JP5639351B2 - 印刷組版として使用される円筒形感光エレメントの作製方法 - Google Patents

印刷組版として使用される円筒形感光エレメントの作製方法 Download PDF

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Publication number
JP5639351B2
JP5639351B2 JP2009188545A JP2009188545A JP5639351B2 JP 5639351 B2 JP5639351 B2 JP 5639351B2 JP 2009188545 A JP2009188545 A JP 2009188545A JP 2009188545 A JP2009188545 A JP 2009188545A JP 5639351 B2 JP5639351 B2 JP 5639351B2
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Japan
Prior art keywords
layer
support
photosensitive layer
sleeve
photosensitive
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JP2009188545A
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English (en)
Japanese (ja)
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JP2010061131A5 (enExample
JP2010061131A (ja
Inventor
ダイバー ベルン
ダイバー ベルン
ライヒェルト ステファン
ライヒェルト ステファン
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EIDP Inc
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EI Du Pont de Nemours and Co
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Publication of JP2010061131A5 publication Critical patent/JP2010061131A5/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/18—Coating curved surfaces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N1/00—Printing plates or foils; Materials therefor
    • B41N1/16—Curved printing plates, especially cylinders
    • B41N1/22—Curved printing plates, especially cylinders made of other substances
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
    • G03F7/202—Masking pattern being obtained by thermal means, e.g. laser ablation

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Optics & Photonics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Materials For Photolithography (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
  • Discharging, Photosensitive Material Shape In Electrophotography (AREA)
JP2009188545A 2008-08-15 2009-08-17 印刷組版として使用される円筒形感光エレメントの作製方法 Active JP5639351B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US18910208P 2008-08-15 2008-08-15
US61/189,102 2008-08-15

Publications (3)

Publication Number Publication Date
JP2010061131A JP2010061131A (ja) 2010-03-18
JP2010061131A5 JP2010061131A5 (enExample) 2012-09-06
JP5639351B2 true JP5639351B2 (ja) 2014-12-10

Family

ID=41335574

Family Applications (1)

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JP2009188545A Active JP5639351B2 (ja) 2008-08-15 2009-08-17 印刷組版として使用される円筒形感光エレメントの作製方法

Country Status (2)

Country Link
EP (1) EP2154572B1 (enExample)
JP (1) JP5639351B2 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5116623B2 (ja) * 2008-09-29 2013-01-09 旭化成イーマテリアルズ株式会社 円筒状印刷原版成形装置
US20130075946A1 (en) * 2010-05-04 2013-03-28 Unipixel Displays, Inc. Method of fabricating micro structured surfaces with electrically conductive patterns
JP5955539B2 (ja) 2010-12-03 2016-07-20 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニーＥ．Ｉ．Ｄｕ Ｐｏｎｔ Ｄｅ Ｎｅｍｏｕｒｓ Ａｎｄ Ｃｏｍｐａｎｙ 印刷で使用するシリンダ形状要素を作製する方法
CN104216231B (zh) * 2013-06-05 2019-02-12 中芯国际集成电路制造(上海)有限公司 涂布装置和涂布方法

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US4045231A (en) 1975-03-15 1977-08-30 Tokyo Ohka Kogyo Kabushiki Kaisha Photosensitive resin composition for flexographic printing plates
DE2722896C3 (de) 1977-05-20 1986-01-02 Du Pont de Nemours (Deutschland) GmbH, 4000 Düsseldorf Verfahren zur Kantenverbindung lichthärtbarer thermoplastischer elastomerer Druckplatten
US4177074A (en) 1978-01-25 1979-12-04 E. I. Du Pont De Nemours And Company Butadiene/acrylonitrile photosensitive, elastomeric polymer compositions for flexographic printing plates
DE2844426C2 (de) 1978-10-12 1989-01-12 Du Pont de Nemours (Deutschland) GmbH, 4000 Düsseldorf Verfahren zur Kantenverbindung von lichthärtbaren, thermoplastischen, elastomeren Druckplatten
CH644471A5 (fr) 1981-02-02 1984-07-31 Michael Graetzel Produit destine a etre utilise comme photocatalyseur, procede de preparation de ce produit et utilisation de ce produit.
DE3137416A1 (de) 1981-09-19 1983-03-31 Basf Ag, 6700 Ludwigshafen Fotopolymerisierbare gemische und elemente daraus
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Also Published As

Publication number Publication date
EP2154572A3 (en) 2010-10-27
EP2154572A2 (en) 2010-02-17
JP2010061131A (ja) 2010-03-18
EP2154572B1 (en) 2017-05-03

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