JP5485250B2 - シリコン細棒の製造方法及び製造装置 - Google Patents
シリコン細棒の製造方法及び製造装置 Download PDFInfo
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- JP5485250B2 JP5485250B2 JP2011273623A JP2011273623A JP5485250B2 JP 5485250 B2 JP5485250 B2 JP 5485250B2 JP 2011273623 A JP2011273623 A JP 2011273623A JP 2011273623 A JP2011273623 A JP 2011273623A JP 5485250 B2 JP5485250 B2 JP 5485250B2
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- 229910052710 silicon Inorganic materials 0.000 title claims description 25
- 239000010703 silicon Substances 0.000 title claims description 25
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title claims description 24
- 238000004519 manufacturing process Methods 0.000 title claims description 12
- 238000005520 cutting process Methods 0.000 claims description 57
- 238000000034 method Methods 0.000 claims description 42
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims description 21
- 239000007788 liquid Substances 0.000 claims description 10
- 239000000463 material Substances 0.000 claims description 9
- 239000002826 coolant Substances 0.000 description 17
- 238000001816 cooling Methods 0.000 description 11
- 229920005591 polysilicon Polymers 0.000 description 7
- 230000008021 deposition Effects 0.000 description 6
- 239000010802 sludge Substances 0.000 description 6
- 230000008646 thermal stress Effects 0.000 description 6
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 5
- 230000035882 stress Effects 0.000 description 5
- 101100008047 Caenorhabditis elegans cut-3 gene Proteins 0.000 description 4
- 101100008048 Caenorhabditis elegans cut-4 gene Proteins 0.000 description 4
- 239000000110 cooling liquid Substances 0.000 description 4
- 101100008044 Caenorhabditis elegans cut-1 gene Proteins 0.000 description 3
- 101100008046 Caenorhabditis elegans cut-2 gene Proteins 0.000 description 3
- 238000000137 annealing Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 238000003698 laser cutting Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000004094 surface-active agent Substances 0.000 description 2
- 101100008049 Caenorhabditis elegans cut-5 gene Proteins 0.000 description 1
- 101100008050 Caenorhabditis elegans cut-6 gene Proteins 0.000 description 1
- 239000005046 Chlorosilane Substances 0.000 description 1
- 206010067482 No adverse event Diseases 0.000 description 1
- POFAUXBEMGMSAV-UHFFFAOYSA-N [Si].[Cl] Chemical class [Si].[Cl] POFAUXBEMGMSAV-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 239000012809 cooling fluid Substances 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 230000000593 degrading effect Effects 0.000 description 1
- 230000032798 delamination Effects 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 238000011068 loading method Methods 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 238000010297 mechanical methods and process Methods 0.000 description 1
- 230000005226 mechanical processes and functions Effects 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 238000011112 process operation Methods 0.000 description 1
- 239000012495 reaction gas Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- -1 silicon halogen compounds Chemical class 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 229910021642 ultra pure water Inorganic materials 0.000 description 1
- 239000012498 ultrapure water Substances 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
- 239000000080 wetting agent Substances 0.000 description 1
- 238000004857 zone melting Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/04—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by tools other than rotary type, e.g. reciprocating tools
