JP5388768B2 - ローカルインターコネクトを備えた半導体装置 - Google Patents
ローカルインターコネクトを備えた半導体装置 Download PDFInfo
- Publication number
- JP5388768B2 JP5388768B2 JP2009207011A JP2009207011A JP5388768B2 JP 5388768 B2 JP5388768 B2 JP 5388768B2 JP 2009207011 A JP2009207011 A JP 2009207011A JP 2009207011 A JP2009207011 A JP 2009207011A JP 5388768 B2 JP5388768 B2 JP 5388768B2
- Authority
- JP
- Japan
- Prior art keywords
- pair
- line structure
- gate line
- semiconductor device
- gate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000004065 semiconductor Substances 0.000 title claims description 29
- 239000000758 substrate Substances 0.000 claims description 24
- 229910052751 metal Inorganic materials 0.000 claims description 7
- 239000002184 metal Substances 0.000 claims description 7
- 125000006850 spacer group Chemical group 0.000 claims description 4
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 3
- 229910052721 tungsten Inorganic materials 0.000 claims description 3
- 239000010937 tungsten Substances 0.000 claims description 3
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims description 2
- 229920005591 polysilicon Polymers 0.000 claims description 2
- 239000010410 layer Substances 0.000 description 36
- 238000000034 method Methods 0.000 description 6
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 230000009977 dual effect Effects 0.000 description 3
- 238000002955 isolation Methods 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000005380 borophosphosilicate glass Substances 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 239000011229 interlayer Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000005360 phosphosilicate glass Substances 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000011982 device technology Methods 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76838—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the conductors
- H01L21/76895—Local interconnects; Local pads, as exemplified by patent document EP0896365
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
- H01L21/82—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
- H01L21/822—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being a semiconductor, using silicon technology
- H01L21/8232—Field-effect technology
- H01L21/8234—MIS technology, i.e. integration processes of field effect transistors of the conductor-insulator-semiconductor type
- H01L21/823475—MIS technology, i.e. integration processes of field effect transistors of the conductor-insulator-semiconductor type interconnection or wiring or contact manufacturing related aspects
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body
- H01L27/08—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including only semiconductor components of a single kind
- H01L27/085—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only
- H01L27/088—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only the components being field-effect transistors with insulated gate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/40—Electrodes ; Multistep manufacturing processes therefor
- H01L29/41—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions
- H01L29/417—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions carrying the current to be rectified, amplified or switched
- H01L29/41725—Source or drain electrodes for field effect devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/40—Electrodes ; Multistep manufacturing processes therefor
- H01L29/41—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions
- H01L29/423—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions not carrying the current to be rectified, amplified or switched
- H01L29/42312—Gate electrodes for field effect devices
- H01L29/42316—Gate electrodes for field effect devices for field-effect transistors
- H01L29/4232—Gate electrodes for field effect devices for field-effect transistors with insulated gate
