JP5361709B2 - ヒュームドシリカ分散液 - Google Patents
ヒュームドシリカ分散液 Download PDFInfo
- Publication number
- JP5361709B2 JP5361709B2 JP2009508286A JP2009508286A JP5361709B2 JP 5361709 B2 JP5361709 B2 JP 5361709B2 JP 2009508286 A JP2009508286 A JP 2009508286A JP 2009508286 A JP2009508286 A JP 2009508286A JP 5361709 B2 JP5361709 B2 JP 5361709B2
- Authority
- JP
- Japan
- Prior art keywords
- fumed silica
- silica
- present
- dispersion
- silanized
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims description 43
- 239000006185 dispersion Substances 0.000 title claims description 18
- 229910021485 fumed silica Inorganic materials 0.000 title claims description 15
- 239000000463 material Substances 0.000 claims description 22
- 239000011248 coating agent Substances 0.000 claims description 10
- 238000000576 coating method Methods 0.000 claims description 10
- 239000002904 solvent Substances 0.000 claims description 9
- 238000000034 method Methods 0.000 claims description 7
- 239000003795 chemical substances by application Substances 0.000 claims description 5
- 239000011230 binding agent Substances 0.000 claims description 4
- 239000000654 additive Substances 0.000 claims description 3
- CCTFMNIEFHGTDU-UHFFFAOYSA-N 3-methoxypropyl acetate Chemical compound COCCCOC(C)=O CCTFMNIEFHGTDU-UHFFFAOYSA-N 0.000 claims description 2
- 230000000996 additive effect Effects 0.000 claims description 2
- 238000004519 manufacturing process Methods 0.000 claims 1
- 239000002245 particle Substances 0.000 description 11
- 239000003973 paint Substances 0.000 description 7
- 239000000377 silicon dioxide Substances 0.000 description 5
- -1 dimethylsilyl Chemical group 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- 229910002012 Aerosil® Inorganic materials 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 3
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000011324 bead Substances 0.000 description 3
- 238000000227 grinding Methods 0.000 description 3
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 3
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 2
- OAYXUHPQHDHDDZ-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethanol Chemical compound CCCCOCCOCCO OAYXUHPQHDHDDZ-UHFFFAOYSA-N 0.000 description 2
- YIWUKEYIRIRTPP-UHFFFAOYSA-N 2-ethylhexan-1-ol Chemical compound CCCCC(CC)CO YIWUKEYIRIRTPP-UHFFFAOYSA-N 0.000 description 2
- XLLIQLLCWZCATF-UHFFFAOYSA-N 2-methoxyethyl acetate Chemical compound COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- YNQLUTRBYVCPMQ-UHFFFAOYSA-N Ethylbenzene Chemical compound CCC1=CC=CC=C1 YNQLUTRBYVCPMQ-UHFFFAOYSA-N 0.000 description 2
- BZLVMXJERCGZMT-UHFFFAOYSA-N Methyl tert-butyl ether Chemical compound COC(C)(C)C BZLVMXJERCGZMT-UHFFFAOYSA-N 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- RWGFKTVRMDUZSP-UHFFFAOYSA-N cumene Chemical compound CC(C)C1=CC=CC=C1 RWGFKTVRMDUZSP-UHFFFAOYSA-N 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 2
- LIKFHECYJZWXFJ-UHFFFAOYSA-N dimethyldichlorosilane Chemical compound C[Si](C)(Cl)Cl LIKFHECYJZWXFJ-UHFFFAOYSA-N 0.000 description 2
- 239000002270 dispersing agent Substances 0.000 description 2
- 238000010348 incorporation Methods 0.000 description 2
