JP5313866B2 - 金属の除去速度を制御するためのハロゲン化物アニオン - Google Patents

金属の除去速度を制御するためのハロゲン化物アニオン Download PDF

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Publication number
JP5313866B2
JP5313866B2 JP2009501475A JP2009501475A JP5313866B2 JP 5313866 B2 JP5313866 B2 JP 5313866B2 JP 2009501475 A JP2009501475 A JP 2009501475A JP 2009501475 A JP2009501475 A JP 2009501475A JP 5313866 B2 JP5313866 B2 JP 5313866B2
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Prior art keywords
bromide
chloride
polishing
substrate
chemical mechanical
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Japanese (ja)
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JP2009530853A (ja
JP2009530853A5 (enExample
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リ，ショウチャン
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キャボット マイクロエレクトロニクス コーポレイション
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    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/02—Polishing compositions containing abrasives or grinding agents
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Weting (AREA)
JP2009501475A 2006-03-23 2007-03-16 金属の除去速度を制御するためのハロゲン化物アニオン Expired - Fee Related JP5313866B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11/388,085 US7820067B2 (en) 2006-03-23 2006-03-23 Halide anions for metal removal rate control
US11/388,085 2006-03-23
PCT/US2007/006709 WO2007111855A2 (en) 2006-03-23 2007-03-16 Halide anions for metal removal rate control

Publications (3)

Publication Number Publication Date
JP2009530853A JP2009530853A (ja) 2009-08-27
JP2009530853A5 JP2009530853A5 (enExample) 2010-05-06
JP5313866B2 true JP5313866B2 (ja) 2013-10-09

Family

ID=38450247

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009501475A Expired - Fee Related JP5313866B2 (ja) 2006-03-23 2007-03-16 金属の除去速度を制御するためのハロゲン化物アニオン

Country Status (9)

Country Link
US (1) US7820067B2 (enExample)
EP (1) EP1996664B1 (enExample)
JP (1) JP5313866B2 (enExample)
KR (1) KR101364318B1 (enExample)
CN (1) CN101389724B (enExample)
IL (1) IL192550A0 (enExample)
MY (1) MY145564A (enExample)
TW (1) TWI343406B (enExample)
WO (1) WO2007111855A2 (enExample)

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US8591763B2 (en) * 2006-03-23 2013-11-26 Cabot Microelectronics Corporation Halide anions for metal removal rate control
US8425797B2 (en) * 2008-03-21 2013-04-23 Cabot Microelectronics Corporation Compositions for polishing aluminum/copper and titanium in damascene structures
US8226840B2 (en) * 2008-05-02 2012-07-24 Micron Technology, Inc. Methods of removing silicon dioxide
US20100096584A1 (en) * 2008-10-22 2010-04-22 Fujimi Corporation Polishing Composition and Polishing Method Using the Same
US10858544B2 (en) * 2018-05-24 2020-12-08 Taiwan Semiconductor Manufacturing Company Ltd. Chemical mechanical polishing slurry and chemical mechanical polishing process using the same
EP3926663A4 (en) * 2019-02-13 2022-12-21 Tokuyama Corporation SEMICONDUCTOR WAFER TREATMENT LIQUID WITH HYPOCHLORITIONS AND PH BUFFER
CN110052909B (zh) * 2019-03-25 2020-08-04 东阳市恒业钢带有限公司 一种钢带无尘环保型抛光装置
CN114180831B (zh) * 2021-12-29 2024-04-02 中国建筑材料科学研究总院有限公司 一种可光刻玻璃及其微结构加工方法

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US6614529B1 (en) 1992-12-28 2003-09-02 Applied Materials, Inc. In-situ real-time monitoring technique and apparatus for endpoint detection of thin films during chemical/mechanical polishing planarization
US5658183A (en) 1993-08-25 1997-08-19 Micron Technology, Inc. System for real-time control of semiconductor wafer polishing including optical monitoring
US5433651A (en) 1993-12-22 1995-07-18 International Business Machines Corporation In-situ endpoint detection and process monitoring method and apparatus for chemical-mechanical polishing
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US5893796A (en) 1995-03-28 1999-04-13 Applied Materials, Inc. Forming a transparent window in a polishing pad for a chemical mechanical polishing apparatus
US5964643A (en) 1995-03-28 1999-10-12 Applied Materials, Inc. Apparatus and method for in-situ monitoring of chemical mechanical polishing operations
US5838447A (en) 1995-07-20 1998-11-17 Ebara Corporation Polishing apparatus including thickness or flatness detector
WO1998004646A1 (en) 1996-07-25 1998-02-05 Ekc Technology, Inc. Chemical mechanical polishing composition and process
US5872633A (en) 1996-07-26 1999-02-16 Speedfam Corporation Methods and apparatus for detecting removal of thin film layers during planarization
US6039891A (en) 1996-09-24 2000-03-21 Cabot Corporation Multi-oxidizer precursor for chemical mechanical polishing
US5958288A (en) * 1996-11-26 1999-09-28 Cabot Corporation Composition and slurry useful for metal CMP
US6294027B1 (en) 1997-10-21 2001-09-25 Lam Research Corporation Methods and apparatus for cleaning semiconductor substrates after polishing of copper film
US6435947B2 (en) 1998-05-26 2002-08-20 Cabot Microelectronics Corporation CMP polishing pad including a solid catalyst
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CN1626567A (zh) * 1999-08-17 2005-06-15 日立化成工业株式会社 化学机械研磨用研磨剂及基板的研磨法
TW501197B (en) * 1999-08-17 2002-09-01 Hitachi Chemical Co Ltd Polishing compound for chemical mechanical polishing and method for polishing substrate
JP4264781B2 (ja) 1999-09-20 2009-05-20 株式会社フジミインコーポレーテッド 研磨用組成物および研磨方法
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Also Published As

Publication number Publication date
WO2007111855A2 (en) 2007-10-04
EP1996664A2 (en) 2008-12-03
MY145564A (en) 2012-02-29
JP2009530853A (ja) 2009-08-27
TW200804548A (en) 2008-01-16
CN101389724B (zh) 2012-05-23
US20070224822A1 (en) 2007-09-27
TWI343406B (en) 2011-06-11
EP1996664B1 (en) 2012-12-05
KR20080108562A (ko) 2008-12-15
KR101364318B1 (ko) 2014-02-18
US7820067B2 (en) 2010-10-26
CN101389724A (zh) 2009-03-18
WO2007111855A3 (en) 2007-11-15
IL192550A0 (en) 2009-02-11

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