JP5388538B2 - 気体発生装置 - Google Patents
気体発生装置 Download PDFInfo
- Publication number
- JP5388538B2 JP5388538B2 JP2008275999A JP2008275999A JP5388538B2 JP 5388538 B2 JP5388538 B2 JP 5388538B2 JP 2008275999 A JP2008275999 A JP 2008275999A JP 2008275999 A JP2008275999 A JP 2008275999A JP 5388538 B2 JP5388538 B2 JP 5388538B2
- Authority
- JP
- Japan
- Prior art keywords
- gas
- bellows
- motor
- unit
- fluorine
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
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- 239000007789 gas Substances 0.000 claims description 222
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims description 55
- 229910000040 hydrogen fluoride Inorganic materials 0.000 claims description 55
- 239000011737 fluorine Substances 0.000 claims description 54
- 229910052731 fluorine Inorganic materials 0.000 claims description 54
- 239000002245 particle Substances 0.000 claims description 25
- 230000006835 compression Effects 0.000 claims description 24
- 238000007906 compression Methods 0.000 claims description 24
- 238000003860 storage Methods 0.000 claims description 19
- 230000008602 contraction Effects 0.000 claims description 13
- 230000005540 biological transmission Effects 0.000 claims description 6
- 230000007423 decrease Effects 0.000 claims description 4
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims 1
- 239000011833 salt mixture Substances 0.000 claims 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 51
- 238000001179 sorption measurement Methods 0.000 description 30
- 238000012545 processing Methods 0.000 description 16
- 230000000052 comparative effect Effects 0.000 description 15
- 239000003638 chemical reducing agent Substances 0.000 description 14
- 238000004519 manufacturing process Methods 0.000 description 8
- 238000005192 partition Methods 0.000 description 8
- 239000000463 material Substances 0.000 description 6
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 6
- 238000005299 abrasion Methods 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- PUZPDOWCWNUUKD-UHFFFAOYSA-M sodium fluoride Chemical compound [F-].[Na+] PUZPDOWCWNUUKD-UHFFFAOYSA-M 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 3
- 229910000792 Monel Inorganic materials 0.000 description 3
- 239000000470 constituent Substances 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 230000007257 malfunction Effects 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 239000010935 stainless steel Substances 0.000 description 3
- 229910001220 stainless steel Inorganic materials 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000005868 electrolysis reaction Methods 0.000 description 2
- 239000012530 fluid Substances 0.000 description 2
- 125000001153 fluoro group Chemical group F* 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 235000013024 sodium fluoride Nutrition 0.000 description 2
- 239000011775 sodium fluoride Substances 0.000 description 2
- HUAUNKAZQWMVFY-UHFFFAOYSA-M sodium;oxocalcium;hydroxide Chemical compound [OH-].[Na+].[Ca]=O HUAUNKAZQWMVFY-UHFFFAOYSA-M 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- PPFMPOUQEOXUNI-UHFFFAOYSA-N F.[Ne] Chemical compound F.[Ne] PPFMPOUQEOXUNI-UHFFFAOYSA-N 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- ISQINHMJILFLAQ-UHFFFAOYSA-N argon hydrofluoride Chemical compound F.[Ar] ISQINHMJILFLAQ-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- QKCGXXHCELUCKW-UHFFFAOYSA-N n-[4-[4-(dinaphthalen-2-ylamino)phenyl]phenyl]-n-naphthalen-2-ylnaphthalen-2-amine Chemical compound C1=CC=CC2=CC(N(C=3C=CC(=CC=3)C=3C=CC(=CC=3)N(C=3C=C4C=CC=CC4=CC=3)C=3C=C4C=CC=CC4=CC=3)C3=CC4=CC=CC=C4C=C3)=CC=C21 QKCGXXHCELUCKW-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
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- Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008275999A JP5388538B2 (ja) | 2008-10-27 | 2008-10-27 | 気体発生装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008275999A JP5388538B2 (ja) | 2008-10-27 | 2008-10-27 | 気体発生装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2010100506A JP2010100506A (ja) | 2010-05-06 |
| JP2010100506A5 JP2010100506A5 (enExample) | 2011-05-26 |
| JP5388538B2 true JP5388538B2 (ja) | 2014-01-15 |
Family
ID=42291501
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008275999A Active JP5388538B2 (ja) | 2008-10-27 | 2008-10-27 | 気体発生装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP5388538B2 (enExample) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5906742B2 (ja) * | 2012-01-05 | 2016-04-20 | セントラル硝子株式会社 | フッ素ガス生成装置 |
| JP6283551B2 (ja) * | 2014-01-20 | 2018-02-21 | 高砂熱学工業株式会社 | 二酸化塩素ガスの発生装置および発生方法 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3238102B2 (ja) * | 1997-07-04 | 2001-12-10 | 川崎重工業株式会社 | 粘性流体の供給制御装置および方法 |
| JP2000185908A (ja) * | 1998-12-24 | 2000-07-04 | Chisso Corp | 二酸化塩素水の製造方法 |
| JP3975312B2 (ja) * | 1999-03-30 | 2007-09-12 | 大阪瓦斯株式会社 | 廃塩酸の処理方法 |
| JP2003190762A (ja) * | 2001-12-27 | 2003-07-08 | L'air Liquide Sa Pour L'etude & L'exploitation Des Procedes Georges Claude | フッ化水素を含むフッ素ガスの生成装置 |
| JP3617835B2 (ja) * | 2002-09-20 | 2005-02-09 | 東洋炭素株式会社 | フッ素ガス発生装置 |
| JP2005061636A (ja) * | 2004-09-10 | 2005-03-10 | Toyo Tanso Kk | ハロゲンガス又はハロゲン含有ガスの供給方法、半導体製造装置のクリーニングルームのクリーニング方法、ハロゲンガス又はハロゲン含有ガスを用いる表面処理方法、半導体製造装置、及び表面処理装置 |
-
2008
- 2008-10-27 JP JP2008275999A patent/JP5388538B2/ja active Active
Also Published As
| Publication number | Publication date |
|---|---|
| JP2010100506A (ja) | 2010-05-06 |
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