceはセリウム成分であり、Oxは酸化物である、複合金属酸化物を含む誘電体層と、を備え、
前記複合金属酸化物は、酸化チタン85重量部〜90重量部と、酸化セリウム10重量部〜15重量部とを含む低放射ガラスであって、
前記低放射ガラスの可視光透過率は、75%以上であり、前記低放射層の厚さは、8から35nmである低放射ガラス。 - 前記低放射ガラスの放射率が0.01〜0.3であり、前記低放射ガラスの可視光透過率が75%以上である、請求項1に記載の低放射ガラス。
- 前記電気伝導性金属は、銀、銅、金、アルミニウムおよび白金よりなる群から選ばれた1種以上を含む、請求項1に記載の低放射ガラス。
- 前記誘電体層は、可視光に対する屈折率が2.4〜2.8である、請求項1に記載の低放射ガラス。
- 前記誘電体層は、前記低放射層の下面に形成される第1の誘電体層および前記低放射層の上面に形成される第2の誘電体層を備える、請求項1に記載の低放射ガラス。
- 前記第1の誘電体層および前記第2の誘電体層は、それぞれ膜厚が10nm〜100nmである、請求項5に記載の低放射ガラス。
- 前記低放射層と前記第2の誘電体層との間に形成されたバリア層をさらに備える、請求項5に記載の低放射ガラス。
- 前記第2の誘電体層の上面に形成されたオーバーコート層をさらに備える、請求項5に記載の低放射ガラス。
- 前記第1の誘電体層の下面に形成されたアンダーコート層をさらに備える、請求項5に記載の低放射ガラス。
- 前記電気伝導性金属を含有する低放射層の両面に、前記一般式1で表される複合金属酸化物をターゲット原料として用いて、前記誘電体層を蒸着するステップを含み、前記複合金属酸化物は、酸化チタン85重量部〜90重量部と、酸化セリウム10重量部〜15重量部とを含む、請求項1から9のいずれかに記載の低放射ガラスの製造方法であって、
前記低放射ガラスの可視光透過率は、75%以上であり、前記低放射層の厚さは、8から35nmである低放射ガラスの製造方法。 - 蒸着は、工程圧力が5×10−2Torr〜5×10−8Torrの真空条件下で行う、請求項10に記載の低放射ガラスの製造方法。
- 蒸着は、アルゴンガス20sccm〜40sccmおよび酸素ガス10sccm〜20sccmを含有する工程ガスを注入した状態で行う、請求項10に記載の低放射ガラスの製造方法。
- 蒸着は、プラズマスパッタリング法を用いて行う、請求項10に記載の低放射ガラスの製造方法。
- 蒸着は、1W/cm2〜5W/cm2の入力電力を印加して行う、請求項13に記載の低放射ガラスの製造方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2009-0091327 | 2009-09-25 | ||
KR20090091327 | 2009-09-25 | ||
PCT/KR2010/006354 WO2011037365A2 (en) | 2009-09-25 | 2010-09-16 | Low emissivity glass comprising dielectric layer and method for producing the same |
Publications (2)
Publication Number | Publication Date |
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JP2013505198A JP2013505198A (ja) | 2013-02-14 |
JP5725481B2 true JP5725481B2 (ja) | 2015-05-27 |
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JP2012530773A Expired - Fee Related JP5725481B2 (ja) | 2009-09-25 | 2010-09-16 | 誘電体層を含有する低放射ガラスおよびその製造方法 |
Country Status (6)
Country | Link |
---|---|
US (1) | US8932723B2 (ja) |
EP (1) | EP2480509B1 (ja) |
JP (1) | JP5725481B2 (ja) |
KR (1) | KR20110033769A (ja) |
CN (1) | CN102548923B (ja) |
WO (1) | WO2011037365A2 (ja) |
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CN102529210B (zh) * | 2011-12-19 | 2014-10-15 | 林嘉宏 | 具有保护膜层的镀膜玻璃及其制备方法 |
FR3002240B1 (fr) * | 2013-02-15 | 2015-07-10 | Quertech Ingenierie | Procede de traitement par un faisceau d'ions pour produire des materiaux en verre antireflet durable |
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US10132964B2 (en) | 2013-12-12 | 2018-11-20 | Lg Hausys, Ltd. | Low-emissivity coating film, method for manufacturing same, and functional construction material for window and doors including same |