- ZXEKIIBDNHEJCQ-UHFFFAOYSA-N isobutanol Chemical compound CC(C)CO ZXEKIIBDNHEJCQ-UHFFFAOYSA-N 0.000 description 2
- HJOVHMDZYOCNQW-UHFFFAOYSA-N isophorone Chemical compound CC1=CC(=O)CC(C)(C)C1 HJOVHMDZYOCNQW-UHFFFAOYSA-N 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 2
- LQNUZADURLCDLV-UHFFFAOYSA-N nitrobenzene Chemical compound [O-][N+](=O)C1=CC=CC=C1 LQNUZADURLCDLV-UHFFFAOYSA-N 0.000 description 2
- 239000000049 pigment Substances 0.000 description 2
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 1
- OZXIZRZFGJZWBF-UHFFFAOYSA-N 1,3,5-trimethyl-2-(2,4,6-trimethylphenoxy)benzene Chemical compound CC1=CC(C)=CC(C)=C1OC1=C(C)C=C(C)C=C1C OZXIZRZFGJZWBF-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- QDRMUFJWOJOOKR-UHFFFAOYSA-N 1-(1-hydroxypropan-2-yloxy)butan-2-ol Chemical compound CCC(O)COC(C)CO QDRMUFJWOJOOKR-UHFFFAOYSA-N 0.000 description 1
- MWGRRMQNSQNFID-UHFFFAOYSA-N 1-(2-methylpropoxy)propan-2-ol Chemical compound CC(C)COCC(C)O MWGRRMQNSQNFID-UHFFFAOYSA-N 0.000 description 1
- BVALZCVRLDMXOQ-UHFFFAOYSA-N 1-nitropentane Chemical compound CCCCC[N+]([O-])=O BVALZCVRLDMXOQ-UHFFFAOYSA-N 0.000 description 1
- FPZWZCWUIYYYBU-UHFFFAOYSA-N 2-(2-ethoxyethoxy)ethyl acetate Chemical compound CCOCCOCCOC(C)=O FPZWZCWUIYYYBU-UHFFFAOYSA-N 0.000 description 1
- PTTPXKJBFFKCEK-UHFFFAOYSA-N 2-Methyl-4-heptanone Chemical compound CC(C)CC(=O)CC(C)C PTTPXKJBFFKCEK-UHFFFAOYSA-N 0.000 description 1
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
- NQBXSWAWVZHKBZ-UHFFFAOYSA-N 2-butoxyethyl acetate Chemical compound CCCCOCCOC(C)=O NQBXSWAWVZHKBZ-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- JOIWPCUDRRYOQH-UHFFFAOYSA-N 2-nitropentane Chemical compound CCCC(C)[N+]([O-])=O JOIWPCUDRRYOQH-UHFFFAOYSA-N 0.000 description 1
- YEYKMVJDLWJFOA-UHFFFAOYSA-N 2-propoxyethanol Chemical compound CCCOCCO YEYKMVJDLWJFOA-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- HAUZXMGCZRCBBO-UHFFFAOYSA-N C(C)(C)OCC(C)O.C(C)OCC(C)O Chemical compound C(C)(C)OCC(C)O.C(C)OCC(C)O HAUZXMGCZRCBBO-UHFFFAOYSA-N 0.000 description 1
- PJFUTQYRUBOSQT-UHFFFAOYSA-N C1(OCCO1)=O.C(C)(=O)OCCCOCC Chemical compound C1(OCCO1)=O.C(C)(=O)OCCCOCC PJFUTQYRUBOSQT-UHFFFAOYSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 1
- KXKVLQRXCPHEJC-UHFFFAOYSA-N acetic acid trimethyl ester Natural products COC(C)=O KXKVLQRXCPHEJC-UHFFFAOYSA-N 0.000 description 1
- 229920006243 acrylic copolymer Polymers 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- QGJOPFRUJISHPQ-NJFSPNSNSA-N carbon disulfide-14c Chemical compound S=[14C]=S QGJOPFRUJISHPQ-NJFSPNSNSA-N 0.000 description 1
- HPXRVTGHNJAIIH-UHFFFAOYSA-N cyclohexanol Chemical compound OC1CCCCC1 HPXRVTGHNJAIIH-UHFFFAOYSA-N 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- GJRQTCIYDGXPES-UHFFFAOYSA-N iso-butyl acetate Natural products CC(C)COC(C)=O GJRQTCIYDGXPES-UHFFFAOYSA-N 0.000 description 1
- FGKJLKRYENPLQH-UHFFFAOYSA-M isocaproate Chemical compound CC(C)CCC([O-])=O FGKJLKRYENPLQH-UHFFFAOYSA-M 0.000 description 1
- OQAGVSWESNCJJT-UHFFFAOYSA-N isovaleric acid methyl ester Natural products COC(=O)CC(C)C OQAGVSWESNCJJT-UHFFFAOYSA-N 0.000 description 1
- SHOJXDKTYKFBRD-UHFFFAOYSA-N mesityl oxide Natural products CC(C)=CC(C)=O SHOJXDKTYKFBRD-UHFFFAOYSA-N 0.000 description 1
