JP5676471B2 - 流動層反応炉においてフルオロシリケートから四フッ化ケイ素を生成するプロセス及びシステム - Google Patents

流動層反応炉においてフルオロシリケートから四フッ化ケイ素を生成するプロセス及びシステム Download PDF

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Publication number
JP5676471B2
JP5676471B2 JP2011542347A JP2011542347A JP5676471B2 JP 5676471 B2 JP5676471 B2 JP 5676471B2 JP 2011542347 A JP2011542347 A JP 2011542347A JP 2011542347 A JP2011542347 A JP 2011542347A JP 5676471 B2 JP5676471 B2 JP 5676471B2
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fluorosilicate
reaction chamber
silicon tetrafluoride
fluidized bed
alkaline earth
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Japanese (ja)
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JP2012512132A5 (enExample
JP2012512132A (ja
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サティシュ・ブーサラプ
プネート・グプタ
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SunEdison Inc
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SunEdison Inc
MEMC Electronic Materials Inc
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
    • B01J8/18—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles
    • B01J8/24—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles according to "fluidised-bed" technique
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/08—Compounds containing halogen
    • C01B33/107—Halogenated silanes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
    • B01J8/005—Separating solid material from the gas/liquid stream
    • B01J8/0055—Separating solid material from the gas/liquid stream using cyclones
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
    • B01J8/18—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles
    • B01J8/20—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles with liquid as a fluidising medium
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/08—Compounds containing halogen
    • C01B33/107—Halogenated silanes
    • C01B33/10705—Tetrafluoride
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B9/00—General methods of preparing halides
    • C01B9/08—Fluorides
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/61—Micrometer sized, i.e. from 1-100 micrometer

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Silicon Compounds (AREA)
  • Devices And Processes Conducted In The Presence Of Fluids And Solid Particles (AREA)
JP2011542347A 2008-12-17 2009-12-15 流動層反応炉においてフルオロシリケートから四フッ化ケイ素を生成するプロセス及びシステム Expired - Fee Related JP5676471B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US13815808P 2008-12-17 2008-12-17
US13816008P 2008-12-17 2008-12-17
US61/138,160 2008-12-17
US61/138,158 2008-12-17
PCT/US2009/068103 WO2010077880A1 (en) 2008-12-17 2009-12-15 Processes and systems for producing silicon tetrafluoride from fluorosilicates in a fluidized bed reactor

Publications (3)

Publication Number Publication Date
JP2012512132A JP2012512132A (ja) 2012-05-31
JP2012512132A5 JP2012512132A5 (enExample) 2012-12-27
JP5676471B2 true JP5676471B2 (ja) 2015-02-25

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JP2011542347A Expired - Fee Related JP5676471B2 (ja) 2008-12-17 2009-12-15 流動層反応炉においてフルオロシリケートから四フッ化ケイ素を生成するプロセス及びシステム

Country Status (9)

Country Link
US (2) US20100150789A1 (enExample)
EP (1) EP2373577B1 (enExample)
JP (1) JP5676471B2 (enExample)
KR (1) KR20110110196A (enExample)
CN (1) CN102317201B (enExample)
MY (1) MY158672A (enExample)
SG (1) SG172067A1 (enExample)
TW (1) TWI511927B (enExample)
WO (1) WO2010077880A1 (enExample)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20130135235A (ko) * 2010-07-23 2013-12-10 메이어 인텔렉츄얼 프로퍼티즈 리미티드 하소 챔버 및 그 방법
US8840860B2 (en) 2010-07-23 2014-09-23 Meyer Intellectual Properties Limited Contamination free compression of corrosive gas
TWI490164B (zh) * 2011-08-02 2015-07-01 Circulon Hungary Ltd 鍛燒室與方法
CN102390835A (zh) * 2011-08-18 2012-03-28 化学工业第二设计院宁波工程有限公司 一种用氟硅酸钙制备四氟化硅的方法
CN103091271B (zh) * 2012-11-28 2016-05-18 贵州瓮福蓝天氟化工股份有限公司 测定四氟化硅气体中杂质碘含量的方法
DE102013104398A1 (de) * 2013-04-30 2014-10-30 Spawnt Private S.À.R.L. Verfahren zur Herstellung von Siliziumtetrafluorid
US9346718B2 (en) 2014-10-17 2016-05-24 Vale S.A. Method for recycling a byproduct of the phosphate fertilizer industry, soil conditioner, and soil conditioner manufacturing process
CN110683548B (zh) * 2018-07-04 2021-08-17 中国科学院过程工程研究所 一种利用氟硅酸钠高效生产四氟化硅和氟化钠的方法
CN110683561B (zh) * 2018-07-04 2020-12-11 中国科学院过程工程研究所 一种综合利用氟硅酸钠高效生产氟化钠、氟化铝和四氯化硅的方法
CN111039293B (zh) * 2018-10-15 2021-06-29 多氟多化工股份有限公司 一种四氟化硅的生产方法
CN109721079A (zh) * 2019-03-08 2019-05-07 青海盐湖工业股份有限公司 一种氯化钾生产系统及生产方法
US10844483B1 (en) 2019-12-16 2020-11-24 Quantum Elements Development, Inc. Quantum printing methods
US11484941B2 (en) 2020-12-15 2022-11-01 Quantum Elements Development Inc. Metal macrostructures
US11623871B2 (en) 2020-12-15 2023-04-11 Quantum Elements Development Inc. Rare earth metal instantiation
CN113955721A (zh) * 2021-09-29 2022-01-21 湖北省宏源药业科技股份有限公司 一种以氟硅酸盐为原料制备氟化盐联产氟硅酸的方法
CN115990439B (zh) * 2022-11-28 2024-07-23 兰州理工大学 一种基于膨胀流化床的无水氟化氢生产设备及工艺

