JP5540305B2 - X線反射装置及びその製造方法 - Google Patents
X線反射装置及びその製造方法 Download PDFInfo
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- JP5540305B2 JP5540305B2 JP2008256136A JP2008256136A JP5540305B2 JP 5540305 B2 JP5540305 B2 JP 5540305B2 JP 2008256136 A JP2008256136 A JP 2008256136A JP 2008256136 A JP2008256136 A JP 2008256136A JP 5540305 B2 JP5540305 B2 JP 5540305B2
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- ray
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- silicon wafer
- ray reflection
- reflection device
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- 238000004519 manufacturing process Methods 0.000 title claims description 10
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 29
- 229910052710 silicon Inorganic materials 0.000 claims description 29
- 239000010703 silicon Substances 0.000 claims description 29
- 230000003287 optical effect Effects 0.000 claims description 19
- 238000000034 method Methods 0.000 claims description 11
- 239000011553 magnetic fluid Substances 0.000 claims description 10
- 238000001312 dry etching Methods 0.000 claims description 9
- 238000005498 polishing Methods 0.000 claims description 7
- 238000009499 grossing Methods 0.000 claims description 5
- 235000012431 wafers Nutrition 0.000 description 29
- 239000002184 metal Substances 0.000 description 11
- 229910052751 metal Inorganic materials 0.000 description 11
- 238000005530 etching Methods 0.000 description 8
- 230000003746 surface roughness Effects 0.000 description 7
- 239000004033 plastic Substances 0.000 description 6
- 239000000758 substrate Substances 0.000 description 6
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 239000000203 mixture Substances 0.000 description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- 238000000137 annealing Methods 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- JJWKPURADFRFRB-UHFFFAOYSA-N carbonyl sulfide Chemical compound O=C=S JJWKPURADFRFRB-UHFFFAOYSA-N 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000003365 glass fiber Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 238000003384 imaging method Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000004452 microanalysis Methods 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 230000004075 alteration Effects 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 230000005489 elastic deformation Effects 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 229920001169 thermoplastic Polymers 0.000 description 1
- 239000004416 thermosoftening plastic Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000004454 trace mineral analysis Methods 0.000 description 1
- 230000001131 transforming effect Effects 0.000 description 1
Images
Description
Claims (5)
- シリコンウェハに異方性ドライエッチングを行って、表面と垂直な方向に一括して複数の曲線状のスリットを形成する工程と、
磁性流体を使って前記複数のスリットの各側壁を研磨してX線反射面を形成する工程と、
を含んだX線反射装置の製造方法。 - X線反射面の形成後に、シリコンウェハ全体を塑性変形して曲面を含む所定の形状にする工程を含む、請求項1に記載のX線反射装置の製造方法。
- シリコンウェハと、
異方性ドライエッチングにより、前記シリコンウェハに同心円状に表面と垂直な方向に設けられた複数の曲線状のスリットと、
前記各スリットの側壁をX線の反射が可能な程度まで平滑化して得られるX線反射面と、
を含んだX線反射装置。 - 請求項3に記載のX線反射装置を、曲面を含む所定の形状に塑性変形したことを特徴とする曲面状X線反射装置。
- 請求項4に記載の曲面状X線反射装置を複数配置したことを特徴とするX線光学装置。
Priority Applications (1)
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JP2008256136A JP5540305B2 (ja) | 2008-10-01 | 2008-10-01 | X線反射装置及びその製造方法 |
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JP2008256136A JP5540305B2 (ja) | 2008-10-01 | 2008-10-01 | X線反射装置及びその製造方法 |
Publications (2)
Publication Number | Publication Date |
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JP2010085304A JP2010085304A (ja) | 2010-04-15 |
JP5540305B2 true JP5540305B2 (ja) | 2014-07-02 |
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JP2008256136A Active JP5540305B2 (ja) | 2008-10-01 | 2008-10-01 | X線反射装置及びその製造方法 |
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JP (1) | JP5540305B2 (ja) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2011146758A2 (en) * | 2010-05-19 | 2011-11-24 | Silver Eric H | Hybrid x-ray optic apparatus and methods |
JP2012037440A (ja) * | 2010-08-10 | 2012-02-23 | Tokyo Metropolitan Univ | X線光学系 |
JP5751573B2 (ja) * | 2010-10-21 | 2015-07-22 | 公立大学法人首都大学東京 | 中性子の集光および結像光学系、ならびにその製造方法 |
JP6172433B2 (ja) * | 2013-01-29 | 2017-08-02 | 国立研究開発法人産業技術総合研究所 | X線反射装置及びその製造方法 |
JP5920796B2 (ja) * | 2014-09-03 | 2016-05-18 | 公立大学法人首都大学東京 | X線反射装置の製造方法 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0833497B2 (ja) * | 1987-03-25 | 1996-03-29 | 株式会社島津製作所 | X線湾曲結晶 |
JP2658907B2 (ja) * | 1994-09-29 | 1997-09-30 | 日本電気株式会社 | 不揮発性半導体記憶装置およびその製造方法 |
JPH10132764A (ja) * | 1996-10-31 | 1998-05-22 | Sumitomo Metal Ind Ltd | 選択励起蛍光x線分析装置および選択励起蛍光x線分析方法 |
JP3604265B2 (ja) * | 1997-10-27 | 2004-12-22 | 独立行政法人科学技術振興機構 | X線回折要素及びその製造方法 |
JPH11165252A (ja) * | 1997-12-04 | 1999-06-22 | Nisca Corp | 研磨材、研磨材の製造方法及び研磨若しくは研削方法 |
JP2000351960A (ja) * | 1999-06-10 | 2000-12-19 | Nisca Corp | 研削用砥粒体 |
AU1536901A (en) * | 1999-11-24 | 2001-06-04 | Btg International Limited | X-ray zoom lens |
JP2003151986A (ja) * | 2001-11-15 | 2003-05-23 | Nec Yamagata Ltd | 半導体装置の製造方法 |
JP4025779B2 (ja) * | 2005-01-14 | 2007-12-26 | 独立行政法人 宇宙航空研究開発機構 | X線集光装置 |
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