JP6518670B2 (ja) * | 2013-12-12 | 2019-05-22 | エルジー・ハウシス・リミテッドLg Hausys,Ltd. | 低放射コーティング膜、その製造方法及びそれを含む窓用機能性建築資材 |
CN104098276B (zh) * | 2014-07-15 | 2016-08-24 | 江阴沐祥节能装饰工程有限公司 | 一种高平整度的低辐射镀膜玻璃制品及其制备方法 |
KR102282176B1 (ko) * | 2015-03-09 | 2021-07-28 | 한국전자통신연구원 | 저방사 필름 및 이를 포함하는 창문 |
KR101714390B1 (ko) * | 2015-06-15 | 2017-03-09 | 주식회사 케이씨씨 | 내구성이 향상된 열처리 가능한 저방사 유리 및 그 제조방법 |
KR101934062B1 (ko) * | 2015-09-14 | 2019-01-02 | (주)엘지하우시스 | 창호용 기능성 건축 자재 |
KR20170086419A (ko) * | 2016-01-18 | 2017-07-26 | 주식회사 케이씨씨 | 저방사 유리 및 그의 제조방법 |
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US4565719A (en) | 1982-10-08 | 1986-01-21 | Optical Coating Laboratory, Inc. | Energy control window film systems and methods for manufacturing the same |
JPH08239244A (ja) * | 1995-03-03 | 1996-09-17 | Asahi Glass Co Ltd | 紫外線吸収ガラス |
JP3724936B2 (ja) * | 1997-09-18 | 2005-12-07 | セントラル硝子株式会社 | 低放射ガラス積層体 |
DE19848751C1 (de) | 1998-10-22 | 1999-12-16 | Ver Glaswerke Gmbh | Schichtsystem für transparente Substrate |
DE19852358C1 (de) | 1998-11-13 | 2000-05-25 | Ver Glaswerke Gmbh | Thermisch hoch belastbares Low-E-Schichtsystem |
US6797388B1 (en) | 1999-03-18 | 2004-09-28 | Ppg Industries Ohio, Inc. | Methods of making low haze coatings and the coatings and coated articles made thereby |
JP4733880B2 (ja) * | 2001-09-25 | 2011-07-27 | 日本板硝子株式会社 | 低放射率透明積層体の製造方法 |
AT502353B1 (de) | 2006-06-29 | 2007-07-15 | Avl List Gmbh | Verfahren und vorrichtung zur konditionierung eines o2-hältigen gases |
EP1980539A1 (fr) | 2007-03-19 | 2008-10-15 | AGC Flat Glass Europe SA | Vitrage à faible emissivite |
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- 2010-08-17 KR KR1020100079347A patent/KR20110033769A/ko not_active Application Discontinuation
- 2010-09-16 WO PCT/KR2010/006354 patent/WO2011037365A2/en active Application Filing
- 2010-09-16 JP JP2012530773A patent/JP5725481B2/ja not_active Expired - Fee Related
- 2010-09-16 EP EP10819006.7A patent/EP2480509B1/en not_active Not-in-force
- 2010-09-16 US US13/394,774 patent/US8932723B2/en active Active
- 2010-09-16 CN CN201080042594.2A patent/CN102548923B/zh active Active
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WO2011037365A2 (en) | 2011-03-31 |
US8932723B2 (en) | 2015-01-13 |
WO2011037365A3 (en) | 2011-07-14 |
EP2480509A4 (en) | 2013-12-25 |
EP2480509A2 (en) | 2012-08-01 |
EP2480509B1 (en) | 2017-03-22 |
KR20110033769A (ko) | 2011-03-31 |
JP2013505198A (ja) | 2013-02-14 |
CN102548923A (zh) | 2012-07-04 |
CN102548923B (zh) | 2015-01-14 |
US20120171443A1 (en) | 2012-07-05 |
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