JP5535357B2 - リソグラフィ装置 - Google Patents
リソグラフィ装置 Download PDFInfo
- Publication number
- JP5535357B2 JP5535357B2 JP2013057644A JP2013057644A JP5535357B2 JP 5535357 B2 JP5535357 B2 JP 5535357B2 JP 2013057644 A JP2013057644 A JP 2013057644A JP 2013057644 A JP2013057644 A JP 2013057644A JP 5535357 B2 JP5535357 B2 JP 5535357B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate table
- substrate
- sensor
- support
- lithographic apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000000758 substrate Substances 0.000 claims description 240
- 238000005259 measurement Methods 0.000 claims description 65
- 238000000059 patterning Methods 0.000 claims description 49
- 230000005855 radiation Effects 0.000 claims description 49
- 230000008859 change Effects 0.000 claims description 35
- 239000003351 stiffener Substances 0.000 claims description 26
- 230000003287 optical effect Effects 0.000 claims description 14
- 208000006011 Stroke Diseases 0.000 claims description 10
- 238000001514 detection method Methods 0.000 claims description 4
- 230000004913 activation Effects 0.000 claims description 2
- 210000003128 head Anatomy 0.000 description 17
- 238000000034 method Methods 0.000 description 10
- 238000006073 displacement reaction Methods 0.000 description 9
- 230000001133 acceleration Effects 0.000 description 7
- 238000005452 bending Methods 0.000 description 7
- 238000013016 damping Methods 0.000 description 7
- 239000010410 layer Substances 0.000 description 7
- 230000008901 benefit Effects 0.000 description 5
- 238000007654 immersion Methods 0.000 description 5
- 239000007788 liquid Substances 0.000 description 5
- 238000001459 lithography Methods 0.000 description 5
- 230000002829 reductive effect Effects 0.000 description 5
- 238000009826 distribution Methods 0.000 description 3
- 238000005286 illumination Methods 0.000 description 3
- 238000004556 laser interferometry Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 230000010363 phase shift Effects 0.000 description 3
- 230000009471 action Effects 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 2
- 238000004590 computer program Methods 0.000 description 2
- 230000008878 coupling Effects 0.000 description 2
- 238000010168 coupling process Methods 0.000 description 2
- 238000005859 coupling reaction Methods 0.000 description 2
- 230000005670 electromagnetic radiation Effects 0.000 description 2
- 230000000670 limiting effect Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 230000003068 static effect Effects 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 238000003491 array Methods 0.000 description 1
- 230000002238 attenuated effect Effects 0.000 description 1
- 238000013500 data storage Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 239000002346 layers by function Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 230000005381 magnetic domain Effects 0.000 description 1
- 230000015654 memory Effects 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000036961 partial effect Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 210000001747 pupil Anatomy 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000012876 topography Methods 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