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0058—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
- B28D5/0076—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for removing dust, e.g. by spraying liquids; for lubricating, cooling or cleaning tool or work
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/0604—Shaping the laser beam, e.g. by masks or multi-focusing by a combination of beams
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/14—Working by laser beam, e.g. welding, cutting or boring using a fluid stream, e.g. a jet of gas, in conjunction with the laser beam; Nozzles therefor
- B23K26/146—Working by laser beam, e.g. welding, cutting or boring using a fluid stream, e.g. a jet of gas, in conjunction with the laser beam; Nozzles therefor the fluid stream containing a liquid
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/38—Removing material by boring or cutting
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/40—Removing material taking account of the properties of the material involved
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B26—HAND CUTTING TOOLS; CUTTING; SEVERING
- B26D—CUTTING; DETAILS COMMON TO MACHINES FOR PERFORATING, PUNCHING, CUTTING-OUT, STAMPING-OUT OR SEVERING
- B26D1/00—Cutting through work characterised by the nature or movement of the cutting member or particular materials not otherwise provided for; Apparatus or machines therefor; Cutting members therefor
- B26D1/01—Cutting through work characterised by the nature or movement of the cutting member or particular materials not otherwise provided for; Apparatus or machines therefor; Cutting members therefor involving a cutting member which does not travel with the work
- B26D1/46—Cutting through work characterised by the nature or movement of the cutting member or particular materials not otherwise provided for; Apparatus or machines therefor; Cutting members therefor involving a cutting member which does not travel with the work having an endless band-knife or the like
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B26—HAND CUTTING TOOLS; CUTTING; SEVERING
- B26D—CUTTING; DETAILS COMMON TO MACHINES FOR PERFORATING, PUNCHING, CUTTING-OUT, STAMPING-OUT OR SEVERING
- B26D1/00—Cutting through work characterised by the nature or movement of the cutting member or particular materials not otherwise provided for; Apparatus or machines therefor; Cutting members therefor
- B26D1/01—Cutting through work characterised by the nature or movement of the cutting member or particular materials not otherwise provided for; Apparatus or machines therefor; Cutting members therefor involving a cutting member which does not travel with the work
- B26D1/547—Cutting through work characterised by the nature or movement of the cutting member or particular materials not otherwise provided for; Apparatus or machines therefor; Cutting members therefor involving a cutting member which does not travel with the work having a wire-like cutting member
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B26—HAND CUTTING TOOLS; CUTTING; SEVERING
- B26D—CUTTING; DETAILS COMMON TO MACHINES FOR PERFORATING, PUNCHING, CUTTING-OUT, STAMPING-OUT OR SEVERING
- B26D7/00—Details of apparatus for cutting, cutting-out, stamping-out, punching, perforating, or severing by means other than cutting
- B26D7/01—Means for holding or positioning work
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/02—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills
- B28D5/022—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills by cutting with discs or wheels
- B28D5/029—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills by cutting with discs or wheels with a plurality of cutting blades