- UIUXUFNYAYAMOE-UHFFFAOYSA-N methylsilane Chemical compound [SiH3]C UIUXUFNYAYAMOE-UHFFFAOYSA-N 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000011164 primary particle Substances 0.000 description 1
- RUOJZAUFBMNUDX-UHFFFAOYSA-N propylene carbonate Chemical compound CC1COC(=O)O1 RUOJZAUFBMNUDX-UHFFFAOYSA-N 0.000 description 1
- 238000002407 reforming Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 239000002966 varnish Substances 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D17/00—Pigment pastes, e.g. for mixing in paints
- C09D17/004—Pigment pastes, e.g. for mixing in paints containing an inorganic pigment
- C09D17/007—Metal oxide
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
- C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
- C09C1/28—Compounds of silicon
- C09C1/30—Silicic acid
- C09C1/3081—Treatment with organo-silicon compounds
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/60—Additives non-macromolecular
- C09D7/61—Additives non-macromolecular inorganic
- C09D7/62—Additives non-macromolecular inorganic modified by treatment with other compounds
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/66—Additives characterised by particle size
- C09D7/67—Particle size smaller than 100 nm
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/66—Additives characterised by particle size
- C09D7/68—Particle size between 100-1000 nm
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/66—Additives characterised by particle size
- C09D7/69—Particle size larger than 1000 nm
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/64—Nanometer sized, i.e. from 1-100 nanometer
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/12—Surface area
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/19—Oil-absorption capacity, e.g. DBP values
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/34—Silicon-containing compounds
- C08K3/36—Silica
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K9/00—Use of pretreated ingredients
- C08K9/04—Ingredients treated with organic substances
- C08K9/06—Ingredients treated with organic substances with silicon-containing compounds
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
- Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]
- Y10T428/2991—Coated
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
- Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]
- Y10T428/2991—Coated
- Y10T428/2993—Silicic or refractory material containing [e.g., tungsten oxide, glass, cement, etc.]
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Wood Science & Technology (AREA)
- Nanotechnology (AREA)
- Inorganic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Composite Materials (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Paints Or Removers (AREA)
- Pigments, Carbon Blacks, Or Wood Stains (AREA)
- Silicon Compounds (AREA)
Description
BET表面積 m2/g: 25〜400
平均一次粒子サイズ nm: 5〜50
pH: 3〜10
炭素含有率 質量%: 0.1〜10
DBP価 %: <200
0.01μm〜1.5μmの範囲内の20質量%〜80質量%
1.5μm〜4.0μmの範囲内の2質量%〜80質量%。
0.2μm〜1.5μmの範囲内の60質量%〜95質量%
1.5μm〜3.5μmの範囲内の5質量%〜40質量%。
実施例1〜3において、シラン化された、構造的に改質されたヒュームドシリカのAerosil(登録商標)R9200を、公知の方法によって、クリアコート系中に取り込む。実施例4によって、シラン化された、構造的に改質されたヒュームドシリカを、本発明の分散液によって取り込む。