- H01L21/0274—Photolithographic processes
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B27/00—Photographic printing apparatus
- G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
- G03B27/52—Details
- G03B27/58—Baseboards, masking frames, or other holders for the sensitive material
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70783—Handling stress or warp of chucks, masks or workpieces, e.g. to compensate for imaging errors or considerations related to warpage of masks or workpieces due to their own weight
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Length Measuring Devices By Optical Means (AREA)
Description
Claims (8)
- パターニングデバイスを支持しかつ放射ビームにパターンを付与してパターン付放射ビームを形成するためのパターニングデバイス支持体と、
基板を支持するための基板支持体と、
前記パターン付放射ビームを前記基板のターゲット部分に投影するための投影システムと、
本体を有する可動オブジェクトを位置決めするように構成された位置決めシステムであって、前記本体の剛性を増加させるように構成され及び/又は前記本体内の相対運動を制振するように構成されたスティフナーを備える、位置決めシステムと、
を備え、
前記スティフナーがセンサ、アクチュエータ及びコントローラを備え、
前記センサが、前記本体の2つの部分の間の距離の変化を表す測定信号を決定するように構成され、
前記コントローラが、前記測定信号に基づいて、前記アクチュエータに作動信号を提供するように構成され、
前記アクチュエータが、前記作動信号に基づいて、前記本体に作動力を加えて、距離の変化を実質的にゼロレベルに維持するように構成された、リソグラフィ装置。 - 前記センサが、レーザ干渉計を備える、請求項1記載のリソグラフィ装置。
- 前記本体が、前記センサの測定ビームを透過する光透過性素子を備える、請求項1又は2記載のリソグラフィ装置。
- 前記本体の2つの更なる部分の間の距離の更なる変化を表す更なる測定信号を決定するように構成された光センサである、更なるセンサを備える、請求項1から3のいずれかに記載のリソグラフィ装置。
- 前記本体が、前記本体の第1の側の第1の表面と、前記本体の第2の側の第2の表面とを有し、
前記第2の側は前記第1の側の反対であり、
前記本体の前記2つの部分が前記第1の表面に近く、前記本体の前記更なる2つの部分が前記第2の表面に近く、前記コントローラが前記測定信号と前記更なる測定信号との間の距離の変化に基づいて作動信号を提供するように構成された、請求項4記載のリソグラフィ装置。 - 前記可動オブジェクトが、前記基板支持体であり、
前記基板支持体は、基板テーブル及び基板テーブル支持体を備え、
前記基板テーブルが、前記本体でありかつ前記基板を保持するよう構成され、
前記基板テーブル支持体が、前記基板テーブルを支持するよう構成された、請求項5記載のリソグラフィ装置。 - 前記基板テーブルが、ショートストロークステージであり、
前記基板テーブル支持体が、ロングストロークステージである、請求項6記載のリソグラフィ装置。 - 前記センサが、ソース及び検出ユニットを備え、
前記ソースが、放射ビームを放射するように構成され、
前記検出ユニットが、前記放射ビームを受けるように構成され、
前記ソース及び前記検出ユニットが前記基板テーブル支持体上にある、請求項6又は7記載のリソグラフィ装置。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US23050109P | 2009-07-31 | 2009-07-31 | |
US61/230,501 | 2009-07-31 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010165421A Division JP5231494B2 (ja) | 2009-07-31 | 2010-07-23 | 位置決めシステム及びリソグラフィ装置 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2014087903A Division JP5841187B2 (ja) | 2009-07-31 | 2014-04-22 | リソグラフィ装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2013131776A JP2013131776A (ja) | 2013-07-04 |
JP5535357B2 true JP5535357B2 (ja) | 2014-07-02 |
Family
ID=43526705
Family Applications (4)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010165421A Active JP5231494B2 (ja) | 2009-07-31 | 2010-07-23 | 位置決めシステム及びリソグラフィ装置 |
JP2013057644A Active JP5535357B2 (ja) | 2009-07-31 | 2013-03-21 | リソグラフィ装置 |
JP2014087903A Active JP5841187B2 (ja) | 2009-07-31 | 2014-04-22 | リソグラフィ装置 |
JP2015222182A Active JP6153586B2 (ja) | 2009-07-31 | 2015-11-12 | 位置決めシステム、リソグラフィ装置及び方法 |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010165421A Active JP5231494B2 (ja) | 2009-07-31 | 2010-07-23 | 位置決めシステム及びリソグラフィ装置 |
Family Applications After (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2014087903A Active JP5841187B2 (ja) | 2009-07-31 | 2014-04-22 | リソグラフィ装置 |
JP2015222182A Active JP6153586B2 (ja) | 2009-07-31 | 2015-11-12 | 位置決めシステム、リソグラフィ装置及び方法 |
Country Status (6)
Country | Link |