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/04—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by tools other than rotary type, e.g. reciprocating tools
- B28D5/045—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by tools other than rotary type, e.g. reciprocating tools by cutting with wires or closed-loop blades
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/02—Silicon
- C01B33/021—Preparation
- C01B33/027—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material
- C01B33/035—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material by decomposition or reduction of gaseous or vaporised silicon compounds in the presence of heated filaments of silicon, carbon or a refractory metal, e.g. tantalum or tungsten, or in the presence of heated silicon rods on which the formed silicon is deposited, a silicon rod being obtained, e.g. Siemens process
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/50—Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Forests & Forestry (AREA)
- Inorganic Chemistry (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Processing Of Stones Or Stones Resemblance Materials (AREA)
Description
まずは、シリコン製のロッドを準備すべきである。好ましくは、それは、多結晶シリコン製のロッドであり、例えばシーメンス法での析出によって作成できるようなロッドである。
まずは、シリコン製のロッドを準備する。それは、好ましくは多結晶シリコン、例えばシーメンス法での析出によって製造された多結晶シリコンである。
Claims (6)
- 以下の、100mmより大きい直径を有する多結晶シリコン製のロッドを準備する工程a)と、鋸引き装置によって前記ロッドから規定の厚さの板状物を順次切り取る工程b)と、その際、前記ロッドは、連続する2つの切断の間にそれぞれ90゜だけ又は180゜だけ軸上で回転され、こうして連続する4つの切断のうち、該4つの切断のそれぞれ2つが対になって、ロッドの半径方向に向かい合う側で行われるか、又は板状物の切り取りが、共通して同時に前記ロッドの半径方向に向かい合う側で行われ、切り取られた板状物を鋸引きして矩形の断面を有する複数の細棒とする工程c)とを含む、シリコン細棒の製造方法。
- 鋸引き装置は、バンドソーもしくはワイヤソーであるか、又は複数の切断工具を含む1つもしくは複数のシャフトである、請求項1に記載の方法。
- 以下の、100mmより大きい直径を有する多結晶シリコン製のロッドを準備する工程a)と、多数の垂直な切断を、第一の鋸引き装置によって前記ロッドの全長にわたって作成する工程b)と、前記ロッドの長手方向において第二の鋸引き装置によって水平な切断を作成して、矩形の断面を有する複数の細棒を前記ロッドから分離する工程c)とを含み、前記工程b)において、個々の切断部は互いに間隔が開けられており、その切断部の間隔と切断深さは、矩形の断面を有する作成されるべき細棒の所望の辺長に従って行われ、その際、前記工程b)及びc)は、順次、何度も続けて行われ、かつ前記ロッドは、相次いでの工程c)による2つの切断の間にそれぞれ90゜だけ又は180゜だけ軸上で回転され、こうして、相次いでの工程c)による4つの切断のうち、該4つの切断のそれぞれ2つが対になって、前記ロッドの半径方向に向かい合う側で行われる、シリコン細棒の製造方法。
- 第一の鋸引き装置が、複数の鋸刃を備えた1つもしくは複数のシャフトを含む、請求項3に記載の方法。
- 第一の鋸引き装置が、複数の液体中で誘導されるレーザを含む、請求項3に記載の方法。
- 第二の鋸引き装置が、バンドソーもしくはワイヤソー又は複数の切断工具を含む1つもしくは複数のシャフトを含む、請求項3から5までのいずれか1項に記載の方法。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102010063407A DE102010063407A1 (de) | 2010-12-17 | 2010-12-17 | Verfahren und Vorrichtung zur Herstellung von Silicium-Dünnstäben |
DE102010063407.7 | 2010-12-17 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2012134489A JP2012134489A (ja) | 2012-07-12 |
JP5485250B2 true JP5485250B2 (ja) | 2014-05-07 |
Family
ID=45093583
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2011273623A Active JP5485250B2 (ja) | 2010-12-17 | 2011-12-14 | シリコン細棒の製造方法及び製造装置 |
Country Status (8)
Country | Link |
---|---|
US (1) | US20120151969A1 (ja) |
EP (1) | EP2465625B1 (ja) |
JP (1) | JP5485250B2 (ja) |
KR (1) | KR101408552B1 (ja) |
CN (1) | CN102555087B (ja) |
CA (1) | CA2758487C (ja) |
DE (1) | DE102010063407A1 (ja) |
ES (1) | ES2425343T3 (ja) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102012218748B4 (de) | 2012-10-15 | 2014-02-13 | Wacker Chemie Ag | Trocknen von Polysilicium |
DE102012218941A1 (de) | 2012-10-17 | 2014-04-17 | Wacker Chemie Ag | Reaktor und Verfahren zur endothermen Gasphasenreaktion in einem Reaktor |
JP6418778B2 (ja) * | 2014-05-07 | 2018-11-07 | 信越化学工業株式会社 | 多結晶シリコン棒、多結晶シリコン棒の製造方法、および、単結晶シリコン |
CN108556159B (zh) * | 2018-01-11 | 2023-12-15 | 王金生 | 一种多锯片切割装置 |
WO2020246152A1 (ja) * | 2019-06-06 | 2020-12-10 | 株式会社トクヤマ | 多結晶シリコンロッドの切断方法、多結晶シリコンロッドのカットロッドの製造方法、多結晶シリコンロッドのナゲットの製造方法、および多結晶シリコンロッドの切断装置 |
