JP5310257B2 - 窒化物結晶製造方法 - Google Patents
窒化物結晶製造方法 Download PDFInfo
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- JP5310257B2 JP5310257B2 JP2009122888A JP2009122888A JP5310257B2 JP 5310257 B2 JP5310257 B2 JP 5310257B2 JP 2009122888 A JP2009122888 A JP 2009122888A JP 2009122888 A JP2009122888 A JP 2009122888A JP 5310257 B2 JP5310257 B2 JP 5310257B2
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- Prior art keywords
- crucible
- seed substrate
- carbon
- crystal
- nitride crystal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000013078 crystal Substances 0.000 title claims description 64
- 150000004767 nitrides Chemical class 0.000 title claims description 13
- 238000004519 manufacturing process Methods 0.000 title claims description 8
- 239000000758 substrate Substances 0.000 claims description 48
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 45
- 229910052799 carbon Inorganic materials 0.000 claims description 45
- 229910052751 metal Inorganic materials 0.000 claims description 3
- 239000002184 metal Substances 0.000 claims description 3
- 229910052783 alkali metal Inorganic materials 0.000 claims 1
- 150000001340 alkali metals Chemical class 0.000 claims 1
- 238000007716 flux method Methods 0.000 claims 1
- 239000002245 particle Substances 0.000 description 20
- 239000007789 gas Substances 0.000 description 11
- 229910002601 GaN Inorganic materials 0.000 description 9
- 230000004907 flux Effects 0.000 description 9
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 8
- 239000011734 sodium Substances 0.000 description 8
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 6
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 6
- 229910052733 gallium Inorganic materials 0.000 description 6
- 229910052708 sodium Inorganic materials 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 5
- 230000006866 deterioration Effects 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- 239000002994 raw material Substances 0.000 description 4
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 239000011810 insulating material Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000002109 crystal growth method Methods 0.000 description 1
- 238000007872 degassing Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
Images
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
Description
2 坩堝
3a ガリウム
3b ナトリウム
4 結晶成長容器
5 育成炉
6 断熱材
7 ヒーター
8 熱電対
9 駆動部
10 原料ガスボンベ
11 原料ガス供給部
12 接続配管
13 圧力調整器
14 ストップバルブ
15 リーク弁
16 切り離し部分
17 凹部
18 炭素粒
19 凹部
20 凸部
21 網状壁
22 種基板台
22a 保持台
22b 脚部
23 容器
Claims (2)
- 坩堝内で、アルカリ金属とIII族金属とを用いてフラックス法によりIII族窒化物結晶を製造する窒化物結晶製造方法であって、
前記坩堝内に種基板を配置すると共に、前記坩堝内に設けられた収納部内に前記種基板と非接触状態となるように炭素を配置し、その後、前記種基板上にIII族窒化物結晶を育成させる窒化物結晶製造方法。 - 前記収納部は、前記種基板の外周より外側に設けられていることを特徴とする請求項1に記載の窒化物結晶製造方法。
Priority Applications (1)
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JP2009122888A JP5310257B2 (ja) | 2009-05-21 | 2009-05-21 | 窒化物結晶製造方法 |
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JP2009122888A JP5310257B2 (ja) | 2009-05-21 | 2009-05-21 | 窒化物結晶製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2010269968A JP2010269968A (ja) | 2010-12-02 |
JP5310257B2 true JP5310257B2 (ja) | 2013-10-09 |
Family
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JP2009122888A Active JP5310257B2 (ja) | 2009-05-21 | 2009-05-21 | 窒化物結晶製造方法 |
Country Status (1)
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JP (1) | JP5310257B2 (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6679024B2 (ja) | 2016-06-16 | 2020-04-15 | パナソニック株式会社 | 結晶成長装置及び結晶製造方法 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4152182A (en) * | 1978-05-15 | 1979-05-01 | International Business Machines Corporation | Process for producing electronic grade aluminum nitride films utilizing the reduction of aluminum oxide |
JPH11209199A (ja) * | 1998-01-26 | 1999-08-03 | Sumitomo Electric Ind Ltd | GaN単結晶の合成方法 |
JP4192966B2 (ja) * | 2006-06-08 | 2008-12-10 | 住友電気工業株式会社 | 窒化ガリウムの結晶成長方法 |
JP4534631B2 (ja) * | 2003-10-31 | 2010-09-01 | 住友電気工業株式会社 | Iii族窒化物結晶の製造方法 |
JP2006089811A (ja) * | 2004-09-24 | 2006-04-06 | Hokkaido Univ | 気相結晶作成装置 |
US8187507B2 (en) * | 2006-11-14 | 2012-05-29 | Osaka University | GaN crystal producing method, GaN crystal, GaN crystal substrate, semiconductor device and GaN crystal producing apparatus |
JP4830901B2 (ja) * | 2007-02-22 | 2011-12-07 | 住友電気工業株式会社 | Iii族窒化物結晶の成長方法およびiii族窒化物結晶 |
JP5338672B2 (ja) * | 2007-09-28 | 2013-11-13 | 株式会社リコー | Iii族元素窒化物の単結晶の製造方法および製造装置 |
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2009
- 2009-05-21 JP JP2009122888A patent/JP5310257B2/ja active Active
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