---|---|
US (1) | US8482719B2 (ja) |
JP (4) | JP5231494B2 (ja) |
KR (1) | KR101169350B1 (ja) |
CN (1) | CN101989050B (ja) |
NL (1) | NL2005013A (ja) |
TW (1) | TWI418923B (ja) |
Families Citing this family (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL2008272A (en) * | 2011-03-09 | 2012-09-11 | Asml Netherlands Bv | Lithographic apparatus. |
NL2008353A (nl) | 2011-03-30 | 2012-10-02 | Asml Netherlands Bv | Lithographic apparatus and method. |
NL2008695A (en) * | 2011-05-25 | 2012-11-27 | Asml Netherlands Bv | Lithographic apparatus comprising substrate table. |
NL2009824A (en) | 2011-12-21 | 2013-06-24 | Asml Netherlands Bv | Lithographic apparatus with a deformation sensor. |
US9207549B2 (en) * | 2011-12-29 | 2015-12-08 | Nikon Corporation | Exposure apparatus and exposure method, and device manufacturing method with encoder of higher reliability for position measurement |
WO2013164145A1 (en) * | 2012-05-04 | 2013-11-07 | Asml Holding N.V. | Active torsion mode control for stage |
TWI468880B (zh) * | 2012-06-15 | 2015-01-11 | Asml Netherlands Bv | 定位系統、微影裝置及器件製造方法 |
US9529280B2 (en) * | 2013-12-06 | 2016-12-27 | Kla-Tencor Corporation | Stage apparatus for semiconductor inspection and lithography systems |
JP6420895B2 (ja) * | 2014-08-06 | 2018-11-07 | エーエスエムエル ネザーランズ ビー.ブイ. | リソグラフィ装置及び物体位置決めシステム |
TWI614587B (zh) * | 2015-09-15 | 2018-02-11 | Huang Tian Xing | 對準方法、對位系統,及黃光微影製程 |
CN111929992A (zh) | 2015-09-30 | 2020-11-13 | 株式会社尼康 | 移动体装置、曝光装置、平面显示器的制造方法、及元件制造方法、以及物体的移动方法 |
CN108139688A (zh) * | 2015-09-30 | 2018-06-08 | 株式会社尼康 | 曝光装置、平面显示器的制造方法、组件制造方法、及曝光方法 |
KR20180059814A (ko) * | 2015-09-30 | 2018-06-05 | 가부시키가이샤 니콘 | 노광 장치, 플랫 패널 디스플레이의 제조 방법, 및 디바이스 제조 방법 |
JP6462614B2 (ja) | 2016-03-16 | 2019-01-30 | 東芝メモリ株式会社 | パターン精度検出装置及び加工システム |
DE102017002542A1 (de) * | 2017-03-16 | 2018-09-20 | Applied Materials, Inc. (N.D.Ges.D. Staates Delaware) | Vorrichtung zum Halten, Positionieren und/oder Bewegen eines Objekts |
JP7285217B2 (ja) * | 2017-04-20 | 2023-06-01 | エーエスエムエル ネザーランズ ビー.ブイ. | 支持構造、方法、及びリソグラフィ装置 |
CN111380464B (zh) * | 2018-12-28 | 2021-05-07 | 上海微电子装备(集团)股份有限公司 | 一种光栅尺的安装装置、安装方法、光栅测量系统及光刻机 |
KR20210116608A (ko) * | 2019-02-26 | 2021-09-27 | 에이에스엠엘 네델란즈 비.브이. | 검사 장치, 리소그래피 장치, 측정 방법 |
EP3742471A1 (en) * | 2019-05-24 | 2020-11-25 | ASML Netherlands B.V. | Stage anti-fretting mechanism for roller bearing lifetime improvement |
Family Cites Families (41)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
SE9503873L (sv) * | 1995-11-02 | 1997-04-21 | Reflex Instr Ab | Anordning för att avkänna elastisk deformation hos ett verktygskaft i en verktygsmaskin |
JP3689949B2 (ja) * | 1995-12-19 | 2005-08-31 | 株式会社ニコン | 投影露光装置、及び該投影露光装置を用いたパターン形成方法 |
JP3733174B2 (ja) * | 1996-06-19 | 2006-01-11 | キヤノン株式会社 | 走査型投影露光装置 |
US6330052B1 (en) * | 1997-06-13 | 2001-12-11 | Canon Kabushiki Kaisha | Exposure apparatus and its control method, stage apparatus, and device manufacturing method |
JP4194160B2 (ja) * | 1998-02-19 | 2008-12-10 | キヤノン株式会社 | 投影露光装置 |
JP2001012540A (ja) * | 1999-06-29 | 2001-01-16 | Canon Inc | 除振装置ならびにデバイス製造装置および方法 |
JP3720680B2 (ja) | 2000-06-16 | 2005-11-30 | キヤノン株式会社 | ステージ装置、露光装置およびデバイス製造方法 |