CN110587831B (zh) * | 2019-09-16 | 2022-02-01 | 顺德中山大学太阳能研究院 | 一种用于光伏双玻组件的线切割设备 |
CN113134716B (zh) * | 2021-04-28 | 2022-06-10 | 苏州苏驼通信科技股份有限公司 | 一种智能无线通信设备散热器件成型制备工艺 |
CN113292238A (zh) * | 2021-06-04 | 2021-08-24 | 江苏立晶工业科技有限公司 | 高硼硅玻璃制品环切装置 |
CN113681738B (zh) * | 2021-09-24 | 2022-07-19 | 燕山大学 | 一种用于多线切割机的振动平台切割辅助装置 |
CN114290213B (zh) * | 2022-01-19 | 2023-08-11 | 太原北方重工机械有限公司 | 一种钢材料自动化加工用切割装置 |
Family Cites Families (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US294997A (en) * | 1884-03-11 | Ments | ||
DE1105396B (de) | 1957-05-29 | 1961-04-27 | Siemens Ag | Verfahren und Vorrichtung zur Herstellung von Reinstsilicium |
NL225538A (ja) | 1955-11-02 | |||
US3771397A (en) * | 1972-06-14 | 1973-11-13 | Morbark Ind Inc | Slab guide for vertically adjustable sawing apparatus |
CA1027461A (en) * | 1976-02-13 | 1978-03-07 | J. Kenneth Seaman | Method and apparatus for cutting wood |
US4149577A (en) * | 1977-03-24 | 1979-04-17 | Matusewicz William P | Cant forming machine |
US4773951A (en) * | 1986-01-07 | 1988-09-27 | Atlantic Richfield Company | Method of manufacturing wafers of semiconductor material |
EP0294997A3 (en) * | 1987-06-12 | 1990-01-31 | Erling Jim Andersen | Method and apparatus for sawing logs |
US5806401A (en) * | 1994-01-04 | 1998-09-15 | Rajala; Edward | Satellite sawmill with adjustable saws and automatic sawbolt centering device |
US5802939A (en) * | 1996-07-18 | 1998-09-08 | Wiand; Richard K. | Table top band saw |
US6562698B2 (en) | 1999-06-08 | 2003-05-13 | Kulicke & Soffa Investments, Inc. | Dual laser cutting of wafers |
DE10019601B4 (de) * | 2000-04-20 | 2006-09-14 | Wacker Chemie Ag | Verfahren zur Herstellung eines polykristallinen Siliciumstabes |
JP3881647B2 (ja) * | 2003-10-07 | 2007-02-14 | 住友チタニウム株式会社 | 多結晶シリコンロッド及びその製造方法 |
JP4341449B2 (ja) * | 2004-03-31 | 2009-10-07 | 三菱マテリアル株式会社 | 多結晶シリコンロッドの切断装置 |
JP2006073768A (ja) | 2004-09-02 | 2006-03-16 | Katsuyo Tawara | シリコンウエハの加工方法 |
JP2009178984A (ja) * | 2008-01-31 | 2009-08-13 | Jcm:Kk | シリコンインゴット用角切断バンドソー装置及びシリコンインゴットの加工方法 |
JP5137670B2 (ja) * | 2008-04-23 | 2013-02-06 | 信越化学工業株式会社 | 多結晶シリコンロッドの製造方法 |
CN201333764Y (zh) * | 2008-07-21 | 2009-10-28 | 浙江昱辉阳光能源有限公司 | 一种切割硅棒的锯床 |
US20110177626A1 (en) | 2008-09-30 | 2011-07-21 | Dennis Depesa | Method Of Determining An Amount of Impurities That A Contaminating Material Contributes To High Purity Silicon And Furnace For Treating High Purity Silicon |
US8425279B2 (en) | 2008-09-30 | 2013-04-23 | Misubishi Polycrystalline Silicon America Corporation (MIPSA) | Apparatus for manufacturing seeds for polycrystalline silicon manufacture |
-
2010
- 2010-12-17 DE DE102010063407A patent/DE102010063407A1/de not_active Withdrawn
-
2011
- 2011-11-15 CA CA2758487A patent/CA2758487C/en not_active Expired - Fee Related
- 2011-12-07 EP EP11192279.5A patent/EP2465625B1/de active Active
- 2011-12-07 ES ES11192279T patent/ES2425343T3/es active Active
- 2011-12-12 US US13/316,672 patent/US20120151969A1/en not_active Abandoned
- 2011-12-14 JP JP2011273623A patent/JP5485250B2/ja active Active
- 2011-12-14 KR KR1020110134142A patent/KR101408552B1/ko active IP Right Grant
- 2011-12-16 CN CN201110424941.4A patent/CN102555087B/zh active Active
Also Published As
Publication number | Publication date |
---|---|
US20120151969A1 (en) | 2012-06-21 |
ES2425343T3 (es) | 2013-10-14 |
JP2012134489A (ja) | 2012-07-12 |
EP2465625A1 (de) | 2012-06-20 |
KR20120068709A (ko) | 2012-06-27 |
CA2758487C (en) | 2014-01-21 |
KR101408552B1 (ko) | 2014-06-17 |
CN102555087B (zh) | 2015-03-18 |
CA2758487A1 (en) | 2012-06-17 |
CN102555087A (zh) | 2012-07-11 |
DE102010063407A1 (de) | 2012-06-21 |
EP2465625B1 (de) | 2013-05-29 |
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