JP5393959B2 - 光硬化性・熱硬化性樹脂組成物及びその硬化物 - Google Patents
光硬化性・熱硬化性樹脂組成物及びその硬化物 Download PDFInfo
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- JP5393959B2 JP5393959B2 JP2007184887A JP2007184887A JP5393959B2 JP 5393959 B2 JP5393959 B2 JP 5393959B2 JP 2007184887 A JP2007184887 A JP 2007184887A JP 2007184887 A JP2007184887 A JP 2007184887A JP 5393959 B2 JP5393959 B2 JP 5393959B2
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Description
さらに本発明の目的は、このような光硬化性・熱硬化性樹脂組成物を用いることによって得られる上記のような諸特性に優れた硬化物、及び該硬化物によりソルダーレジスト及び/又は導体回路層間の絶縁層が形成されてなるプリント配線板を提供することにある。
前記光硬化性・熱硬化性樹脂組成物は、液状形態及びドライフィルムの形態のいずれであってもよいが、フレキシブルプリント配線板の製造、電子部品への実装等のアプリケーションに好適なドライフィルム形態にあることが好ましい。
ドライフィルム化に際しては、本発明の光硬化性・熱硬化性樹脂組成物を適切な粘度に前記有機溶剤で希釈し、コンマコーター、ブレードコーター、リップコーター、ロッドコーター、スクイズコーター、リバースコーター、トランスファロールコーター、グラビアコーター、スプレーコーター等でキャリアフィルム上に均一な厚さに塗布し、通常、50〜130℃の温度で1〜30分間乾燥して膜を得ることができる。塗布膜厚については特に制限はないが、一般に、乾燥後の膜厚で、10〜150μm、好ましくは20〜60μmの範囲で適宜選択される。
剥離可能なカバーフィルムとしては、例えば、ポリエチレンフィルム、ポリテトラフルオロエチレンフィルム、ポリプロピレンフィルム、表面処理した紙等を用いることができ、カバーフィルムを剥離するときに、膜とキャリアフィルムとの接着力よりも膜とカバーフィルムとの接着力がより小さいものであればよい。
また、光硬化させるための照射光源としては、低圧水銀灯、中圧水銀灯、高圧水銀灯、超高圧水銀灯、キセノンランプ又はメタルハライドランプなどが適当である。また、レーザー光線なども活性エネルギー線として利用できる。
撹拌装置、温度計、コンデンサーを備えた反応容器に、1,5−ペンタンジオールと1,6−ヘキサンジオールから誘導されるポリカーボネートジオール(旭化成ケミカルズ(株)製、T−5650J、平均分子量800)280部(3モル)、カルボキシル基を有するジヒドロキシル化合物としてジメチロールプロピオン酸70部(4.5モル)、ポリイソシアネートとしてイソホロンジイソシアネート220部(8.5モル)、及びエチレン性不飽和二重結合を有するモノヒドロキシル化合物として2−ヒドロキシエチルアクリレート40部(2.6モル)を投入した。撹拌しながら60℃まで加熱して停止し、反応容器内の温度が低下し始めた時点で再度加熱して80℃で撹拌を続け、赤外線吸収スペクトルでイソシアネート基の吸収スペクトル(2280cm−1)が消失したことを確認して反応を終了した。次いで、固形分が50質量%となるようにジプロピレングリコールモノメチルエーテルアセテートを添加し、希釈剤を含有する粘稠液体のポリウレタンを得た。得られたポリウレタンの固形分の酸価は48mgKOH/gであった。以下、この反応溶液をワニスA−1と称す。
