JP5539321B2 - 安定な水性スラリー懸濁物 - Google Patents

安定な水性スラリー懸濁物 Download PDF

Info

Publication number
JP5539321B2
JP5539321B2 JP2011506239A JP2011506239A JP5539321B2 JP 5539321 B2 JP5539321 B2 JP 5539321B2 JP 2011506239 A JP2011506239 A JP 2011506239A JP 2011506239 A JP2011506239 A JP 2011506239A JP 5539321 B2 JP5539321 B2 JP 5539321B2
Authority
JP
Japan
Prior art keywords
particles
aqueous
abrasive
metal
suspended
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2011506239A
Other languages
English (en)
Japanese (ja)
Other versions
JP2011524814A (ja
Inventor
ディン，デリアング
リーメン，イェッセ
ワード，イ−ル，イー．
Original Assignee
ピーピーティー リサーチ，インク．
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ピーピーティー リサーチ，インク． filed Critical ピーピーティー リサーチ，インク．
Publication of JP2011524814A publication Critical patent/JP2011524814A/ja
Application granted granted Critical
Publication of JP5539321B2 publication Critical patent/JP5539321B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
    • C10M173/00—Lubricating compositions containing more than 10% water
    • C10M173/02—Lubricating compositions containing more than 10% water not containing mineral or fatty oils
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/02—Polishing compositions containing abrasives or grinding agents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1454—Abrasive powders, suspensions and pastes for polishing
    • C09K3/1463—Aqueous liquid suspensions
    • C—CHEMISTRY; METALLURGY
    • C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
    • C10M2201/00—Inorganic compounds or elements as ingredients in lubricant compositions
    • C10M2201/06—Metal compounds
    • C10M2201/061—Carbides; Hydrides; Nitrides
    • C—CHEMISTRY; METALLURGY
    • C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
    • C10M2201/00—Inorganic compounds or elements as ingredients in lubricant compositions
    • C10M2201/06—Metal compounds
    • C10M2201/062—Oxides; Hydroxides; Carbonates or bicarbonates
    • C—CHEMISTRY; METALLURGY
    • C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
    • C10M2201/00—Inorganic compounds or elements as ingredients in lubricant compositions
    • C10M2201/08—Inorganic acids or salts thereof
    • C10M2201/084—Inorganic acids or salts thereof containing sulfur, selenium or tellurium
    • C—CHEMISTRY; METALLURGY
    • C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
    • C10M2207/00—Organic non-macromolecular hydrocarbon compounds containing hydrogen, carbon and oxygen as ingredients in lubricant compositions
    • C10M2207/04—Ethers; Acetals; Ortho-esters; Ortho-carbonates
    • C10M2207/0406—Ethers; Acetals; Ortho-esters; Ortho-carbonates used as base material
    • C—CHEMISTRY; METALLURGY
    • C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
    • C10M2207/00—Organic non-macromolecular hydrocarbon compounds containing hydrogen, carbon and oxygen as ingredients in lubricant compositions
    • C10M2207/04—Ethers; Acetals; Ortho-esters; Ortho-carbonates
    • C10M2207/046—Hydroxy ethers
    • C—CHEMISTRY; METALLURGY
    • C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
    • C10M2215/00—Organic non-macromolecular compounds containing nitrogen as ingredients in lubricant compositions
    • C10M2215/02—Amines, e.g. polyalkylene polyamines; Quaternary amines
    • C10M2215/04—Amines, e.g. polyalkylene polyamines; Quaternary amines having amino groups bound to acyclic or cycloaliphatic carbon atoms
    • C—CHEMISTRY; METALLURGY
    • C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10N—INDEXING SCHEME ASSOCIATED WITH SUBCLASS C10M RELATING TO LUBRICATING COMPOSITIONS
    • C10N2040/00—Specified use or application for which the lubricating composition is intended
    • C10N2040/20—Metal working
    • C10N2040/22—Metal working with essential removal of material, e.g. cutting, grinding or drilling
    • C—CHEMISTRY; METALLURGY
    • C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10N—INDEXING SCHEME ASSOCIATED WITH SUBCLASS C10M RELATING TO LUBRICATING COMPOSITIONS
    • C10N2050/00—Form in which the lubricant is applied to the material being lubricated
    • C10N2050/015—Dispersions of solid lubricants

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
JP2011506239A 2008-04-24 2008-04-24 安定な水性スラリー懸濁物 Expired - Fee Related JP5539321B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/US2008/005256 WO2009131556A1 (en) 2008-04-24 2008-04-24 Stable aqueous slurry suspensions

Publications (2)

Publication Number Publication Date
JP2011524814A JP2011524814A (ja) 2011-09-08
JP5539321B2 true JP5539321B2 (ja) 2014-07-02

Family

ID=41217080

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011506239A Expired - Fee Related JP5539321B2 (ja) 2008-04-24 2008-04-24 安定な水性スラリー懸濁物

Country Status (5)

Country Link
EP (1) EP2268777A4 (zh)
JP (1) JP5539321B2 (zh)
KR (1) KR20110013417A (zh)
CN (1) CN102027101A (zh)
WO (1) WO2009131556A1 (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2019520989A (ja) * 2016-06-23 2019-07-25 ピーピーティー リサーチ，インク． 分散媒中の不活性粒子および研磨粒子を分離および懸濁させることを目的とした粘性粒子の水性、半水性、非水性スラリーサスペンションのｉｎ−ｓｉｔｕ生成

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102010014551A1 (de) * 2010-03-23 2011-09-29 Schott Solar Ag Fluide Trennmedien und deren Verwendung
CN102451623A (zh) * 2010-10-15 2012-05-16 Ppt研究公司 稳定的水性浆状悬浮液
CN102453439B (zh) * 2010-10-22 2015-07-29 安集微电子（上海）有限公司 一种化学机械抛光液
JP2012135870A (ja) * 2010-12-10 2012-07-19 Nagasaki Univ 切断方法
CN103192297B (zh) * 2012-08-24 2016-09-21 广东工业大学 一种单晶碳化硅晶片的化学集群磁流变复合加工方法
CN102983071B (zh) * 2012-12-12 2015-05-06 天津中环领先材料技术有限公司 一种使用普通砂料的单晶硅晶圆片背损伤加工方法
US11026765B2 (en) 2013-07-10 2021-06-08 H2O Tech, Inc. Stabilized, water-jet slurry apparatus and method
CN103740452B (zh) * 2013-12-20 2015-04-29 开封恒锐新金刚石制品有限公司 环保型金刚线切割用冷却液及其配制方法
CN105908154B (zh) * 2016-06-04 2018-02-02 常州大学 一种用于制备金刚石线锯的二氧化钛溶胶及其应用
CN106590904B (zh) * 2016-11-14 2019-08-06 武汉宜田科技发展有限公司 一种金刚线切割单/多晶硅棒用冷却液
CN108034486B (zh) * 2017-12-20 2020-06-19 苏州禾川化学技术服务有限公司 一种高润滑自消泡易清洗环保油性线切割液
EP3632618B1 (en) * 2018-10-04 2021-03-10 Politecnico di Milano Abrasive water-jet cutting machine and method, and composition comprising abrasive material
CN113614196B (zh) * 2019-01-31 2023-09-29 普瑞恩有限公司 用于抛光硬质基材的多峰金刚石磨料包或浆料
CN111437973B (zh) * 2020-04-15 2022-03-29 山东格润德环保科技有限公司 一种粒径分布均匀的氢氧化镁悬浮液的研磨方法及其应用
TW202311461A (zh) * 2020-07-20 2023-03-16 美商Ｃｍｃ材料股份有限公司 矽晶圓拋光組合物及方法
CN115746789B (zh) * 2022-12-12 2024-03-22 郑州磨料磨具磨削研究所有限公司 一种稳定全悬浮研磨用金刚石研磨液及其制备方法
WO2024162437A1 (ja) * 2023-02-02 2024-08-08 三井金属鉱業株式会社 研磨材スラリー

