JP5564759B2 - 光学フィルタ装置 - Google Patents
光学フィルタ装置 Download PDFInfo
- Publication number
- JP5564759B2 JP5564759B2 JP2008096176A JP2008096176A JP5564759B2 JP 5564759 B2 JP5564759 B2 JP 5564759B2 JP 2008096176 A JP2008096176 A JP 2008096176A JP 2008096176 A JP2008096176 A JP 2008096176A JP 5564759 B2 JP5564759 B2 JP 5564759B2
- Authority
- JP
- Japan
- Prior art keywords
- mirror
- alloy film
- silver
- optical filter
- reflectance
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 230000003287 optical effect Effects 0.000 title claims description 29
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 62
- 229910052799 carbon Inorganic materials 0.000 claims description 62
- 229910045601 alloy Inorganic materials 0.000 claims description 61
- 239000000956 alloy Substances 0.000 claims description 61
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 38
- 229910052709 silver Inorganic materials 0.000 claims description 38
- 239000004332 silver Substances 0.000 claims description 38
- BJQHLKABXJIVAM-UHFFFAOYSA-N bis(2-ethylhexyl) phthalate Chemical compound CCCCC(CC)COC(=O)C1=CC=CC=C1C(=O)OCC(CC)CCCC BJQHLKABXJIVAM-UHFFFAOYSA-N 0.000 claims description 20
- 229910001316 Ag alloy Inorganic materials 0.000 claims description 16
- 239000010410 layer Substances 0.000 claims description 12
- 239000002356 single layer Substances 0.000 claims description 4
- 239000000758 substrate Substances 0.000 description 35
- 230000007423 decrease Effects 0.000 description 13
- 150000003839 salts Chemical class 0.000 description 11
- 239000000463 material Substances 0.000 description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 9
- 239000011521 glass Substances 0.000 description 8
- 238000011156 evaluation Methods 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 230000001681 protective effect Effects 0.000 description 5
- 230000007797 corrosion Effects 0.000 description 3
- 238000005260 corrosion Methods 0.000 description 3
- 239000010936 titanium Substances 0.000 description 3
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- 239000005388 borosilicate glass Substances 0.000 description 2
- 238000002310 reflectometry Methods 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- -1 ITO Substances 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000002845 discoloration Methods 0.000 description 1
- 239000005355 lead glass Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 1
- 229910000484 niobium oxide Inorganic materials 0.000 description 1
- URLJKFSTXLNXLG-UHFFFAOYSA-N niobium(5+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Nb+5] URLJKFSTXLNXLG-UHFFFAOYSA-N 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 229920005591 polysilicon Polymers 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Images
Landscapes
- Mechanical Light Control Or Optical Switches (AREA)
- Optical Filters (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008096176A JP5564759B2 (ja) | 2008-04-02 | 2008-04-02 | 光学フィルタ装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008096176A JP5564759B2 (ja) | 2008-04-02 | 2008-04-02 | 光学フィルタ装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2009251105A JP2009251105A (ja) | 2009-10-29 |