- H01L29/42372—Gate electrodes for field effect devices for field-effect transistors with insulated gate characterised by the conducting layer, e.g. the length, the sectional shape or the lay-out
- H01L29/4238—Gate electrodes for field effect devices for field-effect transistors with insulated gate characterised by the conducting layer, e.g. the length, the sectional shape or the lay-out characterised by the surface lay-out
Description
100a、100b 活性層
101 第1対ソース/ドレイン領域
103 第2対ソース/ドレイン領域
110 分離構造
111 ゲート誘電体層
112 導電線
113 ゲート電極
115 ゲートスペーサ
116 第1ゲート線構造
118 第2ゲート線構造
120、130 誘電体層
132 導電プラグ
136 金属層
200 半導体装置
Claims (9)
- ローカルインターコネクトを備えた半導体装置であって、
基板上に配置され、実質的に同一線上にある第1ゲート線構造と第2ゲート線構造、
前記第1ゲート線構造の両側の前記基板に形成された第1対ソース/ドレイン領域と前記第2ゲート線構造の両側の前記基板に形成された第2対ソース/ドレイン領域、及び
前記第1ゲート線構造と前記第2ゲート線構造の両側の前記基板上に配置され、それらが前記第1対ソース/ドレイン領域のうちの1つと前記第2対ソース/ドレイン領域のうちの1つに接触された一対の導電線を含み、
前記第1ゲート線構造と前記第2ゲート線構造のそれぞれは、
前記基板上に配置されたゲート誘電体層、
前記ゲート誘電体層上に配置されたゲート電極、及び
前記ゲート電極の側壁に配置されたゲートスペーサを含む半導体装置。 - 前記ゲート電極は、ポリシリコンを含む請求項1に記載の半導体装置。
- 前記一対の導電線は、前記ゲート電極と同じレベルにある請求項1に記載の半導体装置。
- 前記第1と第2対ソース/ドレイン領域は、同じ導電型を有する請求項1に記載の半導体装置。
- 前記第1ゲート線構造と前記第2ゲート線構造の前記ゲート電極は、一体成形される請求項4に記載の半導体装置。
- 前記第1と第2対ソース/ドレイン領域は、異なる導電型を有する請求項1に記載の半導体装置。
- 前記一対の導電線は、実質的に前記第1ゲート線構造と前記第2ゲート線構造に平行する請求項1に記載の半導体装置。
- 前記一対の導電線は、タングステンを含む請求項1に記載の半導体装置。
- 前記一対の導電線に配置され、前記一対の導電線のうちの1つに接続された少なくとも1つの導電プラグ、及び
前記導電プラグに配置され、これに接続される金属層を更に含む請求項1に記載の半導体装置。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12/212,034 | 2008-09-17 | ||
US12/212,034 US8138554B2 (en) | 2008-09-17 | 2008-09-17 | Semiconductor device with local interconnects |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2010074158A JP2010074158A (ja) | 2010-04-02 |
JP5388768B2 true JP5388768B2 (ja) | 2014-01-15 |
Family
ID=42006445
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2009207011A Active JP5388768B2 (ja) | 2008-09-17 | 2009-09-08 | ローカルインターコネクトを備えた半導体装置 |
Country Status (5)
Country | Link |
---|---|
US (1) | US8138554B2 (ja) |
JP (1) | JP5388768B2 (ja) |
KR (1) | KR101203936B1 (ja) |
CN (1) | CN101677102B (ja) |
TW (1) | TWI396254B (ja) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9024418B2 (en) | 2013-03-14 | 2015-05-05 | Qualcomm Incorporated | Local interconnect structures for high density |
US9158877B2 (en) * | 2013-05-02 | 2015-10-13 | Taiwan Semiconductor Manufacturing Company, Ltd. | Standard cell metal structure directly over polysilicon structure |
DE102013110607B4 (de) * | 2013-05-02 | 2020-02-27 | Taiwan Semiconductor Manufacturing Company, Ltd. | Standardzellen-Metallstruktur direkt über Polysiliziumstruktur |
US9318476B2 (en) | 2014-03-03 | 2016-04-19 | Qualcomm Incorporated | High performance standard cell with continuous oxide definition and characterized leakage current |
US10177133B2 (en) | 2014-05-16 | 2019-01-08 | Taiwan Semiconductor Manufacturing Co., Ltd. | Semiconductor device including source/drain contact having height below gate stack |
US9349859B1 (en) | 2015-01-29 | 2016-05-24 | Taiwan Semiconductor Manufacturing Company, Ltd. | Top metal pads as local interconnectors of vertical transistors |
US10510688B2 (en) * | 2015-10-26 | 2019-12-17 | Taiwan Semiconductor Manufacturing Co., Ltd. | Via rail solution for high power electromigration |
CN106653679A (zh) * | 2015-11-03 | 2017-05-10 | 中芯国际集成电路制造(上海)有限公司 | 半导体器件及其形成方法 |
US10672708B2 (en) | 2015-11-30 | 2020-06-02 | Taiwan Semiconductor Manufacturing Co., Ltd. | Standard-cell layout structure with horn power and smart metal cut |
DE102016114779A1 (de) * | 2016-05-19 | 2017-11-23 | Taiwan Semiconductor Manufacturing Company, Ltd. | Struktur und Verfahren für ein Halbleiter-Bauelement |
US10692808B2 (en) | 2017-09-18 | 2020-06-23 | Qualcomm Incorporated | High performance cell design in a technology with high density metal routing |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0395957A (ja) * | 1989-09-08 | 1991-04-22 | Toshiba Corp | 半導体論理集積回路 |
JPH06204438A (ja) * | 1992-12-28 | 1994-07-22 | Kawasaki Steel Corp | 半導体装置 |
