JP5552321B2 - 電磁波の測定装置及び方法 - Google Patents

電磁波の測定装置及び方法 Download PDF

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Publication number
JP5552321B2
JP5552321B2 JP2010002481A JP2010002481A JP5552321B2 JP 5552321 B2 JP5552321 B2 JP 5552321B2 JP 2010002481 A JP2010002481 A JP 2010002481A JP 2010002481 A JP2010002481 A JP 2010002481A JP 5552321 B2 JP5552321 B2 JP 5552321B2
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JP
Japan
Prior art keywords
electromagnetic wave
waveform
time waveform
wavelet
time
Prior art date
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Expired - Fee Related
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JP2010002481A
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English (en)
Japanese (ja)
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JP2011141214A5 (enExample
JP2011141214A (ja
Inventor
道徳 塩田
敏彦 尾内
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
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Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2010002481A priority Critical patent/JP5552321B2/ja
Priority to US13/520,701 priority patent/US9104912B2/en
Priority to PCT/JP2010/007591 priority patent/WO2011083558A2/en
Priority to CN201080060768.8A priority patent/CN102696042B/zh
Priority to EP20100807494 priority patent/EP2521986A2/en
Publication of JP2011141214A publication Critical patent/JP2011141214A/ja
Publication of JP2011141214A5 publication Critical patent/JP2011141214A5/ja
Application granted granted Critical
Publication of JP5552321B2 publication Critical patent/JP5552321B2/ja
Expired - Fee Related legal-status Critical Current
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    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F18/00—Pattern recognition
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • G01N21/35—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light
    • G01N21/3581—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light using far infrared light; using Terahertz radiation
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2218/00—Aspects of pattern recognition specially adapted for signal processing
    • G06F2218/02—Preprocessing
    • G06F2218/04—Denoising
    • G06F2218/06—Denoising by applying a scale-space analysis, e.g. using wavelet analysis

Landscapes

  • Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Data Mining & Analysis (AREA)
  • Bioinformatics & Cheminformatics (AREA)
  • Bioinformatics & Computational Biology (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Evolutionary Biology (AREA)
  • Evolutionary Computation (AREA)
  • Physics & Mathematics (AREA)
  • General Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Artificial Intelligence (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
JP2010002481A 2010-01-08 2010-01-08 電磁波の測定装置及び方法 Expired - Fee Related JP5552321B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2010002481A JP5552321B2 (ja) 2010-01-08 2010-01-08 電磁波の測定装置及び方法
US13/520,701 US9104912B2 (en) 2010-01-08 2010-12-28 Apparatus and method for measuring electromagnetic wave
PCT/JP2010/007591 WO2011083558A2 (en) 2010-01-08 2010-12-28 Apparatus and method for measuring electromagnetic wave
CN201080060768.8A CN102696042B (zh) 2010-01-08 2010-12-28 用于测量电磁波的装置和方法
EP20100807494 EP2521986A2 (en) 2010-01-08 2010-12-28 Apparatus and method for measuring electromagnetic wave

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2010002481A JP5552321B2 (ja) 2010-01-08 2010-01-08 電磁波の測定装置及び方法

Publications (3)

Publication Number Publication Date
JP2011141214A JP2011141214A (ja) 2011-07-21
JP2011141214A5 JP2011141214A5 (enExample) 2013-02-21
JP5552321B2 true JP5552321B2 (ja) 2014-07-16

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010002481A Expired - Fee Related JP5552321B2 (ja) 2010-01-08 2010-01-08 電磁波の測定装置及び方法

Country Status (5)

Country Link
US (1) US9104912B2 (enExample)
EP (1) EP2521986A2 (enExample)
JP (1) JP5552321B2 (enExample)
CN (1) CN102696042B (enExample)
WO (1) WO2011083558A2 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6133112B2 (ja) * 2013-04-11 2017-05-24 Ntn株式会社 転がり軸受の診断装置および転がり軸受の診断方法
WO2019038823A1 (ja) * 2017-08-22 2019-02-28 株式会社日立ハイテクノロジーズ 遠赤外分光装置、および遠赤外分光方法
WO2024111794A1 (ko) * 2022-11-22 2024-05-30 삼성전자 주식회사 시간 평균 sar 모드를 수행하는 전자 장치 및 전자 장치의 동작 방법

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3040651B2 (ja) * 1994-02-23 2000-05-15 三菱重工業株式会社 信号処理装置
JP2735064B2 (ja) * 1996-01-31 1998-04-02 日本電気株式会社 波形解析装置
US5939721A (en) * 1996-11-06 1999-08-17 Lucent Technologies Inc. Systems and methods for processing and analyzing terahertz waveforms
JP2004101510A (ja) * 2002-07-15 2004-04-02 Tochigi Nikon Corp パルス光を用いた分光計測方法および装置
US7738111B2 (en) * 2006-06-27 2010-06-15 Lawrence Livermore National Security, Llc Ultrafast chirped optical waveform recording using referenced heterodyning and a time microscope
US8067739B2 (en) * 2007-06-22 2011-11-29 Canon Kabushiki Kaisha Photoconductive element for generation and detection of terahertz wave
US7746400B2 (en) * 2007-07-31 2010-06-29 Aptina Imaging Corporation Method, apparatus, and system providing multi-column shared readout for imagers
JP5371293B2 (ja) * 2007-08-31 2013-12-18 キヤノン株式会社 テラヘルツ波に関する情報を取得するための装置及び方法
JP4975001B2 (ja) * 2007-12-28 2012-07-11 キヤノン株式会社 波形情報取得装置及び波形情報取得方法
WO2009084712A1 (en) * 2007-12-28 2009-07-09 Canon Kabushiki Kaisha Waveform information acquisition apparatus and method
JP2009300109A (ja) * 2008-06-10 2009-12-24 Sony Corp テラヘルツ波測定方法及びテラヘルツ分光装置
JP5238370B2 (ja) 2008-06-18 2013-07-17 藤森工業株式会社 ディスプレイ用前面板および前面板用の積層フィルムの製造方法
WO2010032245A2 (en) * 2008-09-17 2010-03-25 Opticul Diagnostics Ltd. Means and methods for detecting bacteria in an aerosol sample
JP5623061B2 (ja) 2008-12-12 2014-11-12 キヤノン株式会社 検査装置及び検査方法
US20110068268A1 (en) * 2009-09-18 2011-03-24 T-Ray Science Inc. Terahertz imaging methods and apparatus using compressed sensing
JP5596982B2 (ja) * 2010-01-08 2014-10-01 キヤノン株式会社 電磁波の測定装置及び方法

Also Published As

Publication number Publication date
WO2011083558A2 (en) 2011-07-14
EP2521986A2 (en) 2012-11-14
CN102696042A (zh) 2012-09-26
WO2011083558A3 (en) 2011-08-18
JP2011141214A (ja) 2011-07-21
US9104912B2 (en) 2015-08-11
CN102696042B (zh) 2015-11-25
US20120280128A1 (en) 2012-11-08

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