Dispers 652:Tego社製の分散剤
Macrynal SM 565:USBのSurface Specialties社製のアクリルコポリマー
Solvesso 100:Imperial Oil社製の芳香族混合物
BM:Getzmann社製のDispermat SL 5
*)粒ゲージ30μmは、使用できない塗料材料を意味する
**)Degussa AGの技術情報第1284号
***)Coulter LS230 Micro Volumeモジュールにおけるレーザー回折によって、試料を測定した。純粋なワニス系又は溶剤を測定媒体として導入し、かつ試料を数滴添加することによって行った。
****)Degussa AGの技術情報第1204号
Claims (4)
- シラン化された、構造的に改質されたシリカ、及び溶剤としてメトキシプロピルアセテートのみを含有することを特徴とする、クリアコート材料用のヒュームドシリカの分散液。
- さらに添加剤を含有することを特徴とする、請求項1に記載のヒュームドシリカの分散液。
- 請求項1に記載の分散液を、少なくとも1つのバインダーと混合することを特徴とする、溶剤系の塗料材料の製造方法。
- 少なくとも1つの硬化剤を添加することを特徴とする、請求項3に記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102006020987.7 | 2006-05-04 | ||
DE102006020987A DE102006020987A1 (de) | 2006-05-04 | 2006-05-04 | Dispersion von pyrogen hergestelltem Siliciumdioxid |
PCT/EP2007/053370 WO2007128636A2 (en) | 2006-05-04 | 2007-04-05 | Fumed silica dispersion |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2009535469A JP2009535469A (ja) | 2009-10-01 |
JP5361709B2 true JP5361709B2 (ja) | 2013-12-04 |
Family
ID=38269028
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2009508286A Expired - Fee Related JP5361709B2 (ja) | 2006-05-04 | 2007-04-05 | ヒュームドシリカ分散液 |
Country Status (6)
Country | Link |
---|---|
US (1) | US7722714B2 (ja) |
EP (1) | EP2013292A2 (ja) |
JP (1) | JP5361709B2 (ja) |
CN (1) | CN101405351A (ja) |
DE (1) | DE102006020987A1 (ja) |
WO (1) | WO2007128636A2 (ja) |
Families Citing this family (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8258206B2 (en) | 2006-01-30 | 2012-09-04 | Ashland Licensing And Intellectual Property, Llc | Hydrophobic coating compositions for drag reduction |
US20080221263A1 (en) * | 2006-08-31 | 2008-09-11 | Subbareddy Kanagasabapathy | Coating compositions for producing transparent super-hydrophobic surfaces |
DE102007024095A1 (de) * | 2007-05-22 | 2008-11-27 | Evonik Degussa Gmbh | Hydrophobe pyrogen hergestellte Kieselsäure und Silikonkautschukmassen, enthaltend die pyrogene Kieselsäure |
EP2070992A1 (de) * | 2007-12-11 | 2009-06-17 | Evonik Degussa GmbH | Lacksysteme |
EP2107086B1 (de) * | 2008-04-02 | 2012-05-02 | Evonik Degussa GmbH | Dispersion enthaltend hydrophobierte Siliciumdioxidpartikel |
ES2644759T3 (es) * | 2008-07-18 | 2017-11-30 | Evonik Degussa Gmbh | Dispersión de partículas de dióxido de silicio hidrofobizadas y granulado de la misma |
DE102008057524A1 (de) | 2008-11-15 | 2010-05-20 | Basf Coatings Ag | Kratzfestbeschichtete Polycarbonate mit hoher Transparenz, Verfahren zu deren Herstellung und deren Verwendung |
US8147607B2 (en) | 2009-10-26 | 2012-04-03 | Ashland Licensing And Intellectual Property Llc | Hydrophobic self-cleaning coating compositions |
WO2011109302A2 (en) * | 2010-03-01 | 2011-09-09 | Cabot Corporation | Coating comprising multipopulation fumed silica particles |
ES2653617T3 (es) * | 2011-02-02 | 2018-02-08 | Ashland Licensing And Intellectual Property, Llc | Recubrimiento de gel resistente al rayado |
DE102011088787A1 (de) | 2011-12-16 | 2013-06-20 | Evonik Industries Ag | Siloxannitrone und deren Anwendung |
US11026424B2 (en) * | 2016-05-25 | 2021-06-08 | University Of Florida Research Foundation, Incorporated | Texturized insecticidal formulation |