JP3394083B2 (ja) * | 1994-03-04 | 2003-04-07 | シャープ株式会社 | 半導体装置及びその製造方法 |
JP2000114262A (ja) * | 1998-10-05 | 2000-04-21 | Toshiba Corp | 半導体装置及びその製造方法 |
JP4535506B2 (ja) * | 2001-01-30 | 2010-09-01 | ルネサスエレクトロニクス株式会社 | 半導体集積回路装置の製造方法 |
JP2004111746A (ja) | 2002-09-19 | 2004-04-08 | Fujitsu Ltd | 半導体装置及びその製造方法 |
US20050064629A1 (en) * | 2003-09-22 | 2005-03-24 | Chen-Hua Yu | Tungsten-copper interconnect and method for fabricating the same |
JP2006202908A (ja) * | 2005-01-19 | 2006-08-03 | Matsushita Electric Ind Co Ltd | 半導体装置の配線構造、その製造方法および回路基板 |
US7701034B2 (en) * | 2005-01-21 | 2010-04-20 | Taiwan Semiconductor Manufacturing Company, Ltd. | Dummy patterns in integrated circuit fabrication |
DE102006001997B4 (de) * | 2006-01-16 | 2007-11-15 | Infineon Technologies Ag | Halbleiterschaltungsanordnung |
US7345344B2 (en) * | 2006-02-16 | 2008-03-18 | Freescale Semiconductor, Inc. | Embedded substrate interconnect for underside contact to source and drain regions |
US7733698B2 (en) * | 2007-03-21 | 2010-06-08 | Qimonda Ag | Memory device, a non-volatile semiconductor memory device and a method of forming a memory device |
-
2008
- 2008-09-17 US US12/212,034 patent/US8138554B2/en active Active
-
2009
- 2009-09-08 JP JP2009207011A patent/JP5388768B2/ja active Active
- 2009-09-16 CN CN2009101734177A patent/CN101677102B/zh active Active
- 2009-09-16 KR KR1020090087579A patent/KR101203936B1/ko active IP Right Grant
- 2009-09-17 TW TW098131332A patent/TWI396254B/zh active
Also Published As
Publication number | Publication date |
---|---|
CN101677102B (zh) | 2012-02-08 |
US8138554B2 (en) | 2012-03-20 |
KR101203936B1 (ko) | 2012-11-23 |
US20100065921A1 (en) | 2010-03-18 |
TW201013842A (en) | 2010-04-01 |
KR20100032344A (ko) | 2010-03-25 |
JP2010074158A (ja) | 2010-04-02 |
CN101677102A (zh) | 2010-03-24 |
TWI396254B (zh) | 2013-05-11 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5388768B2 (ja) | ローカルインターコネクトを備えた半導体装置 | |
US6734489B2 (en) | Semiconductor element and MIM-type capacitor formed in different layers of a semiconductor device | |
KR100491458B1 (ko) | 반도체 장치 | |
KR100791339B1 (ko) | 평탄화 저항 패턴을 포함하는 복합칩 반도체 소자 및 그제조 방법 | |
KR100675303B1 (ko) | 자기정렬 콘택을 갖는 반도체소자 및 그 형성방법 | |
KR100499175B1 (ko) | 반도체 장치 및 이의 제조 방법 | |
TWI685980B (zh) | 導體-絕緣體-導體電容器及其製造方法 | |
JP3590034B2 (ja) | 半導体容量素子及びその製造方法 | |
TWI755714B (zh) | 靜態隨機存取記憶體元件及其製造方法 | |
US6642604B2 (en) | Semiconductor device with resistor layer having heat radiation path to semiconductor substrate | |
US7768128B2 (en) | Semiconductor memory devices including a damascene wiring line | |
CN111463215A (zh) | 存储器结构及其制造方法 | |
KR100881488B1 (ko) | Mim 캐패시터를 갖는 반도체 소자 및 그의 제조방법 | |
KR20200091192A (ko) | 반도체 장치 및 그 제조 방법 | |
JP2006294979A (ja) | 半導体装置およびその製造方法 | |
KR100650192B1 (ko) | 반도체 소자 및 그의 형성 방법 | |
US6776622B2 (en) | Conductive contact structure and process for producing the same | |
TWI722546B (zh) | 半導體元件及其製造方法 | |
JP3488146B2 (ja) | 半導体装置及びその製造方法 | |
KR100727257B1 (ko) | 반도체 소자의 제조 방법 | |
JP2004104136A (ja) | 半導体集積回路装置の製造方法およびマスクパターンの生成方法 | |
TWI555122B (zh) | 半導體元件之內連線結構其製備方法 | |
KR20220071569A (ko) | 3차원 적층 반도체 소자 및 그 제조 방법 | |
CN114944360A (zh) | 半导体装置及其制造方法 | |
KR0172725B1 (ko) | 반도체 소자의 다층 금속배선 형성방법 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20120522 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20120524 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20120820 |
|
A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20120823 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20120924 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20130319 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20130617 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20130910 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20131008 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 5388768 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |