JP5340807B2 - 半導体ウエーハの加工方法 - Google Patents
半導体ウエーハの加工方法 Download PDFInfo
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- JP5340807B2 JP5340807B2 JP2009123435A JP2009123435A JP5340807B2 JP 5340807 B2 JP5340807 B2 JP 5340807B2 JP 2009123435 A JP2009123435 A JP 2009123435A JP 2009123435 A JP2009123435 A JP 2009123435A JP 5340807 B2 JP5340807 B2 JP 5340807B2
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- semiconductor wafer
- laser beam
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67092—Apparatus for mechanical treatment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/03—Observing, e.g. monitoring, the workpiece
- B23K26/032—Observing, e.g. monitoring, the workpiece using optical means
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/062—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam
- B23K26/0622—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam by shaping pulses
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
- B23K26/0648—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms comprising lenses
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/073—Shaping the laser spot
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/08—Devices involving relative movement between laser beam and workpiece
- B23K26/082—Scanning systems, i.e. devices involving movement of the laser beam relative to the laser head
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/08—Devices involving relative movement between laser beam and workpiece
- B23K26/083—Devices involving movement of the workpiece in at least one axial direction
- B23K26/0853—Devices involving movement of the workpiece in at least in two axial directions, e.g. in a plane
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/08—Devices involving relative movement between laser beam and workpiece
- B23K26/0869—Devices involving movement of the laser head in at least one axial direction
- B23K26/0876—Devices involving movement of the laser head in at least one axial direction in at least two axial directions
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/362—Laser etching
- B23K26/364—Laser etching for making a groove or trench, e.g. for scribing a break initiation groove
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/40—Removing material taking account of the properties of the material involved
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2101/00—Articles made by soldering, welding or cutting
- B23K2101/36—Electric or electronic devices
- B23K2101/40—Semiconductor devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/50—Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26
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- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Laser Beam Processing (AREA)
- Dicing (AREA)
Description
波長 :355nm(上記光源の第3高調波発生)
平均出力 :7W
繰り返し周波数 :10kHz
パルス幅 :30ns
加工送り速度 :200mm/s
本発明のデバイスの加工方法では、半導体ウエーハWを分割して得られたデバイスDの抗折強度の向上が目的であり、レーザ加工方法で製造されたデバイスDの抗折強度が800MPa以上となる加工条件を調べるために以下の実験を行った。
T 粘着テープ(ダイシングテープ)
F 環状フレーム
D デバイス
2 レーザ加工装置
28 チャックテーブル
34 レーザビーム照射ユニット
36 集光器
74 分割溝
Claims (3)
- 交差して形成された複数のストリートによって区画された各領域にそれぞれデバイスを有する半導体ウエーハの加工方法であって、
半導体ウエーハを個々のデバイスに分割する分割工程と、
該分割工程を実施した後、デバイスの外周にパルス幅が2ns以下であり、ピークエネルギー密度が5GW/cm2〜200GW/cm2のデバイスに対して吸収性を有する波長のパルスレーザビームを照射して面取り加工を施す面取り加工工程と、
を備えたことを特徴とする半導体ウエーハの加工方法。 - 前期面取り加工工程では、デバイスの外周に集光されるスポットがスポット径の16/20〜19/20の範囲内で重なるように半導体ウエーハを加工送りして面取り加工を施すことを特徴とする請求項1記載の半導体ウエーハの加工方法。