FR3055631B1 (fr) | 2016-09-08 | 2018-09-28 | Total Marketing Services | Bitume solide a temperature ambiante |
FR3055623B1 (fr) | 2016-09-08 | 2020-04-17 | Total Marketing Services | Liant clair solide a froid |
FR3055568B1 (fr) | 2016-09-08 | 2020-01-31 | Total Marketing Services | Procede de fabrication de materiau sous forme de granules utilisable comme liant routier ou liant d’etancheite et dispositif pour sa fabrication |
FR3055630B1 (fr) | 2016-09-08 | 2020-07-10 | Total Marketing Services | Composition bitumineuse pour enrobes a module eleve |
FR3055633B1 (fr) | 2016-09-08 | 2020-06-12 | Total Marketing Services | Granules de brai solides a temperature ambiante |
FR3059674B1 (fr) | 2016-12-07 | 2018-11-23 | Total Marketing Services | Bitume solide a temperature ambiante |
FR3059673B1 (fr) | 2016-12-07 | 2018-11-23 | Total Marketing Services | Liants solides |
FR3061190B1 (fr) | 2016-12-22 | 2022-05-27 | Total Marketing Services | Liant solide a temperature ambiante |
FR3061191B1 (fr) | 2016-12-22 | 2019-05-24 | Total Marketing Services | Composition d’asphalte coule pour la realisation de revetements |
EP3467052B1 (de) | 2017-10-06 | 2022-04-13 | Evonik Operations GmbH | Wässrige dispersion enthaltend siliziumdioxid und trimethyl 1,6-hexamethylendiamin |
IT201900025168A1 (it) * | 2019-12-20 | 2021-06-20 | Carcano Antonio S P A | Composizione, in particolare utilizzabile quale vernice di copertura di superfici di lastre o componenti |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL246681A (ja) * | 1958-12-24 | |||
JPH06220326A (ja) * | 1993-01-25 | 1994-08-09 | Matsushita Electric Works Ltd | コーティング用組成物 |
JP2004285361A (ja) * | 1993-08-27 | 2004-10-14 | Asahi Glass Co Ltd | 含フッ素溶媒に分散されてなるオルガノゾルおよびその用途 |
JP3465810B2 (ja) * | 1996-10-01 | 2003-11-10 | 日本油脂Basfコーティングス株式会社 | 塗料組成物 |
JPH11343396A (ja) * | 1998-04-03 | 1999-12-14 | Kansai Paint Co Ltd | エポキシ基含有コロイド粒子有機溶剤液、エポキシ基含有コロイド粒子、このコロイド粒子を含む活性エネルギー線硬化型組成物及びそれを使用した被膜形成方法 |
JP4716621B2 (ja) * | 2001-08-09 | 2011-07-06 | 電気化学工業株式会社 | 高濃度シリカスラリー及びシリカスラリーの製造方法 |
DE10239425A1 (de) * | 2002-08-28 | 2004-03-11 | Degussa Ag | Lackformulierungen |
DE10239423A1 (de) * | 2002-08-28 | 2004-03-11 | Degussa Ag | Kieselsäure |
JP4044813B2 (ja) * | 2002-09-18 | 2008-02-06 | 電気化学工業株式会社 | 超微粉シリカ分散スラリーの製造方法 |
US7544726B2 (en) * | 2002-10-14 | 2009-06-09 | Akzo Nobel N.V. | Colloidal silica composition |
US7553888B2 (en) * | 2002-10-14 | 2009-06-30 | Akzo Nobel N.V. | Aqueous dispersion |
DE10330020A1 (de) * | 2003-07-03 | 2005-01-20 | Degussa Ag | Hochgefüllte Silan-Zubereitung |
DE10362060B4 (de) * | 2003-10-21 | 2009-07-09 | Altana Coatings & Sealants Gmbh | Verpackungsmaterial mit einer Barriereschicht für Gase |
US20080199618A1 (en) * | 2005-07-07 | 2008-08-21 | Arkema Inc. | Method of Strengthening a Brittle Oxide Substrate with a Weatherable Coating |
-
2006
- 2006-05-04 DE DE102006020987A patent/DE102006020987A1/de not_active Withdrawn
-
2007
- 2007-04-05 EP EP07727838A patent/EP2013292A2/en not_active Withdrawn
- 2007-04-05 US US12/299,081 patent/US7722714B2/en not_active Expired - Fee Related
- 2007-04-05 JP JP2009508286A patent/JP5361709B2/ja not_active Expired - Fee Related