撹拌装置、温度計、コンデンサーを備えた反応容器に、ポリプロピレングリコール(三洋化成工業(株)製、サンニックスPP−950、平均分子量950)330部(3モル)、カルボキシル基を有するジヒドロキシル化合物としてジメチロールプロピオン酸70部(4.5モル)、ポリイソシアネートとしてイソホロンジイソシアネート220部(8.5モル)、及びエチレン性不飽和二重結合を有するモノヒドロキシル化合物として2−ヒドロキシエチルアクリレート40部(2.6モル)を投入した。撹拌しながら60℃まで加熱して停止し、反応容器内の温度が低下し始めた時点で再度加熱して80℃で撹拌を続け、赤外線吸収スペクトルでイソシアネート基の吸収スペクトル(2280cm−1)が消失したことを確認して反応を終了した。次いで、固形分が50質量%となるようにジプロピレングリコールモノメチルエーテルアセテートを添加し、希釈剤を含有する粘稠液体のポリウレタンを得た。得られたポリウレタンの固形分の酸価は50mgKOH/gであった。以下、この反応溶液をワニスA−2と称す。
クレゾールノボラック型エポキシ樹脂(エピクロンN−695、大日本インキ化学工業(株)製、エポキシ当量220)330部を、ガス導入管、撹拌装置、冷却管及び温度計を備えたフラスコに入れ、ジプロピレングリコールモノメチルエーテルアセテート285部を加え、加熱溶解した。次に、重合禁止剤としてハイドロキノン0.46部と、反応触媒としてトリフェニルホスフィン1.38部を加えた。この混合物を95〜105℃に加熱し、アクリル酸108部を徐々に滴下し、16時間反応させた。この反応生成物を、80〜90℃まで冷却し、テトラヒドロフタル酸無水物122部を加え、8時間反応させた。反応は、電位差滴定による反応液の酸化、全酸化測定を行ない、得られる付加率にて追跡し、反応率95%以上を終点とする。このようにして得られたカルボキシル基含感光性樹脂は、固形分の酸価75mgKOH/gであった。以下、この反応溶液をワニスBと称す。
前記合成例1、2及び比較合成例1で得られた各ワニスを用い、表1に示す配合組成(数値は質量部である)に従って各成分を配合し、3本ロールミルで混練し、光硬化性・熱硬化性樹脂組成物を調製した。
得られた光硬化性・熱硬化性樹脂組成物をアプリケーターにて乾燥後膜厚約40μmとなるように16μm厚のPETフィルムに塗工し、80℃にて30分間予備乾燥を行ない、試験用ドライフィルムを作製した。
その後、得られたドライフィルムを、試験基板にPETフィルム面を上面にして樹脂組成物層が接触するように重ね合わせ、真空ラミネーターにてラミネートした後、PETフィルムを剥離した。ドライフィルムをラミネートした試験基板については、後述の試験方法及び評価方法にて、現像性の各試験を行なった。
次いで、ドライフィルムをラミネートした試験基板に、紫外線露光装置((株)オーク製作所製、型式HMW−680GW)を用いて露光を行なった後、1wt%炭酸ナトリウム水溶液でスプレー現像を行ない、その後、150℃の熱風循環式乾燥炉にて60分間熱硬化を行なった。得られた硬化皮膜を有する各評価基板について、後述の試験方法及び評価方法にて、はんだ耐熱性及び無電解金めっき耐性の各試験を行なった。
前記試験基板として全面銅箔のプリント基板を用い、前記ドライフィルムをラミネートした各試験基板を、液温30℃の1wt%炭酸ナトリウム水溶液を用いてスプレー圧0.2MPaで現像し、目視により基板上の樹脂組成物層が除去されるまでの時間を測定した。
◎:45秒未満
○:45秒以上、60秒未満
×:60秒以上
前記試験基板として全面銅箔のプリント基板を用い、前記ドライフィルムをラミネートした各試験基板を、90℃の熱風循環式乾燥炉に投入し、10分から30分まで5分おきに加熱した後の現像性について評価した。現像は、液温30℃の1wt%炭酸ナトリウム水溶液を用いてスプレー圧0.2MPaで120秒行い、目視にて基板上に残渣が発生しない最長の加熱時間を測定し、評価した。
