JP5705591B2 - プラズマ分光分析装置 - Google Patents

プラズマ分光分析装置 Download PDF

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Publication number
JP5705591B2
JP5705591B2 JP2011049041A JP2011049041A JP5705591B2 JP 5705591 B2 JP5705591 B2 JP 5705591B2 JP 2011049041 A JP2011049041 A JP 2011049041A JP 2011049041 A JP2011049041 A JP 2011049041A JP 5705591 B2 JP5705591 B2 JP 5705591B2
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Japan
Prior art keywords
light emission
narrow portion
measurement
emission
plasma
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JP2011049041A
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English (en)
Japanese (ja)
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JP2012185064A5 (enExample
JP2012185064A (ja
Inventor
小原　賢信
賢信 小原
高村　禅
禅 高村
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Hitachi High Tech Corp
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Hitachi High Technologies Corp
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Publication date
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Priority to JP2011049041A priority Critical patent/JP5705591B2/ja
Priority to US14/000,610 priority patent/US9222890B2/en
Priority to PCT/JP2012/050552 priority patent/WO2012120919A1/ja
Publication of JP2012185064A publication Critical patent/JP2012185064A/ja
Publication of JP2012185064A5 publication Critical patent/JP2012185064A5/ja
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
    • G01N21/66—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light electrically excited, e.g. electroluminescence
    • G01N21/67—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light electrically excited, e.g. electroluminescence using electric arcs or discharges
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
    • G01N21/66—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light electrically excited, e.g. electroluminescence
    • G01N21/69—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light electrically excited, e.g. electroluminescence specially adapted for fluids, e.g. molten metal
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/02—Details
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00—Features of devices classified in G01N21/00
    • G01N2201/08—Optical fibres; light guides

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  • Health & Medical Sciences (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
  • Optical Measuring Cells (AREA)
JP2011049041A 2011-03-07 2011-03-07 プラズマ分光分析装置 Expired - Fee Related JP5705591B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2011049041A JP5705591B2 (ja) 2011-03-07 2011-03-07 プラズマ分光分析装置
US14/000,610 US9222890B2 (en) 2011-03-07 2012-01-13 Plasma spectrometer
PCT/JP2012/050552 WO2012120919A1 (ja) 2011-03-07 2012-01-13 プラズマ分光分析装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011049041A JP5705591B2 (ja) 2011-03-07 2011-03-07 プラズマ分光分析装置

Publications (3)

Publication Number Publication Date
JP2012185064A JP2012185064A (ja) 2012-09-27
JP2012185064A5 JP2012185064A5 (enExample) 2013-08-15
JP5705591B2 true JP5705591B2 (ja) 2015-04-22

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Family Applications (1)

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JP2011049041A Expired - Fee Related JP5705591B2 (ja) 2011-03-07 2011-03-07 プラズマ分光分析装置

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US (1) US9222890B2 (enExample)
JP (1) JP5705591B2 (enExample)
WO (1) WO2012120919A1 (enExample)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104865239B (zh) 2014-02-21 2019-03-22 爱科来株式会社 等离子光谱分析方法
JP6498959B2 (ja) 2014-02-21 2019-04-10 アークレイ株式会社 プラズマ分光分析方法
JP6480210B2 (ja) 2014-02-28 2019-03-06 アークレイ株式会社 プラズマ発生用チップ、プラズマ発生装置およびプラズマ分光分析方法
JP6480211B2 (ja) 2014-02-28 2019-03-06 アークレイ株式会社 プラズマ発生用チップ、プラズマ発生装置およびプラズマ分光分析方法
US9733158B1 (en) * 2014-08-19 2017-08-15 Elemental Scientific, Inc. Dilution into a transfer line between valves for mass spectrometry
JP6656931B2 (ja) 2015-01-13 2020-03-04 アークレイ株式会社 プラズマ分光分析方法およびプラズマ分光分析装置
CN105784675B (zh) * 2015-01-13 2020-01-07 爱科来株式会社 等离子体分光分析方法和等离子体分光分析装置
CN105004709B (zh) * 2015-04-13 2018-06-15 中国地质大学（武汉） 一种液体放电微等离子体激发源装置及等离子体激发方法
JP2017130334A (ja) * 2016-01-20 2017-07-27 株式会社日立ハイテクノロジーズ 荷電粒子ビーム装置及び荷電粒子ビーム装置の画像形成方法
EP3273228A1 (en) 2016-07-22 2018-01-24 ARKRAY, Inc. Plasma spectroscopic analysis method and plasma spectroscopic analyzer
JP7009735B2 (ja) * 2016-09-08 2022-01-26 株式会社リコー 画像表示装置及び物体装置
EP3306314B1 (en) * 2016-10-07 2021-01-20 ARKRAY, Inc. Plasma spectroscopic analysis method and inhibitor of plasma emission derived from non-target
JP6851946B2 (ja) * 2016-10-07 2021-03-31 アークレイ株式会社 プラズマ分光分析方法、及び非ターゲットに由来するプラズマ発光の抑制剤
JP6871088B2 (ja) * 2017-07-05 2021-05-12 アークレイ株式会社 炭素電極の洗浄方法
JP7295525B2 (ja) * 2019-04-24 2023-06-21 国立大学法人東北大学 気泡内圧力測定装置、気泡内圧力測定方法、及び、プログラム、並びに、気泡内圧力評価装置、及び、気泡内圧力評価方法
JP7496767B2 (ja) 2020-12-15 2024-06-07 株式会社日立ハイテク 荷電粒子線装置
US11598727B1 (en) * 2021-08-19 2023-03-07 2S Water Incorporated Solution glow discharge plasma chamber with lens
US20240295475A9 (en) * 2022-08-02 2024-09-05 Aditi Bhaskar Portable compound trace detection device

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0452551A (ja) 1990-06-20 1992-02-20 Hitachi Ltd 成分分析方法及び装置
GB9825722D0 (en) * 1998-11-24 1999-01-20 Imperial College Plasma chip
JP3932368B2 (ja) * 2004-03-25 2007-06-20 国立大学法人北陸先端科学技術大学院大学 プラズマ発生装置
JP2010197358A (ja) * 2009-02-27 2010-09-09 Tokai Kogaku Kk 分光分析装置及び元素分析装置
JP5530222B2 (ja) * 2010-03-02 2014-06-25 国立大学法人北陸先端科学技術大学院大学 プラズマ発生手段、プラズマ発生装置及び元素分析方法

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Publication number Publication date
US20130321803A1 (en) 2013-12-05
WO2012120919A1 (ja) 2012-09-13
JP2012185064A (ja) 2012-09-27
US9222890B2 (en) 2015-12-29

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