TWI511927B - 於流化床反應器中自氟矽酸鹽製備四氟化矽之方法及系統 - Google Patents
於流化床反應器中自氟矽酸鹽製備四氟化矽之方法及系統 Download PDFInfo
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- TWI511927B TWI511927B TW098143408A TW98143408A TWI511927B TW I511927 B TWI511927 B TW I511927B TW 098143408 A TW098143408 A TW 098143408A TW 98143408 A TW98143408 A TW 98143408A TW I511927 B TWI511927 B TW I511927B
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- Taiwan
- Prior art keywords
- reaction chamber
- fluoroantimonate
- fluoride
- fluidized bed
- bed reactor
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims description 45
- 230000008569 process Effects 0.000 title description 8
- ABTOQLMXBSRXSM-UHFFFAOYSA-N silicon tetrafluoride Chemical compound F[Si](F)(F)F ABTOQLMXBSRXSM-UHFFFAOYSA-N 0.000 title 1
- 239000007789 gas Substances 0.000 claims description 116
- 238000006243 chemical reaction Methods 0.000 claims description 90
- 150000001340 alkali metals Chemical class 0.000 claims description 60
- 238000001035 drying Methods 0.000 claims description 36
- 229910001618 alkaline earth metal fluoride Inorganic materials 0.000 claims description 33
- 229910001515 alkali metal fluoride Inorganic materials 0.000 claims description 31
- 229910052783 alkali metal Inorganic materials 0.000 claims description 29
- 229940104869 fluorosilicate Drugs 0.000 claims description 28
- 239000002245 particle Substances 0.000 claims description 28
- CBIYWHCPXHKZME-UHFFFAOYSA-J tetrafluororuthenium Chemical compound [F-].[F-].[F-].[F-].[Ru+4] CBIYWHCPXHKZME-UHFFFAOYSA-J 0.000 claims description 28
- 229910052784 alkaline earth metal Inorganic materials 0.000 claims description 27
- 150000001342 alkaline earth metals Chemical class 0.000 claims description 27
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 27
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical group F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims description 23
- IDYFACFOJYNFAX-UHFFFAOYSA-J tetrafluoroantimony Chemical compound F[Sb](F)(F)F IDYFACFOJYNFAX-UHFFFAOYSA-J 0.000 claims description 22
- -1 lithium fluoroantimonate Chemical compound 0.000 claims description 20
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 claims description 18
- 239000000463 material Substances 0.000 claims description 17
- 238000005979 thermal decomposition reaction Methods 0.000 claims description 17
- 239000002253 acid Substances 0.000 claims description 12
- 239000012530 fluid Substances 0.000 claims description 12
- DGXLYHAWEBCTRU-UHFFFAOYSA-N Fluorocitric acid Chemical compound OC(=O)CC(O)(C(O)=O)C(F)C(O)=O DGXLYHAWEBCTRU-UHFFFAOYSA-N 0.000 claims description 7
- YZBOOASCZHGWQZ-UHFFFAOYSA-J [F-].[F-].[F-].[F-].[Cs+].[Cs+].[Cs+].[Cs+] Chemical compound [F-].[F-].[F-].[F-].[Cs+].[Cs+].[Cs+].[Cs+] YZBOOASCZHGWQZ-UHFFFAOYSA-J 0.000 claims description 7
- 239000000428 dust Substances 0.000 claims description 7
- 239000000843 powder Substances 0.000 claims description 7
- 239000007787 solid Substances 0.000 claims description 7
- 238000012546 transfer Methods 0.000 claims description 7
- 238000009826 distribution Methods 0.000 claims description 6
- 238000010438 heat treatment Methods 0.000 claims description 6
- 239000000203 mixture Substances 0.000 claims description 6
- QHEDSQMUHIMDOL-UHFFFAOYSA-J hafnium(4+);tetrafluoride Chemical compound F[Hf](F)(F)F QHEDSQMUHIMDOL-UHFFFAOYSA-J 0.000 claims description 5
- 238000003860 storage Methods 0.000 claims description 5
- CMCRQEROAJPMQT-UHFFFAOYSA-N [He].F.F.F.F Chemical compound [He].F.F.F.F CMCRQEROAJPMQT-UHFFFAOYSA-N 0.000 claims description 4
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 3
- 239000000374 eutectic mixture Substances 0.000 claims description 3
- 229910052731 fluorine Inorganic materials 0.000 claims description 3
- 239000011737 fluorine Substances 0.000 claims description 3
- 150000003839 salts Chemical class 0.000 claims description 3
- JIMVSXSPGYTTSC-UHFFFAOYSA-J [Ba+2].[F-].[Ba+2].[F-].[F-].[F-] Chemical compound [Ba+2].[F-].[Ba+2].[F-].[F-].[F-] JIMVSXSPGYTTSC-UHFFFAOYSA-J 0.000 claims description 2
- OYLGJCQECKOTOL-UHFFFAOYSA-L barium fluoride Chemical compound [F-].[F-].[Ba+2] OYLGJCQECKOTOL-UHFFFAOYSA-L 0.000 claims description 2
- 229910001632 barium fluoride Inorganic materials 0.000 claims description 2
