EP2268777A4 - STABLE AQUEOUS EXCAVATIVE SUSPENSIONS - Google Patents

STABLE AQUEOUS EXCAVATIVE SUSPENSIONS

Info

Publication number
EP2268777A4
EP2268777A4 EP08743223A EP08743223A EP2268777A4 EP 2268777 A4 EP2268777 A4 EP 2268777A4 EP 08743223 A EP08743223 A EP 08743223A EP 08743223 A EP08743223 A EP 08743223A EP 2268777 A4 EP2268777 A4 EP 2268777A4
Authority
EP
European Patent Office
Prior art keywords
aqueous slurry
stable aqueous
slurry suspensions
suspensions
stable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP08743223A
Other languages
German (de)
English (en)
French (fr)
Other versions
EP2268777A1 (en
Inventor
Irl E Ward
Deliang Ding
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
PPT Research Inc
Original Assignee
PPT Research Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by PPT Research Inc filed Critical PPT Research Inc
Publication of EP2268777A1 publication Critical patent/EP2268777A1/en
Publication of EP2268777A4 publication Critical patent/EP2268777A4/en
Withdrawn legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
    • C10M173/00—Lubricating compositions containing more than 10% water
    • C10M173/02—Lubricating compositions containing more than 10% water not containing mineral or fatty oils
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/02—Polishing compositions containing abrasives or grinding agents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1454—Abrasive powders, suspensions and pastes for polishing
    • C09K3/1463—Aqueous liquid suspensions
    • C—CHEMISTRY; METALLURGY
    • C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
    • C10M2201/00—Inorganic compounds or elements as ingredients in lubricant compositions
    • C10M2201/06—Metal compounds
    • C10M2201/061—Carbides; Hydrides; Nitrides
    • C—CHEMISTRY; METALLURGY
    • C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
    • C10M2201/00—Inorganic compounds or elements as ingredients in lubricant compositions
    • C10M2201/06—Metal compounds
    • C10M2201/062—Oxides; Hydroxides; Carbonates or bicarbonates
    • C—CHEMISTRY; METALLURGY
    • C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
    • C10M2201/00—Inorganic compounds or elements as ingredients in lubricant compositions
    • C10M2201/08—Inorganic acids or salts thereof
    • C10M2201/084—Inorganic acids or salts thereof containing sulfur, selenium or tellurium
    • C—CHEMISTRY; METALLURGY
    • C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
    • C10M2207/00—Organic non-macromolecular hydrocarbon compounds containing hydrogen, carbon and oxygen as ingredients in lubricant compositions
    • C10M2207/04—Ethers; Acetals; Ortho-esters; Ortho-carbonates
    • C10M2207/0406—Ethers; Acetals; Ortho-esters; Ortho-carbonates used as base material
    • C—CHEMISTRY; METALLURGY
    • C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
    • C10M2207/00—Organic non-macromolecular hydrocarbon compounds containing hydrogen, carbon and oxygen as ingredients in lubricant compositions
    • C10M2207/04—Ethers; Acetals; Ortho-esters; Ortho-carbonates
    • C10M2207/046—Hydroxy ethers
    • C—CHEMISTRY; METALLURGY
    • C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
    • C10M2215/00—Organic non-macromolecular compounds containing nitrogen as ingredients in lubricant compositions
    • C10M2215/02—Amines, e.g. polyalkylene polyamines; Quaternary amines
    • C10M2215/04—Amines, e.g. polyalkylene polyamines; Quaternary amines having amino groups bound to acyclic or cycloaliphatic carbon atoms
    • C—CHEMISTRY; METALLURGY
    • C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10N—INDEXING SCHEME ASSOCIATED WITH SUBCLASS C10M RELATING TO LUBRICATING COMPOSITIONS
    • C10N2040/00—Specified use or application for which the lubricating composition is intended
    • C10N2040/20—Metal working
    • C10N2040/22—Metal working with essential removal of material, e.g. cutting, grinding or drilling
    • C—CHEMISTRY; METALLURGY
    • C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10N—INDEXING SCHEME ASSOCIATED WITH SUBCLASS C10M RELATING TO LUBRICATING COMPOSITIONS
    • C10N2050/00—Form in which the lubricant is applied to the material being lubricated
    • C10N2050/015—Dispersions of solid lubricants

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
EP08743223A 2008-04-24 2008-04-24 STABLE AQUEOUS EXCAVATIVE SUSPENSIONS Withdrawn EP2268777A4 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/US2008/005256 WO2009131556A1 (en) 2008-04-24 2008-04-24 Stable aqueous slurry suspensions

Publications (2)

Publication Number Publication Date
EP2268777A1 EP2268777A1 (en) 2011-01-05
EP2268777A4 true EP2268777A4 (en) 2011-11-23

Family

ID=41217080

Family Applications (1)

Application Number Title Priority Date Filing Date
EP08743223A Withdrawn EP2268777A4 (en) 2008-04-24 2008-04-24 STABLE AQUEOUS EXCAVATIVE SUSPENSIONS

Country Status (5)