| JP2009251105A5 JP2009251105A5 (enExample) | 2011-05-12 |
| JP5564759B2 true JP5564759B2 (ja) | 2014-08-06 |
Family
ID=41311920
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008096176A Expired - Fee Related JP5564759B2 (ja) | 2008-04-02 | 2008-04-02 | 光学フィルタ装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP5564759B2 (enExample) |
Families Citing this family (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5428805B2 (ja) | 2009-11-30 | 2014-02-26 | セイコーエプソン株式会社 | 干渉フィルター、光センサー、および光モジュール |
| JP5434719B2 (ja) | 2010-03-19 | 2014-03-05 | セイコーエプソン株式会社 | 光フィルターおよび分析機器 |
| JP2012027226A (ja) * | 2010-07-23 | 2012-02-09 | Seiko Epson Corp | 干渉フィルター、光モジュール、及び分析装置 |
| JP5682165B2 (ja) | 2010-07-23 | 2015-03-11 | セイコーエプソン株式会社 | 干渉フィルター、光モジュール、及び分析装置 |
| JP2012042584A (ja) * | 2010-08-17 | 2012-03-01 | Seiko Epson Corp | 光フィルター、光フィルターモジュール、分光測定器および光機器 |
| JP2012042651A (ja) * | 2010-08-18 | 2012-03-01 | Seiko Epson Corp | 干渉フィルター、光モジュール、及び分析装置 |
| JP5779852B2 (ja) * | 2010-08-25 | 2015-09-16 | セイコーエプソン株式会社 | 波長可変干渉フィルター、光モジュール、および光分析装置 |
| JP5707780B2 (ja) | 2010-08-25 | 2015-04-30 | セイコーエプソン株式会社 | 波長可変干渉フィルター、光モジュール、及び光分析装置 |
| JP5609542B2 (ja) | 2010-10-28 | 2014-10-22 | セイコーエプソン株式会社 | 光測定装置 |
| JP5810512B2 (ja) | 2010-11-12 | 2015-11-11 | セイコーエプソン株式会社 | 光学装置 |
| JP5630227B2 (ja) | 2010-11-15 | 2014-11-26 | セイコーエプソン株式会社 | 光フィルターおよび光フィルターの製造方法 |
| JP2012108440A (ja) * | 2010-11-19 | 2012-06-07 | Seiko Epson Corp | 干渉フィルター、光モジュール、及び光分析装置 |
| JP5720200B2 (ja) | 2010-11-25 | 2015-05-20 | セイコーエプソン株式会社 | 光モジュール、および光測定装置 |
| JP5545190B2 (ja) * | 2010-11-26 | 2014-07-09 | セイコーエプソン株式会社 | 波長可変干渉フィルターの製造方法 |
| JP5673049B2 (ja) * | 2010-12-08 | 2015-02-18 | セイコーエプソン株式会社 | 波長可変干渉フィルター、光モジュール、及び光分析装置 |
| JP5909850B2 (ja) | 2011-02-15 | 2016-04-27 | セイコーエプソン株式会社 | 波長可変干渉フィルター、光モジュール、及び光分析装置 |
| JP5845592B2 (ja) * | 2011-02-17 | 2016-01-20 | セイコーエプソン株式会社 | 波長可変干渉フィルター、光モジュール、及び光分析装置 |
| JP5910099B2 (ja) * | 2012-01-18 | 2016-04-27 | セイコーエプソン株式会社 | 干渉フィルター、光学モジュールおよび電子機器 |
| JP6035768B2 (ja) | 2012-02-16 | 2016-11-30 | セイコーエプソン株式会社 | 干渉フィルター、光学モジュール、および電子機器 |
| JP5983020B2 (ja) | 2012-05-18 | 2016-08-31 | セイコーエプソン株式会社 | 波長可変干渉フィルター、光学フィルターデバイス、光学モジュール、及び電子機器 |
| JP6390090B2 (ja) | 2013-11-19 | 2018-09-19 | セイコーエプソン株式会社 | 光学フィルターデバイス、光学モジュール、及び電子機器 |
| JP5978506B2 (ja) * | 2014-11-14 | 2016-08-24 | セイコーエプソン株式会社 | 干渉フィルター、光モジュール、及び分析装置 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01300202A (ja) * | 1988-05-27 | 1989-12-04 | Sharp Corp | 反射体および該反射体を用いた干渉装置 |
| JP4059714B2 (ja) * | 2002-07-04 | 2008-03-12 | Ｔｄｋ株式会社 | 光記録媒体 |
| JP2007002275A (ja) * | 2005-06-21 | 2007-01-11 | Toyoshima Seisakusho:Kk | 薄膜形成用材料、及びそれを用いて形成された薄膜並びにその形成方法 |
-
2008
- 2008-04-02 JP JP2008096176A patent/JP5564759B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JP2009251105A (ja) | 2009-10-29 |
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