○:30分以上
△:15分以上
×:15分未満
試験基板として銅箔厚18μmの銅張基板を用い、前記したようにして形成した評価基板の硬化皮膜にロジン系フラックスを塗布し、260℃のはんだ槽に10秒間浸漬後、セロハン粘着テープによるピーリング試験を行った後の硬化皮膜の状態を以下の基準で評価した。
○:ピーリング後に硬化皮膜に変化がなかったもの。
×:ピーリング後に硬化皮膜の剥離を生じたもの。
試験基板として銅箔厚18μmの銅張基板を用い、前記したようにして作製した評価基板に、市販の無電解ニッケルめっき浴及び無電解金めっき浴を用いて、ニッケル0.5μm、金0.03μmの条件でめっきを行い、めっき処理後150℃にて10分間、充分に乾燥した後、テープピーリングにより、硬化皮膜の剥がれの有無やめっきのしみ込みの有無を以下の基準で評価した。
◎:硬化皮膜に全く剥がれがないもの。
△:硬化皮膜にほんの僅かに剥がれがあるもの。
×:硬化皮膜に剥がれがあるもの。
ポリイミドフィルム(カプトン100EN、東レ・デュポン(株)製、厚さ25μm)に、前記のようにして作製したドライフィルムを、PETフィルム面を上面にして樹脂組成物層が接触するように重ね合わせ、真空ラミネーターにてラミネートした後、PETフィルムを剥離した。その後、150℃の熱風循環式乾燥炉にて60分間熱硬化させて作製した試験片を、50mm×50mmにカッターでカットした。カット後、硬化皮膜層を上面にして室温下に30分間静置した後、試験片の4隅の水平面からの反り量を測定し、その平均値を反り量とした。
ポリイミドフィルム(カプトン100EN、東レ・デュポン(株)製、厚さ25μm)に、前記のようにして作製したドライフィルムを、PETフィルム面を上面にして樹脂組成物層が接触するように重ね合わせ、真空ラミネーターにてラミネートした後、PETフィルムを剥離した。その後、150℃の熱風循環式乾燥炉にて60分間熱硬化させて作製した試験片を、10mm×80mmにカッターでカットした。カット後、硬化皮膜が外側になるように180°折り曲げ、折り曲げ部に1cm2当たり500gの荷重を60秒間加え、顕微鏡で折り曲げ部を観察し、以下の基準で評価した。
○:硬化皮膜にクラック発生がないもの。
×:硬化皮膜にクラック発生があるもの。
Claims (5)
- (A−1)2個以上のヒドロキシル基を有するポリオール成分がポリカーボネートジオール由来のものである、カルボキシル基及びエチレン性不飽和二重結合を有するウレタン樹脂、(A−2)2個以上のヒドロキシル基を有するポリオール成分がポリエーテルポリオール由来のものである、カルボキシル基及びエチレン性不飽和二重結合を有するウレタン樹脂、(B)光重合開始剤、(C)希釈剤、及び(D)エポキシ樹脂を含有し、前記ウレタン樹脂(A−1)と(A−2)の配合割合(質量比)が、(A−1):(A−2)=95:5〜60:40の範囲内にあることを特徴とする光硬化性・熱硬化性樹脂組成物。
- さらに(E)硬化促進剤を含有することを特徴とする請求項1に記載の光硬化性・熱硬化性樹脂組成物。
- ドライフィルムの形態にあることを特徴とする請求項1又は2に記載の光硬化性・熱硬化性樹脂組成物。
- 基材上に形成した請求項1乃至3のいずれか一項に記載の光硬化性・熱硬化性樹脂組成物の皮膜を露光及び現像後、活性エネルギー線照射後の加熱処理、もしくは加熱処理後の活性エネルギー線照射工程、又は加熱処理により仕上げ硬化して得られる硬化物。
- 請求項1乃至3のいずれか一項に記載の光硬化性・熱硬化性樹脂組成物の硬化物によりソルダーレジスト及び/又は導体回路層間の絶縁層が形成されてなるプリント配線板。
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