- 2007-04-05 WO PCT/EP2007/053370 patent/WO2007128636A2/en active Application Filing
- 2007-04-05 CN CNA200780009726XA patent/CN101405351A/zh active Pending
Also Published As
Publication number | Publication date |
---|---|
WO2007128636A3 (en) | 2008-01-31 |
DE102006020987A1 (de) | 2007-11-08 |
WO2007128636A2 (en) | 2007-11-15 |
US20090120328A1 (en) | 2009-05-14 |
CN101405351A (zh) | 2009-04-08 |
US7722714B2 (en) | 2010-05-25 |
JP2009535469A (ja) | 2009-10-01 |
EP2013292A2 (en) | 2009-01-14 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5361709B2 (ja) | ヒュームドシリカ分散液 | |
KR101704889B1 (ko) | 폴리에테르아민으로 처리된 산화된 카본 블랙 및 그를 포함하는 코팅 조성물 | |
JP5583138B2 (ja) | 顔料粒状物、その製造方法及び使用 | |
JP2010528135A (ja) | シラン処理され且つ粉砕されたフュームドシリカ | |
JP2010528132A (ja) | シラン処理され且つ粉砕されたフュームドシリカ | |
US8399093B2 (en) | Process for preparing redispersible surface-modified silicon dioxide particles | |
EP1530614A1 (en) | Silica | |
JP2000512327A (ja) | 修飾炭素生成物及び両親媒性イオン含有組成物 | |
EP2144968B1 (de) | Dispergierbare nanopartikel | |
JP7372517B2 (ja) | 複合材料及びその製造方法、並びにその用途 | |
TWI419946B (zh) | 包含疏水化二氧化矽粒子之漆料調配物及分散液 | |
JP2023516471A (ja) | 明色伝導性コーティング | |
US20110123806A1 (en) | Dispersion of hydrophobicized silicon dioxide particles and granules thereof | |
JP4438925B2 (ja) | 改質カーボンブラック粒子粉末及びその製造法、当該改質カーボンブラック粒子粉末を含有する塗料及び樹脂組成物 | |
JP4407789B2 (ja) | 改質カーボンブラック粒子粉末及びその製造法、当該改質カーボンブラック粒子粉末を含有する塗料及び樹脂組成物 | |
JP2017020041A (ja) | エアロゲル及び該エアロゲルからなる艶消し剤 | |
JP2004143342A (ja) | 表面改質有機顔料及びその製造法、該表面改質有機顔料を用いた塗料、該表面改質有機顔料を用いた樹脂組成物及び該表面改質有機顔料を用いたゴム組成物 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
RD04 | Notification of resignation of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7424 Effective date: 20101228 Free format text: JAPANESE INTERMEDIATE CODE: A7424 Effective date: 20101227 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20110818 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20110824 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20111122 |
|
A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20111130 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20111220 |
|
A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20111228 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20120123 |
|
A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20120130 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20120224 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20121130 |
|
RD03 | Notification of appointment of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7423 Effective date: 20121221 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20130228 |
|
A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20130307 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20130313 |
|
A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20130321 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20130522 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20130805 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20130903 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 5361709 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
LAPS | Cancellation because of no payment of annual fees |