- 230000006698 induction Effects 0.000 claims description 2
- 230000008018 melting Effects 0.000 claims description 2
- 238000002844 melting Methods 0.000 claims description 2
- XHKUTQNVGAHLPK-UHFFFAOYSA-N 2-fluorocyclohexa-2,5-diene-1,4-dione Chemical compound FC1=CC(=O)C=CC1=O XHKUTQNVGAHLPK-UHFFFAOYSA-N 0.000 claims 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 claims 1
- 150000000703 Cerium Chemical class 0.000 claims 1
- 229910052791 calcium Inorganic materials 0.000 claims 1
- 239000011575 calcium Substances 0.000 claims 1
- 239000000567 combustion gas Substances 0.000 claims 1
- 238000007599 discharging Methods 0.000 claims 1
- NIFIFKQPDTWWGU-UHFFFAOYSA-N pyrite Chemical compound [Fe+2].[S-][S-] NIFIFKQPDTWWGU-UHFFFAOYSA-N 0.000 claims 1
- 229910052683 pyrite Inorganic materials 0.000 claims 1
- 239000011028 pyrite Substances 0.000 claims 1
- 239000000725 suspension Substances 0.000 claims 1
- PPMWWXLUCOODDK-UHFFFAOYSA-N tetrafluorogermane Chemical compound F[Ge](F)(F)F PPMWWXLUCOODDK-UHFFFAOYSA-N 0.000 claims 1
- 238000005243 fluidization Methods 0.000 description 18
- 239000000047 product Substances 0.000 description 13
- 239000006227 byproduct Substances 0.000 description 12
- 238000000354 decomposition reaction Methods 0.000 description 10
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 8
- 239000012535 impurity Substances 0.000 description 8
- 230000032258 transport Effects 0.000 description 7
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 6
- 229910000040 hydrogen fluoride Inorganic materials 0.000 description 6
- 239000007788 liquid Substances 0.000 description 6
- 238000002360 preparation method Methods 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 5
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 4
- 238000013461 design Methods 0.000 description 4
- 230000005496 eutectics Effects 0.000 description 4
- 239000011261 inert gas Substances 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- 238000012545 processing Methods 0.000 description 4
- 239000002994 raw material Substances 0.000 description 4
- 239000011800 void material Substances 0.000 description 4
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 229910045601 alloy Inorganic materials 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- 229910052786 argon Inorganic materials 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 3
- 239000000839 emulsion Substances 0.000 description 3
- 239000001307 helium Substances 0.000 description 3
- 229910052734 helium Inorganic materials 0.000 description 3
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 3
- 238000011084 recovery Methods 0.000 description 3
- 238000000926 separation method Methods 0.000 description 3
- 239000006228 supernatant Substances 0.000 description 3
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 229910000420 cerium oxide Inorganic materials 0.000 description 2
- 238000004581 coalescence Methods 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 238000000605 extraction Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 2
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 2
- JTJMJGYZQZDUJJ-UHFFFAOYSA-N phencyclidine Chemical class C1CCCCN1C1(C=2C=CC=CC=2)CCCCC1 JTJMJGYZQZDUJJ-UHFFFAOYSA-N 0.000 description 2
- 239000002686 phosphate fertilizer Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 229910000792 Monel Inorganic materials 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 239000002250 absorbent Substances 0.000 description 1
- 230000002745 absorbent Effects 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 239000000443 aerosol Substances 0.000 description 1
- 229910000272 alkali metal oxide Inorganic materials 0.000 description 1
- 229910001860 alkaline earth metal hydroxide Inorganic materials 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910052586 apatite Inorganic materials 0.000 description 1
- 229910000963 austenitic stainless steel Inorganic materials 0.000 description 1
- 238000010923 batch production Methods 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 150000004673 fluoride salts Chemical class 0.000 description 1
- 239000010436 fluorite Substances 0.000 description 1
- 230000004927 fusion Effects 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 229910000856 hastalloy Inorganic materials 0.000 description 1
