JP5415106B2 - 樹脂パッケージの製造方法 - Google Patents
樹脂パッケージの製造方法 Download PDFInfo
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- JP5415106B2 JP5415106B2 JP2009046535A JP2009046535A JP5415106B2 JP 5415106 B2 JP5415106 B2 JP 5415106B2 JP 2009046535 A JP2009046535 A JP 2009046535A JP 2009046535 A JP2009046535 A JP 2009046535A JP 5415106 B2 JP5415106 B2 JP 5415106B2
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- copper oxide
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- 229920005989 resin Polymers 0.000 title claims description 177
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- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 claims description 128
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- 229910000431 copper oxide Inorganic materials 0.000 claims description 128
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- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 20
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- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 13
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- 239000001488 sodium phosphate Substances 0.000 description 5
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 5
- 229910000406 trisodium phosphate Inorganic materials 0.000 description 5
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- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 4
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- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 2
- 229910000531 Co alloy Inorganic materials 0.000 description 2
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- QXZUUHYBWMWJHK-UHFFFAOYSA-N [Co].[Ni] Chemical compound [Co].[Ni] QXZUUHYBWMWJHK-UHFFFAOYSA-N 0.000 description 2
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 2
- 238000012790 confirmation Methods 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 229910000365 copper sulfate Inorganic materials 0.000 description 2
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 2
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- BSIDXUHWUKTRQL-UHFFFAOYSA-N nickel palladium Chemical compound [Ni].[Pd] BSIDXUHWUKTRQL-UHFFFAOYSA-N 0.000 description 2
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- 229910000881 Cu alloy Inorganic materials 0.000 description 1
- 239000004641 Diallyl-phthalate Substances 0.000 description 1
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- QUDWYFHPNIMBFC-UHFFFAOYSA-N bis(prop-2-enyl) benzene-1,2-dicarboxylate Chemical compound C=CCOC(=O)C1=CC=CC=C1C(=O)OCC=C QUDWYFHPNIMBFC-UHFFFAOYSA-N 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
- H01L21/56—Encapsulations, e.g. encapsulation layers, coatings
- H01L21/565—Moulds
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- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/31—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
- H01L23/3107—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed
- H01L23/3121—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed a substrate forming part of the encapsulation
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- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/31—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
- H01L23/3107—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed
- H01L23/3142—Sealing arrangements between parts, e.g. adhesion promotors
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- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/498—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
- H01L23/49861—Lead-frames fixed on or encapsulated in insulating substrates
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- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/498—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
- H01L23/49866—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers characterised by the materials
- H01L23/49894—Materials of the insulating layers or coatings
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- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/4805—Shape
- H01L2224/4809—Loop shape
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- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/48151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/48221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/48245—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
