JP5466836B2 - フラックス用洗浄剤組成物 - Google Patents

フラックス用洗浄剤組成物 Download PDF

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Publication number
JP5466836B2
JP5466836B2 JP2008155739A JP2008155739A JP5466836B2 JP 5466836 B2 JP5466836 B2 JP 5466836B2 JP 2008155739 A JP2008155739 A JP 2008155739A JP 2008155739 A JP2008155739 A JP 2008155739A JP 5466836 B2 JP5466836 B2 JP 5466836B2
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flux
component
cleaning
cleaning composition
weight
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JP2009298940A5 (enrdf_load_stackoverflow
JP2009298940A (ja
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浩一 川下
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Kao Corp
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Kao Corp
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  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
JP2008155739A 2008-06-13 2008-06-13 フラックス用洗浄剤組成物 Active JP5466836B2 (ja)

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JP2008155739A JP5466836B2 (ja) 2008-06-13 2008-06-13 フラックス用洗浄剤組成物

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JP2008155739A JP5466836B2 (ja) 2008-06-13 2008-06-13 フラックス用洗浄剤組成物

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JP2009298940A JP2009298940A (ja) 2009-12-24
JP2009298940A5 JP2009298940A5 (enrdf_load_stackoverflow) 2011-04-21
JP5466836B2 true JP5466836B2 (ja) 2014-04-09

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108431194A (zh) * 2015-12-24 2018-08-21 花王株式会社 助焊剂用清洗剂组合物
CN110408944A (zh) * 2019-09-10 2019-11-05 昆山市飞荣达电子材料有限公司 一种金属表面清洗方法

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5414577B2 (ja) * 2010-03-09 2014-02-12 花王株式会社 硬質表面用アルカリ洗浄剤組成物
JP6412377B2 (ja) * 2013-09-11 2018-10-24 花王株式会社 樹脂マスク層用洗浄剤組成物及び回路基板の製造方法
JP6158060B2 (ja) * 2013-12-10 2017-07-05 花王株式会社 半田フラックス残渣除去用洗浄剤組成物
JP6202678B2 (ja) * 2014-02-03 2017-09-27 花王株式会社 半田フラックス残渣除去用洗浄剤組成物
JP6226144B2 (ja) * 2014-02-27 2017-11-08 荒川化学工業株式会社 洗浄剤組成物原液、洗浄剤組成物および洗浄方法
JP6243792B2 (ja) * 2014-05-12 2017-12-06 花王株式会社 はんだが固化された回路基板の製造方法、電子部品が搭載された回路基板の製造方法、及び、フラックス用洗浄剤組成物
JP6345512B2 (ja) * 2014-06-30 2018-06-20 花王株式会社 半田フラックス残渣除去用洗浄剤組成物
JP7073655B2 (ja) * 2017-09-19 2022-05-24 荒川化学工業株式会社 洗浄剤組成物原液、及び該洗浄剤組成物原液を含む洗浄剤組成物
JP7620702B2 (ja) * 2020-10-05 2025-01-23 インテグリス・インコーポレーテッド ポストｃｍｐ洗浄組成物
JP7006826B1 (ja) 2021-07-27 2022-01-24 荒川化学工業株式会社 鉛フリーはんだフラックス用洗浄剤組成物、鉛フリーはんだフラックスの洗浄方法
CN114106935B (zh) * 2021-11-04 2023-07-25 浙江奥首材料科技有限公司 一种水基型助焊剂清洗剂、其制备方法及用途

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61162597A (ja) * 1985-01-09 1986-07-23 旭電化工業株式会社 洗浄剤組成物
US6943142B2 (en) * 2002-01-09 2005-09-13 Air Products And Chemicals, Inc. Aqueous stripping and cleaning composition
US9217929B2 (en) * 2004-07-22 2015-12-22 Air Products And Chemicals, Inc. Composition for removing photoresist and/or etching residue from a substrate and use thereof
TW200734448A (en) * 2006-02-03 2007-09-16 Advanced Tech Materials Low pH post-CMP residue removal composition and method of use
JP4140923B2 (ja) * 2006-03-31 2008-08-27 花王株式会社 洗浄剤組成物

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108431194A (zh) * 2015-12-24 2018-08-21 花王株式会社 助焊剂用清洗剂组合物
CN108431194B (zh) * 2015-12-24 2021-02-02 花王株式会社 助焊剂用清洗剂组合物
CN110408944A (zh) * 2019-09-10 2019-11-05 昆山市飞荣达电子材料有限公司 一种金属表面清洗方法

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JP2009298940A (ja) 2009-12-24

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