JP5693042B2 - 洗浄装置、および洗浄方法 - Google Patents

洗浄装置、および洗浄方法 Download PDF

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Publication number
JP5693042B2
JP5693042B2 JP2010102521A JP2010102521A JP5693042B2 JP 5693042 B2 JP5693042 B2 JP 5693042B2 JP 2010102521 A JP2010102521 A JP 2010102521A JP 2010102521 A JP2010102521 A JP 2010102521A JP 5693042 B2 JP5693042 B2 JP 5693042B2
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JP
Japan
Prior art keywords
catalyst
cleaning
gas
unit
hydrogen radicals
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2010102521A
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English (en)
Japanese (ja)
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JP2011230053A (ja
JP2011230053A5 (https=
Inventor
貴博 中山
貴博 中山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
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Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2010102521A priority Critical patent/JP5693042B2/ja
Priority to EP11162534A priority patent/EP2383613A3/en
Priority to US13/093,687 priority patent/US20110259374A1/en
Publication of JP2011230053A publication Critical patent/JP2011230053A/ja
Publication of JP2011230053A5 publication Critical patent/JP2011230053A5/ja
Application granted granted Critical
Publication of JP5693042B2 publication Critical patent/JP5693042B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning

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  • Epidemiology (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Public Health (AREA)
  • Plasma & Fusion (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Cleaning In General (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2010102521A 2010-04-27 2010-04-27 洗浄装置、および洗浄方法 Expired - Fee Related JP5693042B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2010102521A JP5693042B2 (ja) 2010-04-27 2010-04-27 洗浄装置、および洗浄方法
EP11162534A EP2383613A3 (en) 2010-04-27 2011-04-15 Cleaning apparatus and cleaning method
US13/093,687 US20110259374A1 (en) 2010-04-27 2011-04-25 Cleaning apparatus and cleaning method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2010102521A JP5693042B2 (ja) 2010-04-27 2010-04-27 洗浄装置、および洗浄方法

Publications (3)

Publication Number Publication Date
JP2011230053A JP2011230053A (ja) 2011-11-17
JP2011230053A5 JP2011230053A5 (https=) 2013-06-20
JP5693042B2 true JP5693042B2 (ja) 2015-04-01

Family

ID=44453882

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010102521A Expired - Fee Related JP5693042B2 (ja) 2010-04-27 2010-04-27 洗浄装置、および洗浄方法

Country Status (3)

Country Link
US (1) US20110259374A1 (https=)
EP (1) EP2383613A3 (https=)
JP (1) JP5693042B2 (https=)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2012004070A1 (en) * 2010-07-06 2012-01-12 Asml Netherlands B.V. Components for euv lithographic apparatus, euv lithographic apparatus including such components and method for manufacturing such components
US9265573B2 (en) 2012-07-19 2016-02-23 Covidien Lp Ablation needle including fiber Bragg grating
JP6280116B2 (ja) * 2012-08-03 2018-02-14 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置および方法
JP2014053416A (ja) 2012-09-06 2014-03-20 Toshiba Corp Ｅｕｖ露光装置及びクリーニング方法
US9560730B2 (en) * 2013-09-09 2017-01-31 Asml Netherlands B.V. Transport system for an extreme ultraviolet light source
CN118471789A (zh) * 2018-11-16 2024-08-09 玛特森技术公司 腔室上光以通过减少化学成分改善刻蚀均匀性

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0748440B2 (ja) * 1988-09-19 1995-05-24 株式会社日立製作所 薄膜磁気ヘッドの製造方法
JPH04103770A (ja) * 1990-08-22 1992-04-06 Sumitomo Metal Ind Ltd プラズマプロセス装置
JPH0665465U (ja) * 1993-02-26 1994-09-16 株式会社島津製作所 蒸着装置
JPH10340857A (ja) * 1997-06-10 1998-12-22 Mitsubishi Electric Corp 半導体装置の製造方法及び半導体製造装置
JP2000294535A (ja) * 1999-04-08 2000-10-20 Sony Corp 気相加工方法及びその装置
JP3639795B2 (ja) * 2000-03-13 2005-04-20 キヤノン株式会社 薄膜の製造方法
US7868304B2 (en) * 2005-02-07 2011-01-11 Asml Netherlands B.V. Method for removal of deposition on an optical element, lithographic apparatus, device manufacturing method, and device manufactured thereby
US8172946B2 (en) * 2005-03-02 2012-05-08 Hitachi Kokusai Electric Inc. Semiconductor device manufacturing apparatus and manufacturing method of semiconductor device
US7750326B2 (en) * 2005-06-13 2010-07-06 Asml Netherlands B.V. Lithographic apparatus and cleaning method therefor
US7495239B2 (en) * 2005-12-22 2009-02-24 Asml Netherlands B.V. Method for cleaning a lithographic apparatus module, a cleaning arrangement and a lithographic apparatus comprising the cleaning arrangement
US7504643B2 (en) * 2005-12-22 2009-03-17 Asml Netherlands B.V. Method for cleaning a lithographic apparatus module, a cleaning arrangement and a lithographic apparatus comprising the cleaning arrangement
EP2064005B1 (en) * 2006-09-04 2016-01-06 Philips Intellectual Property & Standards GmbH Method and unit for cleaning a surface region covered with contaminant or undesirable material
NL1036832A1 (nl) * 2008-04-15 2009-10-19 Asml Netherlands Bv Lithographic apparatus comprising an internal sensor and a mini-reactor, and method for treating a sensing surface of an internal sensor of a lithographic apparatus.

Also Published As

Publication number Publication date
EP2383613A3 (en) 2013-01-02
US20110259374A1 (en) 2011-10-27
JP2011230053A (ja) 2011-11-17
EP2383613A2 (en) 2011-11-02

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