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2785953A (en) * 1954-08-04 1957-03-19 Grace W R & Co Process for preparing a dry mixture of ammonium fluosilicate and silica
US3551098A (en) * 1968-01-12 1970-12-29 Flemmert Goesta Lennart Process for decomposing sodium fluosilicate and/or sodium bifluoride into sodium fluoride,hydrogen fluoride and silicon tetrafluoride
US4138509A (en) * 1977-12-23 1979-02-06 Motorola, Inc. Silicon purification process
US4446120A (en) * 1982-01-29 1984-05-01 The United States Of America As Represented By The United States Department Of Energy Method of preparing silicon from sodium fluosilicate
US4402932A (en) * 1982-05-07 1983-09-06 The United States Of America As Represented By The Secretary Of The Interior Thermal decomposition of aluminum chloride hexahydrate
US4416913A (en) * 1982-09-28 1983-11-22 Motorola, Inc. Ascending differential silicon harvesting means and method
US4632816A (en) * 1982-12-13 1986-12-30 Ethyl Corporation Process for production of silane
US4584181A (en) * 1982-12-27 1986-04-22 Sri International Process and apparatus for obtaining silicon from fluosilicic acid
US4748014A (en) * 1982-12-27 1988-05-31 Sri International Process and apparatus for obtaining silicon from fluosilicic acid
US4590043A (en) * 1982-12-27 1986-05-20 Sri International Apparatus for obtaining silicon from fluosilicic acid
US4699632A (en) * 1983-08-02 1987-10-13 Institute Of Gas Technology Process for gasification of cellulosic materials
DE3432678C2 (de) * 1984-09-05 1986-11-20 D. Swarovski & Co., Wattens, Tirol Verfahren zur Herstellung von Siliciumtetrafluorid
DE3688007D1 (de) * 1985-06-12 1993-04-22 Metallgesellschaft Ag Verbrennungsvorrichtung mit zirkulierender wirbelschicht.
US4839969A (en) * 1988-02-26 1989-06-20 Permian Research Corporation Drying method and apparatus
FR2690512B1 (fr) * 1992-04-27 1994-09-09 Stein Industrie Réacteur à lit fluidisé circulant comportant des échangeurs extérieurs alimentés par la recirculation interne.
US5242670A (en) * 1992-07-02 1993-09-07 Gehringer Ronald C Method for hydrofluoric acid digestion of silica/alumina matrix material for the production of silicon tetrafluoride, aluminum fluoride and other residual metal fluorides and oxides
FI97424C (fi) * 1993-06-23 1996-12-10 Foster Wheeler Energia Oy Menetelmä ja laite kuuman kaasun käsittelemiseksi tai hyödyntämiseksi
US5972835A (en) * 1995-09-13 1999-10-26 Research Triangle Institute Fluidizable particulate materials and methods of making same
JPH10231114A (ja) 1997-02-18 1998-09-02 Mitsui Chem Inc ＳｉＦ４の製造方法
DE19735378A1 (de) * 1997-08-14 1999-02-18 Wacker Chemie Gmbh Verfahren zur Herstellung von hochreinem Siliciumgranulat
AUPP624198A0 (en) * 1998-09-30 1998-10-22 Comalco Aluminium Limited Feed processing for improved alumina process performance
US6143915A (en) * 1998-11-23 2000-11-07 Uop Llc Reaction process in hybrid reactor for propylene ammoxidation
JP3909385B2 (ja) * 2001-07-12 2007-04-25 昭和電工株式会社 テトラフルオロシランの製造方法およびその用途
CN101481113A (zh) * 2009-02-27 2009-07-15 多氟多化工股份有限公司 一种四氟化硅的制备方法

Also Published As

Publication number Publication date
SG172067A1 (en) 2011-07-28
CN102317201B (zh) 2014-08-13
CN102317201A (zh) 2012-01-11
JP2012512132A (ja) 2012-05-31
TW201031596A (en) 2010-09-01
US20100150789A1 (en) 2010-06-17
EP2373577A1 (en) 2011-10-12
TWI511927B (zh) 2015-12-11
WO2010077880A1 (en) 2010-07-08
US20100150808A1 (en) 2010-06-17
EP2373577B1 (en) 2014-09-10
MY158672A (en) 2016-10-31
KR20110110196A (ko) 2011-10-06

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