JP5420640B2 - 複数基板の処理装置及びその方法 - Google Patents
複数基板の処理装置及びその方法 Download PDFInfo
- Publication number
- JP5420640B2 JP5420640B2 JP2011507379A JP2011507379A JP5420640B2 JP 5420640 B2 JP5420640 B2 JP 5420640B2 JP 2011507379 A JP2011507379 A JP 2011507379A JP 2011507379 A JP2011507379 A JP 2011507379A JP 5420640 B2 JP5420640 B2 JP 5420640B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- cutting
- station
- unit
- substrates
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000000758 substrate Substances 0.000 title claims description 87
- 238000000034 method Methods 0.000 title claims description 20
- 238000012545 processing Methods 0.000 title description 16
- 238000005520 cutting process Methods 0.000 claims description 87
- 238000007689 inspection Methods 0.000 claims description 29
- 230000008569 process Effects 0.000 claims description 10
- 238000003698 laser cutting Methods 0.000 claims description 8
- 238000003384 imaging method Methods 0.000 claims description 5
- 230000032258 transport Effects 0.000 claims description 3
- 230000009977 dual effect Effects 0.000 claims description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 6
- 229910052802 copper Inorganic materials 0.000 description 6
- 239000010949 copper Substances 0.000 description 6
- 238000012360 testing method Methods 0.000 description 6
- 230000000007 visual effect Effects 0.000 description 5
- 239000000463 material Substances 0.000 description 4
- 239000004033 plastic Substances 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 238000005452 bending Methods 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000005070 sampling Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 238000011179 visual inspection Methods 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0058—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Mechanical Engineering (AREA)
- Dicing (AREA)
- Laser Beam Processing (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| SG200803452-2 | 2008-05-02 | ||
| SG200803452-2A SG142402A1 (en) | 2008-05-02 | 2008-05-02 | Apparatus and method for multiple substrate processing |
| PCT/SG2009/000158 WO2009134212A1 (en) | 2008-05-02 | 2009-05-04 | Apparatus and method for multiple substrate processing |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2011520256A JP2011520256A (ja) | 2011-07-14 |
| JP2011520256A5 JP2011520256A5 (cg-RX-API-DMAC7.html) | 2012-02-16 |
| JP5420640B2 true JP5420640B2 (ja) | 2014-02-19 |
Family
ID=41255265
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011507379A Expired - Fee Related JP5420640B2 (ja) | 2008-05-02 | 2009-05-04 | 複数基板の処理装置及びその方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20110036339A1 (cg-RX-API-DMAC7.html) |
| JP (1) | JP5420640B2 (cg-RX-API-DMAC7.html) |
| KR (1) | KR20110013440A (cg-RX-API-DMAC7.html) |
| CN (1) | CN102046344A (cg-RX-API-DMAC7.html) |
| SG (1) | SG142402A1 (cg-RX-API-DMAC7.html) |
| WO (1) | WO2009134212A1 (cg-RX-API-DMAC7.html) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101310765B1 (ko) * | 2012-02-29 | 2013-09-25 | 주식회사 에스에프에이 | 가요성 기판 절단장치 |
| KR200472836Y1 (ko) * | 2012-07-06 | 2014-05-27 | 프로브 테크놀로지 코포레이션 | 절삭 유닛 및 그 응용설비 |
| JP6218511B2 (ja) * | 2013-09-02 | 2017-10-25 | Towa株式会社 | 切断装置及び切断方法 |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR900001232B1 (ko) * | 1984-12-27 | 1990-03-05 | 가부시끼 가이샤 디스코 | 반도체 웨이퍼 방형절단기 |
| US6826986B2 (en) * | 2001-05-05 | 2004-12-07 | Ah Beng Lim | Bi-directional singulation system and method |
| US7267037B2 (en) * | 2001-05-05 | 2007-09-11 | David Walter Smith | Bidirectional singulation saw and method |
| JP2003124155A (ja) * | 2001-10-12 | 2003-04-25 | Disco Abrasive Syst Ltd | 切削装置 |
| JP3765265B2 (ja) * | 2001-11-28 | 2006-04-12 | 株式会社東京精密 | ダイシング装置 |
| JP4201564B2 (ja) * | 2001-12-03 | 2008-12-24 | 日東電工株式会社 | 半導体ウエハ搬送方法およびこれを用いた半導体ウエハ搬送装置 |
| KR100497506B1 (ko) * | 2003-04-08 | 2005-07-01 | 한미반도체 주식회사 | 반도체 스트립 소잉장치 및 이를 구비한 반도체 패키지의싱귤레이션 장치 |
| JP4315788B2 (ja) * | 2003-11-26 | 2009-08-19 | アピックヤマダ株式会社 | 半導体装置の製造方法及び製造装置 |
| JP2005347421A (ja) * | 2004-06-01 | 2005-12-15 | Apic Yamada Corp | 半導体装置の製造方法及び装置 |
-
2008
- 2008-05-02 SG SG200803452-2A patent/SG142402A1/en unknown
-
2009
- 2009-05-04 WO PCT/SG2009/000158 patent/WO2009134212A1/en not_active Ceased
- 2009-05-04 JP JP2011507379A patent/JP5420640B2/ja not_active Expired - Fee Related
- 2009-05-04 KR KR1020107027093A patent/KR20110013440A/ko not_active Withdrawn
- 2009-05-04 US US12/990,491 patent/US20110036339A1/en not_active Abandoned
- 2009-05-04 CN CN2009801165598A patent/CN102046344A/zh active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| KR20110013440A (ko) | 2011-02-09 |
| JP2011520256A (ja) | 2011-07-14 |
| SG142402A1 (en) | 2009-11-26 |
| US20110036339A1 (en) | 2011-02-17 |
| CN102046344A (zh) | 2011-05-04 |
| WO2009134212A1 (en) | 2009-11-05 |
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