JP5642914B2 - 耐久性を向上させたエキシマレーザ用素子 - Google Patents
耐久性を向上させたエキシマレーザ用素子 Download PDFInfo
- Publication number
- JP5642914B2 JP5642914B2 JP2006026853A JP2006026853A JP5642914B2 JP 5642914 B2 JP5642914 B2 JP 5642914B2 JP 2006026853 A JP2006026853 A JP 2006026853A JP 2006026853 A JP2006026853 A JP 2006026853A JP 5642914 B2 JP5642914 B2 JP 5642914B2
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- JP
- Japan
- Prior art keywords
- aluminum
- layer
- dielectric
- inert gas
- dielectric material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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Classifications
-
- G02B1/105—
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/14—Protective coatings, e.g. hard coatings
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
- G02B5/0891—Ultraviolet [UV] mirrors
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1838—Diffraction gratings for use with ultraviolet radiation or X-rays
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
- G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1861—Reflection gratings characterised by their structure, e.g. step profile, contours of substrate or grooves, pitch variations, materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/08059—Constructional details of the reflector, e.g. shape
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Engineering & Computer Science (AREA)
- Toxicology (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
- Lasers (AREA)
- Optical Elements Other Than Lenses (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Physical Vapour Deposition (AREA)
Description
22 るつぼ
24 蒸着物質
26 誘電材料
30” 基板ブレーズ面
50 接着層
60 アルミニウム層
70 誘電体バリア層
Claims (4)
- 表面にアルミニウムコーティングを備えた光学素子のアルミニウム表面上に稠密な誘電材料膜を被着させることによりレーザリソグラフィ素子を製造する方法であって、
アルミニウム膜をその表面に有する光学素子を提供する工程と、
前記アルミニウム膜をその表面に有する前記光学素子を、選択された誘電性コーティング材料のソースと、不活性ガスイオンおよび酸素イオンのソースとを備えた真空蒸着チャンバに入れる工程と、
前記チャンバを圧力9×10−6mbar未満まで排気する工程と、
コーティング中の前記真空蒸着チャンバ内の圧力が7×10−5mbar〜4×10−4mbarの範囲内となるような態様で、前記誘電性コーティング材料を気化して、1つ又は複数の前記誘電性コーティング材料の層を前記アルミニウム表面上に被着させる工程であって、当該気化及び被着と同時に、イオンで前記誘電性コーティング材料を衝撃し、被着された前記誘電性コーティング材料の層の厚さが20〜150nmの範囲内になるようにし、基板上のアルミニウム層を覆う誘電性コーティングを備えた光学素子を形成する工程と
を有してなり、
(a)1つの誘電材料層を前記アルミニウム膜の表面に被着させる場合、当該1つの誘電材料層は、第1の部分及び第2の部分からなる誘電材料層であって、前記第1の部分は、不活性ガスイオンのみによる衝撃を受けた誘電材料層であり、前記第2の部分は、不活性ガスイオン及び酸素イオンによる衝撃を受けた誘電材料層であること、
(b)複数の誘電材料層を前記アルミニウム膜の表面に被着させる場合、当該複数の誘電材料層の第1の層は、上記第1の部分及び第2の部分からなる誘電体層であって、当該複数の誘電材料層の第2の層及びそれ以降の層は、不活性ガスイオン及び酸素イオンによる衝撃を受けた層であること、
前記誘電体材料が、SiO2およびF−SiO2から成る群より選択される、
ことを特徴とする方法。 - 光学素子を提供することが、基板上にアルミニウム層を有し、前記アルミニウム層と前記基板との間に接着層を有する光学素子を提供することであり、前記接着層が、前記基板とアルミニウムとを接着するために公知の、ニッケル、クロム、ニッケルクロム合金から成る群より選択されることを特徴とする請求項1に記載の方法。
- 前記不活性ガスイオンのみによる衝撃及び前記不活性ガスイオン及び酸素イオンによる衝撃が、80〜150eVの範囲のエネルギで行われることを特徴とする請求項1記載の方法。
- 前記不活性ガスイオンのみによる衝撃及び前記不活性ガスイオン及び酸素イオンによる衝撃が、110eVのエネルギで行われることを特徴とする請求項1記載の方法。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/050,986 | 2005-02-03 | ||
US11/050,986 US7561611B2 (en) | 2005-02-03 | 2005-02-03 | Extended-lifetime elements for excimer lasers |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2014090391A Division JP2014194550A (ja) | 2005-02-03 | 2014-04-24 | 耐久性を向上させたエキシマレーザ用素子 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2006295129A JP2006295129A (ja) | 2006-10-26 |
JP5642914B2 true JP5642914B2 (ja) | 2014-12-17 |
Family
ID=36709923
Family Applications (3)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2006026853A Expired - Fee Related JP5642914B2 (ja) | 2005-02-03 | 2006-02-03 | 耐久性を向上させたエキシマレーザ用素子 |
JP2014090391A Pending JP2014194550A (ja) | 2005-02-03 | 2014-04-24 | 耐久性を向上させたエキシマレーザ用素子 |
JP2016198824A Pending JP2017027077A (ja) | 2005-02-03 | 2016-10-07 | 耐久性を向上させたエキシマレーザ用素子 |
Family Applications After (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2014090391A Pending JP2014194550A (ja) | 2005-02-03 | 2014-04-24 | 耐久性を向上させたエキシマレーザ用素子 |
JP2016198824A Pending JP2017027077A (ja) | 2005-02-03 | 2016-10-07 | 耐久性を向上させたエキシマレーザ用素子 |
Country Status (3)
Country | Link |
---|---|
US (1) | US7561611B2 (ja) |
JP (3) | JP5642914B2 (ja) |
DE (1) | DE102006004835B4 (ja) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9482790B2 (en) * | 2012-05-31 | 2016-11-01 | Corning Incorporated | Silica-modified-fluoride broad angle anti-reflection coatings |
DE102018221189A1 (de) | 2018-12-07 | 2020-06-10 | Carl Zeiss Smt Gmbh | Verfahren zum Bilden von Nanostrukturen an einer Oberfläche und optisches Element |
DE102019200208A1 (de) | 2019-01-10 | 2020-07-16 | Carl Zeiss Smt Gmbh | Verfahren zum in situ dynamischen Schutz einer Oberfläche und optische Anordnung |
JP2022028415A (ja) * | 2020-08-03 | 2022-02-16 | 株式会社島津製作所 | ブレーズド回折格子およびブレーズド回折格子の製造方法 |
DE102021200747A1 (de) | 2021-01-28 | 2022-07-28 | Carl Zeiss Smt Gmbh | Verfahren zum Bilden einer Schicht, optisches Element und optisches System |
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-
2005
- 2005-02-03 US US11/050,986 patent/US7561611B2/en not_active Expired - Fee Related
-
2006
- 2006-02-02 DE DE102006004835.0A patent/DE102006004835B4/de not_active Expired - Fee Related
- 2006-02-03 JP JP2006026853A patent/JP5642914B2/ja not_active Expired - Fee Related
-
2014
- 2014-04-24 JP JP2014090391A patent/JP2014194550A/ja active Pending
-
2016
- 2016-10-07 JP JP2016198824A patent/JP2017027077A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
JP2006295129A (ja) | 2006-10-26 |
DE102006004835B4 (de) | 2019-01-03 |
US20060171438A1 (en) | 2006-08-03 |
JP2014194550A (ja) | 2014-10-09 |
US7561611B2 (en) | 2009-07-14 |
JP2017027077A (ja) | 2017-02-02 |
DE102006004835A1 (de) | 2006-08-10 |
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