- 229910001026 inconel Inorganic materials 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910001512 metal fluoride Inorganic materials 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 238000003801 milling Methods 0.000 description 1
- 239000003595 mist Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- VSIIXMUUUJUKCM-UHFFFAOYSA-D pentacalcium;fluoride;triphosphate Chemical compound [F-].[Ca+2].[Ca+2].[Ca+2].[Ca+2].[Ca+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O VSIIXMUUUJUKCM-UHFFFAOYSA-D 0.000 description 1
- 235000020030 perry Nutrition 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 230000003134 recirculating effect Effects 0.000 description 1
- 238000004064 recycling Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 229910001925 ruthenium oxide Inorganic materials 0.000 description 1
- WOCIAKWEIIZHES-UHFFFAOYSA-N ruthenium(iv) oxide Chemical compound O=[Ru]=O WOCIAKWEIIZHES-UHFFFAOYSA-N 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 235000011121 sodium hydroxide Nutrition 0.000 description 1
- 239000007790 solid phase Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 230000000153 supplemental effect Effects 0.000 description 1
- 230000026676 system process Effects 0.000 description 1
- 238000001291 vacuum drying Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
- B01J8/18—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles
- B01J8/24—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles according to "fluidised-bed" technique
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/08—Compounds containing halogen
- C01B33/107—Halogenated silanes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
- B01J8/005—Separating solid material from the gas/liquid stream
- B01J8/0055—Separating solid material from the gas/liquid stream using cyclones
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
- B01J8/18—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles
- B01J8/20—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles with liquid as a fluidising medium
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/08—Compounds containing halogen
- C01B33/107—Halogenated silanes
- C01B33/10705—Tetrafluoride
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B9/00—General methods of preparing halides
- C01B9/08—Fluorides
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/61—Micrometer sized, i.e. from 1-100 micrometer
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- General Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Combustion & Propulsion (AREA)
- Silicon Compounds (AREA)
- Devices And Processes Conducted In The Presence Of Fluids And Solid Particles (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US13815808P | 2008-12-17 | 2008-12-17 | |
| US13816008P | 2008-12-17 | 2008-12-17 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201031596A TW201031596A (en) | 2010-09-01 |
| TWI511927B true TWI511927B (zh) | 2015-12-11 |
Family
ID=41682271
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW098143408A TWI511927B (zh) | 2008-12-17 | 2009-12-17 | 於流化床反應器中自氟矽酸鹽製備四氟化矽之方法及系統 |
Country Status (9)
| Country | Link |
|---|---|
| US (2) | US20100150789A1 (enExample) |
| EP (1) | EP2373577B1 (enExample) |
| JP (1) | JP5676471B2 (enExample) |
| KR (1) | KR20110110196A (enExample) |
| CN (1) | CN102317201B (enExample) |
| MY (1) | MY158672A (enExample) |
| SG (1) | SG172067A1 (enExample) |
| TW (1) | TWI511927B (enExample) |
| WO (1) | WO2010077880A1 (enExample) |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20130135235A (ko) * | 2010-07-23 | 2013-12-10 | 메이어 인텔렉츄얼 프로퍼티즈 리미티드 | 하소 챔버 및 그 방법 |
| US8840860B2 (en) | 2010-07-23 | 2014-09-23 | Meyer Intellectual Properties Limited | Contamination free compression of corrosive gas |
| TWI490164B (zh) * | 2011-08-02 | 2015-07-01 | Circulon Hungary Ltd | 鍛燒室與方法 |
| CN102390835A (zh) * | 2011-08-18 | 2012-03-28 | 化学工业第二设计院宁波工程有限公司 | 一种用氟硅酸钙制备四氟化硅的方法 |
| CN103091271B (zh) * | 2012-11-28 | 2016-05-18 | 贵州瓮福蓝天氟化工股份有限公司 | 测定四氟化硅气体中杂质碘含量的方法 |
| DE102013104398A1 (de) * | 2013-04-30 | 2014-10-30 | Spawnt Private S.À.R.L. | Verfahren zur Herstellung von Siliziumtetrafluorid |
| US9346718B2 (en) | 2014-10-17 | 2016-05-24 | Vale S.A. | Method for recycling a byproduct of the phosphate fertilizer industry, soil conditioner, and soil conditioner manufacturing process |