Country Link
EP (1) EP2268777A4 (zh)
JP (1) JP5539321B2 (zh)
KR (1) KR20110013417A (zh)
CN (1) CN102027101A (zh)
WO (1) WO2009131556A1 (zh)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102010014551A1 (de) * 2010-03-23 2011-09-29 Schott Solar Ag Fluide Trennmedien und deren Verwendung
CN102451623A (zh) * 2010-10-15 2012-05-16 Ppt研究公司 稳定的水性浆状悬浮液
CN102453439B (zh) * 2010-10-22 2015-07-29 安集微电子（上海）有限公司 一种化学机械抛光液
JP2012135870A (ja) * 2010-12-10 2012-07-19 Nagasaki Univ 切断方法
CN103192297B (zh) * 2012-08-24 2016-09-21 广东工业大学 一种单晶碳化硅晶片的化学集群磁流变复合加工方法
CN102983071B (zh) * 2012-12-12 2015-05-06 天津中环领先材料技术有限公司 一种使用普通砂料的单晶硅晶圆片背损伤加工方法
US11026765B2 (en) * 2013-07-10 2021-06-08 H2O Tech, Inc. Stabilized, water-jet slurry apparatus and method
CN103740452B (zh) * 2013-12-20 2015-04-29 开封恒锐新金刚石制品有限公司 环保型金刚线切割用冷却液及其配制方法
CN105908154B (zh) * 2016-06-04 2018-02-02 常州大学 一种用于制备金刚石线锯的二氧化钛溶胶及其应用
CN108137991A (zh) * 2016-06-23 2018-06-08 Ppt研究公司 用于分离和悬浮惰性磨料颗粒的凝胶状颗粒的稳定的浆料悬浮体的原位形成
CN106590904B (zh) * 2016-11-14 2019-08-06 武汉宜田科技发展有限公司 一种金刚线切割单/多晶硅棒用冷却液
CN108034486B (zh) * 2017-12-20 2020-06-19 苏州禾川化学技术服务有限公司 一种高润滑自消泡易清洗环保油性线切割液
EP3632618B1 (en) * 2018-10-04 2021-03-10 Politecnico di Milano Abrasive water-jet cutting machine and method, and composition comprising abrasive material
JP2022523515A (ja) * 2019-01-31 2022-04-25 プレオン インコーポレイテッド 硬質基板を研磨するためのマルチモーダルダイヤモンド研磨剤パッケージ又はスラリー
CN111437973B (zh) * 2020-04-15 2022-03-29 山东格润德环保科技有限公司 一种粒径分布均匀的氢氧化镁悬浮液的研磨方法及其应用
TW202311461A (zh) * 2020-07-20 2023-03-16 美商Ｃｍｃ材料股份有限公司 矽晶圓拋光組合物及方法
CN115746789B (zh) * 2022-12-12 2024-03-22 郑州磨料磨具磨削研究所有限公司 一种稳定全悬浮研磨用金刚石研磨液及其制备方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SU956529A1 (ru) * 1981-01-05 1982-09-07 Волжский Филиал Всесоюзного Научно-Исследовательского Института Абразивов И Шлифования Суспензи дл механической обработки металлов
US20020128327A1 (en) * 2000-07-05 2002-09-12 Showa Denko K.K. Polishing composition and magnetic recording disk substrate polished with the polishing composition

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0396711A1 (fr) 1988-11-03 1990-11-14 Trimex Silicon E.U.R.L. Unite de clivage par abrasion
JP3296781B2 (ja) * 1998-04-21 2002-07-02 信越半導体株式会社 水性切削液、その製造方法、ならびにこの水性切削液を用いた切削方法
FR2789998B1 (fr) * 1999-02-18 2005-10-07 Clariant France Sa Nouvelle composition de polissage mecano-chimique d'une couche en un materiau conducteur d'aluminium ou d'alliage d'aluminium
US6054422A (en) 1999-02-19 2000-04-25 Ppt Research, Inc. Cutting and lubricating composition for use with a wire cutting apparatus
US6413441B1 (en) * 1999-05-06 2002-07-02 Mpm Ltd. Magnetic polishing fluids
JP3721497B2 (ja) * 1999-07-15 2005-11-30 株式会社フジミインコーポレーテッド 研磨用組成物の製造方法
US6503418B2 (en) * 1999-11-04 2003-01-07 Advanced Micro Devices, Inc. Ta barrier slurry containing an organic additive
JP2001284296A (ja) * 2000-03-02 2001-10-12 Eternal Chemical Co Ltd 研磨性スラリー及びその使用
JP2002020732A (ja) * 2000-07-05 2002-01-23 Showa Denko Kk 研磨用組成物
US6602834B1 (en) 2000-08-10 2003-08-05 Ppt Resaerch, Inc. Cutting and lubricating composition for use with a wire cutting apparatus
TW575660B (en) * 2001-09-07 2004-02-11 Dai Ichi Kogyo Seiyaku Co Ltd Nonflammable water-based cutting fluid composition and nonflammable water-based cutting fluid
JP3813865B2 (ja) * 2001-12-11 2006-08-23 株式会社荏原製作所 研磨方法及び研磨装置
US7294044B2 (en) * 2005-04-08 2007-11-13 Ferro Corporation Slurry composition and method for polishing organic polymer-based ophthalmic substrates
JP2006352096A (ja) * 2005-05-17 2006-12-28 Jsr Corp 化学機械研磨用水系分散体および化学機械研磨方法、ならびに化学機械研磨用水系分散体を調製するためのキット

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SU956529A1 (ru) * 1981-01-05 1982-09-07 Волжский Филиал Всесоюзного Научно-Исследовательского Института Абразивов И Шлифования Суспензи дл механической обработки металлов
US20020128327A1 (en) * 2000-07-05 2002-09-12 Showa Denko K.K. Polishing composition and magnetic recording disk substrate polished with the polishing composition

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
DATABASE WPI Week 198329, Derwent World Patents Index; AN 1983-715136, XP002661480 *
See also references of WO2009131556A1 *

Also Published As

Publication number Publication date
JP2011524814A (ja) 2011-09-08
JP5539321B2 (ja) 2014-07-02
WO2009131556A1 (en) 2009-10-29
EP2268777A1 (en) 2011-01-05
CN102027101A (zh) 2011-04-20
KR20110013417A (ko) 2011-02-09

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Effective date: 20111025

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