- 該スポット径はφ5μm〜φ15μmの範囲内である請求項2記載の半導体ウエーハの加工方法。
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009123435A JP5340807B2 (ja) | 2009-05-21 | 2009-05-21 | 半導体ウエーハの加工方法 |
TW099107583A TWI485763B (zh) | 2009-05-21 | 2010-03-16 | Component processing method |
KR1020100032710A KR101584819B1 (ko) | 2009-05-21 | 2010-04-09 | 반도체 웨이퍼의 가공 방법 |
US12/770,290 US8258045B2 (en) | 2009-05-21 | 2010-04-29 | Device processing method |
CN201010185045.2A CN101890579B (zh) | 2009-05-21 | 2010-05-21 | 器件加工方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009123435A JP5340807B2 (ja) | 2009-05-21 | 2009-05-21 | 半導体ウエーハの加工方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2010272698A JP2010272698A (ja) | 2010-12-02 |
JP5340807B2 true JP5340807B2 (ja) | 2013-11-13 |
Family
ID=43100008
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2009123435A Active JP5340807B2 (ja) | 2009-05-21 | 2009-05-21 | 半導体ウエーハの加工方法 |
Country Status (5)
Country | Link |
---|---|
US (1) | US8258045B2 (ja) |
JP (1) | JP5340807B2 (ja) |
KR (1) | KR101584819B1 (ja) |
CN (1) | CN101890579B (ja) |
TW (1) | TWI485763B (ja) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9016552B2 (en) * | 2013-03-15 | 2015-04-28 | Sanmina Corporation | Method for forming interposers and stacked memory devices |
JP2015170675A (ja) * | 2014-03-06 | 2015-09-28 | 株式会社ディスコ | 板状物の加工方法 |
US10406634B2 (en) * | 2015-07-01 | 2019-09-10 | Apple Inc. | Enhancing strength in laser cutting of ceramic components |
JP6666173B2 (ja) * | 2016-03-09 | 2020-03-13 | 株式会社ディスコ | レーザー加工装置 |
JP6841030B2 (ja) * | 2016-12-26 | 2021-03-10 | 日本精機株式会社 | ヘッドアップディスプレイ装置及び同製造方法 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
AU4398700A (en) * | 1999-04-07 | 2000-10-23 | Siemens Solar Gmbh | Device and method for removing thin layers on a support material |
JP3408805B2 (ja) * | 2000-09-13 | 2003-05-19 | 浜松ホトニクス株式会社 | 切断起点領域形成方法及び加工対象物切断方法 |
JP3722731B2 (ja) * | 2000-09-13 | 2005-11-30 | 浜松ホトニクス株式会社 | レーザ加工方法 |
ATE534142T1 (de) * | 2002-03-12 | 2011-12-15 | Hamamatsu Photonics Kk | Verfahren zum auftrennen eines substrats |
JP2003275884A (ja) | 2002-03-22 | 2003-09-30 | Sumitomo Heavy Ind Ltd | レーザを用いた基板切断方法及び切断装置 |
US7119351B2 (en) * | 2002-05-17 | 2006-10-10 | Gsi Group Corporation | Method and system for machine vision-based feature detection and mark verification in a workpiece or wafer marking system |
JP2005228892A (ja) * | 2004-02-12 | 2005-08-25 | Toshiba Corp | 半導体ウェーハと半導体素子およびその製造方法 |
US20060189091A1 (en) * | 2004-11-11 | 2006-08-24 | Bo Gu | Method and system for laser hard marking |
JP4942313B2 (ja) | 2005-07-07 | 2012-05-30 | 株式会社ディスコ | ウエーハのレーザー加工方法 |
JP2008071870A (ja) * | 2006-09-13 | 2008-03-27 | Toshiba Corp | 半導体素子の製造方法 |
-
2009
- 2009-05-21 JP JP2009123435A patent/JP5340807B2/ja active Active
-
2010
- 2010-03-16 TW TW099107583A patent/TWI485763B/zh active
- 2010-04-09 KR KR1020100032710A patent/KR101584819B1/ko active IP Right Grant
- 2010-04-29 US US12/770,290 patent/US8258045B2/en active Active
- 2010-05-21 CN CN201010185045.2A patent/CN101890579B/zh active Active
Also Published As
Publication number | Publication date |
---|---|
CN101890579A (zh) | 2010-11-24 |
JP2010272698A (ja) | 2010-12-02 |
KR101584819B1 (ko) | 2016-01-13 |
CN101890579B (zh) | 2014-07-30 |
US8258045B2 (en) | 2012-09-04 |
US20100297855A1 (en) | 2010-11-25 |
TWI485763B (zh) | 2015-05-21 |
KR20100126186A (ko) | 2010-12-01 |
TW201113943A (en) | 2011-04-16 |
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