| CN110683548B (zh) * | 2018-07-04 | 2021-08-17 | 中国科学院过程工程研究所 | 一种利用氟硅酸钠高效生产四氟化硅和氟化钠的方法 |
| CN110683561B (zh) * | 2018-07-04 | 2020-12-11 | 中国科学院过程工程研究所 | 一种综合利用氟硅酸钠高效生产氟化钠、氟化铝和四氯化硅的方法 |
| CN111039293B (zh) * | 2018-10-15 | 2021-06-29 | 多氟多化工股份有限公司 | 一种四氟化硅的生产方法 |
| CN109721079A (zh) * | 2019-03-08 | 2019-05-07 | 青海盐湖工业股份有限公司 | 一种氯化钾生产系统及生产方法 |
| US10844483B1 (en) | 2019-12-16 | 2020-11-24 | Quantum Elements Development, Inc. | Quantum printing methods |
| US11484941B2 (en) | 2020-12-15 | 2022-11-01 | Quantum Elements Development Inc. | Metal macrostructures |
| US11623871B2 (en) | 2020-12-15 | 2023-04-11 | Quantum Elements Development Inc. | Rare earth metal instantiation |
| CN113955721A (zh) * | 2021-09-29 | 2022-01-21 | 湖北省宏源药业科技股份有限公司 | 一种以氟硅酸盐为原料制备氟化盐联产氟硅酸的方法 |
| CN115990439B (zh) * | 2022-11-28 | 2024-07-23 | 兰州理工大学 | 一种基于膨胀流化床的无水氟化氢生产设备及工艺 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1239646A (enExample) * | 1968-01-12 | 1971-07-21 |
Family Cites Families (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2785953A (en) * | 1954-08-04 | 1957-03-19 | Grace W R & Co | Process for preparing a dry mixture of ammonium fluosilicate and silica |
| US4138509A (en) * | 1977-12-23 | 1979-02-06 | Motorola, Inc. | Silicon purification process |
| US4446120A (en) * | 1982-01-29 | 1984-05-01 | The United States Of America As Represented By The United States Department Of Energy | Method of preparing silicon from sodium fluosilicate |
| US4402932A (en) * | 1982-05-07 | 1983-09-06 | The United States Of America As Represented By The Secretary Of The Interior | Thermal decomposition of aluminum chloride hexahydrate |
| US4416913A (en) * | 1982-09-28 | 1983-11-22 | Motorola, Inc. | Ascending differential silicon harvesting means and method |
| US4632816A (en) * | 1982-12-13 | 1986-12-30 | Ethyl Corporation | Process for production of silane |
| US4584181A (en) * | 1982-12-27 | 1986-04-22 | Sri International | Process and apparatus for obtaining silicon from fluosilicic acid |
| US4748014A (en) * | 1982-12-27 | 1988-05-31 | Sri International | Process and apparatus for obtaining silicon from fluosilicic acid |
| US4590043A (en) * | 1982-12-27 | 1986-05-20 | Sri International | Apparatus for obtaining silicon from fluosilicic acid |
| US4699632A (en) * | 1983-08-02 | 1987-10-13 | Institute Of Gas Technology | Process for gasification of cellulosic materials |
| DE3432678C2 (de) * | 1984-09-05 | 1986-11-20 | D. Swarovski & Co., Wattens, Tirol | Verfahren zur Herstellung von Siliciumtetrafluorid |
| DE3688007D1 (de) * | 1985-06-12 | 1993-04-22 | Metallgesellschaft Ag | Verbrennungsvorrichtung mit zirkulierender wirbelschicht. |
| US4839969A (en) * | 1988-02-26 | 1989-06-20 | Permian Research Corporation | Drying method and apparatus |
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2009
- 2009-12-15 WO PCT/US2009/068103 patent/WO2010077880A1/en not_active Ceased
- 2009-12-15 MY MYPI2011002828A patent/MY158672A/en unknown
- 2009-12-15 SG SG2011042306A patent/SG172067A1/en unknown
- 2009-12-15 CN CN200980156839.1A patent/CN102317201B/zh not_active Expired - Fee Related
- 2009-12-15 KR KR1020117016705A patent/KR20110110196A/ko not_active Ceased
- 2009-12-15 JP JP2011542347A patent/JP5676471B2/ja not_active Expired - Fee Related
- 2009-12-15 EP EP09775480.8A patent/EP2373577B1/en not_active Not-in-force
- 2009-12-17 US US12/640,346 patent/US20100150789A1/en not_active Abandoned
- 2009-12-17 US US12/640,337 patent/US20100150808A1/en not_active Abandoned
- 2009-12-17 TW TW098143408A patent/TWI511927B/zh not_active IP Right Cessation
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1239646A (enExample) * | 1968-01-12 | 1971-07-21 |
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|---|---|
| SG172067A1 (en) | 2011-07-28 |
| CN102317201B (zh) | 2014-08-13 |
| CN102317201A (zh) | 2012-01-11 |
| JP2012512132A (ja) | 2012-05-31 |
| TW201031596A (en) | 2010-09-01 |
| US20100150789A1 (en) | 2010-06-17 |
| EP2373577A1 (en) | 2011-10-12 |
| WO2010077880A1 (en) | 2010-07-08 |
| US20100150808A1 (en) | 2010-06-17 |
| EP2373577B1 (en) | 2014-09-10 |
| MY158672A (en) | 2016-10-31 |
| KR20110110196A (ko) | 2011-10-06 |
| JP5676471B2 (ja) | 2015-02-25 |
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