- H01L2224/48247—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item
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- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/484—Connecting portions
- H01L2224/4847—Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a wedge bond
- H01L2224/48471—Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a wedge bond the other connecting portion not on the bonding area being a ball bond, i.e. wedge-to-ball, reverse stitch
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- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/151—Die mounting substrate
- H01L2924/156—Material
- H01L2924/157—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
- H01L2924/15738—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950 C and less than 1550 C
- H01L2924/15747—Copper [Cu] as principal constituent
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- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/181—Encapsulation
- H01L2924/183—Connection portion, e.g. seal
- H01L2924/18301—Connection portion, e.g. seal being an anchoring portion, i.e. mechanical interlocking between the encapsulation resin and another package part
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- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Lead Frames For Integrated Circuits (AREA)
- Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
Description
まず、リードフレーム3を用意して表面を洗浄し、リードフレーム3上に、上記方法(b)を用いてその例示された条件で密度ρ(=6.26mg/mm3)及び厚みA(=1.5μm)の酸化銅層20を形成した。その後、以下の条件(実施例1〜8及び比較例1〜4)で酸化銅層20を除去(剥離)した。
比較例1〜4においては、酸性溶液(剥離液)として所定の濃度の塩酸(HCl)、蟻酸(HCOOH)及び燐酸(H3PO4)を用いて酸化銅層20を除去(剥離)した。なお、具体的な条件は、図5に示されている。
図5には、実施例1〜8及び比較例1〜4に用いられた酸性溶液(剥離液)の具体的な種類及びその濃度と、その条件における酸化銅層20に対するエッチングレートV(mg/min・mm2)が示されている。図5に示すように、硫酸、硝酸及び塩酸のいずれにおいても、濃度が高くなるとエッチングレートVが高くなっている。また、同じ濃度である場合には、硫酸、硝酸、塩酸順にエッチングレートVが高くなる傾向にある。また、蟻酸及び燐酸は、硫酸、硝酸及び塩酸に比べてエッチングレートVが十分に低いことが分かる。
リードフレーム3を用意して表面を洗浄し、リードフレーム3上に、上記方法(b)を用いてその例示された条件で密度ρ(=6.26mg/mm3)及び厚みA(=1.5μm)の酸化銅層20を形成した。次に、上記の樹脂接着工程に挙げられた条件の下で樹脂パッケージ本体11を形成し、液晶性ポリマーを用いた樹脂パッケージ1aを製造した。
その後、以下の条件(実施例9〜16及び比較例5〜6)で酸化銅層を除去(剥離)した。なお、実施例9〜16及び比較例5〜6のすべてにおいて、樹脂材料の注入時における金型30A,30Bの温度T1は、300℃であった。
実施例9〜16(図7参照)においては、酸化銅層除去工程で酸性溶液(剥離液)として所定の濃度の硫酸(H2SO4)、硝酸(HNO3)及び塩酸(HCl)を用いて酸化銅層を除去(剥離)した。
比較例5〜6(図7参照)においては、酸性溶液(剥離液)として所定の濃度の塩酸(HCl)を用いて酸化銅層を除去(剥離)した。
樹脂材料の注入時における金型30A,30Bの温度T1を281℃に変更した以外は、実施例9と同様に酸化銅層を除去(剥離)した。
樹脂材料の注入時における金型30A,30Bの温度T1を269℃に変更した以外は、実施例9と同様に酸化銅層を除去(剥離)した。
この試験の結果を、図7に示している。図7は、実施例9〜18及び比較例5〜6の樹脂パッケージ1aそれぞれに対して、酸化銅層の除去(剥離)前及び後における上記の気密性調査の結果を纏めたものである。製造した樹脂パッケージの個数をα0、上記の気密性調査において1×10−8Pa・m3/sec未満のHeリーク値を示した樹脂パッケージ個数をαとすると、図7において、気密性はα/α0×100%で与えられる。気密性の値が高いほど気密性に優れていることを意味する。なお、気密性に優れていることは、具体的には、酸化銅層20a,20b,20cを通って空間SにHeガスがリーク(図6の矢印)しないことを意味する。
Claims (6)
- 樹脂パッケージの製造方法において、
(A)少なくとも表面が銅製のリードフレームの表面を酸化して酸化銅層を形成する工程と、
(B)パッケージ用の樹脂成形によって、前記リードフレーム表面の前記酸化銅層と樹脂とを接着して樹脂パッケージ本体を成形した後、前記酸化銅層の所定領域を酸性溶液によって除去する工程と、を備え、
前記リードフレームは、
電子素子が配置されるべきダイパッドと、
複数のリード端子からなるリード領域と、
を有しており、
前記樹脂パッケージ本体は、
前記ダイパッドの側面の前記酸化銅層と、前記リード領域の側面の前記酸化銅層との間に設けられた底部と、
前記ダイパッドを囲みつつ前記リード領域上の前記酸化銅層に立設した側壁と、
を有しており、
前記所定領域とは、前記リード領域の前記側壁によって囲まれた領域であり、
工程(B)において、
前記酸化銅層の厚みA(μm)、
t1,t2及びt3のうちの最小値d(μm)、
前記酸化銅層の密度ρ(mg/mm3)、
前記酸性溶液における前記酸化銅層のエッチングレートV(mg/min・mm2)及びエッチング時間T(min)は、以下の関係式:
d>(V/ρ)×1000×T>A、及び、2.0×10−3≦V≦2.6×10−2を満たしており、
前記t1は、前記酸化銅層と前記側壁との界面における前記酸化銅層の厚み方向に垂直な方向の前記側壁の厚みであり、
前記t2は、前記底部と前記ダイパッドとの界面に沿って形成された前記酸化銅層の前記底部の内側面から外側面に至るまでの長さの総長の最小値であり、
前記t3は、前記底部と前記リード領域との界面に沿って形成された前記酸化銅層の前記底部の内側面から外側面に至るまでの長さの総長の最小値であることを特徴とする樹脂パッケージの製造方法。 - 工程(B)の後に、(C)前記酸化銅層の除去された前記所定領域内に金属層を形成する工程を更に備えることを特徴とする請求項1記載の樹脂パッケージの製造方法。
- 工程(A)において、
その酸化方法が、
(a)酸素雰囲気で前記リードフレームを加熱する方法、
(b)アルカリ水溶液中に前記リードフレームを浸す方法、
(c)アルカリ水溶液中に前記リードフレームを浸し且つ前記リードフレームの陽極酸化を行う方法、及び
(d)第2銅イオンを含む電着液内に前記リードフレームを浸して且つ前記リードフレームに通電を行う方法、
からなる群から選択された方法であることを特徴とする請求項1又は2に記載の樹脂パッケージの製造方法。 - 前記酸性溶液は、硫酸、硝酸、及び塩酸からなる群から選択された少なくとも1つの酸を含むことを特徴とする請求項1乃至3のいずれか1項に記載の樹脂パッケージの製造方法。
- 工程(B)では樹脂を金型内に注入して成形を行い、前記樹脂は熱可塑性樹脂であり、前記樹脂の注入時における前記金型の温度T1(℃)、前記樹脂の流動開始温度T2(℃)は、以下の関係式:
T1(℃)≧T2(℃)−70(℃)
を満たすことを特徴とする請求項1乃至4のいずれか1項に記載の樹脂パッケージの製造方法。 - 前記熱可塑性樹脂は、液晶性ポリマーであることを特徴とする請求項5に記載の樹脂パッケージの製造方法。
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JP6653139B2 (ja) * | 2015-07-24 | 2020-02-26 | 株式会社三井ハイテック | リードフレーム及びその製造方法 |
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