US6538720B2 (en) * | 2001-02-28 | 2003-03-25 | Silicon Valley Group, Inc. | Lithographic tool with dual isolation system and method for configuring the same |
JP4198338B2 (ja) * | 2001-07-09 | 2008-12-17 | 株式会社 東北テクノアーチ | ステージ装置 |
JP3902942B2 (ja) * | 2001-11-13 | 2007-04-11 | キヤノン株式会社 | 除振装置及びその制御方法、並びに該除振装置を有する露光装置 |
JP2003202051A (ja) * | 2002-01-04 | 2003-07-18 | Canon Inc | 除振装置 |
JP3919560B2 (ja) | 2002-02-26 | 2007-05-30 | キヤノン株式会社 | 振動制御装置及び振動制御方法及び露光装置及びデバイスの製造方法 |
US6881963B2 (en) * | 2002-11-08 | 2005-04-19 | Canon Kabushiki Kaisha | Vibration control of an object |
JP2004164029A (ja) | 2002-11-08 | 2004-06-10 | Canon Inc | 弾性振動の制御装置 |
EP1513018A1 (en) * | 2003-09-04 | 2005-03-09 | ASML Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7133115B2 (en) * | 2003-10-14 | 2006-11-07 | Canon Kabushiki Kaisha | Positioning device, exposure apparatus using the positioning device, and device production method |
JP2005123287A (ja) * | 2003-10-15 | 2005-05-12 | Canon Inc | 位置決め装置 |
US7102729B2 (en) * | 2004-02-03 | 2006-09-05 | Asml Netherlands B.V. | Lithographic apparatus, measurement system, and device manufacturing method |
JP2005268608A (ja) * | 2004-03-19 | 2005-09-29 | Sumitomo Heavy Ind Ltd | ステージ装置 |
US7256871B2 (en) * | 2004-07-27 | 2007-08-14 | Asml Netherlands B.V. | Lithographic apparatus and method for calibrating the same |
US7924406B2 (en) * | 2005-07-13 | 2011-04-12 | Asml Netherlands B.V. | Stage apparatus, lithographic apparatus and device manufacturing method having switch device for two illumination channels |
JP2007035780A (ja) * | 2005-07-25 | 2007-02-08 | Hitachi High-Technologies Corp | 回路パターン製造装置 |
US7348574B2 (en) * | 2005-09-02 | 2008-03-25 | Asml Netherlands, B.V. | Position measurement system and lithographic apparatus |
EP1931947A2 (en) * | 2005-09-21 | 2008-06-18 | Koninklijke Philips Electronics N.V. | System for detecting motion of a body |
JP5040657B2 (ja) * | 2005-10-24 | 2012-10-03 | 株式会社ニコン | 露光装置、露光方法、デバイスの製造方法、デバイス組立方法 |
US7602489B2 (en) * | 2006-02-22 | 2009-10-13 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
KR100671241B1 (ko) * | 2006-05-12 | 2007-01-19 | 충주대학교 산학협력단 | 공극 변위 측정을 이용한 평면 스테이지 면내 위치 검출방법 및 장치 |
JP2007310019A (ja) * | 2006-05-16 | 2007-11-29 | Nsk Ltd | 位置決めテーブル装置 |
US7630059B2 (en) * | 2006-07-24 | 2009-12-08 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
KR101556493B1 (ko) * | 2006-08-31 | 2015-10-01 | 가부시키가이샤 니콘 | 이동체 구동 시스템 및 이동체 구동 방법, 패턴 형성 장치 및 방법, 노광 장치 및 방법, 디바이스 제조 방법, 그리고 결정 방법 |
US7714981B2 (en) * | 2006-10-30 | 2010-05-11 | Asml Netherlands B.V. | Lithographic apparatus and method |
US7545520B2 (en) * | 2006-11-15 | 2009-06-09 | Asml Netherlands B.V. | System and method for CD determination using an alignment sensor of a lithographic apparatus |
JP4386293B2 (ja) | 2007-01-12 | 2009-12-16 | キヤノン株式会社 | 振動制御装置及び振動制御方法及び露光装置及びデバイスの製造方法 |
US7782446B2 (en) * | 2007-03-01 | 2010-08-24 | Asml Netherlands B.V. | Stage system and lithographic apparatus comprising such stage system |
US7903866B2 (en) * | 2007-03-29 | 2011-03-08 | Asml Netherlands B.V. | Measurement system, lithographic apparatus and method for measuring a position dependent signal of a movable object |
