JP5656682B2 - 反射屈折光学系及びそれを有する撮像装置 - Google Patents

反射屈折光学系及びそれを有する撮像装置 Download PDF

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Publication number
JP5656682B2
JP5656682B2 JP2011035746A JP2011035746A JP5656682B2 JP 5656682 B2 JP5656682 B2 JP 5656682B2 JP 2011035746 A JP2011035746 A JP 2011035746A JP 2011035746 A JP2011035746 A JP 2011035746A JP 5656682 B2 JP5656682 B2 JP 5656682B2
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JP
Japan
Prior art keywords
optical system
negative lens
image
optical element
imaging
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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JP2011035746A
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English (en)
Japanese (ja)
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JP2012173525A5 (enExample
JP2012173525A (ja
Inventor
中野　正嗣
正嗣 中野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
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Canon Inc
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Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2011035746A priority Critical patent/JP5656682B2/ja
Priority to US13/401,999 priority patent/US8947774B2/en
Publication of JP2012173525A publication Critical patent/JP2012173525A/ja
Publication of JP2012173525A5 publication Critical patent/JP2012173525A5/ja
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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0804—Catadioptric systems using two curved mirrors
    • G02B17/0808—Catadioptric systems using two curved mirrors on-axis systems with at least one of the mirrors having a central aperture
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0856—Catadioptric systems comprising a refractive element with a reflective surface, the reflection taking place inside the element, e.g. Mangin mirrors

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
  • Microscoopes, Condenser (AREA)
JP2011035746A 2011-02-22 2011-02-22 反射屈折光学系及びそれを有する撮像装置 Expired - Fee Related JP5656682B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2011035746A JP5656682B2 (ja) 2011-02-22 2011-02-22 反射屈折光学系及びそれを有する撮像装置
US13/401,999 US8947774B2 (en) 2011-02-22 2012-02-22 Catadioptric optical system and image pickup apparatus having the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011035746A JP5656682B2 (ja) 2011-02-22 2011-02-22 反射屈折光学系及びそれを有する撮像装置

Publications (3)

Publication Number Publication Date
JP2012173525A JP2012173525A (ja) 2012-09-10
JP2012173525A5 JP2012173525A5 (enExample) 2014-03-06
JP5656682B2 true JP5656682B2 (ja) 2015-01-21

Family

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Family Applications (1)

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JP2011035746A Expired - Fee Related JP5656682B2 (ja) 2011-02-22 2011-02-22 反射屈折光学系及びそれを有する撮像装置

Country Status (2)

Country Link
US (1) US8947774B2 (enExample)
JP (1) JP5656682B2 (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5915489B2 (ja) * 2012-10-04 2016-05-11 ソニー株式会社 反射屈折型レンズ系および撮像装置
CN108873289B (zh) * 2018-09-04 2024-02-09 中国科学院长春光学精密机械与物理研究所 显微物镜光学系统及光学设备

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US7017A (en) * 1850-01-15 Brick-pbess
US4346989A (en) * 1976-11-18 1982-08-31 Hewlett-Packard Company Surveying instrument
JPS6034737B2 (ja) 1977-03-14 1985-08-10 オリンパス光学工業株式会社 顕微鏡対物レンズ
US5031976A (en) * 1990-09-24 1991-07-16 Kla Instruments, Corporation Catadioptric imaging system
US5717518A (en) * 1996-07-22 1998-02-10 Kla Instruments Corporation Broad spectrum ultraviolet catadioptric imaging system
US6483638B1 (en) * 1996-07-22 2002-11-19 Kla-Tencor Corporation Ultra-broadband UV microscope imaging system with wide range zoom capability
US5999310A (en) * 1996-07-22 1999-12-07 Shafer; David Ross Ultra-broadband UV microscope imaging system with wide range zoom capability
EP1079253A4 (en) * 1998-04-07 2004-09-01 Nikon Corp DEVICE AND PROCESS FOR PROJECTION EXPOSURE, AND OPTICAL SYSTEM WITH REFLECTION AND REFRACTION
KR20010041257A (ko) 1998-12-25 2001-05-15 오노 시게오 반사굴절 결상 광학계 및 그 광학계를 구비한 투영 노광장치
US6862142B2 (en) * 2000-03-10 2005-03-01 Kla-Tencor Technologies Corporation Multi-detector microscopic inspection system
US7136234B2 (en) * 2000-09-12 2006-11-14 Kla-Tencor Technologies Corporation Broad band DUV, VUV long-working distance catadioptric imaging system
US7136159B2 (en) * 2000-09-12 2006-11-14 Kla-Tencor Technologies Corporation Excimer laser inspection system
US6842298B1 (en) 2000-09-12 2005-01-11 Kla-Tencor Technologies Corporation Broad band DUV, VUV long-working distance catadioptric imaging system
US7646533B2 (en) * 2003-02-21 2010-01-12 Kla-Tencor Technologies Corporation Small ultra-high NA catadioptric objective
US7672043B2 (en) * 2003-02-21 2010-03-02 Kla-Tencor Technologies Corporation Catadioptric imaging system exhibiting enhanced deep ultraviolet spectral bandwidth
US8675276B2 (en) 2003-02-21 2014-03-18 Kla-Tencor Corporation Catadioptric imaging system for broad band microscopy
DE102005042005A1 (de) * 2004-12-23 2006-07-06 Carl Zeiss Smt Ag Hochaperturiges Objektiv mit obskurierter Pupille
TWI454731B (zh) * 2005-05-27 2014-10-01 Zeiss Carl Smt Gmbh 用於改進投影物鏡的成像性質之方法以及該投影物鏡
US7345825B2 (en) * 2005-06-30 2008-03-18 Kla-Tencor Technologies Corporation Beam delivery system for laser dark-field illumination in a catadioptric optical system
JP5634989B2 (ja) * 2008-06-17 2014-12-03 ケーエルエー−テンカー・コーポレーションＫｌａ−Ｔｅｎｃｏｒ Ｃｏｒｐｏｒａｔｉｏｎ 対物光学系および試料検査装置
JP5836686B2 (ja) * 2011-07-28 2015-12-24 キヤノン株式会社 反射屈折光学系及びそれを有する撮像装置

Also Published As

Publication number Publication date
US8947774B2 (en) 2015-02-03
US20120212600A1 (en) 2012-08-23
JP2012173525A (ja) 2012-09-10

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