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SU956529A1 (ru) * 1981-01-05 1982-09-07 Волжский Филиал Всесоюзного Научно-Исследовательского Института Абразивов И Шлифования Суспензи дл механической обработки металлов
EP0396711A1 (fr) 1988-11-03 1990-11-14 Trimex Silicon E.U.R.L. Unite de clivage par abrasion
JP3296781B2 (ja) * 1998-04-21 2002-07-02 信越半導体株式会社 水性切削液、その製造方法、ならびにこの水性切削液を用いた切削方法
FR2789998B1 (fr) * 1999-02-18 2005-10-07 Clariant France Sa Nouvelle composition de polissage mecano-chimique d'une couche en un materiau conducteur d'aluminium ou d'alliage d'aluminium
US6054422A (en) 1999-02-19 2000-04-25 Ppt Research, Inc. Cutting and lubricating composition for use with a wire cutting apparatus
US6402978B1 (en) * 1999-05-06 2002-06-11 Mpm Ltd. Magnetic polishing fluids for polishing metal substrates
JP3721497B2 (ja) * 1999-07-15 2005-11-30 株式会社フジミインコーポレーテッド 研磨用組成物の製造方法
US6503418B2 (en) * 1999-11-04 2003-01-07 Advanced Micro Devices, Inc. Ta barrier slurry containing an organic additive
JP2001284296A (ja) * 2000-03-02 2001-10-12 Eternal Chemical Co Ltd 研磨性スラリー及びその使用
JP2002020732A (ja) * 2000-07-05 2002-01-23 Showa Denko Kk 研磨用組成物
AU2001269436A1 (en) * 2000-07-05 2002-01-14 Showa Denko K K Polishing composition and magnetic recording disk substrate polished with the polishing composition
US6602834B1 (en) 2000-08-10 2003-08-05 Ppt Resaerch, Inc. Cutting and lubricating composition for use with a wire cutting apparatus
TW575660B (en) * 2001-09-07 2004-02-11 Dai Ichi Kogyo Seiyaku Co Ltd Nonflammable water-based cutting fluid composition and nonflammable water-based cutting fluid
JP3813865B2 (ja) * 2001-12-11 2006-08-23 株式会社荏原製作所 研磨方法及び研磨装置
US7294044B2 (en) * 2005-04-08 2007-11-13 Ferro Corporation Slurry composition and method for polishing organic polymer-based ophthalmic substrates
JP2006352096A (ja) * 2005-05-17 2006-12-28 Jsr Corp 化学機械研磨用水系分散体および化学機械研磨方法、ならびに化学機械研磨用水系分散体を調製するためのキット

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2019520989A (ja) * 2016-06-23 2019-07-25 ピーピーティー リサーチ，インク． 分散媒中の不活性粒子および研磨粒子を分離および懸濁させることを目的とした粘性粒子の水性、半水性、非水性スラリーサスペンションのｉｎ−ｓｉｔｕ生成
JP7116872B2 (ja) 2016-06-23 2022-08-12 ピーピーティー リサーチ，インク． 分散媒中の不活性粒子および研磨粒子を分離および懸濁させることを目的とした粘性粒子の水性、半水性、非水性スラリーサスペンションのｉｎ－ｓｉｔｕ生成

Also Published As

Publication number Publication date
CN102027101A (zh) 2011-04-20
EP2268777A1 (en) 2011-01-05
KR20110013417A (ko) 2011-02-09
WO2009131556A1 (en) 2009-10-29
JP2011524814A (ja) 2011-09-08
EP2268777A4 (en) 2011-11-23

Similar Documents

Publication Publication Date Title
JP5539321B2 (ja) 安定な水性スラリー懸濁物
US7381690B1 (en) Stable aqueous slurry suspensions
US9394502B2 (en) Stable aqueous slurry suspensions
US8157876B2 (en) Slurry composition containing non-ionic polymer and method for use
JP7116872B2 (ja) 分散媒中の不活性粒子および研磨粒子を分離および懸濁させることを目的とした粘性粒子の水性、半水性、非水性スラリーサスペンションのｉｎ－ｓｉｔｕ生成
KR102525356B1 (ko) 코발트 파임 제어제
JP5430650B2 (ja) ワイヤ切断装置を使用するための切断及び潤滑性組成物
KR102538575B1 (ko) 코발트 연마 가속화제
JP6669331B2 (ja) 研磨組成物、及びその研磨組成物を用いた研磨方法
KR20150024275A (ko) 사파이어 표면 연마용 화학적 기계적 연마 조성물 및 그의 사용방법
JP2012172117A (ja) 固定砥粒ワイヤソー用水溶性加工液
SG180067A1 (en) Stable aqueous slurry suspensions
JP6408236B2 (ja) 研磨組成物、及び該研磨組成物を用いた基板の研磨方法
TW201240723A (en) Stable aqueous slurry suspensions
TW201215670A (en) Stable aqueous slurry suspensions
JP2013177617A (ja) 研磨用シリカゾルおよび研磨用組成物
JP5270303B2 (ja) 研磨用シリカゾルおよびその製造方法
US20160304748A1 (en) In Situ Formation of Stable Aqueous, Semi-Aqueous or Non-Aqueous Slurry Suspensions of Gelatinous Particles for Separating and Suspending Inert and Abrasive Particles in a Carrier Medium
TW201215669A (en) A cutting and lubricating composition for use with a wire cutting apparatus
KR20110038340A (ko) 와이어 쏘우용 수용성 절삭액 조성물

Legal Events

Date Code Title Description
A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20110621

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A821

Effective date: 20110621

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20121227

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20121228

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20130326

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20130402

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20130626

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20131106

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20140206

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20140214

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20140228

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20140331

R150 Certificate of patent or registration of utility model

Ref document number: 5539321

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20140430

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

LAPS Cancellation because of no payment of annual fees