US7710540B2 (en) | 2007-04-05 | 2010-05-04 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US8194232B2 (en) * | 2007-07-24 | 2012-06-05 | Nikon Corporation | Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, position control method and position control system, and device manufacturing method |
US8384881B2 (en) * | 2007-09-28 | 2013-02-26 | Asml Netherlands B.V. | Lithographic apparatus, stage apparatus and device manufacturing method |
NL1036511A1 (nl) * | 2008-02-13 | 2009-08-14 | Asml Netherlands Bv | Movable support, position control system, lithographic apparatus and method of controlling a position of an exchangeable object. |
US8325325B2 (en) * | 2008-09-22 | 2012-12-04 | Nikon Corporation | Movable body apparatus, movable body drive method, exposure apparatus, exposure method, and device manufacturing method |
JP5549203B2 (ja) * | 2009-12-01 | 2014-07-16 | セイコーエプソン株式会社 | 光学式位置検出装置、ハンド装置およびタッチパネル |
-
2010
- 2010-07-01 NL NL2005013A patent/NL2005013A/en not_active Application Discontinuation
- 2010-07-06 US US12/830,963 patent/US8482719B2/en active Active
- 2010-07-16 TW TW099123550A patent/TWI418923B/zh active
- 2010-07-23 JP JP2010165421A patent/JP5231494B2/ja active Active
- 2010-07-29 KR KR1020100073450A patent/KR101169350B1/ko active IP Right Grant
- 2010-07-30 CN CN2010102437679A patent/CN101989050B/zh active Active
-
2013
- 2013-03-21 JP JP2013057644A patent/JP5535357B2/ja active Active
-
2014
- 2014-04-22 JP JP2014087903A patent/JP5841187B2/ja active Active
-
2015
- 2015-11-12 JP JP2015222182A patent/JP6153586B2/ja active Active
Also Published As
Publication number | Publication date |
---|---|
JP2016028306A (ja) | 2016-02-25 |
US8482719B2 (en) | 2013-07-09 |
JP5231494B2 (ja) | 2013-07-10 |
JP2011035392A (ja) | 2011-02-17 |
CN101989050B (zh) | 2012-11-28 |
KR101169350B1 (ko) | 2012-07-30 |
JP6153586B2 (ja) | 2017-06-28 |
KR20110013305A (ko) | 2011-02-09 |
US20110026004A1 (en) | 2011-02-03 |
JP2014135519A (ja) | 2014-07-24 |
JP5841187B2 (ja) | 2016-01-13 |
JP2013131776A (ja) | 2013-07-04 |
TWI418923B (zh) | 2013-12-11 |
CN101989050A (zh) | 2011-03-23 |
NL2005013A (en) | 2011-02-02 |
TW201116923A (en) | 2011-05-16 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP6153586B2 (ja) | 位置決めシステム、リソグラフィ装置及び方法 | |
JP5275210B2 (ja) | リソグラフィ装置 | |
US7903866B2 (en) | Measurement system, lithographic apparatus and method for measuring a position dependent signal of a movable object | |
JP5367779B2 (ja) | ステージ装置、リソグラフィ装置及びオブジェクトテーブルの位置決め方法 | |
TWI649637B (zh) | 微影裝置、微影投影裝置及器件製造方法 | |
JP4909204B2 (ja) | ケーブル接続、ケーブル接続用の制御システム、およびケーブル接続を経て振動が第1の対象から第2の対象へと伝達されることを軽減する方法 | |
JP6957692B2 (ja) | リソグラフィ装置 | |
JP2020517980A (ja) | 支持構造、方法、及びリソグラフィ装置 | |
JP5919395B2 (ja) | 可動ステージシステム及びリソグラフィ装置 | |
JP5196669B2 (ja) | リソグラフィ装置 | |
JP5145379B2 (ja) | リソグラフィ装置及びデバイス製造方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20130326 |
|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20130326 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20140214 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20140326 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20140422 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 5535357 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |