JP5449570B2 - 微細凹凸構造を表面に有する部材の検査装置および検査方法、陽極酸化アルミナ層を表面に有する部材の製造方法、及び光学フィルムの製造方法 - Google Patents
微細凹凸構造を表面に有する部材の検査装置および検査方法、陽極酸化アルミナ層を表面に有する部材の製造方法、及び光学フィルムの製造方法 Download PDFInfo
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- JP5449570B2 JP5449570B2 JP2012547195A JP2012547195A JP5449570B2 JP 5449570 B2 JP5449570 B2 JP 5449570B2 JP 2012547195 A JP2012547195 A JP 2012547195A JP 2012547195 A JP2012547195 A JP 2012547195A JP 5449570 B2 JP5449570 B2 JP 5449570B2
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- mold
- anodized alumina
- image processing
- inspection
- imaging
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- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 title claims description 152
- 238000007689 inspection Methods 0.000 title claims description 86
- 238000000034 method Methods 0.000 title claims description 86
- 238000004519 manufacturing process Methods 0.000 title claims description 34
- 239000012788 optical film Substances 0.000 title claims description 6
- 239000011148 porous material Substances 0.000 claims description 116
- 238000012545 processing Methods 0.000 claims description 75
- 238000003384 imaging method Methods 0.000 claims description 67
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 54
- 229910052782 aluminium Inorganic materials 0.000 claims description 54
- 230000003287 optical effect Effects 0.000 claims description 51
- 239000000758 substrate Substances 0.000 claims description 46
- 239000003795 chemical substances by application Substances 0.000 claims description 39
- 230000010287 polarization Effects 0.000 claims description 26
- 238000007743 anodising Methods 0.000 claims description 13
- 230000001678 irradiating effect Effects 0.000 claims description 13
- 238000006243 chemical reaction Methods 0.000 claims description 10
- 238000012546 transfer Methods 0.000 claims description 9
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 45
- 239000011295 pitch Substances 0.000 description 45
- 239000010408 film Substances 0.000 description 38
- 230000002950 deficient Effects 0.000 description 24
- 238000005286 illumination Methods 0.000 description 24
- 239000000463 material Substances 0.000 description 17
- 239000007864 aqueous solution Substances 0.000 description 16
- 235000006408 oxalic acid Nutrition 0.000 description 15
- 230000035945 sensitivity Effects 0.000 description 15
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 14
- 230000002159 abnormal effect Effects 0.000 description 14
- 238000002048 anodisation reaction Methods 0.000 description 14
- 238000001514 detection method Methods 0.000 description 14
- 239000008151 electrolyte solution Substances 0.000 description 13
- 230000008569 process Effects 0.000 description 13
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- 230000003647 oxidation Effects 0.000 description 11
- 238000007254 oxidation reaction Methods 0.000 description 11
- 230000007547 defect Effects 0.000 description 9
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 8
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 7
- 230000008439 repair process Effects 0.000 description 7
- 239000013078 crystal Substances 0.000 description 6
- 230000006870 function Effects 0.000 description 6
- 230000002093 peripheral effect Effects 0.000 description 6
- 230000007423 decrease Effects 0.000 description 5
- 239000000243 solution Substances 0.000 description 5
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 4
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 238000005520 cutting process Methods 0.000 description 4
- 239000003792 electrolyte Substances 0.000 description 4
- 229910052731 fluorine Inorganic materials 0.000 description 4
- 239000011737 fluorine Substances 0.000 description 4
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 4
- 239000011259 mixed solution Substances 0.000 description 4
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 4
- 229920000642 polymer Polymers 0.000 description 4
- 229920001296 polysiloxane Polymers 0.000 description 4
- 230000005856 abnormality Effects 0.000 description 3
- 230000002378 acidificating effect Effects 0.000 description 3
- 230000008859 change Effects 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 230000000295 complement effect Effects 0.000 description 3
- 238000013461 design Methods 0.000 description 3
- 239000006082 mold release agent Substances 0.000 description 3
- 230000000737 periodic effect Effects 0.000 description 3
- 238000001228 spectrum Methods 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000005266 casting Methods 0.000 description 2
- XTEGARKTQYYJKE-UHFFFAOYSA-N chloric acid Chemical compound OCl(=O)=O XTEGARKTQYYJKE-UHFFFAOYSA-N 0.000 description 2
- 229940005991 chloric acid Drugs 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 239000000284 extract Substances 0.000 description 2
- 150000002222 fluorine compounds Chemical class 0.000 description 2
- 238000005242 forging Methods 0.000 description 2
- 229910000077 silane Inorganic materials 0.000 description 2
- -1 silane compound Chemical class 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 208000032544 Cicatrix Diseases 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 238000000149 argon plasma sintering Methods 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000011068 loading method Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 231100000241 scar Toxicity 0.000 description 1
- 230000037387 scars Effects 0.000 description 1
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- 238000003756 stirring Methods 0.000 description 1
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- 239000000126 substance Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/952—Inspecting the exterior surface of cylindrical bodies or wires
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/956—Inspecting patterns on the surface of objects
Landscapes
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Shaping Of Tube Ends By Bending Or Straightening (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Spectrometry And Color Measurement (AREA)
- Optical Elements Other Than Lenses (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012547195A JP5449570B2 (ja) | 2011-09-26 | 2012-09-26 | 微細凹凸構造を表面に有する部材の検査装置および検査方法、陽極酸化アルミナ層を表面に有する部材の製造方法、及び光学フィルムの製造方法 |
Applications Claiming Priority (8)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011209707 | 2011-09-26 | ||
| JP2011209705 | 2011-09-26 | ||
| JP2011209706 | 2011-09-26 | ||
| JP2011209707 | 2011-09-26 | ||
| JP2011209706 | 2011-09-26 | ||
| JP2011209705 | 2011-09-26 | ||
| JP2012547195A JP5449570B2 (ja) | 2011-09-26 | 2012-09-26 | 微細凹凸構造を表面に有する部材の検査装置および検査方法、陽極酸化アルミナ層を表面に有する部材の製造方法、及び光学フィルムの製造方法 |
| PCT/JP2012/074726 WO2013047593A1 (ja) | 2011-09-26 | 2012-09-26 | 微細凹凸構造を表面に有する部材の検査装置および検査方法、陽極酸化アルミナ層を表面に有する部材の製造方法、及び光学フィルムの製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP5449570B2 true JP5449570B2 (ja) | 2014-03-19 |
| JPWO2013047593A1 JPWO2013047593A1 (ja) | 2015-03-26 |
Family
ID=47995623
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012547195A Active JP5449570B2 (ja) | 2011-09-26 | 2012-09-26 | 微細凹凸構造を表面に有する部材の検査装置および検査方法、陽極酸化アルミナ層を表面に有する部材の製造方法、及び光学フィルムの製造方法 |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JP5449570B2 (zh) |
| KR (1) | KR101593856B1 (zh) |
| CN (1) | CN103842803B (zh) |
| TW (1) | TWI529385B (zh) |
| WO (1) | WO2013047593A1 (zh) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6314798B2 (ja) * | 2014-11-12 | 2018-04-25 | Ｊｆｅスチール株式会社 | 表面欠陥検出方法及び表面欠陥検出装置 |
| JP6465345B2 (ja) * | 2014-12-26 | 2019-02-06 | 株式会社荏原製作所 | 研磨パッドの表面性状測定方法および装置 |
| PL3761070T3 (pl) * | 2015-11-16 | 2022-11-21 | Dexerials Corporation | Korpus optyczny, matryca, oraz sposób wytwarzania korpusu optycznego |
| MX2019009157A (es) * | 2017-05-26 | 2019-10-07 | Sintokogio Ltd | Dispositivo de inspeccion y sistema de fundicion. |
| JP7288273B2 (ja) * | 2019-02-27 | 2023-06-07 | 株式会社新菱 | 検査装置、検査システム及び検査方法 |
| KR102194261B1 (ko) | 2019-08-01 | 2020-12-22 | 연세대학교 산학협력단 | 멀티포인트 편광 정보를 이용한 에지 및 표면 상태 검사 장치 및 방법 |
| KR20210093682A (ko) | 2020-01-20 | 2021-07-28 | (주)포인트엔지니어링 | 양극산화막 구조체의 제조 방법 및 양극산화막 구조체 |
| CN118408947A (zh) * | 2024-07-02 | 2024-07-30 | 南通楚捷电子设备有限公司 | 应用于金属表面阳极氧化后的检测方法 |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB9912081D0 (en) * | 1999-05-25 | 1999-07-21 | Secr Defence Brit | Multilayer surface |
| US7586607B2 (en) * | 2006-04-21 | 2009-09-08 | Rudolph Technologies, Inc. | Polarization imaging |
| JP2008249386A (ja) * | 2007-03-29 | 2008-10-16 | Dainippon Screen Mfg Co Ltd | 欠陥検査装置および欠陥検査方法 |
| JP2010015109A (ja) * | 2008-07-07 | 2010-01-21 | Sony Corp | 光学フィルムおよびその製造方法、防眩性偏光子、ならびに表示装置 |
| JP5381040B2 (ja) * | 2008-11-21 | 2014-01-08 | 大日本印刷株式会社 | モスアイ型反射防止フィルム製造用金型の評価方法、製造方法及び再生方法並びにモスアイ型反射防止フィルムの製造方法 |
| JP2011047681A (ja) * | 2009-08-25 | 2011-03-10 | Sumitomo Chemical Co Ltd | 防眩処理用金型の検査装置 |
| JP4976593B2 (ja) * | 2010-03-08 | 2012-07-18 | シャープ株式会社 | 離型処理方法、型、反射防止膜の製造方法、離型処理装置および型の洗浄乾燥装置 |
| WO2011118596A1 (ja) * | 2010-03-25 | 2011-09-29 | 三菱レイヨン株式会社 | 陽極酸化アルミナの製造方法、検査装置および検査方法 |
| US8760655B2 (en) * | 2010-05-19 | 2014-06-24 | Sharp Kabushiki Kaisha | Die inspection method |
-
2012
- 2012-09-25 TW TW101135143A patent/TWI529385B/zh active
- 2012-09-26 JP JP2012547195A patent/JP5449570B2/ja active Active
- 2012-09-26 WO PCT/JP2012/074726 patent/WO2013047593A1/ja active Application Filing
- 2012-09-26 KR KR1020147005180A patent/KR101593856B1/ko active IP Right Grant
- 2012-09-26 CN CN201280046980.8A patent/CN103842803B/zh active Active
Also Published As
| Publication number | Publication date |
|---|---|
| TWI529385B (zh) | 2016-04-11 |
| KR101593856B1 (ko) | 2016-02-12 |
| WO2013047593A1 (ja) | 2013-04-04 |
| CN103842803B (zh) | 2016-07-06 |
| KR20140043487A (ko) | 2014-04-09 |
| TW201321740A (zh) | 2013-06-01 |
| CN103842803A (zh) | 2014-06-04 |
| JPWO2013047593A1 (ja) | 2015-03-26 |
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