JP5534549B2 - 転写装置、転写方法、及びデバイス製造方法 - Google Patents

転写装置、転写方法、及びデバイス製造方法 Download PDF

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Publication number
JP5534549B2
JP5534549B2 JP2009060400A JP2009060400A JP5534549B2 JP 5534549 B2 JP5534549 B2 JP 5534549B2 JP 2009060400 A JP2009060400 A JP 2009060400A JP 2009060400 A JP2009060400 A JP 2009060400A JP 5534549 B2 JP5534549 B2 JP 5534549B2
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substrate
longitudinal direction
pattern
exposure
stage
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Japanese (ja)
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JP2010217207A5 (enrdf_load_stackoverflow
JP2010217207A (ja
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達雄 福井
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Nikon Corp
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Nikon Corp
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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2009060400A 2009-03-13 2009-03-13 転写装置、転写方法、及びデバイス製造方法 Active JP5534549B2 (ja)

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JP2009060400A JP5534549B2 (ja) 2009-03-13 2009-03-13 転写装置、転写方法、及びデバイス製造方法

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JP2009060400A JP5534549B2 (ja) 2009-03-13 2009-03-13 転写装置、転写方法、及びデバイス製造方法

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JP2010217207A JP2010217207A (ja) 2010-09-30
JP2010217207A5 JP2010217207A5 (enrdf_load_stackoverflow) 2012-04-05
JP5534549B2 true JP5534549B2 (ja) 2014-07-02

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Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106919003B (zh) * 2011-11-04 2018-10-16 株式会社尼康 图案形成方法及装置、图案曝光方法、以及元件制造方法
JP2013115332A (ja) * 2011-11-30 2013-06-10 Beac:Kk 露光装置、露光装置ユニット及び被露光部材とマスクとのアライメント方法
TW201517621A (zh) * 2013-10-15 2015-05-01 Fujifilm Corp 攝影模組的製造方法以及攝影模組的製造裝置
JP7175409B2 (ja) * 2017-09-13 2022-11-18 株式会社オーク製作所 露光装置
JP7175149B2 (ja) * 2018-09-27 2022-11-18 株式会社オーク製作所 露光装置および露光方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2773147B2 (ja) * 1988-08-19 1998-07-09 株式会社ニコン 露光装置の位置合わせ装置及び方法
JP3477838B2 (ja) * 1993-11-11 2003-12-10 株式会社ニコン 走査型露光装置及び露光方法
JPH0855784A (ja) * 1994-08-16 1996-02-27 Nikon Corp 露光装置
JP4132095B2 (ja) * 1995-03-14 2008-08-13 株式会社ニコン 走査型露光装置
JP3204137B2 (ja) * 1996-12-25 2001-09-04 ウシオ電機株式会社 帯状ワークの投影露光装置
JP3376935B2 (ja) * 1999-01-25 2003-02-17 ウシオ電機株式会社 帯状ワークの露光装置
JP4499482B2 (ja) * 2004-06-03 2010-07-07 東レエンジニアリング株式会社 帯状ワークの露光装置
JP2006098727A (ja) * 2004-09-29 2006-04-13 Fuji Photo Film Co Ltd 伸縮状態の検出手段を設けた長尺の可撓性記録媒体と、この可撓性記録媒体に伸縮状態を補正して画像を描画可能な描画方法及び装置
JP2006102991A (ja) * 2004-09-30 2006-04-20 Fuji Photo Film Co Ltd 画像記録装置及び画像記録方法
JP4491311B2 (ja) * 2004-09-30 2010-06-30 富士フイルム株式会社 画像記録装置及び画像記録方法
JP2006106505A (ja) * 2004-10-07 2006-04-20 Fuji Photo Film Co Ltd 画像記録装置及び画像記録方法
JP2006337873A (ja) * 2005-06-03 2006-12-14 Fujifilm Holdings Corp 露光装置及び露光方法
JP4542495B2 (ja) * 2005-10-19 2010-09-15 株式会社目白プレシジョン 投影露光装置及びその投影露光方法

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