JP5304749B2 - 真空分析装置 - Google Patents

真空分析装置 Download PDF

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Publication number
JP5304749B2
JP5304749B2 JP2010175904A JP2010175904A JP5304749B2 JP 5304749 B2 JP5304749 B2 JP 5304749B2 JP 2010175904 A JP2010175904 A JP 2010175904A JP 2010175904 A JP2010175904 A JP 2010175904A JP 5304749 B2 JP5304749 B2 JP 5304749B2
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Japan
Prior art keywords
gas
flow path
flow rate
vacuum
resistance tube
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JP2010175904A
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English (en)
Japanese (ja)
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JP2012038483A5 (enExample
JP2012038483A (ja
Inventor
智仁 中野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shimadzu Corp
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Shimadzu Corp
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Publication date
Application filed by Shimadzu Corp filed Critical Shimadzu Corp
Priority to JP2010175904A priority Critical patent/JP5304749B2/ja
Priority to PCT/JP2011/066299 priority patent/WO2012017812A2/ja
Priority to US13/813,875 priority patent/US9214327B2/en
Publication of JP2012038483A publication Critical patent/JP2012038483A/ja
Publication of JP2012038483A5 publication Critical patent/JP2012038483A5/ja
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Publication of JP5304749B2 publication Critical patent/JP5304749B2/ja
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/02—Details
    • H01J49/24—Vacuum systems, e.g. maintaining desired pressures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/004—Combinations of spectrometers, tandem spectrometers, e.g. MS/MS, MSn
    • H01J49/0045—Combinations of spectrometers, tandem spectrometers, e.g. MS/MS, MSn characterised by the fragmentation or other specific reaction
    • H01J49/005—Combinations of spectrometers, tandem spectrometers, e.g. MS/MS, MSn characterised by the fragmentation or other specific reaction by collision with gas, e.g. by introducing gas or by accelerating ions with an electric field

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
  • Electron Tubes For Measurement (AREA)
  • Sampling And Sample Adjustment (AREA)
JP2010175904A 2010-08-05 2010-08-05 真空分析装置 Active JP5304749B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2010175904A JP5304749B2 (ja) 2010-08-05 2010-08-05 真空分析装置
PCT/JP2011/066299 WO2012017812A2 (ja) 2010-08-05 2011-07-19 真空分析装置
US13/813,875 US9214327B2 (en) 2010-08-05 2011-07-19 Vacuum analyzer utilizing resistance tubes to control the flow rate through a vacuum reaction chamber

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2010175904A JP5304749B2 (ja) 2010-08-05 2010-08-05 真空分析装置

Publications (3)

Publication Number Publication Date
JP2012038483A JP2012038483A (ja) 2012-02-23
JP2012038483A5 JP2012038483A5 (enExample) 2013-01-10
JP5304749B2 true JP5304749B2 (ja) 2013-10-02

Family

ID=45559887

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010175904A Active JP5304749B2 (ja) 2010-08-05 2010-08-05 真空分析装置

Country Status (3)

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US (1) US9214327B2 (enExample)
JP (1) JP5304749B2 (enExample)
WO (1) WO2012017812A2 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102983054B (zh) * 2012-11-05 2015-09-02 聚光科技(杭州)股份有限公司 应用在质谱仪中的减压装置及方法
CN104781906B (zh) * 2012-12-20 2017-10-03 Dh科技发展私人贸易有限公司 解析ms3实验期间的事件
JP6180828B2 (ja) * 2013-07-05 2017-08-16 株式会社日立ハイテクノロジーズ 質量分析装置及び質量分析装置の制御方法
GB2540365B (en) * 2015-07-14 2019-12-11 Thermo Fisher Scient Bremen Gmbh Control of gas flow
GB2557670B (en) * 2016-12-15 2020-04-15 Thermo Fisher Scient Bremen Gmbh Improved gas flow control

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000019165A (ja) * 1998-06-30 2000-01-21 Shimadzu Corp ガスクロマトグラフ装置
JP3876554B2 (ja) * 1998-11-25 2007-01-31 株式会社日立製作所 化学物質のモニタ方法及びモニタ装置並びにそれを用いた燃焼炉
US6833028B1 (en) * 2001-02-09 2004-12-21 The Scatter Works Inc. Particle deposition system with enhanced speed and diameter accuracy
US20020189947A1 (en) * 2001-06-13 2002-12-19 Eksigent Technologies Llp Electroosmotic flow controller
MY134338A (en) * 2001-08-24 2007-12-31 Asml Us Inc Atmospheric pressure wafer processing reactor having an internal pressure control system and method
JP4162138B2 (ja) * 2003-10-27 2008-10-08 株式会社リガク 昇温脱離ガス分析装置
US20050108996A1 (en) * 2003-11-26 2005-05-26 Latham Steven R. Filter system for an electronic equipment enclosure
US7140847B2 (en) * 2004-08-11 2006-11-28 The Boc Group, Inc. Integrated high vacuum pumping system
JP2006266854A (ja) * 2005-03-23 2006-10-05 Shinku Jikkenshitsu:Kk 全圧測定電極付き四重極質量分析計及びこれを用いる真空装置
JP5003508B2 (ja) 2008-01-24 2012-08-15 株式会社島津製作所 質量分析システム
JP5226438B2 (ja) * 2008-09-10 2013-07-03 株式会社日立国際電気 基板処理装置、半導体装置の製造方法及び基板処理方法

Also Published As

Publication number Publication date
WO2012017812A2 (ja) 2012-02-09
US9214327B2 (en) 2015-12-15
WO2012017812A3 (ja) 2012-03-29
JP2012038483A (ja) 2012-02-23
US20130134306A1 (en) 2013-05-30

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